JPS6410559A - Sample image pattern measuring device - Google Patents

Sample image pattern measuring device

Info

Publication number
JPS6410559A
JPS6410559A JP62166013A JP16601387A JPS6410559A JP S6410559 A JPS6410559 A JP S6410559A JP 62166013 A JP62166013 A JP 62166013A JP 16601387 A JP16601387 A JP 16601387A JP S6410559 A JPS6410559 A JP S6410559A
Authority
JP
Japan
Prior art keywords
control circuit
measuring
image
central control
magnification
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62166013A
Other languages
Japanese (ja)
Inventor
Katsuya Miyoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62166013A priority Critical patent/JPS6410559A/en
Publication of JPS6410559A publication Critical patent/JPS6410559A/en
Pending legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Tests Of Electronic Circuits (AREA)

Abstract

PURPOSE:To improve the efficiency of the device with receiving no influence of an error in the XY stage and the like by memorizing near the measuring point in a low magnification beforehand, and determining the pattern coordinates in the high magnification automatic measurement in the method matching to the memory. CONSTITUTION:By designating an operator input through an input device 17, a specific measuring operation is carried out through an electro-optical system control circuit 10 in a central control circuit 11. In the automatical measurement, at first the image for the matching near the measuring point is memorized to the central control circuit 11 manually in a low measuring magnification. Then, turning to the automatic mode, the high magnification for measurement, the measuring method, the XY coordinates, and the measuring position coordinates are memorized to the central control circuit 11. After that, the central control circuit 11 takes in the low magnification image, compares it with the matching image, and after the pattern is moved to the center of the image, the device is controlled to carry out the automatic measurement in a high magnification.
JP62166013A 1987-07-02 1987-07-02 Sample image pattern measuring device Pending JPS6410559A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62166013A JPS6410559A (en) 1987-07-02 1987-07-02 Sample image pattern measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62166013A JPS6410559A (en) 1987-07-02 1987-07-02 Sample image pattern measuring device

Publications (1)

Publication Number Publication Date
JPS6410559A true JPS6410559A (en) 1989-01-13

Family

ID=15823284

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62166013A Pending JPS6410559A (en) 1987-07-02 1987-07-02 Sample image pattern measuring device

Country Status (1)

Country Link
JP (1) JPS6410559A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02302610A (en) * 1989-05-17 1990-12-14 Jeol Ltd Length measuring method using electron beam
JP2006299516A (en) * 2005-04-15 2006-11-02 Ishikawajima Constr Mach Co Structure for supporting boom derricking cylinder of hydraulic excavator
CN103837105A (en) * 2012-11-23 2014-06-04 中芯国际集成电路制造(上海)有限公司 Critical size measuring method
US11226194B1 (en) 2020-06-25 2022-01-18 International Business Machines Corporation Apparatus and method for measuring distance between fiducial features, such as magnetic transducers, to an accuracy of within one nanometer

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5569880A (en) * 1978-11-22 1980-05-26 Nec Corp Pattern recognition unit
JPS59148254A (en) * 1983-02-10 1984-08-24 Jeol Ltd Sample shifting device of scanning electron microscope or the like
JPS60117385A (en) * 1983-11-30 1985-06-24 Fujitsu Ltd Pattern recognizing method and its pattern recognizing device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5569880A (en) * 1978-11-22 1980-05-26 Nec Corp Pattern recognition unit
JPS59148254A (en) * 1983-02-10 1984-08-24 Jeol Ltd Sample shifting device of scanning electron microscope or the like
JPS60117385A (en) * 1983-11-30 1985-06-24 Fujitsu Ltd Pattern recognizing method and its pattern recognizing device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02302610A (en) * 1989-05-17 1990-12-14 Jeol Ltd Length measuring method using electron beam
JP2006299516A (en) * 2005-04-15 2006-11-02 Ishikawajima Constr Mach Co Structure for supporting boom derricking cylinder of hydraulic excavator
CN103837105A (en) * 2012-11-23 2014-06-04 中芯国际集成电路制造(上海)有限公司 Critical size measuring method
US11226194B1 (en) 2020-06-25 2022-01-18 International Business Machines Corporation Apparatus and method for measuring distance between fiducial features, such as magnetic transducers, to an accuracy of within one nanometer

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