JPS6366924A - 光ｃｖｄによる固体薄膜の製造装置 - Google Patents

Info

Publication number

JPS6366924A

JPS6366924A JP6969587A JP6969587A JPS6366924A JP S6366924 A JPS6366924 A JP S6366924A JP 6969587 A JP6969587 A JP 6969587A JP 6969587 A JP6969587 A JP 6969587A JP S6366924 A JPS6366924 A JP S6366924A

Authority

JP

Japan

Prior art keywords

gas

reaction

chamber

photo

light

Prior art date

1987-03-23

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Granted

Links

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• 239000010409 thin film Substances 0.000 title claims abstract description 12
• 238000004519 manufacturing process Methods 0.000 title claims description 6
• 238000006243 chemical reaction Methods 0.000 claims abstract description 41
• 239000000758 substrate Substances 0.000 claims abstract description 21
• 230000005284 excitation Effects 0.000 claims abstract description 15
• 238000000354 decomposition reaction Methods 0.000 claims abstract description 5
• 239000007787 solid Substances 0.000 claims description 8
• 230000005281 excited state Effects 0.000 claims description 5
• 238000000034 method Methods 0.000 claims description 5
• 238000001947 vapour-phase growth Methods 0.000 claims description 4
• 230000003287 optical effect Effects 0.000 abstract description 6
• 239000012808 vapor phase Substances 0.000 abstract description 5
• 239000007795 chemical reaction product Substances 0.000 abstract description 4
• 238000005192 partition Methods 0.000 abstract description 3
• BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
• 230000005540 biological transmission Effects 0.000 abstract 1
• 239000007789 gas Substances 0.000 description 47
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 13
• 235000012239 silicon dioxide Nutrition 0.000 description 11
• 239000010453 quartz Substances 0.000 description 10
• 239000012495 reaction gas Substances 0.000 description 9
• YZCKVEUIGOORGS-OUBTZVSYSA-N Deuterium Chemical compound [2H] YZCKVEUIGOORGS-OUBTZVSYSA-N 0.000 description 7
• 229910052805 deuterium Inorganic materials 0.000 description 7
• 238000010586 diagram Methods 0.000 description 7
• 239000001301 oxygen Substances 0.000 description 7
• 229910052760 oxygen Inorganic materials 0.000 description 7
• QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
• 238000000862 absorption spectrum Methods 0.000 description 5
• XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
• 230000005484 gravity Effects 0.000 description 3
• 239000004065 semiconductor Substances 0.000 description 3
• 229910052710 silicon Inorganic materials 0.000 description 3
• 239000010703 silicon Substances 0.000 description 3
• CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
• 239000003795 chemical substances by application Substances 0.000 description 2
• QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
• 229910052753 mercury Inorganic materials 0.000 description 2
• 239000000376 reactant Substances 0.000 description 2
• 238000010521 absorption reaction Methods 0.000 description 1
• 230000004913 activation Effects 0.000 description 1
• 238000010420 art technique Methods 0.000 description 1
• WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
• 229910001634 calcium fluoride Inorganic materials 0.000 description 1
• 229910052681 coesite Inorganic materials 0.000 description 1
• 238000010276 construction Methods 0.000 description 1
• 229910052906 cristobalite Inorganic materials 0.000 description 1
• 230000008021 deposition Effects 0.000 description 1
• 239000000463 material Substances 0.000 description 1
• VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 1
• 150000002926 oxygen Chemical class 0.000 description 1
• 230000001443 photoexcitation Effects 0.000 description 1
• 230000005855 radiation Effects 0.000 description 1
• 230000006798 recombination Effects 0.000 description 1
• 238000005215 recombination Methods 0.000 description 1
• 239000000377 silicon dioxide Substances 0.000 description 1
• 239000007921 spray Substances 0.000 description 1
• 229910001220 stainless steel Inorganic materials 0.000 description 1
• 239000010935 stainless steel Substances 0.000 description 1
• 229910052682 stishovite Inorganic materials 0.000 description 1
• 239000000126 substance Substances 0.000 description 1
• 229910052905 tridymite Inorganic materials 0.000 description 1
• 229910052724 xenon Inorganic materials 0.000 description 1
• FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1