JPS6392021A - ポジ型ホトレジストパタ−ンの熱安定化方法 - Google Patents

ポジ型ホトレジストパタ−ンの熱安定化方法

Info

Publication number
JPS6392021A
JPS6392021A JP61237642A JP23764286A JPS6392021A JP S6392021 A JPS6392021 A JP S6392021A JP 61237642 A JP61237642 A JP 61237642A JP 23764286 A JP23764286 A JP 23764286A JP S6392021 A JPS6392021 A JP S6392021A
Authority
JP
Japan
Prior art keywords
resist pattern
ultraviolet rays
positive type
ultraviolet
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61237642A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0515300B2 (https=
Inventor
Mitsuaki Minato
湊　光朗
Isamu Hijikata
土方　勇
Akira Uehara
植原　晃
Muneo Nakayama
中山　宗雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP61237642A priority Critical patent/JPS6392021A/ja
Publication of JPS6392021A publication Critical patent/JPS6392021A/ja
Publication of JPH0515300B2 publication Critical patent/JPH0515300B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP61237642A 1986-10-06 1986-10-06 ポジ型ホトレジストパタ−ンの熱安定化方法 Granted JPS6392021A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61237642A JPS6392021A (ja) 1986-10-06 1986-10-06 ポジ型ホトレジストパタ−ンの熱安定化方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61237642A JPS6392021A (ja) 1986-10-06 1986-10-06 ポジ型ホトレジストパタ−ンの熱安定化方法

Publications (2)

Publication Number Publication Date
JPS6392021A true JPS6392021A (ja) 1988-04-22
JPH0515300B2 JPH0515300B2 (https=) 1993-03-01

Family

ID=17018349

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61237642A Granted JPS6392021A (ja) 1986-10-06 1986-10-06 ポジ型ホトレジストパタ−ンの熱安定化方法

Country Status (1)

Country Link
JP (1) JPS6392021A (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1991016724A1 (fr) * 1990-04-23 1991-10-31 Tadahiro Ohmi Dispositif de traitement de reserve, procede de traitement de reserve et structure de reserve
EP1441121A2 (en) 2003-01-27 2004-07-28 Denso Corporation Vapor-compression refrigerant cycle system with refrigeration cycle and rankine cycle
JP2004524694A (ja) * 2001-03-08 2004-08-12 モトローラ・インコーポレイテッド ウエハ上に半導体デバイスを形成するリソグラフィー法および機器
US7181919B2 (en) * 2004-03-31 2007-02-27 Denso Corporation System utilizing waste heat of internal combustion engine

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60135943A (ja) * 1983-12-26 1985-07-19 Dainippon Screen Mfg Co Ltd レジスト層の強度向上方法および装置
JPS6352410A (ja) * 1986-08-22 1988-03-05 Hitachi Ltd 半導体装置の製造方法および加熱処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60135943A (ja) * 1983-12-26 1985-07-19 Dainippon Screen Mfg Co Ltd レジスト層の強度向上方法および装置
JPS6352410A (ja) * 1986-08-22 1988-03-05 Hitachi Ltd 半導体装置の製造方法および加熱処理装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1991016724A1 (fr) * 1990-04-23 1991-10-31 Tadahiro Ohmi Dispositif de traitement de reserve, procede de traitement de reserve et structure de reserve
US5516626A (en) * 1990-04-23 1996-05-14 Tadahiro Ohmi Resist processing method
JP2004524694A (ja) * 2001-03-08 2004-08-12 モトローラ・インコーポレイテッド ウエハ上に半導体デバイスを形成するリソグラフィー法および機器
EP1441121A2 (en) 2003-01-27 2004-07-28 Denso Corporation Vapor-compression refrigerant cycle system with refrigeration cycle and rankine cycle
US7178358B2 (en) 2003-01-27 2007-02-20 Denso Corporation Vapor-compression refrigerant cycle system with refrigeration cycle and Rankine cycle
US7181919B2 (en) * 2004-03-31 2007-02-27 Denso Corporation System utilizing waste heat of internal combustion engine

Also Published As

Publication number Publication date
JPH0515300B2 (https=) 1993-03-01

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