JPS63178320U - - Google Patents
Info
- Publication number
- JPS63178320U JPS63178320U JP6910987U JP6910987U JPS63178320U JP S63178320 U JPS63178320 U JP S63178320U JP 6910987 U JP6910987 U JP 6910987U JP 6910987 U JP6910987 U JP 6910987U JP S63178320 U JPS63178320 U JP S63178320U
- Authority
- JP
- Japan
- Prior art keywords
- lens
- sample surface
- movable stage
- air density
- measuring device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010586 diagram Methods 0.000 description 3
Description
第１図は本考案にかかる縮小露光装置の概要図
、第２図はその制御系を示す図、第３図は従来の
縮小露光装置の概要図である。
図において、１は光源、２はコンデンサレンズ
、３はレチクル、４は縮小レンズ、５はウエハー
（試料）、６は移動ステージ、１１はＣＰＵ（中
央制御装置）、１２はＸＹ方向測長器、１３はＺ
方向測長器、１４は気圧測定器を示している。
FIG. 1 is a schematic diagram of a reduction exposure apparatus according to the present invention, FIG. 2 is a diagram showing its control system, and FIG. 3 is a schematic diagram of a conventional reduction exposure apparatus. In the figure, 1 is a light source, 2 is a condenser lens, 3 is a reticle, 4 is a reduction lens, 5 is a wafer (sample), 6 is a moving stage, 11 is a CPU (central control unit), 12 is an XY direction length measuring device, 13 is Z
The direction length measuring device, 14 indicates an atmospheric pressure measuring device.
Claims (1)
をレンズを介して投影する露光装置において、気
圧測定器によつて空気密度を測定して、空気密度
の変化に応じて前記移動ステージとレンズ系との
間隔を変化させ、試料面に対して前記レンズの焦
点が絶えず最適位置にあるように調整されている
ことを特徴とする露光装置。 In an exposure device that projects a reticle pattern onto a sample surface on a movable stage through a lens, the air density is measured using a barometric pressure measuring device, and the distance between the movable stage and the lens system is adjusted according to changes in air density. An exposure apparatus characterized in that the focal point of the lens is constantly adjusted to be at an optimal position with respect to the sample surface by changing the lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6910987U JPS63178320U (en) | 1987-05-09 | 1987-05-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6910987U JPS63178320U (en) | 1987-05-09 | 1987-05-09 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63178320U true JPS63178320U (en) | 1988-11-18 |
Family
ID=30909530
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6910987U Pending JPS63178320U (en) | 1987-05-09 | 1987-05-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63178320U (en) |
-
1987
- 1987-05-09 JP JP6910987U patent/JPS63178320U/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS63178320U (en) | ||
| JPS62186151U (en) | ||
| JPS62112140U (en) | ||
| JPH0420226U (en) | ||
| JPS6321930U (en) | ||
| JPS622250U (en) | ||
| JPS61145938U (en) | ||
| JPH0468518U (en) | ||
| JPH0385523U (en) | ||
| JPS62109157U (en) | ||
| JPH0470732U (en) | ||
| JPS63188644U (en) | ||
| JPS6454045U (en) | ||
| JPS6322730U (en) | ||
| JPH0321842U (en) | ||
| JPH0164007U (en) | ||
| JPS62188350U (en) | ||
| JPS6212943U (en) | ||
| JPS6249232U (en) | ||
| JPS6157519U (en) | ||
| JPH0241252U (en) | ||
| JPH0396033U (en) | ||
| JPH0170370U (en) | ||
| JPS5999436U (en) | illuminance monitor | |
| JPS60173952U (en) | Photo etch exposure device |