JPS6364770U - - Google Patents
Info
- Publication number
- JPS6364770U JPS6364770U JP15755286U JP15755286U JPS6364770U JP S6364770 U JPS6364770 U JP S6364770U JP 15755286 U JP15755286 U JP 15755286U JP 15755286 U JP15755286 U JP 15755286U JP S6364770 U JPS6364770 U JP S6364770U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- disk
- ion
- ion implantation
- buffer stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005468 ion implantation Methods 0.000 claims 3
- 230000007723 transport mechanism Effects 0.000 claims 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15755286U JPS6364770U (fr) | 1986-10-15 | 1986-10-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15755286U JPS6364770U (fr) | 1986-10-15 | 1986-10-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6364770U true JPS6364770U (fr) | 1988-04-28 |
Family
ID=31080205
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15755286U Pending JPS6364770U (fr) | 1986-10-15 | 1986-10-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6364770U (fr) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5763677A (en) * | 1980-10-03 | 1982-04-17 | Hitachi Ltd | Continuous vacuum treating device |
| JPS5763676A (en) * | 1980-10-03 | 1982-04-17 | Hitachi Ltd | Continuous sputtering device |
| JPS59100522A (ja) * | 1982-11-30 | 1984-06-09 | Kokusai Electric Co Ltd | 薄膜形成用自動スパツタリング装置 |
| JPS61113767A (ja) * | 1984-11-09 | 1986-05-31 | Nissin Electric Co Ltd | エンドステ−シヨン |
| JPS61113766A (ja) * | 1984-11-09 | 1986-05-31 | Nissin Electric Co Ltd | エンドステ−シヨン |
| JPS6244571A (ja) * | 1985-08-20 | 1987-02-26 | Toshiba Mach Co Ltd | イオン注入装置 |
-
1986
- 1986-10-15 JP JP15755286U patent/JPS6364770U/ja active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5763677A (en) * | 1980-10-03 | 1982-04-17 | Hitachi Ltd | Continuous vacuum treating device |
| JPS5763676A (en) * | 1980-10-03 | 1982-04-17 | Hitachi Ltd | Continuous sputtering device |
| JPS59100522A (ja) * | 1982-11-30 | 1984-06-09 | Kokusai Electric Co Ltd | 薄膜形成用自動スパツタリング装置 |
| JPS61113767A (ja) * | 1984-11-09 | 1986-05-31 | Nissin Electric Co Ltd | エンドステ−シヨン |
| JPS61113766A (ja) * | 1984-11-09 | 1986-05-31 | Nissin Electric Co Ltd | エンドステ−シヨン |
| JPS6244571A (ja) * | 1985-08-20 | 1987-02-26 | Toshiba Mach Co Ltd | イオン注入装置 |