JPS6360401A - Manufacture of optical film parts - Google Patents

Manufacture of optical film parts

Info

Publication number
JPS6360401A
JPS6360401A JP61205366A JP20536686A JPS6360401A JP S6360401 A JPS6360401 A JP S6360401A JP 61205366 A JP61205366 A JP 61205366A JP 20536686 A JP20536686 A JP 20536686A JP S6360401 A JPS6360401 A JP S6360401A
Authority
JP
Japan
Prior art keywords
optical film
groove
optical
substrate
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP61205366A
Other languages
Japanese (ja)
Inventor
Satoshi Kusaka
日下 敏
Hideki Noda
秀樹 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP61205366A priority Critical patent/JPS6360401A/en
Publication of JPS6360401A publication Critical patent/JPS6360401A/en
Pending legal-status Critical Current

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  • Optical Filters (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

PURPOSE:To obviate the possibility that an optical film is damaged, to improve the yield, and to obtain optical film parts of low cost by forming a V-groove before providing an optical film on an optical substrate, forming the optical film, and thereafter, separating and cutting it to each separate optical film parts by a groove bottom edge line part. CONSTITUTION:A matrix-shaped V-groove 15 is formed symmetrically on the surface and the reverse side of an optical substrate 1, and a plane shape of optical film parts 10 to be manufactured is divided into equal square forms. This V-groove 15 is provided by placing the optical substrate 1 on a table which can be driven in parallel in the X axis and Y axis directions, respectively, and feed a rotating grinding wheel 16 for V-groove deeply into a desired depth from the upper part. After the V-groove 15 has been formed, a desired optical film (filter film polarization separating film, coupler film) 2 is formed by vapor-depositing alternately dielectric films whose refractive indexes are different, by scores of layers, onto the whole surface of the surface of the optical substrate 1 except a chamfered edge line 5 and the groove side wall of the V-groove 15. Thereafter, the optical substrate 1 is cut and separated by the respective groove bottom edge line 15a parts, part of the inner wall surface of the V-groove 15 is left as it is in the edge line part made by a cutting plane 4 of a substrate element piece 14A, and the surface and the reverse side, and the optical film parts 10 having the chamfered edge line 5 is obtained.

Description

【発明の詳細な説明】 〔概要〕 光学基板の表裏両面を、マトリ・ノクス状の■溝により
、光学膜部品の形状等しい角形に区画し、それぞれの区
画の表面に光学膜を形成した後に、溝底稜線部分で、個
々の光学膜部品に分離して、稜線部分が面取りされた光
学膜部品を得ることにより、光学膜、及び基板素片が損
傷する恐れが少な(て、低コストの光学膜部品を提供す
る。
[Detailed Description of the Invention] [Summary] After dividing both the front and back surfaces of an optical substrate into squares having the same shape as the optical film component by matrix-shaped grooves, and forming an optical film on the surface of each division, By separating the optical film parts into individual optical film parts at the groove bottom ridgeline part and obtaining an optical film part with the ridgeline part chamfered, there is less risk of damage to the optical film and the substrate piece. Provide membrane parts.

〔産業上の利用分野〕[Industrial application field]

本発明方法はガラス、シリコン等の光学基板の表面に所
望の光学膜が形成されてなる、光学膜部品の製造方法の
改良に関する。
The method of the present invention relates to an improvement in a method for manufacturing optical film components in which a desired optical film is formed on the surface of an optical substrate made of glass, silicon, or the like.

フィルター膜、偏光分離膜、カプラ膜等の光学膜は、ガ
ラス、シリコン等の光学基板の表面に、屈折率の異なる
誘電体膜を交互に数十層形成することにより得られる。
Optical films such as filter films, polarization separation films, coupler films, etc. are obtained by alternately forming several dozen layers of dielectric films with different refractive indexes on the surface of an optical substrate such as glass or silicon.

このように光学基板の表面に所望の光学膜を形成した光
学膜部品は、所望の光学的特性を容易に得られ、且つ薄
く、小形であるので、光合分波器。
An optical film component in which a desired optical film is formed on the surface of an optical substrate can easily obtain desired optical characteristics, and is thin and small, so it can be used as an optical multiplexer/demultiplexer.

偏光分離器、光減衰器、光変調器等に広く使用されてい
る。
Widely used in polarization separators, optical attenuators, optical modulators, etc.

〔従来の技術〕[Conventional technology]

第3図は従来の光学膜部品の製造方法の工程を示す図で
ある。
FIG. 3 is a diagram showing the steps of a conventional method for manufacturing optical film components.

第3図(alにおいて、1は例えばガラス板よりなる光
学基板であり、光学膜部品10を多数個取りできる角形
である。
In FIG. 3 (al), 1 is an optical substrate made of, for example, a glass plate, and has a rectangular shape from which a large number of optical film components 10 can be formed.

このような光学基板1の表面の全面に、屈折率の異なる
誘電体膜を交互に数十層蒸着等して、所望の光学膜(フ
ィルター膜、偏光分離膜、カプラ膜)2を形成する。
A desired optical film (filter film, polarization separation film, coupler film) 2 is formed by alternately depositing several tens of layers of dielectric films having different refractive indexes on the entire surface of the optical substrate 1.

次に第3図(′b)のように、光学基板1を光学膜部品
10の平面形状に等しくなるように、例えば切断砥石(
円板状で板厚の薄いダイヤモンド砥石)でマトリックス
状に切断して、基板素片IAの表面に光学膜2が形成さ
れた光学膜部品素片10Aに分離する。
Next, as shown in FIG. 3('b), the optical substrate 1 is adjusted to have the same planar shape as the optical film component 10 using, for example, a cutting grindstone.
The substrate piece IA is cut into a matrix shape using a thin diamond grindstone (disc-shaped and thin) to separate into optical film component pieces 10A each having an optical film 2 formed on the surface of the substrate piece IA.

この光学膜部品素片10Aの状態では、基板素片IAの
稜線部分が欠けたり、或いは稜線部分より基板素片IA
に亀裂が入り、光学膜部品素片10Aが損傷する恐れが
ある。
In this state of the optical film component piece 10A, the ridgeline portion of the substrate piece IA may be chipped, or the substrate piece IA may be damaged from the ridgeline portion.
There is a risk that the optical film component piece 10A may be damaged.

したがって、第3図(C)のように、光学膜部品素片1
0Aのそれぞれの稜線部分をラッピング、研磨等して面
取稜線5にして、光学膜部品10を完成させている。
Therefore, as shown in FIG. 3(C), the optical film component piece 1
Each ridgeline portion of 0A is lapped, polished, etc. to form a chamfered ridgeline 5, and the optical film component 10 is completed.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら上記従来の製造方法は、光学膜2を形成後
に、光学基板1を切断して、光学膜部品IOとしている
However, in the conventional manufacturing method described above, after forming the optical film 2, the optical substrate 1 is cut to obtain the optical film component IO.

この切断時に光学膜2が切断され、切断部より光学膜2
に亀裂が発生したり、光学膜2の切断部近傍が欠けて脱
落する等、光学膜2が損傷し、歩留まりが悪いという問
題点がある。
During this cutting, the optical film 2 is cut, and the optical film 2 is
There are problems in that the optical film 2 is damaged, such as cracks occurring in the optical film 2 or parts near the cut portion of the optical film 2 chipping and falling off, resulting in poor yield.

〔問題点を解決するための手段〕[Means for solving problems]

上記従来の問題点を解決するため本発明方法は、第1図
のように、周縁が面取りされた板状の光学基板lの表裏
両面に、マトリックス状の■溝15を形成して、製造し
ようとする光学膜部品10の平面形状等しい角形に区画
する。
In order to solve the above-mentioned conventional problems, the method of the present invention, as shown in FIG. The planar shape of the optical film component 10 is divided into squares having the same shape.

次に面取部及びV溝15を除く光学基板1の表面の全面
に、所望の膜特性を有する光学膜2を形成する。
Next, an optical film 2 having desired film characteristics is formed over the entire surface of the optical substrate 1 excluding the chamfered portion and the V-groove 15.

その後光学基板1をそれぞれの溝底稜線L5a部分で切
断分離して、基板素片IAの表面に光学膜2が形成され
た光学膜部品10とする。
Thereafter, the optical substrate 1 is cut and separated at each groove bottom ridge line L5a to obtain an optical film component 10 in which the optical film 2 is formed on the surface of the substrate piece IA.

〔作用〕[Effect]

上記本発明方法によれば、溝底稜線15aで光学基板1
を切断分離するので、基板素片IAの切断面4と表裏面
とのなす稜線部分に、V溝15の内壁面の一部がその侭
残り、光学膜部品10の稜線は、面取稜線5となる。よ
って、切断分離後に面取り作業を必要としない。
According to the method of the present invention, the optical substrate 1 is
Since the substrate piece IA is cut and separated, a part of the inner wall surface of the V-groove 15 remains at the ridge line formed by the cut surface 4 of the substrate piece IA and the front and back surfaces, and the ridge line of the optical film component 10 is formed by the chamfered ridge line 5. becomes. Therefore, chamfering work is not required after cutting and separation.

また、■溝15には光学膜2を形成してないので、光学
基板1を切断分離時に光学膜2は切断されない。したが
って、光学膜2が損傷する恐れがなく、歩留まりが高く
て、得られる光学膜部品lOが低コストである。
Further, since the optical film 2 is not formed in the groove 15, the optical film 2 is not cut when the optical substrate 1 is cut and separated. Therefore, there is no risk of damage to the optical film 2, the yield is high, and the resulting optical film component IO is low in cost.

〔実施例〕〔Example〕

以下図を参照しながら、本発明方法を具体的に説明する
。なお、全図を通じて同一符号は同一対象物を示す。
The method of the present invention will be specifically explained below with reference to the drawings. Note that the same reference numerals indicate the same objects throughout the figures.

第1図の(al、 (blは本発明方法の工程を示す図
、第2図は本発明方法の一実施例の図で、fa)は■溝
形成時、山)は切断時の側断面図である。
In Fig. 1, (al and bl are diagrams showing the steps of the method of the present invention, and Fig. 2 is a diagram of an embodiment of the method of the present invention, where fa) is the ■ groove formed, and crest) is the side cross section at the time of cutting. It is a diagram.

第1図(a)において、lは、例えばガラス、シリコン
等よりなる光学基板であって、光学膜部品10を多数個
取りできる角形で、周縁の表・裏面と側面とのなす稜線
部分を面とりして、面取稜線5としである。
In FIG. 1(a), l is an optical substrate made of, for example, glass, silicon, etc., and has a rectangular shape from which a large number of optical film components 10 can be taken, and the ridge line formed by the front and back surfaces and the side surface of the periphery is a surface. For example, the chamfered ridge line 5 is used.

このような光学基板1の表面及び裏面に対称に、マトリ
ックス状の■溝15を形成して、製造しようとする光学
膜部品10の平面形状等しい角形に区画する。
Matrix-shaped grooves 15 are formed symmetrically on the front and back surfaces of the optical substrate 1, and are divided into squares having the same planar shape as the optical film component 10 to be manufactured.

この■溝15は、エツチング手段、或いは機械加工手段
で設けることもあるが、第2図(alに示すように、光
学基板1をX軸、Y軸方向にそれぞれ平行駆動可能のテ
ーブル上に載置し、上方より回転する■溝用砥石(例え
ば基板の表面にダイヤモンドの細粒を付着した、ダイヤ
モンド砥石)16を、所望の深さに切り込ませて、■溝
15を設けるのが、所望に大きい溝側壁を容易に得るこ
とができ、有利である。
This groove 15 may be formed by etching or machining, but as shown in FIG. 1. A groove grindstone 16 (for example, a diamond grindstone with fine diamond particles attached to the surface of the substrate), which is rotated from above, is cut to a desired depth to form the desired groove 15. This is advantageous because large groove sidewalls can be easily obtained.

なお、■溝用砥石16の円周面は、頂角が例えば90度
に形成された凸面である。
The circumferential surface of the groove grindstone 16 is a convex surface with an apex angle of, for example, 90 degrees.

■溝15を形成後、第1図(blのように、面取稜線5
及び■溝15の溝側壁を除く光学基板1の表面の全面に
、屈折率の異なる誘電体膜を交互に数十層蒸着等して、
所望の光学膜(フィルター膜、偏光分離膜、カプラ膜)
2を形成する。
■After forming the groove 15, as shown in Figure 1 (bl), the chamfered ridge line 5
and (2) Alternately depositing several tens of layers of dielectric films with different refractive indexes on the entire surface of the optical substrate 1 except for the side walls of the grooves 15.
Desired optical film (filter film, polarization separation film, coupler film)
form 2.

その後光学基板1をそれぞれの溝底稜線15a部分で切
断分離して、基板素片IAの切断面4と表裏面とのなす
稜線部分に、V溝15の内壁面の一部がその侭残り、面
取稜線5となった光学膜部品10とする。
After that, the optical substrate 1 is cut and separated at the respective groove bottom ridgelines 15a, and a part of the inner wall surface of the V-groove 15 remains on the ridgeline formed by the cut surface 4 of the substrate piece IA and the front and back surfaces. The optical film component 10 has a chamfered edge 5.

なお、この切断分離作業は、光学基板1を■溝15部分
で折り曲げてもよいものであるが、第2図(′b)のよ
うに、切断砥石17を使用すると、作業ミスが少なく分
離作業が容易である。
Note that this cutting and separation work can be done by bending the optical substrate 1 at the groove 15, but if a cutting wheel 17 is used as shown in FIG. is easy.

切断砥石17は、例えばダイヤモンド砥石であって、円
板状の砥石の厚さは、■溝15の開口幅よりも小さい厚
さである。
The cutting whetstone 17 is, for example, a diamond whetstone, and the thickness of the disc-shaped whetstone is smaller than the opening width of the groove 15.

