JPH03220219A - Phenol novolac compound, resin, resin composition, and cured product - Google Patents
Phenol novolac compound, resin, resin composition, and cured productInfo
- Publication number
- JPH03220219A JPH03220219A JP2307229A JP30722990A JPH03220219A JP H03220219 A JPH03220219 A JP H03220219A JP 2307229 A JP2307229 A JP 2307229A JP 30722990 A JP30722990 A JP 30722990A JP H03220219 A JPH03220219 A JP H03220219A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- epoxy resin
- compound
- resin
- novolac type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 125
- 229920003986 novolac Polymers 0.000 title claims abstract description 95
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 title claims abstract description 87
- 229920005989 resin Polymers 0.000 title claims description 67
- 239000011347 resin Substances 0.000 title claims description 67
- 239000011342 resin composition Substances 0.000 title description 3
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 24
- 125000005843 halogen group Chemical group 0.000 claims abstract description 20
- 125000003118 aryl group Chemical group 0.000 claims abstract description 13
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 4
- 150000002367 halogens Chemical class 0.000 claims abstract description 3
- 239000003822 epoxy resin Substances 0.000 claims description 98
- 229920000647 polyepoxide Polymers 0.000 claims description 98
- 239000000203 mixture Substances 0.000 claims description 53
- 239000003795 chemical substances by application Substances 0.000 claims description 23
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 21
- 125000004432 carbon atom Chemical group C* 0.000 claims description 20
- 239000000126 substance Substances 0.000 claims description 17
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 56
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 abstract description 21
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 abstract description 14
- 238000010521 absorption reaction Methods 0.000 abstract description 13
- 238000005406 washing Methods 0.000 abstract description 13
- 239000002904 solvent Substances 0.000 abstract description 11
- 239000003377 acid catalyst Substances 0.000 abstract description 4
- 150000007514 bases Chemical class 0.000 abstract description 2
- 239000004843 novolac epoxy resin Substances 0.000 abstract description 2
- 239000000047 product Substances 0.000 description 121
- 235000013824 polyphenols Nutrition 0.000 description 63
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 42
- 238000006243 chemical reaction Methods 0.000 description 38
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 33
- 239000004593 Epoxy Substances 0.000 description 31
- 238000004458 analytical method Methods 0.000 description 17
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 16
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 16
- 239000000243 solution Substances 0.000 description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 11
- 238000001819 mass spectrum Methods 0.000 description 11
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 10
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 10
- 229930003836 cresol Natural products 0.000 description 10
- -1 halohydrin compound Chemical class 0.000 description 10
- 239000007788 liquid Substances 0.000 description 10
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 8
- YXVFYQXJAXKLAK-UHFFFAOYSA-N biphenyl-4-ol Chemical compound C1=CC(O)=CC=C1C1=CC=CC=C1 YXVFYQXJAXKLAK-UHFFFAOYSA-N 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 8
- 241000238557 Decapoda Species 0.000 description 7
- 238000004992 fast atom bombardment mass spectroscopy Methods 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 230000007935 neutral effect Effects 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 5
- 229950011260 betanaphthol Drugs 0.000 description 5
- 125000003700 epoxy group Chemical group 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 239000012299 nitrogen atmosphere Substances 0.000 description 5
- WXNZTHHGJRFXKQ-UHFFFAOYSA-N 4-chlorophenol Chemical compound OC1=CC=C(Cl)C=C1 WXNZTHHGJRFXKQ-UHFFFAOYSA-N 0.000 description 4
- 229930040373 Paraformaldehyde Natural products 0.000 description 4
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 150000002790 naphthalenes Chemical class 0.000 description 4
- 150000004780 naphthols Chemical class 0.000 description 4
- 239000012044 organic layer Substances 0.000 description 4
- 229920002866 paraformaldehyde Polymers 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- QHPQWRBYOIRBIT-UHFFFAOYSA-N 4-tert-butylphenol Chemical compound CC(C)(C)C1=CC=C(O)C=C1 QHPQWRBYOIRBIT-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 238000007654 immersion Methods 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 150000008442 polyphenolic compounds Chemical class 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 3
- QWBBPBRQALCEIZ-UHFFFAOYSA-N 2,3-dimethylphenol Chemical compound CC1=CC=CC(O)=C1C QWBBPBRQALCEIZ-UHFFFAOYSA-N 0.000 description 2
- NKTOLZVEWDHZMU-UHFFFAOYSA-N 2,5-xylenol Chemical compound CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 2
- SRJCJJKWVSSELL-UHFFFAOYSA-N 2-methylnaphthalen-1-ol Chemical compound C1=CC=CC2=C(O)C(C)=CC=C21 SRJCJJKWVSSELL-UHFFFAOYSA-N 0.000 description 2
- YCOXTKKNXUZSKD-UHFFFAOYSA-N 3,4-xylenol Chemical compound CC1=CC=C(O)C=C1C YCOXTKKNXUZSKD-UHFFFAOYSA-N 0.000 description 2
- KLSLBUSXWBJMEC-UHFFFAOYSA-N 4-Propylphenol Chemical compound CCCC1=CC=C(O)C=C1 KLSLBUSXWBJMEC-UHFFFAOYSA-N 0.000 description 2
- HXDOZKJGKXYMEW-UHFFFAOYSA-N 4-ethylphenol Chemical compound CCC1=CC=C(O)C=C1 HXDOZKJGKXYMEW-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000003934 aromatic aldehydes Chemical class 0.000 description 2
- LLEMOWNGBBNAJR-UHFFFAOYSA-N biphenyl-2-ol Chemical compound OC1=CC=CC=C1C1=CC=CC=C1 LLEMOWNGBBNAJR-UHFFFAOYSA-N 0.000 description 2
- 238000007664 blowing Methods 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- GBMDVOWEEQVZKZ-UHFFFAOYSA-N methanol;hydrate Chemical compound O.OC GBMDVOWEEQVZKZ-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 238000011417 postcuring Methods 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 238000007142 ring opening reaction Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- BBOCZFGVXFNCTC-UHFFFAOYSA-N 1-methylnaphthalen-2-ol Chemical compound C1=CC=C2C(C)=C(O)C=CC2=C1 BBOCZFGVXFNCTC-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- HKHXLHGVIHQKMK-UHFFFAOYSA-N 2-chloro-m-cresol Chemical compound CC1=CC=CC(O)=C1Cl HKHXLHGVIHQKMK-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- 229940061334 2-phenylphenol Drugs 0.000 description 1
- QBWKPGNFQQJGFY-QLFBSQMISA-N 3-[(1r)-1-[(2r,6s)-2,6-dimethylmorpholin-4-yl]ethyl]-n-[6-methyl-3-(1h-pyrazol-4-yl)imidazo[1,2-a]pyrazin-8-yl]-1,2-thiazol-5-amine Chemical compound N1([C@H](C)C2=NSC(NC=3C4=NC=C(N4C=C(C)N=3)C3=CNN=C3)=C2)C[C@H](C)O[C@H](C)C1 QBWKPGNFQQJGFY-QLFBSQMISA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- GZFGOTFRPZRKDS-UHFFFAOYSA-N 4-bromophenol Chemical compound OC1=CC=C(Br)C=C1 GZFGOTFRPZRKDS-UHFFFAOYSA-N 0.000 description 1
- RHMPLDJJXGPMEX-UHFFFAOYSA-N 4-fluorophenol Chemical compound OC1=CC=C(F)C=C1 RHMPLDJJXGPMEX-UHFFFAOYSA-N 0.000 description 1
- CYYZDBDROVLTJU-UHFFFAOYSA-N 4-n-Butylphenol Chemical compound CCCCC1=CC=C(O)C=C1 CYYZDBDROVLTJU-UHFFFAOYSA-N 0.000 description 1
- ZUTYZAFDFLLILI-UHFFFAOYSA-N 4-sec-Butylphenol Chemical compound CCC(C)C1=CC=C(O)C=C1 ZUTYZAFDFLLILI-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 206010037660 Pyrexia Diseases 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229940125846 compound 25 Drugs 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000012772 electrical insulation material Substances 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003261 o-tolyl group Chemical group [H]C1=C([H])C(*)=C(C([H])=C1[H])C([H])([H])[H] 0.000 description 1
- 235000010292 orthophenyl phenol Nutrition 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- ZMANZCXQSJIPKH-UHFFFAOYSA-O triethylammonium ion Chemical compound CC[NH+](CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-O 0.000 description 1
Landscapes
- Phenolic Resins Or Amino Resins (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、特に電子部品の封止または積層用の材料とし
て有用な化合物、樹脂、樹脂組成物及びその硬化物に関
する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to compounds, resins, resin compositions, and cured products thereof that are particularly useful as materials for sealing or laminating electronic components.
[従来の技術〕
一般にエポキシ樹脂は、接着性、耐薬品性、電気特性、
機械特性、耐熱性に優れているため接着剤、塗料、電気
絶縁材料などに幅広く用いられている。中でも電気電子
部品の分野では、従来のエポキシ樹脂が電気絶縁材料と
して多く用いられている。ICの封止剤としてエポキシ
樹脂、フェノールノボラック樹脂を主成分とした樹脂組
成物が使用されており、エポキシ樹脂としでは耐熱性に
優れた硬化物を与えるクレゾールノボラックのエポキシ
樹脂か多く使用されている。[Conventional technology] Epoxy resins generally have good adhesive properties, chemical resistance, electrical properties,
Due to its excellent mechanical properties and heat resistance, it is widely used in adhesives, paints, electrical insulation materials, etc. In particular, in the field of electrical and electronic components, conventional epoxy resins are often used as electrical insulating materials. Resin compositions containing epoxy resins and phenol novolac resins as main components are used as sealants for ICs, and cresol novolac epoxy resins are often used as epoxy resins, as they produce cured products with excellent heat resistance. .
[発明か解決しようとする課題]
近年の電子材料の発展に伴うICの高密度、高集積化は
、特に封止剤に対してより一層の耐熱性さらに低吸水を
要求することになった。とりわけ高密度実装におけるハ
ンダ浴浸漬という過酷な条件は硬化物に対して高耐熱、
低吸水率化という要求をますます強めている。しかし、
従来の組成物において、エポキシ樹脂として一般に用い
られているクレゾールノボラック型エポキシ樹脂を用い
た場合、耐熱性においてハンダ浴浸漬といった過酷な条
件に問題なく耐えられる硬化物は得られていない。また
、耐熱性を有する硬化物を与えるとして提案されている
、特開昭63−264622号公報記載のフェノール性
水酸基を有する芳香族アルデヒドとフェノール類を縮合
して得られるポリフェノールをエポキシ化をしたポリエ
ポキシ化合物などでは、その硬化物は、吸水率の面でク
レゾールノボラック型エポキシ樹脂の硬化物には及ばな
い。さらに、特開昭62−20206号公報には、lナ
フトールとホルムアルデヒドの縮合物のポリグリシジル
エーテルか提案されているがこのものは、硬化物の耐熱
性の向上は認められるものの、軟化点の上昇、あるいは
、溶融粘度の上昇がみられ作業性を損なうという欠点を
有する。[Problems to be Solved by the Invention] The high density and high integration of ICs accompanying the recent development of electronic materials has required particularly higher heat resistance and lower water absorption for sealants. In particular, the harsh conditions of immersion in a solder bath during high-density mounting require high heat resistance and
Demand for lower water absorption rates is increasing. but,
In conventional compositions, when a cresol novolak type epoxy resin, which is commonly used as an epoxy resin, is used, a cured product that has heat resistance and can withstand harsh conditions such as immersion in a solder bath without any problem has not been obtained. Furthermore, a polyphenol prepared by epoxidizing a polyphenol obtained by condensing an aromatic aldehyde having a phenolic hydroxyl group with phenols described in JP-A No. 63-264622 has been proposed to provide a cured product having heat resistance. When it comes to epoxy compounds, the cured products thereof are not as good as the cured products of cresol novolac type epoxy resins in terms of water absorption. Furthermore, JP-A No. 62-20206 proposes a polyglycidyl ether of a condensate of l-naphthol and formaldehyde, which improves the heat resistance of the cured product, but increases the softening point. Alternatively, the melt viscosity increases, which impairs workability.
一方、硬化剤として一般に使用されているフェノールノ
ボラック樹脂は耐熱性の面で未だ不十分であり、低分子
量体(2核体フェノールノボラック)を少なくする試み
などがなされているものの、ますます過酷になっていく
条件下(例えば、ハンダ浴浸漬)には、満足な結果をも
たらしていない。そこで耐熱性、低吸水率性の硬化物を
与え、更に良好な作業性を兼ね備えた樹脂の開発が待ち
望まれている。On the other hand, the phenol novolak resins commonly used as curing agents still have insufficient heat resistance, and although attempts have been made to reduce the amount of low molecular weight substances (binuclear phenol novolacs), Under increasing conditions (e.g. solder bath immersion), satisfactory results have not been achieved. Therefore, there is a need for the development of a resin that provides a cured product with heat resistance and low water absorption, and also has better workability.
[課題を解決するための手段]
本発明者らは前述の課題を解決するために鋭意検討した
結果、ナフトール環を導入した特定の構造の化合物を使
用することにより硬化物の耐熱性と低吸水率化を同時に
実現することができ、しかも作業性が良好であることを
見いだし本発明を完成させるに至った。[Means for Solving the Problems] As a result of intensive studies in order to solve the above-mentioned problems, the present inventors have found that heat resistance and low water absorption of cured products can be achieved by using a compound with a specific structure into which a naphthol ring is introduced. The present invention was completed after discovering that it is possible to simultaneously achieve efficiency reduction and to have good workability.
即ち、本発明は、
(1) 式(I)
R1、R−、、R−s、R′1、R−7、R″8、R′
、は夫々独立して水素原子、炭素数1〜4のアルキル基
、アリール基、またはハロゲン原子を示す)で表される
化合物0式(I[)
(4) R,!がメチル基でR14が水素原子である
上記(3)に記載の化合物。That is, the present invention provides: (1) Formula (I) R1, R-, , Rs, R'1, R-7, R'8, R'
, each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group, or a halogen atom) Formula (I[) (4) R,! The compound according to (3) above, wherein is a methyl group and R14 is a hydrogen atom.
(5)式(IV)
■1@
(式中、R1゜、RII、R52、R′11、R′、2
は夫々独立して水素原子、炭素数1〜4のアルキル基、
フェニル基又はハロゲン原子を示す)で表される化合物
。(5) Formula (IV) ■1@ (In the formula, R1゜, RII, R52, R'11, R', 2
each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms,
phenyl group or halogen atom).
(3)式(III)
(式中、R3゜、R11、I’2+z、R′、1、R′
1.、は夫々独立して水素原子、炭素数1〜4のアルキ
ル基、フェニル基又はハロゲン原子を示す)で表わされ
る化合物。(3) Formula (III) (wherein, R3゜, R11, I'2+z, R', 1, R'
1. each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a halogen atom).
(6)式(V)
Js
(式中、R+sは炭素数1〜4のアルキル基、フェニル
基又はハロゲン原子を示し、R1は水素原子又は炭素数
1〜4のアルキル基を示す。)で表される化合物。(6) Formula (V) Js (wherein, R+s represents an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a halogen atom, and R1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.) compound.
(式中、R+sは炭素数1〜4のアルキル基、フェニル
基又はハロゲン原子を示し、R14は水素原子又は炭素
数1〜4のアルキル基を示す。)で表わされる化合物。(In the formula, R+s represents an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a halogen atom, and R14 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.)
R+3かメチル基でR1か水素原子である上記(6)に
記載の化合物。The compound according to (6) above, wherein R+3 is a methyl group and R1 is a hydrogen atom.
上記(1)に記載の化合物を含んでなるノボラック型樹
脂。A novolak-type resin comprising the compound described in (1) above.
上記(2)、(3)又は(4)記載の化合物を含んでな
るフェノール類ノボラック型樹脂。A phenolic novolac type resin comprising the compound described in (2), (3) or (4) above.
(lO)上記(5)、(6)又は(7)記載の化合物を
含んでなるフェノール類ノボラック型エポキシ樹脂。(lO) A phenolic novolac type epoxy resin comprising the compound described in (5), (6) or (7) above.
(11) 化合物の含有量か30重量%以上である上
記(8)、(9)又はαω記載の樹脂。(11) The resin according to (8), (9) or αω, wherein the content of the compound is 30% by weight or more.
(12) (a)エポキシ樹脂としての式[VI)(
式中、R1、R1、R1、R1、R5、R6、R7、R
,、R,、R−、、R′ 5、R−、、R″7、R−、
、R−、は夫々独立して水素原子、炭素数1〜4のアル
キル基、アリール基またはハロゲン原子を示す。)で表
される化合物を含むフェノール類ノボラック型エポキシ
樹脂と、(b)硬化剤とを含んでなるエポキシ樹脂組成
物。(12) (a) Formula [VI) as epoxy resin (
In the formula, R1, R1, R1, R1, R5, R6, R7, R
,,R,,R-,,R'5,R-,,R″7,R-,
, R- each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group, or a halogen atom. An epoxy resin composition comprising a phenolic novolac type epoxy resin containing a compound represented by (b) a curing agent.
フェノール類ノボラック型エポキシ樹脂が、上記αω記
載の樹脂である上記α2記載のエポキシ樹脂組成物。The epoxy resin composition according to α2 above, wherein the phenolic novolac type epoxy resin is the resin described above αω.
(+ 4 ) (alエポキシ樹脂と、fb)硬化剤
としての式[
(式中、R1、R2、R2、R1、R5、R6、R7、
R,、R,、R−、、R−、、R−、、R7、R′8、
R−、は夫々独立して、水素原子、炭素数1〜4のアル
キル基、アリール基またはハロゲン原子を示す)で表さ
れる化合物を含むフェノール類ノボラック型樹脂とを含
んでなるエポキシ樹脂組成物。(+4) (Al epoxy resin and fb) Formula as curing agent [ (wherein, R1, R2, R2, R1, R5, R6, R7,
R,,R,,R-,,R-,,R-,,R7,R'8,
An epoxy resin composition comprising a phenolic novolak type resin containing a compound represented by R-, each independently representing a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group, or a halogen atom. .
(15) フェノール類ノボラック型衝脂が上記(9
)記載の樹脂である上記α4記載のエポキシ樹脂組成物
。(15) The phenolic novolac type fat is the above (9
) The epoxy resin composition described in α4 above, which is the resin described in ).
(16) (a)エポキシ樹脂としての上記uz記載
のフェノール類ノボラック型エポキシ衝脂と、(bl硬
化剤としての上記Iに記載のフェノール類ノボラック型
樹脂、とを含んでなるエポキシ樹脂組成物。(16) (a) An epoxy resin composition comprising the phenolic novolak type epoxy resin described in the above uz as an epoxy resin and the phenolic novolac type resin described in the above I as a bl curing agent.
(17) フェノール類ノボラック型エポキシ樹脂が
上記叫記載の樹脂であり、フェノール類ノボラック型樹
脂か上記(9)記載の樹脂である、上記αω記載のエポ
キシ樹脂組成物。(17) The epoxy resin composition according to the above αω, wherein the phenolic novolak type epoxy resin is the resin described in the above description, and the phenolic novolac type resin is the resin described in the above (9).
(18)硬化促進剤を含む上記α2、α3.Q41、α
9、ae又はαη記載のエポキシ樹脂組成物。(18) The above α2, α3. Q41, α
9. The epoxy resin composition described in ae or αη.
(19)式[■〕
1”IF5
R3
(式中、R1、R7、R2は夫々独立して水素原子、炭
素数1〜4のアルキル基、アリール基又はハロゲン原子
を示す)で表される化合物のうち対応するものと、
式[IX]
OH
(式中、R4、R6、R6、R7、R,、R1、は夫々
独立して水素原子、炭素数1〜4のアルキル基、アリー
ル基又はハロゲン原子を示す)で表されるナフトール類
のうち対応するものとを反応させて得られる上記(8)
、(9)又はαυ記載の樹脂。(19) Compound represented by formula [■] 1”IF5 R3 (wherein R1, R7, and R2 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group, or a halogen atom) Corresponding ones of formula [IX] OH (wherein R4, R6, R6, R7, R,, R1 are each independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group, or a halogen The above (8) obtained by reacting with the corresponding naphthols represented by
, (9) or the resin described in αυ.
(20)フェノール類ノボラック型樹脂が上記α9で得
られる樹脂である上記Q4、αS、αe、面又は0gの
エポキシ樹脂組成物。(20) The above Q4, αS, αe, surface or 0 g epoxy resin composition, wherein the phenolic novolac type resin is the resin obtained in the above α9.
(21)上記0窃で得られる樹脂を更にエビハロヒドリ
ン化合物と反応させて得られる上記(8)、aIll又
はaυ記載の樹脂。(21) The resin described in (8) above, aIll or aυ, which is obtained by further reacting the resin obtained in the above process with an shrimp halohydrin compound.
(22) フェノール類ノボラック型エポキシ樹脂か
上記(21)で得られる樹脂である上記αり、aa、α
G、0η又は08のエポキシ樹脂組成物。(22) The above α, aa, α which is a phenolic novolak type epoxy resin or a resin obtained in the above (21)
Epoxy resin composition of G, 0η or 08.
(23)上記0り、aa、I、α9、ae、tt’n、
aa、w又は(22)のエポキシ樹脂組成物の硬化物。(23) 0ri, aa, I, α9, ae, tt'n,
A cured product of the epoxy resin composition of aa, w or (22).
に関するものである。It is related to.
以下、本発明の詳細な説明する。The present invention will be explained in detail below.
本発明の化合物において、炭素数1〜4のアルキル基と
しては、メチル基、エチル基、n−ブロビル基、イソプ
ロピル基、n−ブチル基、イソブチル基、S−ブチル基
、t−ブチル基が挙げられ、特にメチル基、t−ブチル
基が好ましい。アリール基としては、フェニル基、4−
メチルフェニル基、2−メチルフェニル基等が挙げられ
るが、特にフェニル基が好ましい。ハロゲン原子として
は、塩素原子、フッ素原子、臭素原子、ヨウ素原子等が
挙げられるが、特に塩素原子が好ましい。In the compound of the present invention, examples of the alkyl group having 1 to 4 carbon atoms include methyl group, ethyl group, n-brobyl group, isopropyl group, n-butyl group, isobutyl group, S-butyl group, and t-butyl group. Among them, methyl group and t-butyl group are particularly preferred. As the aryl group, phenyl group, 4-
Examples include methylphenyl group and 2-methylphenyl group, with phenyl group being particularly preferred. Examples of the halogen atom include a chlorine atom, a fluorine atom, a bromine atom, an iodine atom, and the like, with a chlorine atom being particularly preferred.
本発明の化合物及びこれを含んでなる樹脂のうち、特に
好ましいものは、式[II]又は式[V]で表される化
合物及びこれを含んでなる樹脂である。Among the compounds of the present invention and resins containing the same, particularly preferred are compounds represented by formula [II] or formula [V] and resins containing the same.
本発明の化合物及びこれを含んでなる樹脂は、次のよう
にして製造することかできる。The compound of the present invention and the resin containing the same can be produced as follows.
即ち、式〔■〕で表される化合物と式(IX)で表され
るナフトール類とを酸触媒の存在下に脱水縮合させるこ
とにより製造できる。That is, it can be produced by dehydrating and condensing a compound represented by formula [■] and a naphthol represented by formula (IX) in the presence of an acid catalyst.
式〔■〕で表されるジメチロール化合物としては、2−
メチルフェノールジメチロール化合物、4−メチルフェ
ノールジメチロール化合物、2.3−ジメチルフェノー
ルジメチロール化合物、2,5−ジメチルフェノールジ
メチロール化合物、3,4−ジメチルフェノールジメチ
ロール化合物、2.3.5−トリメチルフェノールジメ
チロール化合物、4−エチルフェノールジメチロール化
合物、4−n−プロピルフェノールジメチロール化合物
、4−i−プロピルフェノールジメチロール化合物、4
−n−ブチルフェノールジメチロール化合物、4−s−
ブチルフェノールジメチロール化合物、4−t−ブチル
フェノールジメチロール化合物等の1置換〜3置換のア
ルキルフェノールジメチロール化合物、2−フェニルフ
ェノールジメチロール化合物、4−フェニルフェノール
ジメチロール化合物、または、4−フルオロフェノール
ジメチロール化合物、4−クロロフェノールジメチロー
ル化合物、4−ブロモフェノールジメチロール化合物な
どのハロゲン置換フェノールジメチロール化合物、ある
いは2−クロル−3−メチルフェノールジメチロール化
合物などが挙げられるが、これらに限定されるものでは
ない。The dimethylol compound represented by the formula [■] is 2-
Methylphenol dimethylol compound, 4-methylphenol dimethylol compound, 2,3-dimethylphenol dimethylol compound, 2,5-dimethylphenol dimethylol compound, 3,4-dimethylphenol dimethylol compound, 2.3.5- Trimethylphenol dimethylol compound, 4-ethylphenol dimethylol compound, 4-n-propylphenol dimethylol compound, 4-i-propylphenol dimethylol compound, 4
-n-butylphenol dimethylol compound, 4-s-
Butylphenol dimethylol compound, 1- to 3-substituted alkylphenol dimethylol compound such as 4-t-butylphenol dimethylol compound, 2-phenylphenol dimethylol compound, 4-phenylphenol dimethylol compound, or 4-fluorophenol dimethylol compounds, halogen-substituted phenol dimethylol compounds such as 4-chlorophenol dimethylol compounds, 4-bromophenol dimethylol compounds, and 2-chloro-3-methylphenol dimethylol compounds, but are limited to these. isn't it.
また、式(IX)で表されるナフトール類としては、!
−ナフトール、2−ナフトール、l−メチル−2−ナフ
トール、2−メチル−1−ナフトール、などが挙げられ
ナフトール環の5.6.7.8位に置換基を導入しても
構わない。Moreover, as the naphthols represented by formula (IX),!
-naphthol, 2-naphthol, 1-methyl-2-naphthol, 2-methyl-1-naphthol, etc., and substituents may be introduced at positions 5, 6, 7, and 8 of the naphthol ring.
以上のうち、ジメチロール化合物としては、式〔X)
H
(式中、Rは炭素数1〜4のアルキル基、フェニル基又
はハロゲン原子を示す)で表される4−位置換フェノー
ルのジメチロール化合物か好ましい。特に、4−メチル
フェノールジメチロール化合物か最も好ましい。また、
ナフトール類としては、特にl−ナフトール、2−メチ
ル−■−ナフトール類か好ましい。Among the above, the dimethylol compound is a dimethylol compound of a phenol substituted at the 4-position represented by the formula [X) H (wherein R represents an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a halogen atom). preferable. In particular, 4-methylphenol dimethylol compounds are most preferred. Also,
As the naphthols, l-naphthol and 2-methyl-■-naphthol are particularly preferred.
酸触媒としては、塩酸、硫酸、リン酸、Pトルエンスル
ホル酸、しゆう酸等が使用でき、酸触媒は式〔■〕で表
される化合物の0、1〜30重量%用いるのが好ましい
。また、ナフトール類は式〔■〕で表される化合物に対
して2〜15モル倍用いるのが好ましい。反応は、無溶
媒でも、ベンゼン、トルエン、メチルイソブチルケトン
等の溶媒中でも行うことができる。反応温度は、20〜
150℃の範囲が好ましい。反応終了後、使用した触媒
を水洗等により除去し、溶媒及び過剰のナフトール類を
減圧下に留去することにより目的の式〔■〕で表される
フェノール類ノボラック型化合物(式[1]においてX
がHを示すもの)を含むフェノール類ノボラック型樹脂
か得られる。As the acid catalyst, hydrochloric acid, sulfuric acid, phosphoric acid, P-toluenesulfonic acid, oxalic acid, etc. can be used, and it is preferable to use the acid catalyst in an amount of 0.1 to 30% by weight of the compound represented by formula [■]. . Moreover, it is preferable to use naphthols in an amount of 2 to 15 times the mole of the compound represented by formula [■]. The reaction can be carried out without a solvent or in a solvent such as benzene, toluene, methyl isobutyl ketone, or the like. The reaction temperature is 20~
A range of 150°C is preferred. After the reaction is completed, the used catalyst is removed by washing with water, etc., and the solvent and excess naphthol are distilled off under reduced pressure to obtain the desired phenolic novolak type compound represented by formula [■] (in formula [1]). X
is H).
このようにして得られるフェノール類ノボラック型樹脂
は、式〔■〕で表される化合物(式[I]においてXが
Hを示すもの)を30重量%以上含むのが好ましく、特
に35重量%以上含むのが好ましい。The phenolic novolac type resin obtained in this way preferably contains 30% by weight or more, particularly 35% by weight or more of the compound represented by formula [■] (in formula [I], X represents H). It is preferable to include.
次に、このようにして得られた式[■]で表されるフェ
ノール類ノボラック型化合物又は該化合物を含むフェノ
ール類ノボラック型樹脂に式[XI]
(式中、Xはハロゲン原子を表す)
で表されるエビハロヒドリン化合物を塩基性化合物の存
在下で反応させることにより、式[VI]で表される化
合物(式[I]においてXがボラック型エボキソ樹脂か
容易に得られる。Next, the phenolic novolac type compound represented by the formula [■] obtained in this way or the phenolic novolac type resin containing the compound is added with the formula [XI] (wherein, X represents a halogen atom). By reacting the shrimp halohydrin compound represented by the formula in the presence of a basic compound, a compound represented by the formula [VI] (in the formula [I], X is a borac type eboxo resin) can be easily obtained.
前記式(X I )において、Xで表されるハロゲン原
子としてCf、Br、■等か挙げられ、式[X I ]
の化合物としては、具体的には、エピクロルヒドリン、
エビブロムヒドリン、エビヨードヒドリン等が挙げられ
、これらの混合物を用いることもできるが工業的にはエ
ピクロルヒドリンが好適に使用される。In the formula (X I ), examples of the halogen atom represented by X include Cf, Br, ■, etc., and the formula [X I ]
Specifically, the compounds include epichlorohydrin,
Examples include shrimp bromohydrin and shrimp iodohydrin, and mixtures thereof can also be used, but epichlorohydrin is preferably used industrially.
式[■]で表される化合物又はこの化合物を含むフェノ
ール類ノボラック型樹脂とエビハロヒドリン化合物の反
応は公知の方法により行うことか出来る。The reaction between the compound represented by the formula [■] or the phenolic novolac type resin containing this compound and the shrimp halohydrin compound can be carried out by a known method.
例えば、式[■]で表される化合物又はこれを含むフェ
ノール類ノボラック型樹脂と、その水酸基当量に対して
過剰モル量のエビハロヒドリン化合物とを、テトラメチ
ルアンモニウムクロリド、テトラメチルアンモニウムプ
ロミド、トリエチルアンモニウムクロリドなどの第4級
ア〉モニウム塩または水酸化ナトリウム、水酸化カリウ
ムなどのアルカリ金属水酸化物などの存在下で反応させ
、第4級アンモニウム塩などを用いた場合は開環付加反
応の段階で反応がとまるので次いて上記アルカリ金属水
酸化物を加えて閉環反応させる。For example, a compound represented by the formula [■] or a phenolic novolac type resin containing the same, and an excess molar amount of the shrimp halohydrin compound relative to the hydroxyl equivalent thereof, are combined with tetramethylammonium chloride, tetramethylammonium bromide, triethylammonium The reaction is carried out in the presence of a quaternary ammonium salt such as chloride or an alkali metal hydroxide such as sodium hydroxide or potassium hydroxide. If a quaternary ammonium salt is used, the ring-opening addition reaction step Since the reaction stops, the above alkali metal hydroxide is then added to cause a ring-closing reaction.
また、最初からアルカリ金属水酸化物を加えて反応する
場合は、開環付加反応および閉環反応を一気に行わせる
。In addition, when reacting by adding an alkali metal hydroxide from the beginning, the ring-opening addition reaction and the ring-closing reaction are performed at once.
エビハロヒドリン化合物の使用割合は、式[■]で表さ
れる化合物又はこれを含むフェノール類ノボラック型樹
脂の水酸基当量lに対して通常1〜50モル、好ましく
は3〜15モルの範囲である。The proportion of the shrimp halohydrin compound to be used is generally 1 to 50 moles, preferably 3 to 15 moles, per 1 of the hydroxyl equivalent of the compound represented by formula [■] or the phenolic novolak type resin containing the same.
又、この際、反応を円滑に行なわせる為、メタノールな
どのアルコール類、あるいはアセトン又はジメチルスル
ホキシド、ジメチルスルホン、ジメチルホルムアミドな
どの非プロトン性極性溶媒を用いることができ、特にジ
メチルスルホキシドを用いることは好ましい。In addition, in order to facilitate the reaction, alcohols such as methanol, or aprotic polar solvents such as acetone, dimethyl sulfoxide, dimethyl sulfone, and dimethyl formamide can be used. In particular, dimethyl sulfoxide is not recommended. preferable.
アルカリ金属水酸化物の使用量は、式[■]で表される
化合物又はこれを含むフェノール類ノボラック型樹脂の
水酸基当量lに対して通常0.8〜1.5モル、好まし
くは0.9〜1.3モルの範囲であり、第4級アンモニ
ウム塩を使用する場合その使用量は、式[■]で表され
る化合物又はこれを含むフェノール類ノボラック型樹脂
の水酸基当量lに対して通常o、 o o t −tモ
ル、好ましくは0.005〜0.5モルの範囲である。The amount of alkali metal hydroxide used is usually 0.8 to 1.5 mol, preferably 0.9 mol per hydroxyl equivalent of the compound represented by formula [■] or the phenolic novolac type resin containing the same. ~1.3 mol, and when a quaternary ammonium salt is used, the amount used is usually within the range of 1 mol of hydroxyl group of the compound represented by formula [■] or the phenolic novolak type resin containing it. o, o o t -t mol, preferably in the range of 0.005 to 0.5 mol.
反応温度は通常30〜130°C好ましくは40〜12
0℃である。The reaction temperature is usually 30-130°C, preferably 40-120°C.
It is 0°C.
また反応で生成した水を反応系外に除去しながら反応を
進行させることもできる。Furthermore, the reaction can be allowed to proceed while removing water produced in the reaction from the reaction system.
反応終了後副生じた塩を、水洗、ろ過等により除去し過
剰のエピハロヒドリン化合物を留去することにより、式
[VI]で表される化合物を含むフェノール類ノボラッ
ク型エポキシ樹脂か得られる。After completion of the reaction, by-produced salts are removed by water washing, filtration, etc., and excess epihalohydrin compound is distilled off, thereby obtaining a phenolic novolac type epoxy resin containing the compound represented by formula [VI].
このようにして得られるフェノール類ノボラック型エポ
キシ樹脂は、式[VI]で表される化もの)を30!貢
%以上含むのか好ましく、特に35重量%以上含むのか
好ましい。The phenolic novolac type epoxy resin thus obtained has a compound represented by the formula [VI]) of 30! It is preferable that the content is at least 35% by weight, particularly preferably at least 35% by weight.
以下、本発明のエポキシ樹脂組成物について説明する。The epoxy resin composition of the present invention will be explained below.
前記αL(13、αG、α力、α印、(22)のエポキ
シ樹脂組成物において、
本発明のフェノール類ノボラック型エポキシ樹脂は単独
で又は他のエポキシ樹脂と併用して使用することができ
る。併用する場合、本発明のフェノール類ノボラック型
エポキシ樹脂の全エポキシ樹脂中に占める割合は30重
量%以上が好ましく、特に50重量%以上が好ましい。In the epoxy resin composition of αL (13, αG, α force, α mark, (22)), the phenolic novolac type epoxy resin of the present invention can be used alone or in combination with other epoxy resins. When used together, the proportion of the phenolic novolac type epoxy resin of the present invention in the total epoxy resin is preferably 30% by weight or more, particularly preferably 50% by weight or more.
本発明のフェノール類ノボラック型エポキシ樹脂と併用
される他のエポキシ樹脂としては、ビスフェノールA型
エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ビス
フェノールS型エポキシ樹脂、指環式エポキシ樹脂、ビ
フェニル型エポキシ樹脂等も使用できるが、特にノボラ
ック型エポキシ樹脂が耐熱性の点で有利である。Other epoxy resins used in combination with the phenolic novolak epoxy resin of the present invention include bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, ring type epoxy resin, biphenyl type epoxy resin, etc. However, novolac type epoxy resin is particularly advantageous in terms of heat resistance.
たとえば、クレゾールノボラック型エポキシ樹脂、フェ
ノールノボラック型エポキシ樹脂、臭素化フェノールノ
ボラック型エポキシ樹脂なとか挙げられるがこれらに限
定されるものではない。Examples include, but are not limited to, cresol novolac type epoxy resins, phenol novolac type epoxy resins, and brominated phenol novolac type epoxy resins.
これらは単独で用いてもよく、2種以上併用してもよい
。These may be used alone or in combination of two or more.
前記α4、α9、αe、a7)、aε、(イ)のエポキ
シ樹脂組成物において、本発明のフェノール類ノボラッ
ク型樹脂は単独で又は他の硬化剤と併用して使用するこ
とができる。併用する場合、本発明のフェノール類ノボ
ラック型樹脂の全硬化剤中に占める割合は30重量%以
上か好ましく、特に50重量%以上が好ましい。In the epoxy resin compositions α4, α9, αe, a7), aε, and (a), the phenolic novolac type resin of the present invention can be used alone or in combination with other curing agents. When used together, the proportion of the phenolic novolac type resin of the present invention in the total curing agent is preferably 30% by weight or more, particularly preferably 50% by weight or more.
本発明のフェノール類ノボラック型樹脂と併用される他
の硬化剤としては、
例えば脂肪属ポリアミン、芳香属ポリアミン、ポリアミ
ドポリアミン等のポリアミン系硬化剤、無水へキサヒド
ロフタル酸、無水メチルテトラヒドロフタル酸等の酸無
水物系硬化剤、フェノールノボラック、クレゾールノボ
ラック等のフェノール系硬化剤、三フッ化ホウ素等のル
イス酸又はそれらの塩類、シシアンジアミF類等の硬化
剤等か挙げられるが、これらに限定されるものではない
。これらは単独で用いてもよく、2種以上併用してもよ
い。Other curing agents used in combination with the phenolic novolak type resin of the present invention include, for example, polyamine curing agents such as aliphatic polyamines, aromatic polyamines, polyamide polyamines, hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, etc. Examples include, but are not limited to, acid anhydride curing agents, phenol curing agents such as phenol novolak and cresol novolak, Lewis acids such as boron trifluoride or their salts, and curing agents such as ciscyandiami F. It's not something you can do. These may be used alone or in combination of two or more.
前記−、α9、a8、(2)のエポキシ樹脂組成物にお
いて、(alエポキシ樹脂としては、本発明のフェノー
ル類ノボラック型エポキシ樹脂の他に、前記他のエポキ
シ樹脂等か挙げられる。In the epoxy resin composition of -, α9, a8, (2), examples of the (al epoxy resin) include the phenolic novolac type epoxy resin of the present invention as well as the other epoxy resins mentioned above.
前記αり、a3.0段、(22)のエポキシ樹脂組成物
において、tb+硬化剤としては、本発明のフェノール
類ノボラック型樹脂の他に、前記他の硬化剤等が挙げら
れる。In the epoxy resin composition having α-ri, a3.0 step, (22), examples of the tb+ curing agent include the above-mentioned other curing agents in addition to the phenolic novolac type resin of the present invention.
本発明のエポキシ樹脂組成物において、(b)硬化剤の
使用量は、(alエポキシ樹脂のエポキシ基1当量に対
して0.5〜1.5当量が好ましく特に0.6〜1.2
当量が好ましい。In the epoxy resin composition of the present invention, the amount of the curing agent (b) used is preferably 0.5 to 1.5 equivalents, particularly 0.6 to 1.2 equivalents per equivalent of epoxy groups in the (al epoxy resin).
Equivalent amounts are preferred.
硬化促進剤としては、2−メチルイミダゾール、2−エ
チルイミダゾール等のイミダゾール系化合物、2−(ジ
メチルアミノメチル)フェノール等の第3アミン系化合
物、トリフェニルホスフィン等のホスフィン化合物等か
挙げられ、公知の種々の硬化促進剤か使用でき、特に限
、定されるものではない。硬化促進剤の使用量はエポキ
シ樹脂(al 100重量部に対して0.01−15重
量部の範囲か好ましく、特に0.1−10重量部の範囲
が好ましい。Examples of the curing accelerator include imidazole compounds such as 2-methylimidazole and 2-ethylimidazole, tertiary amine compounds such as 2-(dimethylaminomethyl)phenol, and phosphine compounds such as triphenylphosphine. Various curing accelerators can be used, and there are no particular limitations. The amount of the curing accelerator used is preferably in the range of 0.01-15 parts by weight, particularly preferably in the range of 0.1-10 parts by weight, per 100 parts by weight of the epoxy resin (al).
本発明のエポキシ樹脂組成物には、更に必要に応じて公
知の添加剤を配合することかでき、添加剤としては、例
えばシリカ、アルミナ、タルク、ガラス繊維等の無機充
填剤、シランカップリング剤のような充填剤の表面処理
剤、離型剤、顔料等が挙げられる。The epoxy resin composition of the present invention may further contain known additives as necessary. Examples of additives include inorganic fillers such as silica, alumina, talc, and glass fiber, and silane coupling agents. Examples include surface treatment agents for fillers such as, mold release agents, and pigments.
本発明のエポキシ樹脂組成物は、各成分を均一に混合す
ることにより得られる。The epoxy resin composition of the present invention is obtained by uniformly mixing each component.
本発明のエポキシ樹脂組成物は、通常130〜170の
温度で30〜300秒の範囲で予備硬化し、さらに15
0〜200℃の温度で2〜8時間後硬化することにより
充分な硬化反応か進行し、本発明の硬化物か得られる。The epoxy resin composition of the present invention is usually precured at a temperature of 130 to 170°C for 30 to 300 seconds, and further cured for 150 to 150 seconds.
By post-curing at a temperature of 0 to 200°C for 2 to 8 hours, a sufficient curing reaction proceeds, and the cured product of the present invention can be obtained.
こうして得られた硬化物は耐熱性を保持しながら、低吸
水性を有している。The cured product thus obtained has low water absorption while maintaining heat resistance.
このように、本発明の式[■]の化合物若しくはこれを
含むフェノール類ノボラック型樹脂及び/又は式[VI
]の化合物若しくはこれを含むフェノール類ノボラック
型エポキシ樹脂を用いて得られる硬化物は、高耐熱、低
吸水性の二つの特性を兼ね備えた優れた性能を有する。In this way, the compound of formula [■] of the present invention or the phenolic novolac type resin containing the same and/or the compound of formula [VI
] The cured product obtained using the compound or the phenolic novolac type epoxy resin containing the same has excellent performance that combines the two characteristics of high heat resistance and low water absorption.
従って、本発明の上記化合物又は樹脂は、耐熱性、低吸
水性の要求される広範な分野で、エポキシ樹脂として、
あるいはその硬化剤として用いることかできる。具体的
には、絶縁材料、積層板、封止材料等あらゆる電気電子
材料の配合成分として宵月である。又、成型材料、複合
材料等の分野に用いることができる。エポキシ樹脂成分
、硬化剤成分の両方に本発明のフェノール類ノボラック
型エポキシ樹脂及びフェノール類ノボラック型樹脂を用
いることによりその効果は倍増する。また、本発明の樹
脂はナフトール環を有するにもかかわらず軟化点が低く
抑えられているためトランスファー成型等、従来通りの
手法を用いることかできる。Therefore, the above compound or resin of the present invention can be used as an epoxy resin in a wide range of fields where heat resistance and low water absorption are required.
Alternatively, it can be used as a curing agent. Specifically, it is used as a compounding component of all electrical and electronic materials such as insulating materials, laminates, and sealing materials. Furthermore, it can be used in fields such as molding materials and composite materials. By using the phenolic novolac type epoxy resin and phenolic novolac type resin of the present invention for both the epoxy resin component and the curing agent component, the effect is doubled. Further, since the resin of the present invention has a low softening point despite having a naphthol ring, conventional methods such as transfer molding can be used.
[実施例] 以下に実施例を挙げて本発明を説明する。[Example] The present invention will be explained below with reference to Examples.
実施例1゜
4−メチルフェノール162g(1,5モル)、バラホ
ルムアルデヒド90g(3モル)及び水100−を温度
計、冷却管、滴下ロート及び攪拌機を付けた12のフラ
スコに仕込み、窒素を吹込みなから攪拌した。Example 1 162 g (1.5 moles) of 4-methylphenol, 90 g (3 moles) of paraformaldehyde, and 100 g of water were charged into 12 flasks equipped with a thermometer, condenser, dropping funnel, and stirrer, and nitrogen was blown into the flasks. I stirred it because it was a bit crowded.
室温下、15%水酸化ナトリウム水溶液120g(水酸
化ナトリウムとして0.45モル)を発熱に注意しなが
ら液温か50°Cを越えないようにゆっくり滴下した。At room temperature, 120 g of a 15% aqueous sodium hydroxide solution (0.45 mol as sodium hydroxide) was slowly added dropwise while being careful not to generate heat so that the liquid temperature did not exceed 50°C.
その後、水浴中で50°Cまで加熱し、10時間反応し
た。反応終了時、水300−を加え室温まで冷却し発熱
に注意しながら、10%塩酸水溶液で中和し、その後、
析出した結晶を濾取した。濾液のpHが6〜7になるま
で洗浄し、減圧下(10mHg)50″Cで乾燥し、白
色結晶の4−メチルフェノールジメチロール化合物(A
M)(式[X]においてRがメチル基の化合物)202
gを得た。Thereafter, the mixture was heated to 50°C in a water bath and reacted for 10 hours. At the end of the reaction, add 300ml of water, cool to room temperature, and neutralize with a 10% aqueous hydrochloric acid solution while paying attention to heat generation.
The precipitated crystals were collected by filtration. The filtrate was washed until the pH was 6 to 7, dried under reduced pressure (10 mHg) at 50''C, and white crystals of 4-methylphenol dimethylol compound (A
M) (Compound where R is a methyl group in formula [X]) 202
I got g.
こうして得られた白色結晶の4−メチルフェノールジメ
チロール化合物(AM)168gを温度計、攪拌機を付
けたガラス容器に仕込み、さらにl−ナフトール100
8g及びメチルイソブチケトン1500−を加えて窒素
雰囲気下で室温で攪拌した。そして、p−トルエンスル
ホン酸1.7 gを発熱に注意し、液温が50°Cを越
えないよう徐々に添加した。168 g of the thus obtained white crystalline 4-methylphenol dimethylol compound (AM) was charged into a glass container equipped with a thermometer and a stirrer, and 100 g of l-naphthol was added.
8 g and 1,500 g of methyl isobutiketone were added, and the mixture was stirred at room temperature under a nitrogen atmosphere. Then, 1.7 g of p-toluenesulfonic acid was gradually added, being careful not to generate heat, so that the liquid temperature did not exceed 50°C.
添加後、油浴上で50°Cまで加温し2時間反応させた
後、分液ロートに移し水洗した。洗滌水が中性を示すま
で水洗後、有機層から溶媒及び未反応物を減圧下に除去
し、本発明のフェノール類ノボラック型樹脂(A−1)
370gを得た。生成物(A−1)の軟化温度(JIS
K2425環球法)は112℃で水酸基当量(g/ m
o 1! )は138であった。After the addition, the mixture was heated to 50°C on an oil bath and reacted for 2 hours, then transferred to a separatory funnel and washed with water. After washing with water until the washing water shows neutrality, the solvent and unreacted substances are removed from the organic layer under reduced pressure to obtain the phenolic novolac type resin (A-1) of the present invention.
370g was obtained. Softening temperature (JIS
K2425 ring and ball method) is the hydroxyl equivalent (g/m
o 1! ) was 138.
実施例2
実施例1においてl−ナフトールの使用量を576gと
した以外は実施例1と同様の操作により生成物(A−2
)368gを得た。生成物(A−2)の軟化温度は11
7°Cで水酸基当量は137であった。Example 2 The product (A-2
) 368g was obtained. The softening temperature of product (A-2) is 11
The hydroxyl equivalent was 137 at 7°C.
実施例3゜
実施例1において1−ナフトールの使用量を432gと
した以外は実施例1と同様の操作により生成物(A−3
)365gを得た。生成物(A−3)の軟化温度は11
8℃で水酸基当量は137であった。Example 3 The product (A-3
) 365g was obtained. The softening temperature of product (A-3) is 11
The hydroxyl equivalent was 137 at 8°C.
実施例4゜
実施例1におい・てl−ナフトール1008gの代わり
に2−ナフトール1008gを用いた以外は実施例1と
同様の操作により生成物(A−4)371gを得た。生
成物(A −4>の軟化温度は113℃で水酸基当量は
138であった。Example 4 371 g of product (A-4) was obtained in the same manner as in Example 1 except that 1008 g of 2-naphthol was used instead of 1008 g of l-naphthol. The product (A-4> had a softening temperature of 113°C and a hydroxyl equivalent of 138.
実施例5゜
4−t−ブチルフェノール222g(1,5モル)、パ
ラホルムアルデヒド90g(3モル)及び水100−を
温度計、冷却管、滴下ロート及び攪拌機を取り付けたl
I!のフラスコに仕込み、窒素を吹き込みなから攪拌し
た。室温下、15%水酸化ナトリウム水溶液120g(
水酸化ナトリウムとして0.45モル)を発熱に注意し
なから液温か50℃を越えないようにゆっくり滴下した
。その後、水浴中で50°Cにて10時間反応した。反
応終了後、水300−を加え室温まで冷却し発熱に注意
しながら10%塩酸水溶液で中和した。クロロホルムを
5001R1加えて油層を分離し、水−メタノール溶液
(水:メタノール=80/20(重量%))にて洗浄し
、無水硫酸ナトリウムを加えて乾燥した。続いて、減圧
下でクロロホルムを除去し、黄緑色の粘りけのある液体
として4−t−ブチルフェノールジメチロール化合物(
AB)式[X]においてRがt−ブチル基の化合物25
6g (純度82%)を得た。こうして得られた4−t
−ブチルフェノールジメチロール化合物(AB)254
gを温度計、攪拌機をつけたガラス容器に仕込み、さら
に1−ナフトール576g及びメチルイソブチルケトン
1500rdを加えて窒素雰囲気下で室温において攪拌
した。そして、p−1ルエンスルホン酸!、7gを発熱
に注意し、液温か50°Cを越えないように徐々に添加
した。Example 5 222 g (1.5 moles) of 4-t-butylphenol, 90 g (3 moles) of paraformaldehyde, and 100 g of water were placed in a liter equipped with a thermometer, cooling tube, dropping funnel, and stirrer.
I! The mixture was poured into a flask and stirred after blowing in nitrogen. At room temperature, 120 g of 15% sodium hydroxide aqueous solution (
0.45 mol (as sodium hydroxide) was slowly added dropwise to the solution while being careful not to generate heat so that the liquid temperature did not exceed 50°C. Thereafter, the reaction was carried out in a water bath at 50°C for 10 hours. After the reaction was completed, 300 g of water was added, the mixture was cooled to room temperature, and neutralized with a 10% aqueous hydrochloric acid solution while being careful not to generate heat. 5001R1 of chloroform was added to separate the oil layer, washed with a water-methanol solution (water:methanol=80/20 (wt%)), and dried by adding anhydrous sodium sulfate. Subsequently, chloroform was removed under reduced pressure, and 4-t-butylphenol dimethylol compound (
AB) Compound 25 in which R is a t-butyl group in formula [X]
6g (purity 82%) was obtained. The 4-t thus obtained
-Butylphenol dimethylol compound (AB) 254
g was placed in a glass container equipped with a thermometer and a stirrer, and 576 g of 1-naphthol and 1500 rd of methyl isobutyl ketone were added thereto, followed by stirring at room temperature under a nitrogen atmosphere. And p-1 luenesulfonic acid! , 7 g was added gradually, being careful not to generate heat, so that the liquid temperature did not exceed 50°C.
添加後、湯浴中50°Cにて2時間反応させた後、分液
ロートに移し水洗した。洗浄水か中性を示すまで水洗後
、育機層から溶媒及び未反応物を減圧下で除去し、本発
明のフェノール類ノボラック型樹脂(A−5)414g
を得た。生成物(A−5)の軟化温度(JIS K2
425環球式〉は121℃で水酸基当量(g/mof)
は151であった。After the addition, the mixture was reacted for 2 hours at 50°C in a hot water bath, and then transferred to a separatory funnel and washed with water. After washing with water until the washing water becomes neutral, the solvent and unreacted substances were removed from the growing layer under reduced pressure, and 414 g of the phenolic novolac type resin (A-5) of the present invention was obtained.
I got it. Softening temperature of product (A-5) (JIS K2
425 ring and ball formula> is the hydroxyl group equivalent (g/mof) at 121°C
was 151.
実施例6゜
実施例5において!−ナフトールの代わりに2−ナフト
ール576gを使用した以外は、実施例5と同様の操作
により生成物(A−6)を420g得た。生成物(A−
6)の軟化温度は126℃で水酸基当量は152であっ
た。Example 6゜In Example 5! -420 g of product (A-6) was obtained in the same manner as in Example 5, except that 576 g of 2-naphthol was used instead of naphthol. Product (A-
The softening temperature of 6) was 126°C and the hydroxyl equivalent was 152.
実施例7゜
4−クロロフェノール193g(1,5モル)、パラホ
ルムアルデヒド90g(3モル)及び水100−を温度
計、冷却管、滴下ロート及び攪拌機を取り付けた11の
フラスコに仕込み、窒素を吹き込みながら攪拌した。室
温下、15%水酸化ナトリウム水溶液120g(水酸化
ナトリウムとして0.45モル)を発熱に注意しなから
液温か50℃を越えないようにゆっくり滴下した。その
後、水浴中で50℃にて10時間反応した。反応終了後
、水300−を加え室温まで冷却し発熱に注意しながら
10%塩酸水溶液で中和した。その後、析出した結晶を
濾取し、濾液のpHが6〜7になるまで洗浄し、減圧下
(10wHg)50°Cで乾燥し白色結晶の4−クロロ
フェノールジメチロール化合物(AC)(式〔X〕にお
いてRがCfの化合物)226 gを得た。こうして得
られた4−クロロフェノールジメチロール化合物(AC
)189gを温度計、攪拌機をつけたガラス容器に仕込
み、さらにl−ナフトール576g及びメチルイソブチ
ルケトン1500−を加えて窒素雰囲気下で室温におい
て攪拌した。そして、p−トルエンスルホン酸1.7
gを発熱に注意し、液温か50°Cを越えないように徐
々に添加した。添加後、湯浴中50℃にて2時間反応さ
せた後、分液ロートに移し水洗した。洗浄水が中性を示
すまで水洗後、有機層から溶媒及び未反応物を減圧下で
除去し、本発明に使用するフェノール類ノボラック型樹
脂(A−7)388gを得た。生成物(A−7)の軟化
温度(JIS K2425環球式)は118℃で水酸
基当量(g/mof)は142であった。Example 7 193 g (1.5 moles) of 4-chlorophenol, 90 g (3 moles) of paraformaldehyde, and 100 g of water were charged into 11 flasks equipped with a thermometer, condenser, dropping funnel, and stirrer, and nitrogen was blown into the flask. while stirring. At room temperature, 120 g of a 15% aqueous sodium hydroxide solution (0.45 mol as sodium hydroxide) was slowly added dropwise, being careful not to generate heat, so that the liquid temperature did not exceed 50°C. Thereafter, the reaction was carried out in a water bath at 50° C. for 10 hours. After the reaction was completed, 300 g of water was added, the mixture was cooled to room temperature, and neutralized with a 10% aqueous hydrochloric acid solution while being careful not to generate heat. Thereafter, the precipitated crystals were collected by filtration, washed until the pH of the filtrate became 6 to 7, and dried at 50°C under reduced pressure (10 wHg) to form white crystals of 4-chlorophenol dimethylol compound (AC) (formula [ 226 g of a compound in which R is Cf) was obtained. The 4-chlorophenol dimethylol compound (AC
) was placed in a glass container equipped with a thermometer and a stirrer, and 576 g of 1-naphthol and 1,500 g of methyl isobutyl ketone were added thereto, followed by stirring at room temperature under a nitrogen atmosphere. and p-toluenesulfonic acid 1.7
g was added gradually, being careful not to generate heat, so that the liquid temperature did not exceed 50°C. After the addition, the mixture was reacted for 2 hours at 50°C in a hot water bath, and then transferred to a separatory funnel and washed with water. After washing with water until the washing water became neutral, the solvent and unreacted substances were removed from the organic layer under reduced pressure to obtain 388 g of phenolic novolac type resin (A-7) used in the present invention. The softening temperature (JIS K2425 ring and ball system) of the product (A-7) was 118°C, and the hydroxyl equivalent (g/mof) was 142.
実施例8、
実施例7においてl−ナフトールの代わりに2−ナフト
ール576gを用いた以外は実施例7と同様の操作によ
り生成物(A−8)380gを得た。生成物(A−8)
の軟化温度は120℃で水酸基当量は144であった。Example 8 380 g of product (A-8) was obtained in the same manner as in Example 7 except that 576 g of 2-naphthol was used instead of 1-naphthol. Product (A-8)
The softening temperature was 120°C and the hydroxyl equivalent was 144.
実施例9゜
4−フェニルフェノール255g(1,5モル)、バラ
ホルムアルデヒド90g(3モル)及び水100−を温
度計、冷却管、滴下ロート及び攪拌機を付けたlI!の
フラスコに仕込み、窒素を吹込みながら攪拌した。室温
下、15%水酸化ナトリウム水溶液120g(水酸化ナ
トリウムとして0.45モル)を発熱に注意しながら、
液温か50℃を越えないようにゆっくり滴下した。Example 9 255 g (1.5 moles) of 4-phenylphenol, 90 g (3 moles) of paraformaldehyde, and 100 g of water were placed in a lI! equipped with a thermometer, condenser, dropping funnel, and stirrer. The mixture was charged into a flask and stirred while blowing nitrogen. At room temperature, add 120 g of a 15% aqueous sodium hydroxide solution (0.45 mol as sodium hydroxide) while being careful not to generate heat.
The mixture was slowly added dropwise so that the liquid temperature did not exceed 50°C.
その後、水浴中で50℃まで加熱し、200時間反応た
。反応終了後、水300rIdlを加え室温まで冷却し
、発熱に注意しながら、10%塩酸水溶液で中和した。Thereafter, the mixture was heated to 50° C. in a water bath and reacted for 200 hours. After the reaction was completed, 300 rIdl of water was added, the mixture was cooled to room temperature, and the mixture was neutralized with a 10% aqueous hydrochloric acid solution while being careful not to generate heat.
これにクロロホルム500−を加えて油層を分離し、水
−メタノール水溶液[水:メタノール=80:20(重
量%)]にて洗浄し、無水硫酸ナトリウムを加えて乾燥
した。続いて、減圧下でクロロホルムを除去し、黄色の
粘周液体として4−フェニルフェノールジメチロール化
合物(AP)(式[X]においてRがフェニル基の化合
物)305g(純度78%)を得た。Chloroform 500- was added to this to separate the oil layer, washed with a water-methanol aqueous solution [water:methanol=80:20 (wt%)], and dried by adding anhydrous sodium sulfate. Subsequently, chloroform was removed under reduced pressure to obtain 305 g (78% purity) of 4-phenylphenol dimethylol compound (AP) (a compound in which R is a phenyl group in formula [X]) as a yellow viscous liquid.
こうして得られた4−フェニルフェノールジメチロール
化合物(AP)295gを温度計、攪拌機を付けたガラ
ス容器に仕込み、さらにl−ナフトール576g及びメ
チルイソブチルケトン1500−を加えて窒素雰囲気下
で室温で攪拌した。そして、p−1ルエンスルホン酸1
、7 gを発熱に注意し、液温か50℃を越えないよう
に徐々に添加した。295 g of the 4-phenylphenol dimethylol compound (AP) thus obtained was placed in a glass container equipped with a thermometer and a stirrer, and 576 g of l-naphthol and 1,500 g of methyl isobutyl ketone were added and stirred at room temperature under a nitrogen atmosphere. . and p-1 luenesulfonic acid 1
, 7 g was added gradually, being careful not to generate heat, so that the liquid temperature did not exceed 50°C.
添加後、油浴中で50℃まで加温し2時間反応させた後
、分液ロートに移し水洗した。洗浄水が中性を示すまで
水洗後、有機層から溶媒及び未反応物を減圧下に除去し
、本発明のフェノール類ノボラック型樹脂(A−9)4
15gを得た。生成物(A−9)の軟化温度(JISK
2425 環球法)は128°Cで水酸基当量(g
/ m o l )は159であった。After the addition, the mixture was heated to 50° C. in an oil bath and reacted for 2 hours, then transferred to a separatory funnel and washed with water. After washing with water until the washing water becomes neutral, the solvent and unreacted substances are removed from the organic layer under reduced pressure, and the phenolic novolac type resin (A-9) 4 of the present invention is prepared.
15g was obtained. Softening temperature of product (A-9) (JISK
2425 ring and ball method) is the hydroxyl equivalent (g
/mol) was 159.
実施例10、
実施例9においてl−ナフトールの代わりに2−ナフト
ール576gを用いた以外は実施例9と同様の操作によ
り生成物(A−10)420gを得た。生成物(A−1
0)の軟化温度は131℃で水酸基当量は159であっ
た。Example 10 420 g of product (A-10) was obtained in the same manner as in Example 9 except that 576 g of 2-naphthol was used instead of 1-naphthol. Product (A-1
0) had a softening temperature of 131°C and a hydroxyl equivalent of 159.
実施例It。Example It.
実施例1において得られた4−メチルフェノールジメチ
ロール化合物(式(X)においてRかメチル基の化合物
)(AM)168gを温度計、攪拌機を付けたガラス容
器に仕込み、さらに2−メチル−1−ナフトール632
g、メチルイソブチルケトン1500−を加えて窒素雰
囲気下で室温で攪拌した。そして、p−トルエンスルホ
ン酸1.7gを発熱に注意し液温か50°Cを越えない
ように徐々に添加した。168 g of the 4-methylphenol dimethylol compound (compound with R or methyl group in formula (X)) (AM) obtained in Example 1 was charged into a glass container equipped with a thermometer and a stirrer, and further 2-methyl-1 -Naphthol 632
g and 1500 g of methyl isobutyl ketone were added, and the mixture was stirred at room temperature under a nitrogen atmosphere. Then, 1.7 g of p-toluenesulfonic acid was gradually added while being careful not to generate heat so that the liquid temperature did not exceed 50°C.
添加後、油浴中で50℃まで加温し、2時間反応させた
後、有機層から溶媒及び未反応物を減圧下に除去し、本
発明のフェノール類ノボラック型樹脂(A−11s9o
gを得た。生成物(A−11)の軟化温度は107℃で
水酸基当量はl 47 (g/mof)であった。After the addition, the mixture was heated to 50°C in an oil bath and reacted for 2 hours, and then the solvent and unreacted substances were removed from the organic layer under reduced pressure.
I got g. The product (A-11) had a softening temperature of 107° C. and a hydroxyl equivalent of 1 47 (g/mof).
分析例
実施例1−11で得られた本発明のフェノール類ノボラ
ック型樹脂である生成物(A−1)〜(A−11)につ
いて、各々GPC分析を行い、式[1[I]で表される
化合物のものと思われるピークを分取し、マススペクト
ル(FAB−MS)よって分析した。その結果、生成物
(八−1)〜(A−4)についてはM= 420、生成
物(A−5)及び(A−6)についてはM7C3、生成
物(A−7)及び(A−8)についてはM”440(4
42)、生成物(A−9)及び(A−10)については
M“482、生成物(A−11)についてはM=448
が各々得られた。従って、実施例1〜11で得られた生
成物(A−1)〜(A−11)中には、各々第1表示す
ような含有量で式[I]によって表される化合物が含ま
れることが確認された。Analysis Example The products (A-1) to (A-11), which are phenolic novolac type resins of the present invention obtained in Example 1-11, were each subjected to GPC analysis, and the results were expressed by the formula [1[I]. A peak believed to be that of the compound was collected and analyzed by mass spectrometry (FAB-MS). As a result, for products (8-1) to (A-4), M = 420, for products (A-5) and (A-6), M7C3, and for products (A-7) and (A- 8) is M”440 (4
42), M “482 for products (A-9) and (A-10), M = 448 for product (A-11)
were obtained respectively. Therefore, the products (A-1) to (A-11) obtained in Examples 1 to 11 each contain the compound represented by formula [I] in the content as shown in the first column. This was confirmed.
なお、GPC分析条件は次の通り。The GPC analysis conditions are as follows.
GPC装置:高滓製作所
(カラム: T S K −G −3000X L (
1本)十TSK−G−2000XL(2本))
溶 媒:テトラヒドロフラン 1mj/rnin検
出 :UV(254nm)
応用実施例1〜12
硬化剤として実施例1−11で得られた生成物(A−1
)〜(A−11)を、エポキシ樹脂としてクレゾールノ
ボラック型エポキシ樹脂またはビスフェノールA型エポ
キシ樹脂を、硬化促進剤として2−メチルイミダゾール
を用い、これらを第2表に示す割合で配合して得た組成
物を70〜80°Cで15分間ロール混練し、これを冷
却、粉砕し、ダブレット化し、更にトランスファー成形
機により成型後、160℃で2時間予備硬化し、180
″Cで8時間ボストキュアを行なって硬化物(試験片)
を得た。この硬化物のガラス転移温度(Tg) 、熱変
形温度(HDT)及び吸水率を次の条件で測定した。GPC device: Takasugi Seisakusho (Column: TSK-G-3000XL (
1 bottle) 10TSK-G-2000XL (2 bottles) Solvent: Tetrahydrofuran 1mj/rnin test
Output: UV (254 nm) Application Examples 1-12 The product obtained in Example 1-11 (A-1
) to (A-11) were obtained by blending cresol novolac type epoxy resin or bisphenol A type epoxy resin as the epoxy resin and 2-methylimidazole as the curing accelerator in the proportions shown in Table 2. The composition was roll-kneaded at 70 to 80°C for 15 minutes, cooled, pulverized, made into a doublet, molded using a transfer molding machine, and precured at 160°C for 2 hours to form a 180°
Cured product (test piece) after 8 hours of post-curing at ``C''
I got it. The glass transition temperature (Tg), heat distortion temperature (HDT) and water absorption of this cured product were measured under the following conditions.
ガラス転移温度
熱機械側定装fit(TMA)、真空理工■T M −
7000
昇温速度
2°C/min
熱変形温度
JIS K7207に規定された条件吸 水 率
条 件 100℃の水中で50時間煮沸した後の
重量増加量
(重量%)
なお、使用したエポキシ樹脂のクレゾールノボラック型
エポキシ樹脂、ビスフェノールA型エポキシ樹脂は次の
通り。Glass transition temperature thermomechanical side fixed fit (TMA), vacuum science and technology ■TM -
7000 Temperature increase rate 2°C/min Heat distortion temperature Conditions specified in JIS K7207 Water absorption rate Conditions Weight increase (% by weight) after boiling in water at 100°C for 50 hours Note that the cresol of the epoxy resin used Novolac type epoxy resin and bisphenol A type epoxy resin are as follows.
クレゾールノボラック型エポキシ樹脂 EOCN1020 (日本化薬■製) エポキシ当量(g/mof)200 軟化温度 65°C ビスフェノールA型エポキシ樹脂 エボミックR−301(三井石油化学エポキシ■製) エポキシ当量(g/moIり470 軟化温軟化源8℃ 硬化物の評価結果を第2表に示した。Cresol novolac type epoxy resin EOCN1020 (manufactured by Nippon Kayaku ■) Epoxy equivalent (g/mof) 200 Softening temperature 65°C Bisphenol A type epoxy resin Evomic R-301 (manufactured by Mitsui Petrochemical Epoxy ■) Epoxy equivalent (g/mol 470 Softening temperature Softening source 8℃ The evaluation results of the cured products are shown in Table 2.
応用比較例1−2゜
第2表に示す割合で市販の硬化剤とエポキシ樹脂と硬化
促進剤を配合した以外は応用実施例1、−12と同様の
操作により硬化物の評価を行なった。Comparative Application Examples 1-2 The cured products were evaluated in the same manner as in Application Examples 1 and 12, except that a commercially available curing agent, epoxy resin, and curing accelerator were blended in the proportions shown in Table 2.
評価結果を第2表に示した。The evaluation results are shown in Table 2.
尚、配合した市販の硬化剤は次のとおり。The commercially available curing agents blended are as follows.
フェノールノボラック樹脂(日本化薬■製)水酸基当量
(g/moIり 106
軟化源度 85℃
実施例12
温度計、攪拌装置、滴下ロート及び生成水分離装置のつ
いた1にの反応器に、実施例1で得た生成物(A−1)
(水酸基当量(g / m o l )138)138
g及びエピクロルヒドリン460gを仕込み窒素置換を
行った後、48%水酸化ナトリウム水溶液85gを5時
間かけて滴下した。滴下中は反応温度60℃、圧力10
0〜150wHgの条件下で生成水及び水酸化ナトリウ
ム水溶液の水をエピクロルヒドリンとの共沸により連続
的に反応系外に除去し、エピクロルヒドリンは系内゛に
戻した。Phenol novolac resin (manufactured by Nippon Kayaku ■) Hydroxyl equivalent (g/moI) 106 Softening source degree 85°C Example 12 The reaction was carried out in a reactor equipped with a thermometer, a stirring device, a dropping funnel, and a produced water separation device. Product obtained in Example 1 (A-1)
(Hydroxy group equivalent (g/mol) 138) 138
After charging 460 g of epichlorohydrin and purging with nitrogen, 85 g of a 48% aqueous sodium hydroxide solution was added dropwise over 5 hours. During the dropwise addition, the reaction temperature was 60°C and the pressure was 10°C.
Under conditions of 0 to 150 wHg, the produced water and the water in the aqueous sodium hydroxide solution were continuously removed from the reaction system by azeotropy with epichlorohydrin, and epichlorohydrin was returned to the system.
ついで過剰の未反応エピクロルヒドリンを減圧下に回収
した後、メチルイソブチルケトン500−を、加え10
0dの水で水層が中性を示すまで洗浄した。メチルイソ
ブチルケトン相からメチルイソブチルケトンを減圧下に
除去し、その後、再びメチルイソブチルケトン400g
を加え再溶解した。Then, after recovering excess unreacted epichlorohydrin under reduced pressure, 500% of methyl isobutyl ketone was added and
The mixture was washed with 0 d of water until the aqueous layer became neutral. Methyl isobutyl ketone was removed from the methyl isobutyl ketone phase under reduced pressure, and then 400 g of methyl isobutyl ketone was added again.
was added and redissolved.
得られたメチルイソブチルケトン溶液に2゜%水酸化ナ
トリウム溶液20gを加え反応温度70℃で2時間反応
した。20 g of 2% sodium hydroxide solution was added to the obtained methyl isobutyl ketone solution, and the mixture was reacted at a reaction temperature of 70° C. for 2 hours.
反応終了後、水で水層か中性を示すまで洗滌をくり返し
た。After the reaction was completed, washing was repeated with water until the aqueous layer became neutral.
ついで、メチルイソブチルケトン相からメチルイソブチ
ルケトンを減圧下に除去し、淡黄色の固体(B−1)1
70gを得た。本発明のフェノール類ノボラック型エポ
キシ樹脂である生成物(B−1)の軟化温度(JIS
K2425)は75℃でエポキシ当量(g/moIl
)は213であった。Then, methyl isobutyl ketone was removed from the methyl isobutyl ketone phase under reduced pressure to obtain a pale yellow solid (B-1) 1
70g was obtained. Softening temperature (JIS
K2425) has an epoxy equivalent (g/mol) at 75°C.
) was 213.
又、生成物(B−1)を前記分析例と同様にしてGPC
分析したところ、生成物(B−1)中の式[V]で表さ
れるフェノール類ノボラック型エポキシ化合物の含有量
は57重量%であった。In addition, the product (B-1) was subjected to GPC in the same manner as in the above analysis example.
As a result of analysis, the content of the phenolic novolak type epoxy compound represented by formula [V] in the product (B-1) was 57% by weight.
生成物(B−1)のマススペクトル(FAB−MS)で
M=588が得られたことにより次の構造を有する化合
物が上記含有量で含まれる化合物であることを確認した
。Since M=588 was obtained in the mass spectrum (FAB-MS) of the product (B-1), it was confirmed that the compound having the following structure was contained in the above content.
実施例13゜
温度計、攪拌装置、及び滴下ロートのついたIfの反応
器に、実施例1で得た生成物(A−1)(水酸基当量(
g/mo Iり138) 138g、エピクロルヒドリ
ン460g及びジメチルスルホキシド230gを仕込み
窒素置換を行った後、30℃の水浴中にて水酸化ナトリ
ウム40gを徐々に加えた。発熱に注意しなから30
”Cにて5時間、50℃にて2時間、さらに70”Cに
て1時間反応を行った。ついで水を加えて水層が中性を
示すまで洗浄した。その後油層からエピクロルヒドリン
及びジメチルスルホキシドを減圧下に除去した。その後
メチルイソブチルケトンを400g加え再溶解した。得
られたメチルイソブチルケトン溶液に20%水酸化ナト
リウム溶液20gを加え反応温度70°Cで2時間反応
した。反応終了後、水で洗浄を繰り返しメチルイソブチ
ルケトン層からメチルイソブチルケトンを減圧下に除去
し黄色の固体(B−2)167gを得た。本発明のフェ
ノール類ノボラック型エポキシ樹脂である生成物(B−
2)の軟化温度は77℃でエポキシ当量(g/moIり
は212であった。又、実施例12と同様のGPC分析
の結果、生成物(B−2)中の式[V]で表されるフェ
ノール類ノボラック型エポキシ化合物の含有量は59重
量%であった。生成物(B−2)のマススペクトル(F
AB−MS)でM= 588であった。このことにより
、実施例12に示した構造式を有する化合物が、上記含
有量で含まれる化合物であることを確認した。Example 13 The product (A-1) obtained in Example 1 (hydroxyl equivalent (
After charging 138 g/mo I 138), 460 g of epichlorohydrin, and 230 g of dimethyl sulfoxide and purging with nitrogen, 40 g of sodium hydroxide was gradually added in a water bath at 30°C. Be careful of fever 30
The reaction was carried out at 70°C for 5 hours, at 50°C for 2 hours, and then at 70°C for 1 hour. Then, water was added to wash the mixture until the aqueous layer became neutral. Thereafter, epichlorohydrin and dimethyl sulfoxide were removed from the oil layer under reduced pressure. Thereafter, 400 g of methyl isobutyl ketone was added and redissolved. 20 g of 20% sodium hydroxide solution was added to the obtained methyl isobutyl ketone solution, and the mixture was reacted at a reaction temperature of 70° C. for 2 hours. After the reaction was completed, washing with water was repeated and methyl isobutyl ketone was removed from the methyl isobutyl ketone layer under reduced pressure to obtain 167 g of a yellow solid (B-2). The product (B-
The softening temperature of 2) was 77°C, and the epoxy equivalent (g/mol) was 212. Also, as a result of the same GPC analysis as in Example 12, the product (B-2) was expressed by the formula [V]. The content of the phenolic novolac type epoxy compound was 59% by weight.The mass spectrum of the product (B-2) (F
AB-MS) and M = 588. This confirmed that the compound having the structural formula shown in Example 12 was included in the above content.
実施例14
生成物(A−1)の代わりに実施例2で得た生成物(A
−2)(水酸基当量(g / m o l )137)
137gを用いた以外は実施例12と同様にして反応を
行ない生成物(B−3)172gを得た。本発明のフェ
ノール類ノボラック型エポキシ樹脂である生成物(B−
3>の軟化温度は89℃でエポキシ当量(g / m
o I! )は215であった。又、実施例12と同様
の分析の結果、生成物(B−3)中の式[V]で表され
るフェノール類ノボラック型エポキシ化合物の含有量は
37重量%であった。生成物(B −3’)のマススペ
クトル(FAB−MS)でhイ゛588が得られたこと
により、実施例12に示した構造式を育する化合物が、
上記含有量で含まれる化合物であるこ・とを確認した。Example 14 The product (A-1) obtained in Example 2 was replaced with the product (A-1).
-2) (Hydroxy group equivalent (g/mol) 137)
The reaction was carried out in the same manner as in Example 12, except that 137 g was used, and 172 g of product (B-3) was obtained. The product (B-
The softening temperature of 3> is 89℃ and the epoxy equivalent (g/m
o I! ) was 215. Further, as a result of the same analysis as in Example 12, the content of the phenolic novolak type epoxy compound represented by formula [V] in the product (B-3) was 37% by weight. The mass spectrum (FAB-MS) of the product (B-3') revealed that h588 was obtained, indicating that the compound having the structural formula shown in Example 12 was
It was confirmed that the compound was contained in the above content.
実施例15
生成物(A−1)の代わりに実施例3で得た生成物(A
−3)(水酸基当量(g/no 1)137)137
gを用いた以外は実施例12と同様にして反応を行ない
、生成物(B−4)170gを得た。本発明のフェノー
ル類ノボラック型樹脂である生成物(B−4)の軟化温
度は92℃でエポキシ当量(g/mof)は212であ
った。Example 15 The product (A-1) obtained in Example 3 was replaced with the product (A-1).
-3) (Hydroxyl equivalent (g/no 1) 137) 137
The reaction was carried out in the same manner as in Example 12, except that g was used, and 170 g of product (B-4) was obtained. The product (B-4), which is a phenolic novolac type resin of the present invention, had a softening temperature of 92°C and an epoxy equivalent (g/mof) of 212.
実施例12と同様の分析結果、生成物(B −4)中の
式[V]で表されるフェノール類ノボラック型エボキン
化合物の含装置は32重量%であった。生成物(B−4
)のマススペクトル(FAB−MS)でM”588が得
られたことにより、実施例12に示した構造式を有する
化合物が、上記含有量で含まれる化合物であることを確
認した。As a result of the same analysis as in Example 12, the content of the phenolic novolac type evoquin compound represented by formula [V] in the product (B-4) was 32% by weight. Product (B-4
), it was confirmed that the compound having the structural formula shown in Example 12 was a compound contained in the above content.
実施例16
生成物(A−1)代わりに実施例4で得た生成物(A
−4)(水酸基当量(g/no l)138)138g
を用いた以外は実施例12と同様にして反応を行い生成
物(B−5)169gを得た。Example 16 The product (A-1) obtained in Example 4 was used instead of the product (A-1).
-4) (Hydroxyl group equivalent (g/no l) 138) 138g
The reaction was carried out in the same manner as in Example 12 except that 169 g of product (B-5) was obtained.
本発明のフェノール類ノボラック型エポキシ樹脂である
生成物(B−5)の軟化温度は76℃でエポキシ当量(
g/mof)は214であった。実施例12と同様の分
析の結果、生成物(B−5)中の式[V]で表されるフ
ェノール類ノボラック型エポキシ化合物の含有量は55
重量%であった。生成物(B−5)のマススペクトル(
FAB−MS)でM′″588か得られたことにより、
実施例12に示した構造式を有する化合物(但し、ナフ
タレン核に対するエポキシ基の結合位置は2−位である
)が、上記含有量で含まれる化合物であることを確認し
た。The softening temperature of the product (B-5), which is a phenolic novolac type epoxy resin of the present invention, is 76°C and the epoxy equivalent (
g/mof) was 214. As a result of the same analysis as in Example 12, the content of the phenolic novolak type epoxy compound represented by formula [V] in the product (B-5) was 55
% by weight. Mass spectrum of product (B-5) (
FAB-MS), M'''588 was obtained,
It was confirmed that the compound having the structural formula shown in Example 12 (however, the bonding position of the epoxy group to the naphthalene nucleus is the 2-position) was a compound contained in the above content.
実施例17
生成物(A−1)の代わりに実施例5で得た生成物(A
−5)(水酸基当量(g/mof)151)151gを
用いた以外は実施例12と同様にして反応を行ない生成
物(B−6)186gを得た。本発明のフェノール類ノ
ボラック型エポキシ樹脂である生成物(B−6)の軟化
温度は89℃でエポキシ当量(g / m o l )
は240であった。又、実施例12と同様の分析の結果
、生成物(B−6)中の式[V]で表されるフェノール
類ノボラック型エポキシ化合物の含有量は35重量%で
あった。生成物(B−6)のマススペクトル(FAB−
MS)でM゛628が得られたことにより、次の構造を
有する化合物が、上記含有量で含まれる化合物であるこ
とを確認した。Example 17 Product (A-1) obtained in Example 5 was replaced with product (A-1).
-5) (hydroxyl equivalent (g/mof) 151) The reaction was carried out in the same manner as in Example 12 except that 151 g of the product (hydroxyl group equivalent (g/mof) 151) was used to obtain 186 g of product (B-6). The softening temperature of the product (B-6), which is a phenolic novolac type epoxy resin of the present invention, is 89°C and the epoxy equivalent (g / mol)
was 240. Further, as a result of the same analysis as in Example 12, the content of the phenolic novolac type epoxy compound represented by formula [V] in the product (B-6) was 35% by weight. Mass spectrum of product (B-6) (FAB-
By obtaining M'628 by MS), it was confirmed that the compound having the following structure was contained in the above content.
実施例18
生成物(A−1)の代わりに実施例6で得た生成物(A
−6)(水酸基当量(g / m o l )152)
152gを用いた以外は実施例12と同様にして反応を
行ない生成物(B−7)188gを得た。本発明のフェ
ノール類ノボラック型エポキシ樹脂である生成物(B−
7)の軟化温度は92℃でエポキシ当量(g / m
o l )は238であった。又、実施例12と同様の
分析の結果、生成(B−7)中の式[V]で表されるフ
ェノール類ノボラック型エポキシ化合物の含有量は38
重量%であった。生成物(B−7)のマススペクトル(
FAB−MS)でM”628が得られたことにより、実
施例17に示した構造式を有する化合物(但し、ナフタ
レン核に対するエポキシ基の結合位置は2−位である)
が、上記含有量で含まれる化合物であることを確認した
。Example 18 The product (A-1) obtained in Example 6 was replaced with the product (A-1).
-6) (Hydroxy group equivalent (g/mol) 152)
The reaction was carried out in the same manner as in Example 12, except that 152 g was used, and 188 g of product (B-7) was obtained. The product (B-
7) The softening temperature is 92 °C and the epoxy equivalent (g/m
o l ) was 238. Furthermore, as a result of the same analysis as in Example 12, the content of the phenolic novolak type epoxy compound represented by formula [V] in the product (B-7) was 38
% by weight. Mass spectrum of product (B-7) (
FAB-MS), M''628 was obtained, resulting in a compound having the structural formula shown in Example 17 (however, the bonding position of the epoxy group to the naphthalene nucleus is the 2-position).
was confirmed to be a compound contained in the above content.
実施例19
生成物(A−1)の代わりに実施例7で得た生成(A−
7)(水酸基当量(g / m o 1 )142)1
42gを用いた以外は実施例12と同様にして反応を行
ない生成物(B−8)176gを得た。本発明のフェノ
ール類ノボラック型エポキシ樹脂である生成物(B−8
)の軟化温度は95℃でエポキシ当量(g/moA’)
は230であった。又、実施例12と同様の分析の結果
、生成物(B−8)中の式[V]で表されるフェノール
類ノボラック型エポキシ化合物の含有量は37重量%で
あった。生成物(B−8)のマススペクトル(FAB−
MS)でM2O3及び6!0か得られたことにより、次
の構造を有する化合物が、上記含有量で含まれる化合物
であることを確認した。Example 19 Product (A-1) obtained in Example 7 was substituted for product (A-1).
7) (Hydroxyl group equivalent (g/m o 1) 142) 1
The reaction was carried out in the same manner as in Example 12, except that 42 g was used, and 176 g of product (B-8) was obtained. The product (B-8) which is a phenolic novolac type epoxy resin of the present invention
) has a softening temperature of 95°C and an epoxy equivalent (g/moA')
was 230. Further, as a result of the same analysis as in Example 12, the content of the phenolic novolak type epoxy compound represented by formula [V] in the product (B-8) was 37% by weight. Mass spectrum of product (B-8) (FAB-
Since M2O3 and 6!0 were obtained by MS), it was confirmed that the compound having the following structure was contained in the above content.
実施例20
生成物(A−1)の代わりに実施例8て得た生成物(A
−8)(水酸基当量(g / m o 1 )144)
144gを用いた以外は実施例12と同様にして反応を
行ない生成物(B−9)180gを得た。本発明のフェ
ノール類ノボラック型エポキシ樹脂である生成物(B−
9)の軟化温度は96℃でエポキシ当量(g/mof)
は232であった。又、実施例12と同様の分析の結果
、生成物(B−9)中の式[V]で表されるフェノール
類ノボラック型エポキシ化合物の含有量は38重量%で
あった。生成物(B−9)のマススペクトル(FAB−
MS)でM゛608及び610か得られたことにより、
実施例19に示した構造式を有する化合物(但し、ナフ
タレン核に対するエポキシ基の結合位置は2−位である
)が、上記含有量で含まれる化合物であることを確認し
た。Example 20 The product (A-1) obtained in Example 8 was replaced with the product (A-1).
-8) (Hydroxy group equivalent (g/m o 1) 144)
The reaction was carried out in the same manner as in Example 12 except that 144 g was used to obtain 180 g of product (B-9). The product (B-
The softening temperature of 9) is 96°C and the epoxy equivalent (g/mof)
was 232. Further, as a result of the same analysis as in Example 12, the content of the phenolic novolac type epoxy compound represented by formula [V] in the product (B-9) was 38% by weight. Mass spectrum of product (B-9) (FAB-
MS), M゛608 and 610 were obtained,
It was confirmed that the compound having the structural formula shown in Example 19 (however, the bonding position of the epoxy group to the naphthalene nucleus is the 2-position) was a compound contained in the above content.
実施例21
生成物(A−1)の代わりに実施例9で得た生成物(A
−9)(水酸基当量(g/moIり159)159gを
用いた以外は実施例12と同様にして反応を行ない生成
物(B−10)194gを得た。本発明のフェノール類
ノボラック型エポキシ樹脂である生成物(B−10)の
軟化温度は95℃でエポキシ当量(g / m 。Example 21 Product (A-1) obtained in Example 9 was replaced with product (A-1).
-9) (The reaction was carried out in the same manner as in Example 12 except that 159 g of hydroxyl group equivalent (g/moI ratio 159) was used to obtain 194 g of product (B-10). Phenolic novolac type epoxy resin of the present invention The softening temperature of the product (B-10) is 95 °C and the epoxy equivalent (g/m).
りは233であった。実施例12と同様の分析の結果、
生成物(B−10)中の式[V]で表されるフェノール
類ノボラック型エポキシ化合物の含有量は42重量%で
あった。生成物(B−10)のマススペクトル(FAB
−MS)でM= 650か得られたことにより、次の構
造を有する化合物が上記含有量で含まれる化合物である
ことを確認した。The average was 233. As a result of the same analysis as in Example 12,
The content of the phenolic novolac type epoxy compound represented by formula [V] in the product (B-10) was 42% by weight. Mass spectrum (FAB) of product (B-10)
-MS), M = 650 was obtained, confirming that the compound having the following structure was contained in the above content.
実施例22・
生成物(A−1)の代わりに実施例1Oで得た生成物(
A−10)(水酸基当量(g / m 。Example 22 Product obtained in Example 1O instead of product (A-1) (
A-10) (Hydroxyl group equivalent (g/m).
f)159)159gを用いた以外は実施例12と同様
にして反応を行い、生成物(B−11)190gを得た
。本発明のフェノール類ノボラック型エポキシ樹脂であ
る生成物(B−11)の軟化温度は97℃で、エポキシ
当量(g/ m 。f) The reaction was carried out in the same manner as in Example 12 except that 159 g of 159) was used to obtain 190 g of product (B-11). The product (B-11), which is a phenolic novolac type epoxy resin of the present invention, has a softening temperature of 97°C and an epoxy equivalent (g/m).
Iりは230であった。又、実施例12と同様の分析の
結果、生成物(B−11)中の式[V]で表されるフェ
ノール類ノボラック型エポキシ化合物の含有量は43重
量%であった。生成物(B−11)のマススペクトル(
FAB−MS)てM゛て650か得られたことにより実
施例21に示した構造式を有する化合物(但し、ナフタ
レン核に対するエポキシ基の結合位置は2−位である。I was 230. Further, as a result of the same analysis as in Example 12, the content of the phenolic novolac type epoxy compound represented by formula [V] in the product (B-11) was 43% by weight. Mass spectrum of product (B-11) (
FAB-MS), a compound having the structural formula shown in Example 21 was obtained (however, the bonding position of the epoxy group to the naphthalene nucleus was at the 2-position).
)が上記含有量で含まれる化合物であることを確認した
。) was confirmed to be a compound contained in the above content.
実施例23
生成物(A−1)の代わりに実施例11で得た生成物(
A−11)(水酸基当量(g / m 。Example 23 Instead of product (A-1), the product obtained in Example 11 (
A-11) (Hydroxyl group equivalent (g/m).
!4’)147)1・47gを用いた以外は実施例13
と同様にして反応を行い生成物(B−12)179gを
得た。本発明のフェノール類ノボラック型エポキシ樹脂
である生成物(B−12)の軟化温度は83℃でエポキ
シ当量(g / m 。! Example 13 except that 4') 147) 1.47 g was used.
The reaction was carried out in the same manner as above to obtain 179 g of product (B-12). The product (B-12), which is a phenolic novolak type epoxy resin of the present invention, has a softening temperature of 83°C and an epoxy equivalent (g/m).
i>は218であった。又、実施例12と同様の分析の
結果、生成物(B−12)中の式[V]で表されるフェ
ノール類ノボラック型エポキシ化合物の含有量は52重
量%であった。生成物(B−12)のマススペクトル(
FAB−MS)でM”616が得られたことにより、次
の構造を有する化合物が上記含有率で含まれる化合物で
あることを確認した。i> was 218. Further, as a result of the same analysis as in Example 12, the content of the phenolic novolak type epoxy compound represented by formula [V] in the product (B-12) was 52% by weight. Mass spectrum of product (B-12) (
By obtaining M''616 by FAB-MS), it was confirmed that the compound having the following structure was contained at the above content.
応用実施例13〜26
第3表に示す割合で実施例1〜11で得られた生成(A
−1)〜(A−11)を硬化剤とし、実施例12〜23
で得られた生成物(B−1)〜(B−12)をエポキシ
樹脂とし、硬化促進剤に2−メチルイミダゾールを用い
、これらを第3表に示す割合で配合し、以下応用実施例
1〜12と同様にして試験を行った。硬化物の評価結果
を第3表に示した。Application Examples 13-26 The products obtained in Examples 1-11 (A
-1) to (A-11) as a curing agent, Examples 12 to 23
The products (B-1) to (B-12) obtained in (B-1) to (B-12) were used as an epoxy resin, and 2-methylimidazole was used as a curing accelerator, and these were blended in the proportions shown in Table 3. The test was conducted in the same manner as in 12. The evaluation results of the cured products are shown in Table 3.
応用比較例3及び4
第3表に示す割合で硬化剤としてフェノールノボラック
樹脂(H−1)を、エポキシ樹脂としてクレゾールノボ
ラック型エポキシ樹脂(EOCN 1020)を、また
は芳香族アルデヒドとフェノールを櫂合して得られるポ
リフェノールのポリエポキシ化合物(EPPN502)
を、硬化促進剤として2−メチルイミダゾールを用い、
応用実施例1−12と同様に試験を行い、硬化物の評価
を行なった。Application Comparative Examples 3 and 4 A phenol novolac resin (H-1) was used as a curing agent, a cresol novolak type epoxy resin (EOCN 1020) was used as an epoxy resin, or an aromatic aldehyde and phenol were combined in the proportions shown in Table 3. polyepoxy compound of polyphenol obtained by (EPPN502)
using 2-methylimidazole as a curing accelerator,
Tests were conducted in the same manner as in Application Example 1-12, and the cured products were evaluated.
評価結果を第3表に示した。The evaluation results are shown in Table 3.
尚、上記(H−1)、(EOCN 1020)、(EP
PN502)は以下の通り。In addition, the above (H-1), (EOCN 1020), (EP
PN502) is as follows.
H−1:日本山薬■製、フェノールノボラック樹脂
軟化温度 85℃
水酸基当量(g/IIIoi) 106EOCN−1
020:日本山薬■製、クレゾールノボラック型エポキ
シ樹脂
軟化温度 65°C
EPPN502
エポキシ当量(g / mol> 200=日本化薬
■製、ポリエポキシ化
合物
軟化温度 70″C
エポキシ当量(g 7m01 ’) 168応用実施
例27〜36
第4表に示す割合でフェノールノボラック(日本化薬味
製、軟化温度85℃、水酸基当量(g/mol)+ 0
5)と実施例!2.14及び16〜23で得られた生成
物(B−1’)、(B−3)、(B−5)〜(B−12
)と2−メチルイミダゾールを配合し、以下応用実施例
1〜12と同様に試験を行ない、得られた硬化物の評価
結果を第4表に示した。H-1: Nippon Yamayaku ■, phenol novolac resin Softening temperature 85°C Hydroxyl equivalent (g/IIIoi) 106EOCN-1
020: Made by Nippon Kayaku ■, cresol novolac type epoxy resin Softening temperature 65°C EPPN502 Epoxy equivalent (g / mol> 200 = Made by Nippon Kayaku ■, polyepoxy compound Softening temperature 70''C Epoxy equivalent (g 7m01') 168 Application Examples 27-36 Phenol novolak (Nippon Kajimi Co., Ltd., softening temperature 85°C, hydroxyl equivalent (g/mol) + 0) in the proportions shown in Table 4
5) and examples! Products (B-1'), (B-3), (B-5) to (B-12) obtained in 2.14 and 16-23
) and 2-methylimidazole, and the following tests were conducted in the same manner as in Application Examples 1 to 12, and the evaluation results of the obtained cured products are shown in Table 4.
応用比較例5及び6
生成物(B−1)、(B−3)、(B−5)〜(B−1
2)の代りに第4表に示す割合で次の参考例1で得られ
た生成物(D−1)又は下記の市販の0−クレゾールノ
ボラック型エポキシ樹脂EOCN1020を用いて、そ
の他は応用実施例27〜36と同様にして試験を行なっ
た。Application Comparative Examples 5 and 6 Products (B-1), (B-3), (B-5) to (B-1
In place of 2), the product (D-1) obtained in the following Reference Example 1 or the following commercially available 0-cresol novolac type epoxy resin EOCN1020 was used in the proportions shown in Table 4, and the rest were the same as in the applied examples. Tests were conducted in the same manner as in Examples 27-36.
結果を第4表に示した。The results are shown in Table 4.
EOCN−1020:日本化薬味製、エポキシ当量(g
/moIり200、軟化塩
度65°C
参考例1゜
温度計、攪拌機を付けたガラス容器に1−ナフトール1
44 g、水20g1シュウ酸1.6gを仕込み、11
0℃に加熱して溶融し、ここにホルマリン水溶液(37
%)73gを30分間かけて滴下した。つづいて、90
分間同温度で加熱し、つづいて150℃まで昇温しで更
に120分間反応させた。ついで、反応物をとり出し、
粉砕し、熱水で洗滌後乾燥した。得られたノボラック型
ナフトール樹脂の水酸基当量(g / m o I!
)は156、軟化温度は175℃、GPC分析による平
均分子量は730(分子中ナフトール成分を平均4.7
個含む)であった。EOCN-1020: Nippon Kajimi Co., Ltd., epoxy equivalent (g
/mol ratio 200, softening salinity 65°C Reference example 1° 1-naphthol 1 in a glass container equipped with a thermometer and a stirrer
44 g, water 20g 1 oxalic acid 1.6g, 11
Heat to 0°C to melt, and add formalin aqueous solution (37
%) was added dropwise over 30 minutes. Next, 90
The mixture was heated at the same temperature for a minute, and then the temperature was raised to 150°C, and the reaction was continued for an additional 120 minutes. Then, take out the reactant,
It was crushed, washed with hot water, and dried. The hydroxyl equivalent of the obtained novolak naphthol resin (g/m o I!
) is 156, the softening temperature is 175°C, and the average molecular weight by GPC analysis is 730 (the naphthol component in the molecule is 4.7 on average).
).
このノボラック型ナフトール樹11156gを生成物(
A−1)の代りに使用した以外は実施例12と同様の操
作を実施してポリグリシジルエーテル(D−1)195
gを得た。ポリグリシジルエーテル(D−1)の軟化温
度は+20’Cでエポキシ当量(g/mof)は270
であった。The product (
Polyglycidyl ether (D-1) 195 was obtained by carrying out the same operation as in Example 12 except that it was used instead of A-1).
I got g. The softening temperature of polyglycidyl ether (D-1) is +20'C and the epoxy equivalent (g/mof) is 270
Met.
本発明の化合物を含む樹脂は軟化温度が低く、しかも溶
融粘度が小さい為、取り扱い易く、作業性が優れ、又、
これを用いて得られる硬化物は耐熱性の指標であるガラ
ス転移温度、熱変形温度が高く、しかも吸水率が従来の
樹脂より得られる硬化物に較べて低くすることができる
。The resin containing the compound of the present invention has a low softening temperature and low melt viscosity, so it is easy to handle and has excellent workability.
The cured product obtained using this resin has a high glass transition temperature and heat distortion temperature, which are indicators of heat resistance, and can have a lower water absorption rate than cured products obtained from conventional resins.
従って、本発明の化合物を含む樹脂は、近年の耐熱、低
吸水の要求に応えることができ、この性質を利用して広
範な分野、具体的には電子部品の封圧用材料、成形材料
又は積層用の材料として使用され1.極めて有用である
。Therefore, the resin containing the compound of the present invention can meet the recent demands for heat resistance and low water absorption, and can be used in a wide range of fields, specifically as sealing materials, molding materials, and laminated materials for electronic components. Used as a material for 1. Extremely useful.
Claims (23)
▼を示し、 R_1、R_2、R_3、R_4、R_5、R_6、R
_7、R_8、R_9、R′_4、R′_5、R′_6
、R′_7、R′_8、R′_9、は夫々独立して水素
原子、炭素数1−4のアルキル基、アリール基、または ハロゲン原子を示す)で表される化合物。(1) Formula [ I ] ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [ I ] (In the formula, X represents H or ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, R_1, R_2, R_3, R_4, R_5 ,R_6,R
_7, R_8, R_9, R'_4, R'_5, R'_6
, R'_7, R'_8, and R'_9 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group, or a halogen atom).
1_1、R′_1_2は夫々独立して水素原子、炭素数
1〜4の アルキル基、フェニル基又はハロゲン原子 を示す)で表される化合物。(2) Formula [II] ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [II] (In the formula, R_1_0, R_1_1, R_1_2, R'_
1_1 and R'_1_2 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a halogen atom).
ニル基又はハロゲン原子を示し、R_1_4は水素原子
又は炭素数1〜4のアルキル基 を示す。)で表される化合物。(3) Formula [III] ▲ Numerical formulas, chemical formulas, tables, etc. 1 to 4 alkyl groups).
ある請求項3に記載の化合物。(4) The compound according to claim 3, wherein R_1_3 is a methyl group and R_1_4 is a hydrogen atom.
1_1、R′_1_2は夫々独立して、水素原子、炭素
数1〜4 のアルキル基、フェニル基又はハロゲン原 子を示す)で表される化合物。(5) Formula [IV] ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [IV] (In the formula, R_1_0, R_1_1, R_1_2, R'_
1_1 and R'_1_2 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a halogen atom.
ニル基又はハロゲン原子を示し、R_1_4は水素原子
又は炭素数1〜4のアルキル基 を示す。)で表される化合物。(6) Formula [V] ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [V] (In the formula, R_1_3 represents an alkyl group having 1 to 4 carbon atoms, a phenyl group, or a halogen atom, and R_1_4 represents a hydrogen atom or a carbon number 1 to 4 alkyl groups).
ある請求項6に記載の化合物。(7) The compound according to claim 6, wherein R_1_3 is a methyl group and R_1_4 is a hydrogen atom.
型樹脂。(8) A novolak-type resin comprising the compound according to claim 1.
ェノール類ノボラック型樹脂。(9) A phenolic novolac type resin comprising the compound according to claim 2, 3 or 4.
フェノール類ノボラック型エポキシ樹脂。(10) A phenolic novolac type epoxy resin comprising the compound according to claim 5, 6 or 7.
8、9又は10記載の樹脂。(11) The resin according to claim 8, 9 or 10, wherein the content of the compound is 30% by weight or more.
化学式、表等があります▼〔IV〕(式中、R_1、R_
2、R_3、R_4、R_5、R_6、R_7、R_8
、R_9、R′_4、R′_5、R′_6、R′_7、
R′_8、R′_9は夫々独立して水素原子、炭素数1
〜4のアルキル基、アリー ル基またはハロゲン原子を示す。)で表される化合物を
含むフェノール類ノボラック型エポキシ樹脂と、(b)
硬化剤とを含んでなるエポキシ樹脂組成物。(12) (a) Formula as epoxy resin [VI] ▲ Formula,
There are chemical formulas, tables, etc. ▼ [IV] (In the formula, R_1, R_
2, R_3, R_4, R_5, R_6, R_7, R_8
, R_9, R'_4, R'_5, R'_6, R'_7,
R'_8 and R'_9 are each independently a hydrogen atom, carbon number 1
-4 alkyl group, aryl group or halogen atom. ) A phenolic novolac type epoxy resin containing a compound represented by (b)
An epoxy resin composition comprising a curing agent.
求項10記載の樹脂である請求項12記載のエポキシ樹
脂組成物。(13) The epoxy resin composition according to claim 12, wherein the phenolic novolac type epoxy resin is the resin according to claim 10.
式〔VII〕 ▲数式、化学式、表等があります▼〔VII〕 (式中、R_1、R_2、R_3、R_4、R_1_5
、R_6、R_7、R_8、R_9、R′_4、R′_
5、R′_6、R′_7、R′_8、R′_9は夫々独
立して、水素原子、炭素数1〜4のアルキル基、アリー
ル基またはハロゲン原子を示す)で表される化合物を含
むフェノール類ノボラック型樹脂、とを含んでなるエポ
キシ樹脂組成物。(14) Formula for (a) epoxy resin and (b) curing agent [VII] ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ [VII] (In the formula, R_1, R_2, R_3, R_4, R_1_5
, R_6, R_7, R_8, R_9, R'_4, R'_
5, R'_6, R'_7, R'_8, and R'_9 each independently represent a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group, or a halogen atom). An epoxy resin composition comprising a phenolic novolac type resin.
の樹脂である請求項14記載のエポキシ樹脂組成物。(15) The epoxy resin composition according to claim 14, wherein the phenolic novolac type resin is the resin according to claim 9.
のフェノール類ノボラック型エポキシ樹脂と、 (b)硬化剤としての請求項14に記載のフェノール類
ノボラック型樹脂とを含んでなるエポキシ樹脂組成物。(16) An epoxy resin composition comprising (a) the phenolic novolac type epoxy resin according to claim 12 as an epoxy resin, and (b) the phenolic novolac type resin according to claim 14 as a curing agent. thing.
項10記載の樹脂であり、フェノール類ノボラック型樹
脂が請求項9記載の樹脂である、請求項16記載のエポ
キシ樹脂組成物。(17) The epoxy resin composition according to claim 16, wherein the phenolic novolac type epoxy resin is the resin according to claim 10, and the phenolic novolac type resin is the resin according to claim 9.
5、16又は17記載のエポキシ樹脂組成物。(18) Claims 12, 13, 14, 1 containing a curing accelerator
5, 16 or 17. The epoxy resin composition according to item 5, 16 or 17.
子、炭素数1〜4のアルキル基、アリール基又はハロゲ
ン原子を示す)で表される化合物のうち対応するものと
、 式[IX] ▲数式、化学式、表等があります▼[IX] (式中、R_4、R_5、R_6、R_7、R_8、R
_9は夫々独立して水素原子、炭素数1〜4のアルキル
基、アリール基又はハロゲン原子を示す)で表されるナ
フトール類のうち対応するものとを反応させて得られる
請求項8、9又は11記載の樹脂。(19) Formula [VIII] ▲ Numerical formulas, chemical formulas, tables, etc. are available ▼ [VIII] (In the formula, R_1, R_2, R_3 are each independently a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group, or a halogen ▼There are mathematical formulas, chemical formulas, tables, etc.▼[IX] (In the formula, R_4, R_5, R_6, R_7, R_8, R
_9 each independently represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an aryl group, or a halogen atom). Resin according to 11.
得られる樹脂である請求項14、15、16、17又は
18のエポキシ樹脂組成物。(20) The epoxy resin composition according to claim 14, 15, 16, 17 or 18, wherein the phenolic novolac type resin is the resin obtained according to claim 19.
リン化合物と反応させて得られる請求項8、10又は1
1記載の樹脂。(21) Claim 8, 10 or 1 obtained by further reacting the resin obtained in Claim 19 with an epihalohydrin compound.
Resin according to 1.
項21で得られる樹脂である請求項12、13、16、
17又は18のエポキシ樹脂組成物。(22) Claims 12, 13, 16, wherein the phenolic novolac type epoxy resin is the resin obtained in Claim 21;
Epoxy resin composition of No. 17 or 18.
18、20又は22のエポキシ樹脂組成物の硬化物。(23) Claims 12, 13, 14, 15, 16, 17,
Cured product of the epoxy resin composition of No. 18, 20 or 22.
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29970389 | 1989-11-20 | ||
JP29970589 | 1989-11-20 | ||
JP29970489 | 1989-11-20 | ||
JP1-299705 | 1989-11-22 | ||
JP30205989 | 1989-11-22 | ||
JP1-299703 | 1989-11-22 | ||
JP1-299704 | 1989-11-22 | ||
JP1-302059 | 1989-11-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH03220219A true JPH03220219A (en) | 1991-09-27 |
JP3074013B2 JP3074013B2 (en) | 2000-08-07 |
Family
ID=27479761
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP02307229A Expired - Lifetime JP3074013B2 (en) | 1989-11-20 | 1990-11-15 | Epoxy resin composition and cured product thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3074013B2 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0450223A (en) * | 1990-06-18 | 1992-02-19 | Shin Etsu Chem Co Ltd | Epoxy resin composition and semiconductor device |
JPH0597969A (en) * | 1991-10-03 | 1993-04-20 | Shin Etsu Chem Co Ltd | Thermosetting resin composition and semiconductor device |
JP2010242107A (en) * | 2007-04-06 | 2010-10-28 | Osaka Gas Co Ltd | Phenol resin and method for producing the same |
JP2013010903A (en) * | 2011-06-30 | 2013-01-17 | Dic Corp | Epoxy resin, curing resin composition, cured product thereof, semiconductor sealing material, and printed wiring board |
JP2014062187A (en) * | 2012-09-21 | 2014-04-10 | Dic Corp | Epoxy resin, curable resin composition, cured product thereof and printed wiring board |
JP2014062188A (en) * | 2012-09-21 | 2014-04-10 | Dic Corp | Phenylphenol-naphthol resin, curable resin composition, cured product thereof and printed wiring board |
JP2014108992A (en) * | 2012-12-03 | 2014-06-12 | Dic Corp | Cyanic acid ester resin, curable resin composition, its cured product, prepreg, circuit board, semiconductor encapsulation material and build-up film |
-
1990
- 1990-11-15 JP JP02307229A patent/JP3074013B2/en not_active Expired - Lifetime
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0450223A (en) * | 1990-06-18 | 1992-02-19 | Shin Etsu Chem Co Ltd | Epoxy resin composition and semiconductor device |
JPH0597969A (en) * | 1991-10-03 | 1993-04-20 | Shin Etsu Chem Co Ltd | Thermosetting resin composition and semiconductor device |
JP2010242107A (en) * | 2007-04-06 | 2010-10-28 | Osaka Gas Co Ltd | Phenol resin and method for producing the same |
JP2013010903A (en) * | 2011-06-30 | 2013-01-17 | Dic Corp | Epoxy resin, curing resin composition, cured product thereof, semiconductor sealing material, and printed wiring board |
JP2014062187A (en) * | 2012-09-21 | 2014-04-10 | Dic Corp | Epoxy resin, curable resin composition, cured product thereof and printed wiring board |
JP2014062188A (en) * | 2012-09-21 | 2014-04-10 | Dic Corp | Phenylphenol-naphthol resin, curable resin composition, cured product thereof and printed wiring board |
JP2014108992A (en) * | 2012-12-03 | 2014-06-12 | Dic Corp | Cyanic acid ester resin, curable resin composition, its cured product, prepreg, circuit board, semiconductor encapsulation material and build-up film |
Also Published As
Publication number | Publication date |
---|---|
JP3074013B2 (en) | 2000-08-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
GB2316407A (en) | Epoxy resins and compositions containing them | |
JPH06247989A (en) | Cyclic phosphazene compound, resin composition and its cured material | |
JPS6198726A (en) | Epoxy resin composition for sealing electronic parts | |
EP0429667B1 (en) | Phenolic novolac resin, product of curing thereof, and method of production thereof | |
JPH03220219A (en) | Phenol novolac compound, resin, resin composition, and cured product | |
JP3132610B2 (en) | Naphthalene ring-containing resin, resin composition and cured product thereof | |
JP3661101B2 (en) | Epoxy resin composition | |
JP2631560B2 (en) | Novolak epoxy resins with phenols and their production | |
JPH07304846A (en) | Epoxy resin composition | |
JPH0521925B2 (en) | ||
JP3944765B2 (en) | Epoxy resin, epoxy resin composition and cured product thereof | |
JP3451104B2 (en) | Epoxy resin composition | |
JPH04323214A (en) | Novolak resin, its production, epoxy resin, resin composition and its cured product | |
JP2856565B2 (en) | Resin manufacturing method | |
JPH093162A (en) | Epoxy resin mixture, epoxy resin composition, and its cured product | |
JP2870709B2 (en) | New compounds, resins, resin compositions and cured products | |
JPH08169937A (en) | Epoxy resin composition and copper-clad laminate | |
JP2870710B2 (en) | New compounds, resins, resin compositions and cured products | |
JPH04316528A (en) | New compound, resin, resin composition and cured material | |
JP2887214B2 (en) | Naphthol compound, its production method, epoxy compound, composition and cured product | |
JPH05287053A (en) | Epoxy resin, resin composition and cured product | |
JPH04337314A (en) | New epoxy resin, resin composition and cured material thereof | |
JPH07330645A (en) | Compound of polyphenols, epoxy resin, epoxy resin composition and cured material thereof | |
JP3192471B2 (en) | Epoxy resin, resin composition and cured product | |
JPH04209623A (en) | Epoxy resin composition and its cured product |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090602 Year of fee payment: 9 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110602 Year of fee payment: 11 |
|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110602 Year of fee payment: 11 |