JPS641228A - Jig for heat treating wafer - Google Patents

Jig for heat treating wafer

Info

Publication number
JPS641228A
JPS641228A JP15633987A JP15633987A JPS641228A JP S641228 A JPS641228 A JP S641228A JP 15633987 A JP15633987 A JP 15633987A JP 15633987 A JP15633987 A JP 15633987A JP S641228 A JPS641228 A JP S641228A
Authority
JP
Japan
Prior art keywords
circumference
columns
jig
pins
supporting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15633987A
Other languages
Japanese (ja)
Other versions
JPH011228A (en
JP2593660B2 (en
Inventor
Kazuhiro Morishima
Yuichi Sakai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coorstek KK
Original Assignee
Toshiba Ceramics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Ceramics Co Ltd filed Critical Toshiba Ceramics Co Ltd
Priority to JP62156339A priority Critical patent/JP2593660B2/en
Publication of JPS641228A publication Critical patent/JPS641228A/en
Publication of JPH011228A publication Critical patent/JPH011228A/en
Application granted granted Critical
Publication of JP2593660B2 publication Critical patent/JP2593660B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE: To reduce flying amount of dust from an atmosphere by disposing a protecting cylinder member on the periphery of a semiconductor wafer placed on a jig body.
CONSTITUTION: A jig body 20 has a plurality of supporting columns 22 inserted at the center of a lower platelike body 21 along its circumference, an upper platelike body 23 arranged on the upper ends of the columns 22, and a plurality of positioning pins 24 protruded on the same circumference outside the inserting positions of the columns 22. Supporting grooves 23a for supporting a wafer are opened at the same height positions. The diameter of the circumference for placing the pins 24 is formed larger than that of the body 23. A protecting cylinder member 30 is formed at its lower and upper ends with lower and upper openings 31, 33. The diameter of the opening 31 is slightly larger than that of the circumference for placing the pins 24. At least one vent hole 32 is formed at the periphery of the lower opening.
COPYRIGHT: (C)1989,JPO&Japio
JP62156339A 1987-06-23 1987-06-23 Jig for wafer heat treatment Expired - Fee Related JP2593660B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62156339A JP2593660B2 (en) 1987-06-23 1987-06-23 Jig for wafer heat treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62156339A JP2593660B2 (en) 1987-06-23 1987-06-23 Jig for wafer heat treatment

Publications (3)

Publication Number Publication Date
JPS641228A true JPS641228A (en) 1989-01-05
JPH011228A JPH011228A (en) 1989-01-05
JP2593660B2 JP2593660B2 (en) 1997-03-26

Family

ID=15625607

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62156339A Expired - Fee Related JP2593660B2 (en) 1987-06-23 1987-06-23 Jig for wafer heat treatment

Country Status (1)

Country Link
JP (1) JP2593660B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04163913A (en) * 1990-10-29 1992-06-09 Nec Corp Vertical type heat treat furnace
JPH054463U (en) * 1991-07-01 1993-01-22 古河電気工業株式会社 Vapor phase growth equipment
WO2009138637A1 (en) * 2008-04-24 2009-11-19 Alcatel Lucent Station and method for measuring the contamination of an enclosure used for transporting semiconductor substrates

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62140413A (en) * 1985-12-16 1987-06-24 Nec Corp Vertical type diffusion equipment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62140413A (en) * 1985-12-16 1987-06-24 Nec Corp Vertical type diffusion equipment

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04163913A (en) * 1990-10-29 1992-06-09 Nec Corp Vertical type heat treat furnace
JPH054463U (en) * 1991-07-01 1993-01-22 古河電気工業株式会社 Vapor phase growth equipment
WO2009138637A1 (en) * 2008-04-24 2009-11-19 Alcatel Lucent Station and method for measuring the contamination of an enclosure used for transporting semiconductor substrates

Also Published As

Publication number Publication date
JP2593660B2 (en) 1997-03-26

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees