JPS6360401A - Manufacture of optical film parts - Google Patents
Manufacture of optical film partsInfo
- Publication number
- JPS6360401A JPS6360401A JP61205366A JP20536686A JPS6360401A JP S6360401 A JPS6360401 A JP S6360401A JP 61205366 A JP61205366 A JP 61205366A JP 20536686 A JP20536686 A JP 20536686A JP S6360401 A JPS6360401 A JP S6360401A
- Authority
- JP
- Japan
- Prior art keywords
- optical film
- groove
- optical
- substrate
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000012788 optical film Substances 0.000 title claims abstract description 66
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 claims abstract description 43
- 230000003287 optical effect Effects 0.000 claims abstract description 33
- 239000010408 film Substances 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims description 12
- 230000002093 peripheral effect Effects 0.000 claims 1
- 238000005520 cutting process Methods 0.000 abstract description 13
- 230000010287 polarization Effects 0.000 abstract description 5
- 238000000151 deposition Methods 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 9
- 238000000926 separation method Methods 0.000 description 6
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
Description
【発明の詳細な説明】
〔概要〕
光学基板の表裏両面を、マトリ・ノクス状の■溝により
、光学膜部品の形状等しい角形に区画し、それぞれの区
画の表面に光学膜を形成した後に、溝底稜線部分で、個
々の光学膜部品に分離して、稜線部分が面取りされた光
学膜部品を得ることにより、光学膜、及び基板素片が損
傷する恐れが少な（て、低コストの光学膜部品を提供す
る。[Detailed Description of the Invention] [Summary] After dividing both the front and back surfaces of an optical substrate into squares having the same shape as the optical film component by matrix-shaped grooves, and forming an optical film on the surface of each division, By separating the optical film parts into individual optical film parts at the groove bottom ridgeline part and obtaining an optical film part with the ridgeline part chamfered, there is less risk of damage to the optical film and the substrate piece. Provide membrane parts.
本発明方法はガラス、シリコン等の光学基板の表面に所
望の光学膜が形成されてなる、光学膜部品の製造方法の
改良に関する。The method of the present invention relates to an improvement in a method for manufacturing optical film components in which a desired optical film is formed on the surface of an optical substrate made of glass, silicon, or the like.
フィルター膜、偏光分離膜、カプラ膜等の光学膜は、ガ
ラス、シリコン等の光学基板の表面に、屈折率の異なる
誘電体膜を交互に数十層形成することにより得られる。Optical films such as filter films, polarization separation films, coupler films, etc. are obtained by alternately forming several dozen layers of dielectric films with different refractive indexes on the surface of an optical substrate such as glass or silicon.
このように光学基板の表面に所望の光学膜を形成した光
学膜部品は、所望の光学的特性を容易に得られ、且つ薄
く、小形であるので、光合分波器。An optical film component in which a desired optical film is formed on the surface of an optical substrate can easily obtain desired optical characteristics, and is thin and small, so it can be used as an optical multiplexer/demultiplexer.
偏光分離器、光減衰器、光変調器等に広く使用されてい
る。Widely used in polarization separators, optical attenuators, optical modulators, etc.
第３図は従来の光学膜部品の製造方法の工程を示す図で
ある。FIG. 3 is a diagram showing the steps of a conventional method for manufacturing optical film components.
第３図（ａｌにおいて、１は例えばガラス板よりなる光
学基板であり、光学膜部品１０を多数個取りできる角形
である。In FIG. 3 (al), 1 is an optical substrate made of, for example, a glass plate, and has a rectangular shape from which a large number of optical film components 10 can be formed.
このような光学基板１の表面の全面に、屈折率の異なる
誘電体膜を交互に数十層蒸着等して、所望の光学膜（フ
ィルター膜、偏光分離膜、カプラ膜）２を形成する。A desired optical film (filter film, polarization separation film, coupler film) 2 is formed by alternately depositing several tens of layers of dielectric films having different refractive indexes on the entire surface of the optical substrate 1.
次に第３図（′ｂ）のように、光学基板１を光学膜部品
１０の平面形状に等しくなるように、例えば切断砥石（
円板状で板厚の薄いダイヤモンド砥石）でマトリックス
状に切断して、基板素片ＩＡの表面に光学膜２が形成さ
れた光学膜部品素片１０Ａに分離する。Next, as shown in FIG. 3('b), the optical substrate 1 is adjusted to have the same planar shape as the optical film component 10 using, for example, a cutting grindstone.
The substrate piece IA is cut into a matrix shape using a thin diamond grindstone (disc-shaped and thin) to separate into optical film component pieces 10A each having an optical film 2 formed on the surface of the substrate piece IA.
この光学膜部品素片１０Ａの状態では、基板素片ＩＡの
稜線部分が欠けたり、或いは稜線部分より基板素片ＩＡ
に亀裂が入り、光学膜部品素片１０Ａが損傷する恐れが
ある。In this state of the optical film component piece 10A, the ridgeline portion of the substrate piece IA may be chipped, or the substrate piece IA may be damaged from the ridgeline portion.
There is a risk that the optical film component piece 10A may be damaged.
したがって、第３図（Ｃ）のように、光学膜部品素片１
０Ａのそれぞれの稜線部分をラッピング、研磨等して面
取稜線５にして、光学膜部品１０を完成させている。Therefore, as shown in FIG. 3(C), the optical film component piece 1
Each ridgeline portion of 0A is lapped, polished, etc. to form a chamfered ridgeline 5, and the optical film component 10 is completed.
しかしながら上記従来の製造方法は、光学膜２を形成後
に、光学基板１を切断して、光学膜部品ＩＯとしている
。However, in the conventional manufacturing method described above, after forming the optical film 2, the optical substrate 1 is cut to obtain the optical film component IO.
この切断時に光学膜２が切断され、切断部より光学膜２
に亀裂が発生したり、光学膜２の切断部近傍が欠けて脱
落する等、光学膜２が損傷し、歩留まりが悪いという問
題点がある。During this cutting, the optical film 2 is cut, and the optical film 2 is
There are problems in that the optical film 2 is damaged, such as cracks occurring in the optical film 2 or parts near the cut portion of the optical film 2 chipping and falling off, resulting in poor yield.
上記従来の問題点を解決するため本発明方法は、第１図
のように、周縁が面取りされた板状の光学基板ｌの表裏
両面に、マトリックス状の■溝１５を形成して、製造し
ようとする光学膜部品１０の平面形状等しい角形に区画
する。In order to solve the above-mentioned conventional problems, the method of the present invention, as shown in FIG. The planar shape of the optical film component 10 is divided into squares having the same shape.
次に面取部及びＶ溝１５を除く光学基板１の表面の全面
に、所望の膜特性を有する光学膜２を形成する。Next, an optical film 2 having desired film characteristics is formed over the entire surface of the optical substrate 1 excluding the chamfered portion and the V-groove 15.
その後光学基板１をそれぞれの溝底稜線Ｌ５ａ部分で切
断分離して、基板素片ＩＡの表面に光学膜２が形成され
た光学膜部品１０とする。Thereafter, the optical substrate 1 is cut and separated at each groove bottom ridge line L5a to obtain an optical film component 10 in which the optical film 2 is formed on the surface of the substrate piece IA.
上記本発明方法によれば、溝底稜線１５ａで光学基板１
を切断分離するので、基板素片ＩＡの切断面４と表裏面
とのなす稜線部分に、Ｖ溝１５の内壁面の一部がその侭
残り、光学膜部品１０の稜線は、面取稜線５となる。よ
って、切断分離後に面取り作業を必要としない。According to the method of the present invention, the optical substrate 1 is
Since the substrate piece IA is cut and separated, a part of the inner wall surface of the V-groove 15 remains at the ridge line formed by the cut surface 4 of the substrate piece IA and the front and back surfaces, and the ridge line of the optical film component 10 is formed by the chamfered ridge line 5. becomes. Therefore, chamfering work is not required after cutting and separation.
また、■溝１５には光学膜２を形成してないので、光学
基板１を切断分離時に光学膜２は切断されない。したが
って、光学膜２が損傷する恐れがなく、歩留まりが高く
て、得られる光学膜部品ｌＯが低コストである。Further, since the optical film 2 is not formed in the groove 15, the optical film 2 is not cut when the optical substrate 1 is cut and separated. Therefore, there is no risk of damage to the optical film 2, the yield is high, and the resulting optical film component IO is low in cost.
以下図を参照しながら、本発明方法を具体的に説明する
。なお、全図を通じて同一符号は同一対象物を示す。The method of the present invention will be specifically explained below with reference to the drawings. Note that the same reference numerals indicate the same objects throughout the figures.
第１図の（ａｌ、 （ｂｌは本発明方法の工程を示す図
、第２図は本発明方法の一実施例の図で、ｆａ）は■溝
形成時、山）は切断時の側断面図である。In Fig. 1, (al and bl are diagrams showing the steps of the method of the present invention, and Fig. 2 is a diagram of an embodiment of the method of the present invention, where fa) is the ■ groove formed, and crest) is the side cross section at the time of cutting. It is a diagram.
第１図（ａ）において、ｌは、例えばガラス、シリコン
等よりなる光学基板であって、光学膜部品１０を多数個
取りできる角形で、周縁の表・裏面と側面とのなす稜線
部分を面とりして、面取稜線５としである。In FIG. 1(a), l is an optical substrate made of, for example, glass, silicon, etc., and has a rectangular shape from which a large number of optical film components 10 can be taken, and the ridge line formed by the front and back surfaces and the side surface of the periphery is a surface. For example, the chamfered ridge line 5 is used.
このような光学基板１の表面及び裏面に対称に、マトリ
ックス状の■溝１５を形成して、製造しようとする光学
膜部品１０の平面形状等しい角形に区画する。Matrix-shaped grooves 15 are formed symmetrically on the front and back surfaces of the optical substrate 1, and are divided into squares having the same planar shape as the optical film component 10 to be manufactured.
この■溝１５は、エツチング手段、或いは機械加工手段
で設けることもあるが、第２図（ａｌに示すように、光
学基板１をＸ軸、Ｙ軸方向にそれぞれ平行駆動可能のテ
ーブル上に載置し、上方より回転する■溝用砥石（例え
ば基板の表面にダイヤモンドの細粒を付着した、ダイヤ
モンド砥石）１６を、所望の深さに切り込ませて、■溝
１５を設けるのが、所望に大きい溝側壁を容易に得るこ
とができ、有利である。This groove 15 may be formed by etching or machining, but as shown in FIG. 1. A groove grindstone 16 (for example, a diamond grindstone with fine diamond particles attached to the surface of the substrate), which is rotated from above, is cut to a desired depth to form the desired groove 15. This is advantageous because large groove sidewalls can be easily obtained.
なお、■溝用砥石１６の円周面は、頂角が例えば９０度
に形成された凸面である。The circumferential surface of the groove grindstone 16 is a convex surface with an apex angle of, for example, 90 degrees.
■溝１５を形成後、第１図（ｂｌのように、面取稜線５
及び■溝１５の溝側壁を除く光学基板１の表面の全面に
、屈折率の異なる誘電体膜を交互に数十層蒸着等して、
所望の光学膜（フィルター膜、偏光分離膜、カプラ膜）
２を形成する。■After forming the groove 15, as shown in Figure 1 (bl), the chamfered ridge line 5
and (2) Alternately depositing several tens of layers of dielectric films with different refractive indexes on the entire surface of the optical substrate 1 except for the side walls of the grooves 15.
Desired optical film (filter film, polarization separation film, coupler film)
form 2.
その後光学基板１をそれぞれの溝底稜線１５ａ部分で切
断分離して、基板素片ＩＡの切断面４と表裏面とのなす
稜線部分に、Ｖ溝１５の内壁面の一部がその侭残り、面
取稜線５となった光学膜部品１０とする。After that, the optical substrate 1 is cut and separated at the respective groove bottom ridgelines 15a, and a part of the inner wall surface of the V-groove 15 remains on the ridgeline formed by the cut surface 4 of the substrate piece IA and the front and back surfaces. The optical film component 10 has a chamfered edge 5.
なお、この切断分離作業は、光学基板１を■溝１５部分
で折り曲げてもよいものであるが、第２図（′ｂ）のよ
うに、切断砥石１７を使用すると、作業ミスが少なく分
離作業が容易である。Note that this cutting and separation work can be done by bending the optical substrate 1 at the groove 15, but if a cutting wheel 17 is used as shown in FIG. is easy.
切断砥石１７は、例えばダイヤモンド砥石であって、円
板状の砥石の厚さは、■溝１５の開口幅よりも小さい厚
さである。The cutting whetstone 17 is, for example, a diamond whetstone, and the thickness of the disc-shaped whetstone is smaller than the opening width of the groove 15.
このような切断砥石１７を使用して、Ｘ軸、Ｙ軸方向に
それぞれ平行駆動可能のテーブル上に光学基板１を載置
し、切断砥石１７を回転させながら、上方より溝底稜線
１５ａ部分に切り込ませることにより、容易に、且つ綺
麗な切断面４を有する基板素片ＩＡに分離できる。Using such a cutting wheel 17, place the optical substrate 1 on a table that can be driven in parallel in the X-axis and Y-axis directions, and while rotating the cutting wheel 17, cut the groove bottom ridgeline 15a from above. By making the cuts, it is possible to easily separate the substrate into pieces IA having clean cut surfaces 4.
上述のように、溝底稜ｖＡ１５ａで光学基板ｌを切断分
離するので、基板素片ＩＡの切断面４と表裏面とのなす
稜線部分に、■溝１５の内壁面の一部がその侭残り、光
学膜部品１０の稜線は、面取稜線５となる。よって、切
断分離後に面取り作業を必要としない。As mentioned above, since the optical substrate l is cut and separated at the groove bottom ridge vA15a, a part of the inner wall surface of the groove 15 remains on the ridge line formed by the cut surface 4 of the substrate piece IA and the front and back surfaces. , the ridgeline of the optical film component 10 becomes a chamfered ridgeline 5. Therefore, chamfering work is not required after cutting and separation.
また、■溝１５には光学膜２を形成してないので、光学
基板１を切断分離時に光学膜２は切断されない。したが
って、光学膜２が損傷する恐れがなく、歩留まりが高い
。Further, since the optical film 2 is not formed in the groove 15, the optical film 2 is not cut when the optical substrate 1 is cut and separated. Therefore, there is no risk of damage to the optical film 2, and the yield is high.
以上説明したように本発明方法は、光学基板に光学膜を
牽制する前に■溝を形成し、光学膜を形成後に、溝底稜
線部分で個々の光学膜部品に分離切断する光学膜部品の
製造方法であって、光学膜が損傷する恐れがなくて、歩
留まりが向上し、低コストの光学膜部品を得られるとい
う、実用上で優れた効果がある。As explained above, in the method of the present invention, a groove is formed on the optical substrate before the optical film is restrained, and after the optical film is formed, the optical film components are separated and cut into individual optical film components at the groove bottom ridgeline. This manufacturing method has excellent practical effects in that there is no risk of damage to the optical film, the yield is improved, and optical film components can be obtained at low cost.
第１図の（ａｌ、 （ｂｌは本発明方法の工程を示す図
、第２図は本発明方法の一実施例の図で、（ａｌは■溝
形成時の側断面図、
（ｂ）は切断時の側断面図、
第３図の（ａｌ、 （ｂｌ、 （ｃｌは従来方法の工程
を示す図である。
図において、
１は光学基板、 ＩＡは基板素片、２は光学膜、
４は切断面、
５は面取稜線、 １０は光学膜部品、１０Ａは光
学膜部品素片、
１５はＶ溝、
１５ａは溝底稜線、
１６は■溝用砥石、
１７は切断砥石を示す。
（（１’）
（ｂン
（ｂ）
渠２図In Fig. 1, (al and (bl) are diagrams showing the steps of the method of the present invention, Fig. 2 is a diagram of an embodiment of the method of the present invention, (al is a side sectional view during groove formation, and (b) is a diagram showing the steps of the method of the present invention. (al, (bl, (cl) in Fig. 3 are diagrams showing the steps of the conventional method. In the figure, 1 is an optical substrate, IA is a substrate piece, 2 is an optical film,
4 is a cut surface, 5 is a chamfered ridgeline, 10 is an optical film component, 10A is an optical film component piece, 15 is a V groove, 15a is a groove bottom ridgeline, 16 is a grindstone for grooves, and 17 is a cutting grindstone. ((1') (bn(b) Ditch 2 diagram
Claims (1)
、光学膜部品（１０）の平面形状等しい角形に区画する
、マトリックス状のＶ溝（１５）を形成する工程と、 該Ｖ溝形成工程後に実施する、面取部及び該Ｖ溝（１５
）を除く該光学基板（１）の表面の全面に、所望の膜特
性を有する光学膜（２）を形成する工程と、該光学膜形
成工程後実施する、該光学基板（１）をそれぞれの溝底
稜線（１５ａ）部分で分離する工程とを、有することを
特徴とする光学膜部品の製造方法。[Claims] A matrix-like V-groove (15) is formed on both the front and back surfaces of a plate-shaped optical substrate (1) with a chamfered peripheral edge, which is divided into squares having the same planar shape as the optical film component (10). step, and the chamfered portion and the V-groove (15
) A step of forming an optical film (2) having desired film characteristics on the entire surface of the optical substrate (1) except for A method for manufacturing an optical film component, comprising the step of separating at a groove bottom ridgeline (15a).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61205366A JPS6360401A (en) | 1986-09-01 | 1986-09-01 | Manufacture of optical film parts |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61205366A JPS6360401A (en) | 1986-09-01 | 1986-09-01 | Manufacture of optical film parts |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6360401A true JPS6360401A (en) | 1988-03-16 |
Family
ID=16505659
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61205366A Pending JPS6360401A (en) | 1986-09-01 | 1986-09-01 | Manufacture of optical film parts |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6360401A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01276739A (en) * | 1988-04-28 | 1989-11-07 | Tokin Corp | Manufacture of ld excited solid state laser element |
| JPH02141703A (en) * | 1988-11-24 | 1990-05-31 | Dainippon Printing Co Ltd | Production of color filter |
| JPH04211203A (en) * | 1990-02-13 | 1992-08-03 | Nippon Telegr & Teleph Corp <Ntt> | Dielectric multilayer film filter and manufacture thereof and optical element by use of this |
| JP2001166141A (en) * | 1999-12-09 | 2001-06-22 | Sumitomo Chem Co Ltd | Optical film |
| WO2002031545A1 (en) * | 2000-10-10 | 2002-04-18 | Nikon Corporation | Filter member manufacturing method, filter member cutting method, filter chip cutting method, and filter chip manufacturing method |
| CN101963679A (en) * | 2009-07-23 | 2011-02-02 | 日本电波工业株式会社 | Optical filter |
-
1986
- 1986-09-01 JP JP61205366A patent/JPS6360401A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01276739A (en) * | 1988-04-28 | 1989-11-07 | Tokin Corp | Manufacture of ld excited solid state laser element |
| JPH0658982B2 (en) * | 1988-04-28 | 1994-08-03 | 株式会社トーキン | Method for manufacturing LD pumped solid-state laser device |
| JPH02141703A (en) * | 1988-11-24 | 1990-05-31 | Dainippon Printing Co Ltd | Production of color filter |
| JPH04211203A (en) * | 1990-02-13 | 1992-08-03 | Nippon Telegr & Teleph Corp <Ntt> | Dielectric multilayer film filter and manufacture thereof and optical element by use of this |
| JP2001166141A (en) * | 1999-12-09 | 2001-06-22 | Sumitomo Chem Co Ltd | Optical film |
| WO2002031545A1 (en) * | 2000-10-10 | 2002-04-18 | Nikon Corporation | Filter member manufacturing method, filter member cutting method, filter chip cutting method, and filter chip manufacturing method |
| CN101963679A (en) * | 2009-07-23 | 2011-02-02 | 日本电波工业株式会社 | Optical filter |
| JP2011027923A (en) * | 2009-07-23 | 2011-02-10 | Nippon Dempa Kogyo Co Ltd | Optical filter |
| US8437097B2 (en) | 2009-07-23 | 2013-05-07 | Nihon Dempa Kogyo Co., Ltd. | Optical filter |
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