JPS6361119U - - Google Patents
Info
- Publication number
- JPS6361119U JPS6361119U JP15520686U JP15520686U JPS6361119U JP S6361119 U JPS6361119 U JP S6361119U JP 15520686 U JP15520686 U JP 15520686U JP 15520686 U JP15520686 U JP 15520686U JP S6361119 U JPS6361119 U JP S6361119U
- Authority
- JP
- Japan
- Prior art keywords
- tube
- vertical cvd
- sample
- film thickness
- distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010453 quartz Substances 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 2
Landscapes
- Chemical Vapour Deposition (AREA)
Description
第１図は本考案による一実施例の縦型ＣＶＤ装
置の概略図、第２図は従来の縦型ＣＶＤ装置の概
略図、である。 図において、１は石英管、２は試料載物台、３
は制風筒、４は試料、５はガス導入管、５ａは導
入口、６はガス排出管、６ａは排出口、を示す。
置の概略図、第２図は従来の縦型ＣＶＤ装置の概
略図、である。 図において、１は石英管、２は試料載物台、３
は制風筒、４は試料、５はガス導入管、５ａは導
入口、６はガス排出管、６ａは排出口、を示す。
Claims (1)
- 縦型ＣＶＤ装置における成長膜厚の分布改善の
ため、ガス導入管５から導入ガスが試料４の表面
に沿つて均等に流れるように、石英管１の内側の
試料載物台２直近の周囲に円筒型の制風筒３を配
設したことを特徴とする縦型ＣＶＤ装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986155206U JP2513179Y2 (ja) | 1986-10-09 | 1986-10-09 | 縦型ｃｖｄ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986155206U JP2513179Y2 (ja) | 1986-10-09 | 1986-10-09 | 縦型ｃｖｄ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6361119U true JPS6361119U (ja) | 1988-04-22 |
| JP2513179Y2 JP2513179Y2 (ja) | 1996-10-02 |
Family
ID=31075705
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986155206U Expired - Lifetime JP2513179Y2 (ja) | 1986-10-09 | 1986-10-09 | 縦型ｃｖｄ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2513179Y2 (ja) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS566428A (en) * | 1979-06-28 | 1981-01-23 | Sanyo Electric Co Ltd | Epitaxial growth apparatus |
| JPS6192049A (ja) * | 1984-10-12 | 1986-05-10 | Nec Corp | チヤンネルの有効利用を実現したメツセ−ジ受信が可能な無線選択呼出受信機 |
-
1986
- 1986-10-09 JP JP1986155206U patent/JP2513179Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS566428A (en) * | 1979-06-28 | 1981-01-23 | Sanyo Electric Co Ltd | Epitaxial growth apparatus |
| JPS6192049A (ja) * | 1984-10-12 | 1986-05-10 | Nec Corp | チヤンネルの有効利用を実現したメツセ−ジ受信が可能な無線選択呼出受信機 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2513179Y2 (ja) | 1996-10-02 |
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