JPS6415994A - Manufacture of transparent electrode - Google Patents
Manufacture of transparent electrodeInfo
- Publication number
- JPS6415994A JPS6415994A JP17247387A JP17247387A JPS6415994A JP S6415994 A JPS6415994 A JP S6415994A JP 17247387 A JP17247387 A JP 17247387A JP 17247387 A JP17247387 A JP 17247387A JP S6415994 A JPS6415994 A JP S6415994A
- Authority
- JP
- Japan
- Prior art keywords
- conductive film
- transparent conductive
- transparent electrode
- substrate
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/07—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process being removed electrolytically
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
PURPOSE:To obtain easily an electrode having an arbitrary circuit pattern, by performing etching while a voltage is applied using a transparent conductive film as an anode, after the transparent electrode whose main component is indium oxide is formed on a substrate. CONSTITUTION:A transparent conductive film is formed on a glass substrate by high frequency sputtering method applying a material wherein indium oxide and aluminum fluoride are mixed with a weight ratio of 95:5 and sintered. This is annealed in a vacuum. After a photoresist is spread thereon, baking is performed. After exposed with a high pressure mercury lamp, the substrate is dipped in a developing solution, and further baked to form a line-type resist pattern, which is etched by applying sulfuric acid to an etching solution. In this process, a voltage of 5V is applied by using the transparent conductive film and a platinum plate as an anode and a cathode, respectively. Thereby, the pattern of transparent electrode which coincides completely with the resist pattern is formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17247387A JPS6415994A (en) | 1987-07-09 | 1987-07-09 | Manufacture of transparent electrode |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17247387A JPS6415994A (en) | 1987-07-09 | 1987-07-09 | Manufacture of transparent electrode |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6415994A true JPS6415994A (en) | 1989-01-19 |
Family
ID=15942639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17247387A Pending JPS6415994A (en) | 1987-07-09 | 1987-07-09 | Manufacture of transparent electrode |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6415994A (en) |
-
1987
- 1987-07-09 JP JP17247387A patent/JPS6415994A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5548935A (en) | Forming of electrode pattern | |
| JPS56160740A (en) | Manufacture of thin-film field type cold cathode | |
| JPS6415994A (en) | Manufacture of transparent electrode | |
| JPS54148484A (en) | Manufacture of semiconductor wafer test device | |
| JPS6427229A (en) | Etching method for semiconductor substrate | |
| JPS5568636A (en) | Anodic oxidation method of compound semiconductor by plasma | |
| US3471291A (en) | Protective plating of oxide-free silicon surfaces | |
| JPS57147847A (en) | Gas discharge display panel | |
| SU609144A1 (en) | Method of manufacturing cathode-grid unit with autoelectronic cathode | |
| JPS61220240A (en) | Formation of electrode | |
| EP0393979A3 (en) | Method for manufacturing edge end emission type electroluminescent device arrays | |
| JPH08273535A (en) | Method for forming electrode in gas-discharge display panel | |
| JPH08167373A (en) | Electrode forming method in gas discharge display panel | |
| SU544713A1 (en) | Device for etching metal films | |
| KR950006104B1 (en) | Mehtod of forming electrode of discharge display device | |
| JPS5586038A (en) | Method for patterning electrode of gas-discharge display panel | |
| JPH03174796A (en) | Method for forming highly accurate thin film circuit | |
| JPS63304520A (en) | Manufacture of transparent electrode | |
| JPS563945A (en) | Fluorescent display tube | |
| JPS55140259A (en) | Manufacturing hybrid integrated circuit | |
| JPS5667154A (en) | Flat plate type display unit | |
| JPS6456900A (en) | Metal mask and production thereof | |
| JPS5613733A (en) | Forming method for electrode | |
| JPS5763912A (en) | Electrode forming method | |
| JPS57114231A (en) | Plasma etching device |