JPS61149329U - - Google Patents
Info
- Publication number
- JPS61149329U JPS61149329U JP3124185U JP3124185U JPS61149329U JP S61149329 U JPS61149329 U JP S61149329U JP 3124185 U JP3124185 U JP 3124185U JP 3124185 U JP3124185 U JP 3124185U JP S61149329 U JPS61149329 U JP S61149329U
- Authority
- JP
- Japan
- Prior art keywords
- wafer chuck
- exposure machine
- alignment exposure
- receiving element
- light receiving
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010586 diagram Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Landscapes
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Description
第１図は本考案の目合せ露光機用ウエハーチヤ
ツク部の平面図、第２図は従来の目合せ露光機の
光源光学系の構成図、第３図は従来のウエハーチ
ヤツクを表わす平面図である。
１……ウエハーチヤツク本体、２……ウエハー
吸着用溝、３……受光素子。
FIG. 1 is a plan view of a wafer chuck for an alignment exposure machine according to the present invention, FIG. 2 is a block diagram of a light source optical system of a conventional alignment exposure machine, and FIG. 3 is a plan view of a conventional wafer chuck. 1... Wafer chuck body, 2... Wafer adsorption groove, 3... Light receiving element.
Claims (1)
照度測定用受光素子を設けたことを特徴とする目
合せ露光機用ウエハーチヤツク。 A wafer chuck for an alignment exposure machine, characterized in that a light receiving element for measuring exposure illuminance is provided in the main body of the wafer chuck for an alignment exposure machine.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3124185U JPS61149329U (en) | 1985-03-05 | 1985-03-05 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3124185U JPS61149329U (en) | 1985-03-05 | 1985-03-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS61149329U true JPS61149329U (en) | 1986-09-16 |
Family
ID=30531668
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3124185U Pending JPS61149329U (en) | 1985-03-05 | 1985-03-05 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61149329U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011138058A (en) * | 2009-12-28 | 2011-07-14 | Hitachi High-Technologies Corp | Exposure device, exposure method, and method for manufacturing display panel substrate |
-
1985
- 1985-03-05 JP JP3124185U patent/JPS61149329U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011138058A (en) * | 2009-12-28 | 2011-07-14 | Hitachi High-Technologies Corp | Exposure device, exposure method, and method for manufacturing display panel substrate |