JPS6411088A - Laser beam marker and marking method - Google Patents

Laser beam marker and marking method

Info

Publication number
JPS6411088A
JPS6411088A JP63021996A JP2199688A JPS6411088A JP S6411088 A JPS6411088 A JP S6411088A JP 63021996 A JP63021996 A JP 63021996A JP 2199688 A JP2199688 A JP 2199688A JP S6411088 A JPS6411088 A JP S6411088A
Authority
JP
Japan
Prior art keywords
liquid crystal
impressed
closed
working time
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP63021996A
Other languages
Japanese (ja)
Other versions
JP2602266B2 (en
Inventor
Koji Kuwabara
Makoto Yano
Takao Umeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63021996A priority Critical patent/JP2602266B2/en
Publication of JPS6411088A publication Critical patent/JPS6411088A/en
Application granted granted Critical
Publication of JP2602266B2 publication Critical patent/JP2602266B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67282—Marking devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44B—MACHINES, APPARATUS OR TOOLS FOR ARTISTIC WORK, e.g. FOR SCULPTURING, GUILLOCHING, CARVING, BRANDING, INLAYING
    • B44B7/00—Machines, apparatus or hand tools for branding, e.g. using radiant energy such as laser beams
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1313—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells specially adapted for a particular application
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
    • H01S3/1065—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using liquid crystals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/007—Marks, e.g. trade marks

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Liquid Crystal (AREA)
  • Electromagnetism (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Laser Beam Processing (AREA)

Abstract

PURPOSE:To make sharp marks on an electronic parts by delaying the working time of a laser switch to the working time of a power source of a liquid crystal element by a timer and projecting polarized light at a perfect working time of liquid crystal element. CONSTITUTION:An input signal is inputted from a final control element 21A to close an operating input contact. A 1st timer 24 is late but the liquid crystal power source switch 25 is closed because an exciting coil 23 is excited, an auxiliary contact is closed and a 1st exciting coil on the liquid crystal side is excited. When an impressed voltage is impressed to liquid elements 13 and the liquid element 13 is in a working time, liquid crystal molecules become active. The 1st timer 24 is operated, an auxiliary contact is closed, a 2nd exciting coil on the side of a laser beam machine is excited, a switch 26 is closed and pulse voltage from a pulse power source part 27 is impressed to a laser beam oscillator 11. P polarized light 12A produced at the oscillator 11 projects the liquid element 13 for a prescribed time. In this manner, the laser passing through the liquid crystal part where an voltage is impressed is taken out in straight polarization, sharp marks can be marked on an electronic part 17.
JP63021996A 1987-03-02 1988-02-03 Laser marker and laser oscillator using the same Expired - Fee Related JP2602266B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63021996A JP2602266B2 (en) 1987-03-02 1988-02-03 Laser marker and laser oscillator using the same

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP4525187 1987-03-02
JP62-45251 1987-03-02
JP63021996A JP2602266B2 (en) 1987-03-02 1988-02-03 Laser marker and laser oscillator using the same

Publications (2)

Publication Number Publication Date
JPS6411088A true JPS6411088A (en) 1989-01-13
JP2602266B2 JP2602266B2 (en) 1997-04-23

Family

ID=26359156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63021996A Expired - Fee Related JP2602266B2 (en) 1987-03-02 1988-02-03 Laser marker and laser oscillator using the same

Country Status (1)

Country Link
JP (1) JP2602266B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5231263A (en) * 1990-03-09 1993-07-27 Hitachi, Ltd. Liquid crystal mask type laser marking system
US5331446A (en) * 1992-06-10 1994-07-19 Ag Technology Co., Ltd. Liquid crystal optical element and a laser projection apparatus using polymer dispersed liquid crystal
WO1994026457A1 (en) * 1993-05-07 1994-11-24 Kabushiki Kaisha Komatsu Seisakusho Laser liquid crystal marker and method for judging deterioration of liquid crystal
WO1995009067A1 (en) * 1993-09-30 1995-04-06 Komatsu Ltd. Transmission type liquid crystal mask marker
JPH07103821A (en) * 1993-09-30 1995-04-21 Komatsu Ltd Optical sensor for yag laser marker
US5734145A (en) * 1994-02-08 1998-03-31 Komatsu Ltd. Laser marking method using laser heated liquid crystal mask
JP2007059948A (en) * 2006-11-27 2007-03-08 Oki Electric Ind Co Ltd Semiconductor chip, method for manufacturing semiconductor chip, lead frame, method for manufacturing lead frame, semiconductor device, and method for manufacturing semiconductor device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014171245A1 (en) * 2013-04-17 2014-10-23 村田機械株式会社 Laser processor and laser processing method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5075738A (en) * 1973-11-07 1975-06-21
JPS5638888A (en) * 1979-09-07 1981-04-14 Hitachi Ltd Pattern forming method
JPS61108488A (en) * 1984-10-31 1986-05-27 Nec Corp Laser beam machine
JPS6224884A (en) * 1985-07-23 1987-02-02 Nec Corp Laser beam machine

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5075738A (en) * 1973-11-07 1975-06-21
JPS5638888A (en) * 1979-09-07 1981-04-14 Hitachi Ltd Pattern forming method
JPS61108488A (en) * 1984-10-31 1986-05-27 Nec Corp Laser beam machine
JPS6224884A (en) * 1985-07-23 1987-02-02 Nec Corp Laser beam machine

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5231263A (en) * 1990-03-09 1993-07-27 Hitachi, Ltd. Liquid crystal mask type laser marking system
US5331446A (en) * 1992-06-10 1994-07-19 Ag Technology Co., Ltd. Liquid crystal optical element and a laser projection apparatus using polymer dispersed liquid crystal
WO1994026457A1 (en) * 1993-05-07 1994-11-24 Kabushiki Kaisha Komatsu Seisakusho Laser liquid crystal marker and method for judging deterioration of liquid crystal
US5896163A (en) * 1993-05-07 1999-04-20 Kabushiki Kaisha Komatsu Seisakusho Laser liquid crystal marker and method for judging deterioration of liquid crystal
WO1995009067A1 (en) * 1993-09-30 1995-04-06 Komatsu Ltd. Transmission type liquid crystal mask marker
JPH07103821A (en) * 1993-09-30 1995-04-21 Komatsu Ltd Optical sensor for yag laser marker
US5663826A (en) * 1993-09-30 1997-09-02 Komatsu Ltd. Transmission type liquid crystal mask marker
US5734145A (en) * 1994-02-08 1998-03-31 Komatsu Ltd. Laser marking method using laser heated liquid crystal mask
JP2007059948A (en) * 2006-11-27 2007-03-08 Oki Electric Ind Co Ltd Semiconductor chip, method for manufacturing semiconductor chip, lead frame, method for manufacturing lead frame, semiconductor device, and method for manufacturing semiconductor device

Also Published As

Publication number Publication date
JP2602266B2 (en) 1997-04-23

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees