JPS6360525B2 - - Google Patents

Info

Publication number
JPS6360525B2
JPS6360525B2 JP58205817A JP20581783A JPS6360525B2 JP S6360525 B2 JPS6360525 B2 JP S6360525B2 JP 58205817 A JP58205817 A JP 58205817A JP 20581783 A JP20581783 A JP 20581783A JP S6360525 B2 JPS6360525 B2 JP S6360525B2
Authority
JP
Japan
Prior art keywords
mask
alignment pattern
pattern
alignment
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58205817A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6098623A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP58205817A priority Critical patent/JPS6098623A/ja
Publication of JPS6098623A publication Critical patent/JPS6098623A/ja
Publication of JPS6360525B2 publication Critical patent/JPS6360525B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58205817A 1983-11-04 1983-11-04 投影式露光方法及びその装置 Granted JPS6098623A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58205817A JPS6098623A (ja) 1983-11-04 1983-11-04 投影式露光方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58205817A JPS6098623A (ja) 1983-11-04 1983-11-04 投影式露光方法及びその装置

Publications (2)

Publication Number Publication Date
JPS6098623A JPS6098623A (ja) 1985-06-01
JPS6360525B2 true JPS6360525B2 (enrdf_load_stackoverflow) 1988-11-24

Family

ID=16513188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58205817A Granted JPS6098623A (ja) 1983-11-04 1983-11-04 投影式露光方法及びその装置

Country Status (1)

Country Link
JP (1) JPS6098623A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03142828A (ja) * 1989-10-27 1991-06-18 Tokyo Electron Ltd 処理装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0820212B2 (ja) * 1986-09-17 1996-03-04 富士通株式会社 微細パタ−ンの位置合わせ方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
JPS58112330A (ja) * 1981-12-25 1983-07-04 Nippon Kogaku Kk <Nikon> 投影型露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03142828A (ja) * 1989-10-27 1991-06-18 Tokyo Electron Ltd 処理装置

Also Published As

Publication number Publication date
JPS6098623A (ja) 1985-06-01

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