JPS6413730A - Lift-off flatting method - Google Patents
Lift-off flatting methodInfo
- Publication number
- JPS6413730A JPS6413730A JP16878787A JP16878787A JPS6413730A JP S6413730 A JPS6413730 A JP S6413730A JP 16878787 A JP16878787 A JP 16878787A JP 16878787 A JP16878787 A JP 16878787A JP S6413730 A JPS6413730 A JP S6413730A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- dissolved
- sample
- photoresist
- positive type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 6
- 239000010409 thin film Substances 0.000 abstract 6
- 229920002120 photoresistant polymer Polymers 0.000 abstract 5
- 235000012239 silicon dioxide Nutrition 0.000 abstract 3
- 239000000377 silicon dioxide Substances 0.000 abstract 3
- 239000000758 substrate Substances 0.000 abstract 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 abstract 2
- 229910001873 dinitrogen Inorganic materials 0.000 abstract 2
- 239000010408 film Substances 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 2
- 229910052758 niobium Inorganic materials 0.000 abstract 2
- 239000010955 niobium Substances 0.000 abstract 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 238000009877 rendering Methods 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 238000004544 sputter deposition Methods 0.000 abstract 1
Landscapes
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16878787A JPS6413730A (en) | 1987-07-08 | 1987-07-08 | Lift-off flatting method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16878787A JPS6413730A (en) | 1987-07-08 | 1987-07-08 | Lift-off flatting method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6413730A true JPS6413730A (en) | 1989-01-18 |
| JPH0319696B2 JPH0319696B2 (enrdf_load_stackoverflow) | 1991-03-15 |
Family
ID=15874462
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16878787A Granted JPS6413730A (en) | 1987-07-08 | 1987-07-08 | Lift-off flatting method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6413730A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5705432A (en) * | 1995-12-01 | 1998-01-06 | Hughes Aircraft Company | Process for providing clean lift-off of sputtered thin film layers |
| WO2003032092A1 (en) * | 2001-10-05 | 2003-04-17 | The Regents Of The University Of Michigan | Planarizing recess etch |
| WO2007148538A1 (ja) * | 2006-06-21 | 2007-12-27 | Idemitsu Kosan Co., Ltd. | ストリッピング組成物、ｔｆｔ基板の製造方法及びストリッピング組成物のリサイクル方法 |
-
1987
- 1987-07-08 JP JP16878787A patent/JPS6413730A/ja active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5705432A (en) * | 1995-12-01 | 1998-01-06 | Hughes Aircraft Company | Process for providing clean lift-off of sputtered thin film layers |
| WO2003032092A1 (en) * | 2001-10-05 | 2003-04-17 | The Regents Of The University Of Michigan | Planarizing recess etch |
| WO2007148538A1 (ja) * | 2006-06-21 | 2007-12-27 | Idemitsu Kosan Co., Ltd. | ストリッピング組成物、ｔｆｔ基板の製造方法及びストリッピング組成物のリサイクル方法 |
| JP5143731B2 (ja) * | 2006-06-21 | 2013-02-13 | 出光興産株式会社 | ストリッピング組成物、ｔｆｔ基板の製造方法及びストリッピング組成物のリサイクル方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0319696B2 (enrdf_load_stackoverflow) | 1991-03-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |