JPS6381118A - Novolak type epoxy resin of phenols - Google Patents
Novolak type epoxy resin of phenolsInfo
- Publication number
- JPS6381118A JPS6381118A JP22484186A JP22484186A JPS6381118A JP S6381118 A JPS6381118 A JP S6381118A JP 22484186 A JP22484186 A JP 22484186A JP 22484186 A JP22484186 A JP 22484186A JP S6381118 A JPS6381118 A JP S6381118A
- Authority
- JP
- Japan
- Prior art keywords
- type epoxy
- product
- epoxy resin
- tetranuclear
- epoxy compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920003986 novolac Polymers 0.000 title claims abstract description 54
- 239000003822 epoxy resin Substances 0.000 title claims description 25
- 229920000647 polyepoxide Polymers 0.000 title claims description 25
- 150000002989 phenols Chemical class 0.000 title abstract description 8
- 150000001875 compounds Chemical class 0.000 claims abstract description 35
- 239000004593 Epoxy Substances 0.000 claims abstract description 33
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 49
- 239000000126 substance Substances 0.000 claims description 4
- 229940126062 Compound A Drugs 0.000 claims 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 claims 1
- 125000000217 alkyl group Chemical group 0.000 abstract description 4
- 229920005989 resin Polymers 0.000 abstract description 3
- 239000011347 resin Substances 0.000 abstract description 3
- 239000000047 product Substances 0.000 description 43
- 230000015572 biosynthetic process Effects 0.000 description 22
- 238000006243 chemical reaction Methods 0.000 description 22
- 238000003786 synthesis reaction Methods 0.000 description 22
- 238000009826 distribution Methods 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 238000004458 analytical method Methods 0.000 description 11
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 230000014759 maintenance of location Effects 0.000 description 10
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 239000007787 solid Substances 0.000 description 9
- 239000002904 solvent Substances 0.000 description 8
- 210000003323 beak Anatomy 0.000 description 7
- 241000238557 Decapoda Species 0.000 description 6
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 5
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 5
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 4
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 4
- 238000004992 fast atom bombardment mass spectroscopy Methods 0.000 description 4
- 150000002366 halogen compounds Chemical class 0.000 description 4
- 238000001819 mass spectrum Methods 0.000 description 4
- -1 pentanuclear Chemical class 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 229930003836 cresol Natural products 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 238000007142 ring opening reaction Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- JEFSTMHERNSDBC-UHFFFAOYSA-N 1,2-dimethylcyclohexa-2,4-dien-1-ol Chemical compound CC1=CC=CCC1(C)O JEFSTMHERNSDBC-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- HZBYPGZQDSNMFN-UHFFFAOYSA-N 3,5-dimethoxy-2,6-dimethylheptan-4-one Chemical compound COC(C(C)C)C(=O)C(OC)C(C)C HZBYPGZQDSNMFN-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 230000001588 bifunctional effect Effects 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000004035 construction material Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000012778 molding material Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- 239000011345 viscous material Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、4核体フェノール類ノボラック型エポキシ化
合物を30重量%゛以上含み、2核体フェノール類ノボ
ラック型エポキシ化合物の量が15重量%以下であるフ
ェノール類ノボラック型エポキシ樹脂に関する。Detailed Description of the Invention [Industrial Application Field] The present invention comprises a tetranuclear phenolic novolac type epoxy compound containing 30% by weight or more, and a dinuclear phenolic novolac type epoxy compound containing 15% by weight. The present invention relates to the following phenolic novolac type epoxy resin.
一般にエポキシ樹脂は電気機器材料、塗料、接着剤、土
木建築材料、各種複合材料などに広く使用され、用途に
応じて、耐熱性、耐薬品性。In general, epoxy resins are widely used in electrical equipment materials, paints, adhesives, civil engineering and construction materials, and various composite materials, and depending on the application, they have heat resistance and chemical resistance.
可と5性等の性質が要求されているがこれらの性質を同
時に満足させるものは知られていない。Although properties such as posability and pentabularity are required, there is no known material that satisfies both of these properties at the same time.
エポキシ樹脂として、ビスフェノールへのジグリシジル
エーテルは常温で液体であり、他の硬化剤との混合が容
易であるため広く使用されているが、2官能性であるた
め硬化物の熱変形温度が150℃程度と低く、耐熱性を
有しているとは言えない。耐熱性が改善されたものとし
て、フェノール類ノボラック型エポキシ樹脂があり、耐
熱性が要求される分野で使用されている。中でもo−ク
レゾールノボラックのエポキシ樹脂はICの封止剤樹脂
として使用されている。Diglycidyl ether to bisphenol is widely used as an epoxy resin because it is liquid at room temperature and can be easily mixed with other curing agents, but because it is bifunctional, the heat distortion temperature of the cured product is 150 It cannot be said to have heat resistance, as it is as low as ℃. Phenolic novolac type epoxy resins with improved heat resistance are used in fields where heat resistance is required. Among these, o-cresol novolak epoxy resin is used as a sealant resin for ICs.
しかしながら、一般に使用されている0−クレゾールノ
ボラックのエポキシ樹脂は広い分子量分布をもち、特に
エポキシ樹脂中に含まれる2核体等の低分子量化合物は
、硬化物とした場合に硬化物の耐熱性を低下させる。一
方2核体の含量を減少させたエポキシ樹脂の場合、硬化
物の耐熱性は向上するものの、従来のエポキシ樹脂は広
い分子量分布を持つため分子量分布が必然的に高分子側
に偏り、原料ノボラック及びそのエポキシ樹脂の軟化温
度が上昇し、溶融粘度が高くなる為1作業性が悪くなり
、使用が限定される等の欠点を有する。However, the commonly used 0-cresol novolac epoxy resin has a wide molecular weight distribution, and in particular, low molecular weight compounds such as binuclear bodies contained in the epoxy resin may affect the heat resistance of the cured product. lower. On the other hand, in the case of epoxy resins with a reduced content of binuclear bodies, the heat resistance of the cured product improves, but since conventional epoxy resins have a wide molecular weight distribution, the molecular weight distribution is inevitably biased toward the polymer side, and the raw material novolac The softening temperature of the epoxy resin increases and the melt viscosity increases, resulting in poor workability and limited use.
本発明者らはエポキシ樹脂について種々検討の結果、2
核体が極めて少なく、4核体を主成分とする分子量分布
の狭いフェノール類ノボラック型エポキシ樹脂は、軟化
温度及び溶融粘度が低いにもかかわらず、硬化物とした
場合に、硬化物は耐熱性に優れているということを見い
出し本発明を完成させるに至った。As a result of various studies on epoxy resins, the present inventors found that 2
Phenolic novolac type epoxy resin with very few nuclei and narrow molecular weight distribution mainly consisting of tetranuclear bodies has a low softening temperature and melt viscosity, but when made into a cured product, it has low heat resistance. The present invention was completed based on the discovery that it has excellent properties.
(式中、Rは水素原子又は炭素数10以下のアルキル基
であり、nは1.2または3を示す。)で表わされる4
核体フェノール類ノボラック型エポキシ化合物を30重
量%以上含み%2核体フェノール類ノボラック型エポキ
シ化合物の量が15重量%以下であるフェノール類ノボ
ラック型エポキシ樹脂に関する。(In the formula, R is a hydrogen atom or an alkyl group having 10 or less carbon atoms, and n represents 1.2 or 3.) 4
The present invention relates to a phenolic novolac type epoxy resin containing 30% by weight or more of a nuclear phenolic novolac type epoxy compound and 15% by weight or less of a dinuclear phenolic novolac type epoxy compound.
本発明のエポキシ樹脂は従来のフェノール類ノボラック
のエポキシ樹脂に比べ軟化温度が低く、硬化物は高い耐
熱性を有する。The epoxy resin of the present invention has a lower softening temperature than conventional phenolic novolac epoxy resins, and the cured product has high heat resistance.
本発明のエポキシ樹脂は、一般式(T)のエポキシ化合
物を30重量%以上含むが、この一般式+1)のエポキ
シ化合物の好ましい含有量は35重量%以上である。The epoxy resin of the present invention contains 30% by weight or more of the epoxy compound of general formula (T), and the preferable content of the epoxy compound of general formula +1) is 35% by weight or more.
本発明のエポキシ樹脂中に含まれる2核体フェノール類
ノボラック型エポキシ化合物の量は15重量%以下であ
るが、より好ましくは10重量%以下であり、特に好ま
しくは5重量%以下である。これら2核体フェノール類
ノボラック型エポキシ化合物としては1式+81で表わ
される化合物が挙げられる。The amount of the dinuclear phenol novolac type epoxy compound contained in the epoxy resin of the present invention is 15% by weight or less, more preferably 10% by weight or less, particularly preferably 5% by weight or less. Examples of these dinuclear phenol novolac type epoxy compounds include compounds represented by formula 1+81.
2核体フェノール類ノボラック型エポキシ化合物の量が
多すぎると、硬化物が十分な耐熱性を有さなくなる。If the amount of the dinuclear phenol novolac type epoxy compound is too large, the cured product will not have sufficient heat resistance.
本発明のエポキシ樹脂中、上記4核体及び2核体フェノ
ール類ノボラック型エポキシ化合物以外の成分は5核体
、6核体、8核体等の多核体フェノール類ノボラック型
エポキシ化合物である。In the epoxy resin of the present invention, the components other than the tetranuclear and dinuclear phenolic novolac type epoxy compounds are polynuclear phenolic novolac type epoxy compounds such as pentanuclear, hexanuclear, and octanuclear.
一般式(T)で表わされるエポキシ化合物を主成分とし
て含む本発明のエポキシ樹脂は、一般式(式中、Rln
は前記と同じ意味を表わす。)で表わされる4核体フェ
ノール類ノボラックを30重量%以上含み、2核体フェ
ノール類ノボラックの量が15重量%以下であるフェノ
ール類ノボラックに一般式(m)
(式中、Xはハロゲン原子を表わす)
で表わされるエピノ・ロゲン化合物を塩基性化合物の存
在下で反応させることにより容易に得られる。The epoxy resin of the present invention containing an epoxy compound represented by the general formula (T) as a main component has a general formula (where Rln
has the same meaning as above. ) containing 30% by weight or more of a tetranuclear phenolic novolac and 15% by weight or less of a dinuclear phenolic novolak, which has the general formula (m) (wherein, X represents a halogen atom). It can be easily obtained by reacting an epino-rogen compound represented by the following formula in the presence of a basic compound.
前記一般式CI+及びIにおいてRで表わされるアルキ
ル基としては、メチル基、エチル基、n−プロピル基、
i−プロピル基、n−ブチル基、t−ブチル基、n−ノ
ニル基等が例示される。The alkyl group represented by R in the general formulas CI+ and I includes methyl group, ethyl group, n-propyl group,
Examples include i-propyl group, n-butyl group, t-butyl group, and n-nonyl group.
特に好ましいRとしては水素原子、炭素数1〜6のアル
キル基が挙げられる。Particularly preferable examples of R include a hydrogen atom and an alkyl group having 1 to 6 carbon atoms.
一般式Iで表わされる4核体フェノール類ノボラックと
しては、具体的には、0−クレゾールの4核体、0−ク
レゾールとフェノールの4核体% 0−クレゾールとm
−クレゾールの4核体、0−クレゾールとp−クレゾー
ルの4核体、0−クレゾールとp−t−ブチルクレゾー
ルの4核体、o−クレゾールトp −n−ノニルフェノ
ールの4核体、0−クレゾールと2.4−及び/又は2
.6−キシレノールの4核体等が例示される。Specifically, the tetranuclear phenolic novolak represented by the general formula I includes a tetranuclear body of 0-cresol, a tetranuclear body of 0-cresol and phenol, 0-cresol and m
-Cresol tetranuclear, 0-cresol and p-cresol tetranuclear, 0-cresol and pt-butylcresol tetranuclear, o-cresol p-n-nonylphenol tetranuclear, 0- cresol and 2.4- and/or 2
.. Examples include tetranuclear bodies of 6-xylenol.
前記一般式(m)において、Xで表わされるハロゲン原
子としてはC1,Br、 I等が挙げられ、−般式(m
)の化合物としては、具体的には、エピクロルヒドリン
、エビブロムヒドリン、エビヨードヒドリン等 が挙げ
られ、これらの混合物も用いることができるが工業的に
はエピクロルヒドリンが好適に使用される。In the general formula (m), examples of the halogen atom represented by X include C1, Br, I, etc.
) Specific examples of the compound include epichlorohydrin, shrimp bromohydrin, shrimp iodohydrin, etc. Although mixtures of these can also be used, epichlorohydrin is preferably used industrially.
フェノール類ノボラックと一般式(m)で示されるエビ
ハロゲン化合物の反応は公知の方法により行うことが出
来る。The reaction between the phenolic novolac and the shrimp halogen compound represented by the general formula (m) can be carried out by a known method.
フェノール類ノボラックと、フェノール類ノボラックの
水酸基当量に対して過剰モル量のエビハロゲン化合物と
をテトラメチルアンモニウムクロリド、テトラメチルア
ンモニウムプロミド、トリエチルアンモニウムクロリド
などの第4級アンモニウム塩または水酸化ナトリウム、
水酸化カリウムなどのアルカリ金属水酸化物などの存在
下で反応させ、第4級アンモニウム塩などを用いた場合
は開環付加反応の段階で反応がとまるので次いで上記ア
ルカリ金属水酸化物を加えて閉環反応させる。A phenolic novolac and a shrimp halogen compound in an excess molar amount relative to the hydroxyl equivalent of the phenolic novolac are combined with a quaternary ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide, triethylammonium chloride, or sodium hydroxide,
The reaction is carried out in the presence of an alkali metal hydroxide such as potassium hydroxide, and when a quaternary ammonium salt is used, the reaction stops at the stage of the ring-opening addition reaction, so the above alkali metal hydroxide is then added. Perform a ring-closing reaction.
また最初から゛アルカリ金属水酸化物を加えて ・反
応する場合は、開環付加反応および閉環反応を一気に行
わせる。In addition, when reacting by adding an alkali metal hydroxide from the beginning, the ring-opening addition reaction and ring-closing reaction are performed at once.
エビハロゲン化合物の使用割合はフェノール類ノボラッ
クの水酸基当量1に対して通常1〜50モル、好ましく
は3〜15モルの範囲である。The proportion of the shrimp halogen compound used is generally 1 to 50 mol, preferably 3 to 15 mol, per 1 hydroxyl equivalent of the phenol novolak.
アルカリ金属水酸化物の使用量はフェノール類ノボラッ
クの水酸基当i1に対して通常0.8〜1.5モル、好
ましくは0.9〜1.3モルの範囲であり、第4級アン
モニウム塩を使用する場合その使用量はフェノール類ノ
ボラックの水酸基当量】に対して通常0.001〜1モ
ル、好ましくは0.005〜0.5モルの範囲である。The amount of alkali metal hydroxide used is usually in the range of 0.8 to 1.5 mol, preferably 0.9 to 1.3 mol, per 1 hydroxyl group of the phenolic novolac. When used, the amount used is usually 0.001 to 1 mol, preferably 0.005 to 0.5 mol, based on the hydroxyl equivalent of the phenolic novolak.
反応温度は通常30〜130℃好ましくは40〜120
℃である。The reaction temperature is usually 30-130°C, preferably 40-120°C.
It is ℃.
また反応で生成した水を反応系外に除去しながら反応を
進行させることもできる。Furthermore, the reaction can be allowed to proceed while removing water produced in the reaction from the reaction system.
反応終了後副生じた塩を、水洗、濾過等により除去し過
′剰のエビハロゲン化合物を留去することによりエポキ
シ樹脂が得られる。After the completion of the reaction, by-product salts are removed by washing with water, filtration, etc., and excess shrimp halogen compound is distilled off to obtain an epoxy resin.
上記反応に使用する、4核体フェノール類ノボラックを
30重量%以上含み、2核体フェノール類ノボラックの
量が15重量%以下であるフェノール類ノボラックは1
次のようにして製造することが出来る。即ち、一般式(
■)で表わされる0−クレゾール2核体ジメチロール化
合物〔以下化合物(IV)という〕と一般式■(式中、
R,nは前記と同じ意味を有する。)で表わされるフェ
ノール類を酸触媒の存在下に脱水縮合させることにより
製造できる。酸触媒としては、塩酸、硫酸、リン酸、
p−)ルエンスルホン酸、シュウ酸等が使用でき、酸触
媒は化合物([V)の0.1〜30重量%用いるのが好
ましい。又、フェノール類は化合物(IV)に対して2
〜15モル倍用いるのが好ましい。反応は。The phenolic novolak containing 30% by weight or more of tetranuclear phenolic novolak and 15% by weight or less of dinuclear phenolic novolak used in the above reaction is 1
It can be manufactured as follows. That is, the general formula (
(2) 0-cresol dinuclear dimethylol compound [hereinafter referred to as compound (IV)] and the general formula (2) (wherein,
R and n have the same meanings as above. ) can be produced by dehydration condensation of phenols represented by the following in the presence of an acid catalyst. As acid catalysts, hydrochloric acid, sulfuric acid, phosphoric acid,
p-) Luenesulfonic acid, oxalic acid, etc. can be used, and the acid catalyst is preferably used in an amount of 0.1 to 30% by weight of the compound ([V)]. In addition, phenols have a 2
It is preferable to use up to 15 moles. What is the reaction?
無溶媒でも、ベンゼン、トルエン、メチルインブチルケ
トン等の溶媒中で行うこともできる。It can be carried out without a solvent or in a solvent such as benzene, toluene, methyl in butyl ketone, etc.
反応温度は20〜150℃の範囲が好ましい。The reaction temperature is preferably in the range of 20 to 150°C.
反応終了後、使用した触媒を水洗等により除去し、溶媒
及び過剰のフェノール類を減圧下に留去することにより
、4咳体フェノール類ノボラックを30重貴簡以上含む
上記フェノール類ノボラックを得ることができる。After the reaction is completed, the used catalyst is removed by washing with water, etc., and the solvent and excess phenols are distilled off under reduced pressure to obtain the above-mentioned phenolic novolak containing 30 or more phenolic novolaks. Can be done.
従来公知のフェノール類ノボラックの製法である0−ク
レゾール等のフェノール類トホルムアルデヒドを反応さ
せる方法でフェノール類ノボラックを製造した場合、広
い分子量分布を持つフェノール類ノボラックが得られ、
上記のようなフェノール類ノボラックは得られない。When phenolic novolacs are produced by a method of reacting phenolic toformaldehyde such as 0-cresol, which is a conventional method for producing phenolic novolaks, phenolic novolacs with a wide molecular weight distribution are obtained.
Phenolic novolaks such as those mentioned above cannot be obtained.
本発明のエポキシ樹脂は単独で又は他のエポキシ化合物
との併用で、通常のエポキシ樹脂と同様に、脂肪族ポリ
アミン、芳香族ポリアミン、ポリアミドポリアミン等の
ポリアミン系硬化剤、無水へキサヒドロフタル酸、無水
メチルテトラヒドロフタル酸等の酸無水物系硬化剤、フ
ェノールノボラック、クレゾールノボラック等のフェノ
ール系硬化剤、三フフ化ホウ素等のルイス酸又はそれら
の塩類、ジシアンジアミド類等の硬化剤等により硬化さ
せることができる。又。The epoxy resin of the present invention can be used alone or in combination with other epoxy compounds, as well as a polyamine curing agent such as aliphatic polyamine, aromatic polyamine, polyamide polyamine, hexahydrophthalic anhydride, Curing with acid anhydride curing agents such as methyltetrahydrophthalic anhydride, phenol curing agents such as phenol novolak and cresol novolak, Lewis acids such as boron trifluoride or their salts, and curing agents such as dicyandiamide. Can be done. or.
必要に応じて硬化促進剤、無機又は有機の充填剤等の種
々の配合剤を添加することができる。Various compounding agents such as a curing accelerator and an inorganic or organic filler can be added as necessary.
本発明のエポキシ樹脂は、耐熱性の畏求されな
る広範へ分野に用いることができる。具体的には、絶縁
材料、積層板封止材料、成型材料、複合材料等を例示す
ることができる。The epoxy resin of the present invention can be used in a wide range of fields where heat resistance is required. Specifically, insulating materials, laminate sealing materials, molding materials, composite materials, etc. can be exemplified.
以下、本発明を実施例で説明する。 The present invention will be explained below with reference to Examples.
合成例1゜
温度計、攪拌機を付けたガラス容器にO−クレゾール2
核体ジメチロール化合物〔化合物■〕200g(0,6
9モル)及び0−クレゾール750g(6,9モル)を
仕込み窒素雰囲気下で室温で撹拌した。Synthesis Example 1゜O-cresol 2 is placed in a glass container equipped with a thermometer and a stirrer.
Nuclear dimethylol compound [Compound ■] 200g (0,6
9 mol) and 750 g (6.9 mol) of 0-cresol were charged and stirred at room temperature under a nitrogen atmosphere.
p−)ルエンスルホン酸2 g (o−フレジー □
ル2核体ジメチロール化合物に対し1.0重量%)を発
熱に注意し、液温が50℃を越えないよう徐々に添加し
た。p-) Luenesulfonic acid 2 g (o-Frezy □
(1.0% by weight based on the dinuclear dimethylol compound) was gradually added to the solution, taking care not to generate heat so that the liquid temperature did not exceed 50°C.
添加後油浴上で50℃まで加温し2時間反応させた後、
メチルイソブチルケトン500m1加えて210分液ロ
ートに移し水洗した。洗浄水が中性を示すまで水洗後、
有機層を減圧下濃縮し、淡黄点粘性物(At306 g
を得た。このものは室温に放置すると固化した。生成物
囚の軟化温度(JIS K2425環球法)は81.0
℃で水酸基当量(g / mol )は119でありた
。After the addition, the mixture was heated to 50°C on an oil bath and reacted for 2 hours.
500 ml of methyl isobutyl ketone was added, and the mixture was transferred to a 210 separatory funnel and washed with water. After washing with water until the washing water shows neutrality,
The organic layer was concentrated under reduced pressure to obtain a pale yellow viscous substance (306 g of At
I got it. This solidified when left at room temperature. The softening temperature of the product (JIS K2425 ring and ball method) is 81.0.
The hydroxyl equivalent (g/mol) was 119 at °C.
合成例2゜
合成例Iにおいて、0−クレゾールの代りにフェノール
650g(6,91モル)を用いた以外は合成例1と同
様に反応させ黄色固体(B1288gを得た。生成物(
Blの軟化温度は84.2℃であった0
合成例3゜
合成例]において、0−クレゾールの代りにp−t−ブ
チルフェノール1035g(6,9モル)を用い、又、
溶媒としてメチルイソブチルケトン1500 mlを加
え反応温度を80℃とした以外は合成例1と同様に反応
させ黄色固体(C)36]gを得た。生成物(0の軟化
温度は103℃であった。Synthesis Example 2 In Synthesis Example I, the reaction was carried out in the same manner as in Synthesis Example 1 except that 650 g (6.91 mol) of phenol was used instead of 0-cresol to obtain 1288 g of a yellow solid (B.
The softening temperature of Bl was 84.2°C. In Synthesis Example 3, 1035 g (6.9 mol) of pt-butylphenol was used instead of 0-cresol, and
The reaction was carried out in the same manner as in Synthesis Example 1 except that 1500 ml of methyl isobutyl ketone was added as a solvent and the reaction temperature was set to 80° C. to obtain 36] g of a yellow solid (C). The softening temperature of the product (0) was 103°C.
合成例4゜
合成例1において0−クレゾールの代りに2゜6−キシ
レノール842g(6,9モル)を用い又、溶媒として
メチルイソブチルケトン1500m1を加え反応温度を
80℃とした以外は合成例1と同様に反応して黄色固体
(DI335 gを得た。Synthesis Example 4 Synthesis Example 1 except that 842 g (6.9 mol) of 2゜6-xylenol was used instead of 0-cresol in Synthesis Example 1, 1500 ml of methyl isobutyl ketone was added as a solvent, and the reaction temperature was 80°C. A yellow solid (335 g of DI) was obtained by reacting in the same manner as above.
生成物0の軟化温度は82.7℃で水酸基当量(g /
mol )は127であった。The softening temperature of product 0 is 82.7°C and the hydroxyl equivalent (g/
mol) was 127.
合成例5゜
0−クレゾールを298g(2,76モル)用い又、溶
媒としてメチルイソブチルケトン600m1を加えた以
外は合成例】と同様に反応させ、黄色固体■313gを
得た。Synthesis Example 5 A reaction was carried out in the same manner as in Synthesis Example except that 298 g (2.76 mol) of 0-cresol was used and 600 ml of methyl isobutyl ketone was added as a solvent to obtain 313 g of a yellow solid (2).
生成物[F]の軟化温度は88.3℃で水酸基当量(g
/mol)は120であった。The softening temperature of the product [F] was 88.3°C, and the hydroxyl equivalent (g
/mol) was 120.
合成例1〜5で得られた生成物(At 、 (Bl 、
(C1。Products obtained in Synthesis Examples 1 to 5 (At, (Bl,
(C1.
■)及びDをGPCで分析した結果、4核体及び2核体
フェノール類ノボラックの含有量は次のとおりであった
。(2) and D were analyzed by GPC, and the contents of tetranuclear and dinuclear phenolic novolacs were as follows.
(B) 8.0 0.8
(C) 70 0.1以下(
D) 85 2.3(E
) 54 1.1なお分
析条件は次のとおり。(B) 8.0 0.8
(C) 70 0.1 or less (
D) 85 2.3 (E
) 54 1.1 The analysis conditions are as follows.
GPC装置: 高滓製作所
(カラム : TSK−G−3000XL(1本)+
TSK−G−2000XL(2本))
溶 媒 : テトラヒドロフランII?lI/分検
出 UV(254nm)実施例1゜
温度計、撹拌装置、滴下ロート及び生成水分離装置のつ
いた■!の反応器に、合成例1で得た生成物(Al(水
酸基当量(g/mot) ] ] 9 )150g及
びエピクロルヒドリン475gを仕込み窒素置換を行っ
た後、48%水酸化ナトリウム水浴液106.8gを5
時間かけて滴下した。GPC device: Takasugi Seisakusho (Column: TSK-G-3000XL (1 piece) +
TSK-G-2000XL (2 bottles) Solvent: Tetrahydrofuran II? lI/min Detection UV (254 nm) Example 1゜With thermometer, stirring device, dropping funnel and produced water separation device ■! Into a reactor, 150 g of the product obtained in Synthesis Example 1 (Al (hydroxyl group equivalent (g/mot) ) ] 9 ) and 475 g of epichlorohydrin were charged, and the reactor was replaced with nitrogen, followed by 106.8 g of a 48% sodium hydroxide water bath solution. 5
It dripped over time.
滴下中は反応温度60°C1圧力100〜150mmH
gの条件下で生成水及び水酸化ナトリウム水溶液の水を
エピクロルヒドリンとの共沸により連続的に反応系外に
除去し、エピクロルヒドリンは系内に戻した。During dropping, the reaction temperature was 60°C and the pressure was 100 to 150 mmH.
Under the conditions of g, the produced water and the water in the aqueous sodium hydroxide solution were continuously removed from the reaction system by azeotropy with epichlorohydrin, and epichlorohydrin was returned to the system.
ついで過剰の未反応エピクロルヒドリンを減)ン
圧下に回収した後、メチXイソブチルケトン500m1
ya1′、iえ100m1の水で水層が中性ヲ示すまで
洗浄した。メチルイソブチルケトン層を減圧下濃縮し、
淡黄色の固体(AI)210.7gを得た。Then, after recovering excess unreacted epichlorohydrin under reduced pressure, 500 ml of methoxy-isobutyl ketone was added.
The mixture was washed with 100 ml of water until the aqueous layer became neutral. The methyl isobutyl ketone layer was concentrated under reduced pressure,
210.7 g of pale yellow solid (AI) was obtained.
生成物(A1)の軟化温度(JIS K2425)54
.0℃でエポキシ当量(g/mol)は】83であった
。Softening temperature of product (A1) (JIS K2425) 54
.. The epoxy equivalent (g/mol) at 0°C was 83.
溶媒としてテトラヒドロフラン(THF)を用いて生成
物(A1)をGPC分析したところ第1図に示される分
子量分布曲線を得た(分析条件は合成例と同じ)。When product (A1) was analyzed by GPC using tetrahydrofuran (THF) as a solvent, the molecular weight distribution curve shown in FIG. 1 was obtained (the analysis conditions were the same as in the synthesis example).
この条件でのビスフェノールFの現われるリテンション
タイムは24.7分で、メインピークのリテンションタ
イムはベンゼン核を4個有する4核体のリテンションタ
イムに相当し、第1図よりメインビークの組成量は53
重量%であった。Under these conditions, the retention time at which bisphenol F appears is 24.7 minutes, and the retention time of the main peak corresponds to the retention time of a tetranuclear substance having four benzene nuclei, and from Figure 1, the composition amount of the main peak is 53.
% by weight.
生成物(A1)のマススペクトル(FAB−MS)でM
”692が得られたことより次の構造を有する成分が主
成分であることがわかった。In the mass spectrum (FAB-MS) of product (A1), M
692 was obtained, it was found that the main component was a component having the following structure.
(分子量692)
又、第1図より生成物(A1)は2核体フェノール類ノ
ボラック型エポキシ化合物を1,7重量%含んでいるこ
とがわかった。(Molecular weight: 692) Also, from FIG. 1, it was found that the product (A1) contained 1.7% by weight of a dinuclear phenolic novolac type epoxy compound.
実施例2゜
生成物(8)の代りに合成例2で得た生成物(B)(水
酸基当量(g/mo+)11z)l、zgを用いた以外
は実施例1と同様に反応して黄色固体(Bl )202
gを得た。Example 2 The reaction was carried out in the same manner as in Example 1, except that the product (B) (hydroxyl group equivalent (g/mo+) 11z) l, zg obtained in Synthesis Example 2 was used instead of product (8). Yellow solid (Bl) 202
I got g.
生成物(B1)の軟化温度は50.2℃でエポキシ当量
(g / mol )は176であった。The softening temperature of the product (B1) was 50.2 °C and the epoxy equivalent (g/mol) was 176.
生成物(Bl)のGPC分析(分析条件は合成例と同じ
)による分子量分布曲線を第2図に示したが、メインビ
ークのリテンションタイムはベンゼン核4個有する4核
体のリテンションタイムに相当し、メインピークの組成
量は61重量%であった。Figure 2 shows the molecular weight distribution curve of the product (Bl) obtained by GPC analysis (the analysis conditions are the same as the synthesis example), and the retention time of the main beak corresponds to the retention time of a tetranuclear body with four benzene nuclei. , the composition amount of the main peak was 61% by weight.
生成物(B1)のマススペクトル(FAB−MS)でM
7C3が得られたことより、次の構造を有する成分が主
成分であることがわかった。In the mass spectrum (FAB-MS) of product (B1), M
From the fact that 7C3 was obtained, it was found that the main component was a component having the following structure.
(分子量664)
又、第2図より、生成物(Bl)は2核体フェノール類
ノボラック型エポキシ化合物を1.3重量%含んでいる
ことがわかった。(Molecular weight: 664) Also, from FIG. 2, it was found that the product (Bl) contained 1.3% by weight of a dinuclear phenol novolac type epoxy compound.
実施例3゜
合成例(4)の代りに合成例3で得た生成物(0(水酸
基当量(g/mo1)140)177gを用いた以外は
実施例1と同様に反応して黄色固体(C1)231gを
得た。Example 3゜A yellow solid ( C1) 231g was obtained.
生成物(CI)の軟化温度は65,6℃でエポキシ当量
(g/mol)は215であった。The product (CI) had a softening temperature of 65.6° C. and an epoxy equivalent (g/mol) of 215.
生成物(CI)のGPC分析(分析条件は合成例と同じ
)による分子量分布曲線を第3図に示したが、メインビ
ークのリテンションタイムはベンゼン核4個を有する4
核体のリテンションタイムに相当し、メインビークの組
成量は65重量%であった。Figure 3 shows the molecular weight distribution curve of the product (CI) by GPC analysis (analysis conditions are the same as the synthesis example), and the retention time of the main beak is 4.
This corresponds to the retention time of the core, and the composition amount of the main beak was 65% by weight.
生成物(CI)のマススペクトル(FAB −MS )
でM” 776が得られたことより、次の構造を有する
成分が主成分であることがわかった。Mass spectrum (FAB-MS) of product (CI)
From the fact that M''776 was obtained, it was found that the main component was a component having the following structure.
(分子量776)
又、第3図より、生成物(C1)における2核体フェノ
ール類ノボラック型エポキシ化合物の含有量は0.1重
量%以下であった。(Molecular weight: 776) Also, from FIG. 3, the content of the dinuclear phenol novolac type epoxy compound in the product (C1) was 0.1% by weight or less.
実施例4゜
生成物囚の代りに合成例4で得た生成物の)159g(
水酸基当量(g/mol) 127 )を用いた以外は
実施例Iと同様に反応して黄色固体(DI ) 2 ]
8 gを得た。Example 4 159 g (of the product obtained in Synthesis Example 4) instead of the product
The reaction was carried out in the same manner as in Example I except that hydroxyl group equivalent (g/mol) 127) was used to form a yellow solid (DI) 2 ]
8 g was obtained.
