JPS639655B2 - - Google Patents

Info

Publication number
JPS639655B2
JPS639655B2 JP55046661A JP4666180A JPS639655B2 JP S639655 B2 JPS639655 B2 JP S639655B2 JP 55046661 A JP55046661 A JP 55046661A JP 4666180 A JP4666180 A JP 4666180A JP S639655 B2 JPS639655 B2 JP S639655B2
Authority
JP
Japan
Prior art keywords
exposure
pattern
electron beam
resist
ultraviolet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55046661A
Other languages
English (en)
Japanese (ja)
Other versions
JPS56142639A (en
Inventor
Yasuo Iida
Katsumi Mori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP4666180A priority Critical patent/JPS56142639A/ja
Publication of JPS56142639A publication Critical patent/JPS56142639A/ja
Publication of JPS639655B2 publication Critical patent/JPS639655B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/7045—Hybrid exposures, i.e. multiple exposures of the same area using different types of exposure apparatus, e.g. combining projection, proximity, direct write, interferometric, UV, x-ray or particle beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP4666180A 1980-04-09 1980-04-09 Photo-etching technique jointly using electron ray exposure and ultraviolet ray exposure Granted JPS56142639A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4666180A JPS56142639A (en) 1980-04-09 1980-04-09 Photo-etching technique jointly using electron ray exposure and ultraviolet ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4666180A JPS56142639A (en) 1980-04-09 1980-04-09 Photo-etching technique jointly using electron ray exposure and ultraviolet ray exposure

Publications (2)

Publication Number Publication Date
JPS56142639A JPS56142639A (en) 1981-11-07
JPS639655B2 true JPS639655B2 (fr) 1988-03-01

Family

ID=12753511

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4666180A Granted JPS56142639A (en) 1980-04-09 1980-04-09 Photo-etching technique jointly using electron ray exposure and ultraviolet ray exposure

Country Status (1)

Country Link
JP (1) JPS56142639A (fr)

Also Published As

Publication number Publication date
JPS56142639A (en) 1981-11-07

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