JPS6418141A - Pattern forming material - Google Patents

Pattern forming material

Info

Publication number
JPS6418141A
JPS6418141A JP62173859A JP17385987A JPS6418141A JP S6418141 A JPS6418141 A JP S6418141A JP 62173859 A JP62173859 A JP 62173859A JP 17385987 A JP17385987 A JP 17385987A JP S6418141 A JPS6418141 A JP S6418141A
Authority
JP
Japan
Prior art keywords
surfactant
resin
silicone resin
ladder structure
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62173859A
Other languages
English (en)
Other versions
JP2541566B2 (ja
Inventor
Keiji Watabe
Kazumasa Saito
Shunichi Fukuyama
Shoji Shiba
Yoko Kawasaki
Yasuhiro Yoneda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP62173859A priority Critical patent/JP2541566B2/ja
Publication of JPS6418141A publication Critical patent/JPS6418141A/ja
Application granted granted Critical
Publication of JP2541566B2 publication Critical patent/JP2541566B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
JP62173859A 1987-07-14 1987-07-14 パタ−ン形成材料 Expired - Fee Related JP2541566B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62173859A JP2541566B2 (ja) 1987-07-14 1987-07-14 パタ−ン形成材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62173859A JP2541566B2 (ja) 1987-07-14 1987-07-14 パタ−ン形成材料

Publications (2)

Publication Number Publication Date
JPS6418141A true JPS6418141A (en) 1989-01-20
JP2541566B2 JP2541566B2 (ja) 1996-10-09

Family

ID=15968467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62173859A Expired - Fee Related JP2541566B2 (ja) 1987-07-14 1987-07-14 パタ−ン形成材料

Country Status (1)

Country Link
JP (1) JP2541566B2 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04107462A (ja) * 1990-08-28 1992-04-08 Oki Electric Ind Co Ltd 感光性樹脂組成物
JPH06179949A (ja) * 1992-12-11 1994-06-28 Nippon Steel Corp 耐食性および加工性の優れた鋼
JP2008256966A (ja) * 2007-04-05 2008-10-23 Nissan Chem Ind Ltd 電子線硬化のケイ素含有レジスト下層膜を形成するためのケイ素含有レジスト下層膜形成組成物

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10066123B2 (en) 2013-12-09 2018-09-04 3M Innovative Properties Company Curable silsesquioxane polymers, compositions, articles, and methods
US10370564B2 (en) 2014-06-20 2019-08-06 3M Innovative Properties Company Adhesive compositions comprising a silsesquioxane polymer crosslinker, articles and methods
EP3157986A1 (en) 2014-06-20 2017-04-26 3M Innovative Properties Company Curable polymers comprising silsesquioxane polymer core and silsesquioxane polymer outer layer and methods
US10392538B2 (en) 2014-06-20 2019-08-27 3M Innovative Properties Company Adhesive compositions comprising a silsesquioxane polymer crosslinker, articles and methods
US9957416B2 (en) 2014-09-22 2018-05-01 3M Innovative Properties Company Curable end-capped silsesquioxane polymer comprising reactive groups
JP2017528577A (ja) 2014-09-22 2017-09-28 スリーエム イノベイティブ プロパティズ カンパニー シルセスキオキサンポリマーコア、シルセスキオキサンポリマー外層、及び反応性基を含む硬化性ポリマー

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5849717A (ja) * 1981-09-18 1983-03-24 Hitachi Ltd 光又は放射線硬化性ポリオルガノシロキサン組成物
JPS6275440A (ja) * 1985-09-30 1987-04-07 Toshiba Corp 感光性組成物

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5849717A (ja) * 1981-09-18 1983-03-24 Hitachi Ltd 光又は放射線硬化性ポリオルガノシロキサン組成物
JPS6275440A (ja) * 1985-09-30 1987-04-07 Toshiba Corp 感光性組成物

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04107462A (ja) * 1990-08-28 1992-04-08 Oki Electric Ind Co Ltd 感光性樹脂組成物
JPH06179949A (ja) * 1992-12-11 1994-06-28 Nippon Steel Corp 耐食性および加工性の優れた鋼
JP2008256966A (ja) * 2007-04-05 2008-10-23 Nissan Chem Ind Ltd 電子線硬化のケイ素含有レジスト下層膜を形成するためのケイ素含有レジスト下層膜形成組成物

Also Published As

Publication number Publication date
JP2541566B2 (ja) 1996-10-09

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees