JPS6217121U - - Google Patents

Info

Publication number
JPS6217121U
JPS6217121U JP10778285U JP10778285U JPS6217121U JP S6217121 U JPS6217121 U JP S6217121U JP 10778285 U JP10778285 U JP 10778285U JP 10778285 U JP10778285 U JP 10778285U JP S6217121 U JPS6217121 U JP S6217121U
Authority
JP
Japan
Prior art keywords
wafer
stage
exposure mask
detection means
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10778285U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10778285U priority Critical patent/JPS6217121U/ja
Publication of JPS6217121U publication Critical patent/JPS6217121U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例の概略構成図である
。 1…ウエハ、2…ステージ、3…駆動回路、4
…レーザ干渉計、5…制御回路、6…マスク、7
…支持台、8,8…デイテクタ。
FIG. 1 is a schematic diagram of an embodiment of the present invention. 1... Wafer, 2... Stage, 3... Drive circuit, 4
...Laser interferometer, 5...Control circuit, 6...Mask, 7
...Support stand, 8,8...detector.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 少なくとも2点に放射性物質を導入したウエハ
を載置するステージと、該ステージを駆動制御す
るステージ制御手段と、露光用マスクを支持する
支持手段と、放射線を検出する検出手段とを備え
、該検出手段は前記露光用マスクにおける前記ウ
エハの放射性物質を導入した点に対応する点上に
位置し、前記検出手段にて放射線を検出する事で
前記ウエハと前記露光用マスクとのアライメント
をとる事を特徴とするマスクアライメント装置。
A stage for placing a wafer into which radioactive material has been introduced at at least two points, a stage control means for driving and controlling the stage, a support means for supporting an exposure mask, and a detection means for detecting radiation; The means is located on the exposure mask at a point corresponding to the point at which the radioactive substance of the wafer is introduced, and the means detects radiation with the detection means to align the wafer and the exposure mask. Features of mask alignment equipment.
JP10778285U 1985-07-15 1985-07-15 Pending JPS6217121U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10778285U JPS6217121U (en) 1985-07-15 1985-07-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10778285U JPS6217121U (en) 1985-07-15 1985-07-15

Publications (1)

Publication Number Publication Date
JPS6217121U true JPS6217121U (en) 1987-02-02

Family

ID=30984376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10778285U Pending JPS6217121U (en) 1985-07-15 1985-07-15

Country Status (1)

Country Link
JP (1) JPS6217121U (en)

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