生成物(DI )の軟化温度は52.3℃で、エポキシ
当量(g/mol)は184であった。The softening temperature of the product (DI) was 52.3°C, and the epoxy equivalent (g/mol) was 184.
生成物(D])のGPC分析(分析条件は合成例と同じ
)による分子量分布曲線を第4図に示したが、メインビ
ークのリテンションタイムはベンゼン核4個有する4核
体のリテンションタイムに相当しメインビークの組成量
は75重量%であった。Figure 4 shows the molecular weight distribution curve of the product (D]) obtained by GPC analysis (analysis conditions are the same as the synthesis example), and the retention time of the main beak corresponds to the retention time of a tetranuclear substance having four benzene nuclei. The composition amount of the main beak was 75% by weight.
生成物(D])のマススペクトル(FAB−MS )で
M720が得られたことより次の構造を有する化合物が
主成分であることがわかった又、第4図より、生成物(
D])は2核体フェノール類ノボラック型エポキシ化合
物を2、O重畳%含んでいることがわかった。The mass spectrum (FAB-MS) of the product (D]) showed that M720 was obtained, indicating that the main component was a compound having the following structure.
D]) was found to contain 2.0% by weight of a dinuclear phenolic novolac type epoxy compound.
実施例5゜
生成物囚の代りに合成例5で得た生成物(E)150g
(水酸基当量120)を用いた以外は実施例1と同様に
反応させて黄色固体(El)209gを得た。Example 5゜150 g of the product (E) obtained in Synthesis Example 5 instead of the product prisoner
The reaction was carried out in the same manner as in Example 1 except that (hydroxyl equivalent: 120) was used to obtain 209 g of a yellow solid (El).
生成物(El)の軟化温度は58.6℃でエポキシ当量
(g/mol)は】86であった。The softening temperature of the product (El) was 58.6°C, and the epoxy equivalent (g/mol) was 86.
生成物(El)のGPC分析(分析条件は合成例と同じ
)による分子量分布曲線を第5図に示した。メインビー
クのリテンションタイムは実施例1と同じであったが、
実施例1に比べ高分子化合物が多く、メインビークの組
成量は37重量%であった。FIG. 5 shows the molecular weight distribution curve of the product (El) obtained by GPC analysis (analysis conditions are the same as in the synthesis example). The main beak retention time was the same as in Example 1, but
The content of the polymer compound was larger than in Example 1, and the composition amount of the main beak was 37% by weight.
又、第5図より、生成物(El)は2核体フェノール類
ノボラック型エポキシ化合物を2.4重量%含んでいる
ことがわかった。Further, from FIG. 5, it was found that the product (El) contained 2.4% by weight of a dinuclear phenol novolac type epoxy compound.
参考例1゜
第1表に示す割合でフェノールノボラック(日本化薬■
製、軟化温度85℃)に実施例1゜2、3.4及び5で
得られた4核体フェノール類ノボラック型エポキシ化合
物を主成分とする生成物(AI)、(Bl)、(CI)
、(DI)、及び(El)を配合し、2−メチルイミダ
ゾールを触媒に用いて加熱硬化させた。Reference Example 1゜Phenol novolac (Nippon Kayaku ■
Products (AI), (Bl), (CI) whose main component is the tetranuclear phenolic novolac type epoxy compound obtained in Example 1.2, 3.4 and 5 (softening temperature: 85°C)
, (DI), and (El) were blended and heated and cured using 2-methylimidazole as a catalyst.
比較例として実施例1.2.3.4及び5で得られた生
成物(A1)〜(El)の代りに第1表に示す割合で下
記の市販の0−クレゾールノボラック型エポキシ樹脂を
用いて加熱硬化した。As a comparative example, the following commercially available 0-cresol novolak type epoxy resin was used in place of the products (A1) to (El) obtained in Examples 1.2.3.4 and 5 in the proportions shown in Table 1. It was heated and cured.
EOCN 1020 :日本化薬■製、エポキシ半量
(g/mol)含む、[:GPCによる分子量分布曲線
を第6図に示す(分析条件は合成例と
同じ)〕
EOCN102S:日本化薬■製、エポキシ当i(g/
mo+)212、軟化温度51.6℃、14核体及び2
核体をそれぞれ12,5.16.6重量%含む。EOCN 1020: Manufactured by Nippon Kayaku ■, containing half the amount (g/mol) of epoxy [: The molecular weight distribution curve by GPC is shown in Figure 6 (analysis conditions are the same as the synthesis example)] EOCN102S: Manufactured by Nippon Kayaku ■, epoxy Toi (g/
mo+) 212, softening temperature 51.6°C, 14 nuclear bodies and 2
Contains 12, 5, and 16.6% by weight of nuclear bodies, respectively.
ビスフェノールFのエポキシ化物(E−BisF)日本
化薬■製、エポキシ当量(g / mol )168、
液状
以上の硬化物についてガラス転移温度(Tg)及び熱変
形温度(HDT)を測定し、その結果を第1表に示した
。第1表から明らかなように、本発明のフェノール類ノ
ボラック型エポキシ樹脂を用いた場合、得られる硬化物
は耐熱性に優れていることがわかる。Epoxidized product of bisphenol F (E-BisF) manufactured by Nippon Kayaku ■, epoxy equivalent (g/mol) 168,
The glass transition temperature (Tg) and heat distortion temperature (HDT) of the cured product in a liquid state or higher were measured, and the results are shown in Table 1. As is clear from Table 1, when the phenolic novolac type epoxy resin of the present invention is used, the resulting cured product has excellent heat resistance.
本発明のフェノール類ノボラック型エポキシ樹脂は、従
来のものに比し分子量分布が狭く、軟化温度が低いため
取り扱い易く1作業性が優れ、又、これを用いて得られ
る硬化物は耐熱性に優れている。The phenolic novolac type epoxy resin of the present invention has a narrower molecular weight distribution and lower softening temperature than conventional ones, so it is easy to handle and has excellent workability, and the cured product obtained using it has excellent heat resistance. ing.
第1図〜第6図は、実施例1〜5で得られた生成物(A
I)、(Bl)、((j)、(DI)、(El)及び比
較のために用いたEOCNI020の分子量分布曲線で
ある。Figures 1 to 6 show the products obtained in Examples 1 to 5 (A
I), (Bl), ((j), (DI), (El), and molecular weight distribution curves of EOCNI020 used for comparison.
Claims (1)
であり、nは1、2又は3を示す)で表わされる4核体
フェノール類ノボラック型エポキシ化合物を30重量%
以上含み、2核体フェノール類ノボラック型エポキシ化
合物の量が15重量%以下であるフェノール類ノボラッ
ク型エポキシ樹脂。[Claims] Represented by the general formula ▲ Numerical formulas, chemical formulas, tables, etc. 30% by weight of tetranuclear phenolic novolac type epoxy compound
A phenolic novolac type epoxy resin containing the above, and the amount of the dinuclear phenolic novolac type epoxy compound being 15% by weight or less.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22484186A JPS6381118A (en) | 1986-09-25 | 1986-09-25 | Novolak type epoxy resin of phenols |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP22484186A JPS6381118A (en) | 1986-09-25 | 1986-09-25 | Novolak type epoxy resin of phenols |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6381118A true JPS6381118A (en) | 1988-04-12 |
JPH0521925B2 JPH0521925B2 (en) | 1993-03-26 |
Family
ID=16820013
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP22484186A Granted JPS6381118A (en) | 1986-09-25 | 1986-09-25 | Novolak type epoxy resin of phenols |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6381118A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63301218A (en) * | 1987-06-02 | 1988-12-08 | Asahi Chiba Kk | Epoxy resin composition |
JPH04181789A (en) * | 1990-11-16 | 1992-06-29 | Toshiba Chem Corp | Epoxy resin composition and copper-plated laminated board |
JPH04220422A (en) * | 1990-12-20 | 1992-08-11 | Nippon Kayaku Co Ltd | Epoxy resin, resin composition containing same, and cured article prepared from the composition |
WO1997029144A1 (en) * | 1996-02-09 | 1997-08-14 | Nippon Kayaku Kabushiki Kaisha | Epoxy resin, epoxy resin composition and products of curing thereof |
JPH11209585A (en) * | 1998-01-28 | 1999-08-03 | Asahi Denka Kogyo Kk | Polyol resin composition |
JP2000297199A (en) * | 1999-04-14 | 2000-10-24 | Shin Etsu Chem Co Ltd | Epoxy resin composition, and laminated film and semiconductor device prepared by using same |
KR100563509B1 (en) * | 1998-09-25 | 2006-03-23 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Epoxy Resin Compositions, and Laminated Films and Semiconductor Devices Using the Epoxy Resin Compositions |
JP2016523313A (en) * | 2013-06-28 | 2016-08-08 | スリーエム イノベイティブ プロパティズ カンパニー | High modulus epoxy adhesive for shim processing applications |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101446081B1 (en) * | 2013-11-26 | 2014-10-01 | 주식회사 진영뉴웍스 | Spray nozzle structure for silver mirror coating and spray apparatus comprising the same |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5219755A (en) * | 1975-08-05 | 1977-02-15 | Dow Chemical Co | Epoxy novolak resin production method |
-
1986
- 1986-09-25 JP JP22484186A patent/JPS6381118A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5219755A (en) * | 1975-08-05 | 1977-02-15 | Dow Chemical Co | Epoxy novolak resin production method |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63301218A (en) * | 1987-06-02 | 1988-12-08 | Asahi Chiba Kk | Epoxy resin composition |
JPH04181789A (en) * | 1990-11-16 | 1992-06-29 | Toshiba Chem Corp | Epoxy resin composition and copper-plated laminated board |
JPH04220422A (en) * | 1990-12-20 | 1992-08-11 | Nippon Kayaku Co Ltd | Epoxy resin, resin composition containing same, and cured article prepared from the composition |
WO1997029144A1 (en) * | 1996-02-09 | 1997-08-14 | Nippon Kayaku Kabushiki Kaisha | Epoxy resin, epoxy resin composition and products of curing thereof |
US6124420A (en) * | 1996-02-09 | 2000-09-26 | Nippon Kayaku Kabushiki Kaisha | Epoxy resin, epoxy resin composition and hardened product thereof |
JPH11209585A (en) * | 1998-01-28 | 1999-08-03 | Asahi Denka Kogyo Kk | Polyol resin composition |
KR100563509B1 (en) * | 1998-09-25 | 2006-03-23 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Epoxy Resin Compositions, and Laminated Films and Semiconductor Devices Using the Epoxy Resin Compositions |
JP2000297199A (en) * | 1999-04-14 | 2000-10-24 | Shin Etsu Chem Co Ltd | Epoxy resin composition, and laminated film and semiconductor device prepared by using same |
JP2016523313A (en) * | 2013-06-28 | 2016-08-08 | スリーエム イノベイティブ プロパティズ カンパニー | High modulus epoxy adhesive for shim processing applications |
US10059862B2 (en) | 2013-06-28 | 2018-08-28 | 3M Innovative Properties Company | High modulus epoxy adhesives for shimming applications |
Also Published As
Publication number | Publication date |
---|---|
JPH0521925B2 (en) | 1993-03-26 |
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