JPS6418648A - Thick film thermal head - Google Patents
Thick film thermal headInfo
- Publication number
- JPS6418648A JPS6418648A JP17568787A JP17568787A JPS6418648A JP S6418648 A JPS6418648 A JP S6418648A JP 17568787 A JP17568787 A JP 17568787A JP 17568787 A JP17568787 A JP 17568787A JP S6418648 A JPS6418648 A JP S6418648A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- heating resistor
- smoothing
- resistant
- wear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
Landscapes
- Electronic Switches (AREA)
Abstract
PURPOSE:To prevent the damage of a recording paper and to enhance contact properties with paper, by a method wherein a heating resistor layer is disposed on a substrate, and a smoothing layer is provided between the heating resistor layer and an upper wear-resistant layer. CONSTITUTION:A glaze layer 2 is formed on an insulating substrate 1, comb- type electrodes 3 are formed, and a heating resistor layer 4 is formed using a resistant base etc. Thereafter, a smoothing layer 5 is formed on the heating resistor layer 4 by a method in which a material for the smoothing layer 5, such as an SiO2-based coating agent, a TiO2-based coating agent, or a silanol solution, is applied thereon by dipping, spin-coating, or the like and sintered at a high temperature. In this manner, the smoothing layer 5 can be controlled to have a film thickness of 1-2mum with an enhanced smoothness. Thereafter, a wear-resistant layer 6 made of a glass etc., is formed on the aforesaid smoothing layer 5. In this manner, the irregularities existing on the surface of the heating resistor layer 4 is absorbed by the smoothing layer 5; thus, the smoothness on the wear-resistant layer 6 is improved.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17568787A JPS6418648A (en) | 1987-07-14 | 1987-07-14 | Thick film thermal head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17568787A JPS6418648A (en) | 1987-07-14 | 1987-07-14 | Thick film thermal head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6418648A true JPS6418648A (en) | 1989-01-23 |
Family
ID=16000483
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17568787A Pending JPS6418648A (en) | 1987-07-14 | 1987-07-14 | Thick film thermal head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6418648A (en) |
-
1987
- 1987-07-14 JP JP17568787A patent/JPS6418648A/en active Pending
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