JPS6419740A - Substrate holding jig for wet processor - Google Patents

Substrate holding jig for wet processor

Info

Publication number
JPS6419740A
JPS6419740A JP17460987A JP17460987A JPS6419740A JP S6419740 A JPS6419740 A JP S6419740A JP 17460987 A JP17460987 A JP 17460987A JP 17460987 A JP17460987 A JP 17460987A JP S6419740 A JPS6419740 A JP S6419740A
Authority
JP
Japan
Prior art keywords
substrate
substrate sub
processed
make
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17460987A
Other languages
Japanese (ja)
Other versions
JP2591753B2 (en
Inventor
Masateru Wakui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP17460987A priority Critical patent/JP2591753B2/en
Publication of JPS6419740A publication Critical patent/JPS6419740A/en
Application granted granted Critical
Publication of JP2591753B2 publication Critical patent/JP2591753B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To avoid the uneven wet processing while effectively draining the processing liquid by a method wherein a substrate to be subjected to single wafer processing is held to make the surface to be processed perpendicular while holding the substrate by two holding sides intersecting with each other at a specific angle. CONSTITUTION:The title wet processor is composed of a continuous automatized line system provided with a developing part, an etching part and a peeling off part. In this processor, a transparent glass substrate SUB (to be processed) is subjected to single wafer processing and held by a substrate holding jig 40 to make the surface (to be processed) of the substrate SUB perpendicular. Furthermore, the jig 40 is constituted so that respective holding sides 40A, 40B may make a specific angle to a horizontal plane to obliquely hold the transparent substrate SUB. Consequently, the liquid can be dripped actively from one point of the substrate SUB so that the wet processing liquid may be drained immediately.
JP17460987A 1987-07-15 1987-07-15 Substrate holding jig for wet processing equipment Expired - Fee Related JP2591753B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17460987A JP2591753B2 (en) 1987-07-15 1987-07-15 Substrate holding jig for wet processing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17460987A JP2591753B2 (en) 1987-07-15 1987-07-15 Substrate holding jig for wet processing equipment

Publications (2)

Publication Number Publication Date
JPS6419740A true JPS6419740A (en) 1989-01-23
JP2591753B2 JP2591753B2 (en) 1997-03-19

Family

ID=15981578

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17460987A Expired - Fee Related JP2591753B2 (en) 1987-07-15 1987-07-15 Substrate holding jig for wet processing equipment

Country Status (1)

Country Link
JP (1) JP2591753B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11202473A (en) * 1998-01-16 1999-07-30 Dainippon Printing Co Ltd Mask preparation device
JP2014009132A (en) * 2012-06-29 2014-01-20 Hoya Corp Glass substrate holder, and production method of glass substrate of cover glass for electronic apparatus
CN109913827A (en) * 2019-03-29 2019-06-21 太湖金张科技股份有限公司 A kind of sputtering process protective device and its application method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178436U (en) * 1981-05-06 1982-11-11

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178436U (en) * 1981-05-06 1982-11-11

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11202473A (en) * 1998-01-16 1999-07-30 Dainippon Printing Co Ltd Mask preparation device
JP2014009132A (en) * 2012-06-29 2014-01-20 Hoya Corp Glass substrate holder, and production method of glass substrate of cover glass for electronic apparatus
CN109913827A (en) * 2019-03-29 2019-06-21 太湖金张科技股份有限公司 A kind of sputtering process protective device and its application method

Also Published As

Publication number Publication date
JP2591753B2 (en) 1997-03-19

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees