JPS6367237U - - Google Patents
Info
- Publication number
- JPS6367237U JPS6367237U JP16166086U JP16166086U JPS6367237U JP S6367237 U JPS6367237 U JP S6367237U JP 16166086 U JP16166086 U JP 16166086U JP 16166086 U JP16166086 U JP 16166086U JP S6367237 U JPS6367237 U JP S6367237U
- Authority
- JP
- Japan
- Prior art keywords
- workpiece
- stage
- electron beam
- beam lithography
- lithography apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000609 electron-beam lithography Methods 0.000 claims description 5
- 238000001514 detection method Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 1
Description
第１図は本考案の実施例を示す電子ビーム描画
装置の構成図、第２図は従来の電子ビーム描画装
置の構成図、第３図は第２図の動作説明図、第４
図１，２は第２図の動作を示す従来の電子ビーム
描画装置の構成図、第５図は第１図の動作説明図
である。
１……真空チヤンバ、２……真空予備室、３…
…扉、５……テーブル、６……クランプ装置、７
……ホルダ、８……被加工物（マスクブランクス
）、１０……駆動回路、１１……ダスト、３０…
…検出手段（光センサ）、３１……制御回路。
FIG. 1 is a block diagram of an electron beam lithography system showing an embodiment of the present invention, FIG. 2 is a block diagram of a conventional electron beam lithography system, FIG. 3 is an explanatory diagram of the operation of FIG. 2, and FIG.
1 and 2 are block diagrams of a conventional electron beam lithography apparatus showing the operation of FIG. 2, and FIG. 5 is an explanatory diagram of the operation of FIG. 1. 1... Vacuum chamber, 2... Vacuum preliminary chamber, 3...
...Door, 5...Table, 6...Clamp device, 7
... Holder, 8 ... Workpiece (mask blank), 10 ... Drive circuit, 11 ... Dust, 30 ...
...Detection means (light sensor), 31...Control circuit.
Claims (1)
ステージと、このステージ上に載置された被加工
物を固定する動作制御可能なクランプ装置とを備
え、電子ビームを用いて前記被加工物上に所定の
パターンを描画する電子ビーム描画装置において
、 前記ステージへの前記被加工物の装填状態を検
出する検出手段と、この検出手段の検出結果を条
件として前記クランプ装置を動作させる制御回路
とを設けたことを特徴とする電子ビーム描画装置
。[Claim for Utility Model Registration] An electronic system comprising a stage for placing a workpiece installed in a vacuum chamber and a clamping device whose operation can be controlled to fix the workpiece placed on this stage. An electron beam lithography apparatus that draws a predetermined pattern on the workpiece using a beam, further comprising: a detection means for detecting a loading state of the workpiece on the stage; An electron beam lithography apparatus comprising a control circuit for operating a clamp device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16166086U JPS6367237U (en) | 1986-10-22 | 1986-10-22 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16166086U JPS6367237U (en) | 1986-10-22 | 1986-10-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6367237U true JPS6367237U (en) | 1988-05-06 |
Family
ID=31088181
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16166086U Pending JPS6367237U (en) | 1986-10-22 | 1986-10-22 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6367237U (en) |
-
1986
- 1986-10-22 JP JP16166086U patent/JPS6367237U/ja active Pending
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