このような切断砥石17を使用して、X軸、Y軸方向に
それぞれ平行駆動可能のテーブル上に光学基板1を載置
し、切断砥石17を回転させながら、上方より溝底稜線
15a部分に切り込ませることにより、容易に、且つ綺
麗な切断面4を有する基板素片IAに分離できる。
Using such a cutting wheel 17, place the optical substrate 1 on a table that can be driven in parallel in the X-axis and Y-axis directions, and while rotating the cutting wheel 17, cut the groove bottom ridgeline 15a from above. By making the cuts, it is possible to easily separate the substrate into pieces IA having clean cut surfaces 4.

上述のように、溝底稜vA15aで光学基板lを切断分
離するので、基板素片IAの切断面4と表裏面とのなす
稜線部分に、■溝15の内壁面の一部がその侭残り、光
学膜部品10の稜線は、面取稜線5となる。よって、切
断分離後に面取り作業を必要としない。
As mentioned above, since the optical substrate l is cut and separated at the groove bottom ridge vA15a, a part of the inner wall surface of the groove 15 remains on the ridge line formed by the cut surface 4 of the substrate piece IA and the front and back surfaces. , the ridgeline of the optical film component 10 becomes a chamfered ridgeline 5. Therefore, chamfering work is not required after cutting and separation.

また、■溝15には光学膜2を形成してないので、光学
基板1を切断分離時に光学膜2は切断されない。したが
って、光学膜2が損傷する恐れがなく、歩留まりが高い
Further, since the optical film 2 is not formed in the groove 15, the optical film 2 is not cut when the optical substrate 1 is cut and separated. Therefore, there is no risk of damage to the optical film 2, and the yield is high.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明方法は、光学基板に光学膜を
牽制する前に■溝を形成し、光学膜を形成後に、溝底稜
線部分で個々の光学膜部品に分離切断する光学膜部品の
製造方法であって、光学膜が損傷する恐れがなくて、歩
留まりが向上し、低コストの光学膜部品を得られるとい
う、実用上で優れた効果がある。
As explained above, in the method of the present invention, a groove is formed on the optical substrate before the optical film is restrained, and after the optical film is formed, the optical film components are separated and cut into individual optical film components at the groove bottom ridgeline. This manufacturing method has excellent practical effects in that there is no risk of damage to the optical film, the yield is improved, and optical film components can be obtained at low cost.

【図面の簡単な説明】[Brief explanation of drawings]

第1図の(al、 (blは本発明方法の工程を示す図
、第2図は本発明方法の一実施例の図で、(alは■溝
形成時の側断面図、 (b)は切断時の側断面図、 第3図の(al、 (bl、 (clは従来方法の工程
を示す図である。 図において、 1は光学基板、    IAは基板素片、2は光学膜、
     4は切断面、 5は面取稜線、    10は光学膜部品、10Aは光
学膜部品素片、 15はV溝、 15aは溝底稜線、 16は■溝用砥石、 17は切断砥石を示す。 ((1’) (bン (b) 渠2図
In Fig. 1, (al and (bl) are diagrams showing the steps of the method of the present invention, Fig. 2 is a diagram of an embodiment of the method of the present invention, (al is a side sectional view during groove formation, and (b) is a diagram showing the steps of the method of the present invention. (al, (bl, (cl) in Fig. 3 are diagrams showing the steps of the conventional method. In the figure, 1 is an optical substrate, IA is a substrate piece, 2 is an optical film,
4 is a cut surface, 5 is a chamfered ridgeline, 10 is an optical film component, 10A is an optical film component piece, 15 is a V groove, 15a is a groove bottom ridgeline, 16 is a grindstone for grooves, and 17 is a cutting grindstone. ((1') (bn(b) Ditch 2 diagram

Claims (1)

【特許請求の範囲】 周縁が面取りされた板状の光学基板(1)の表裏両面に
、光学膜部品(10)の平面形状等しい角形に区画する
、マトリックス状のV溝(15)を形成する工程と、 該V溝形成工程後に実施する、面取部及び該V溝(15
)を除く該光学基板(1)の表面の全面に、所望の膜特
性を有する光学膜(2)を形成する工程と、該光学膜形
成工程後実施する、該光学基板(1)をそれぞれの溝底
稜線(15a)部分で分離する工程とを、有することを
特徴とする光学膜部品の製造方法。
[Claims] A matrix-like V-groove (15) is formed on both the front and back surfaces of a plate-shaped optical substrate (1) with a chamfered peripheral edge, which is divided into squares having the same planar shape as the optical film component (10). step, and the chamfered portion and the V-groove (15
) A step of forming an optical film (2) having desired film characteristics on the entire surface of the optical substrate (1) except for A method for manufacturing an optical film component, comprising the step of separating at a groove bottom ridgeline (15a).
JP61205366A 1986-09-01 1986-09-01 Manufacture of optical film parts Pending JPS6360401A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61205366A JPS6360401A (en) 1986-09-01 1986-09-01 Manufacture of optical film parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61205366A JPS6360401A (en) 1986-09-01 1986-09-01 Manufacture of optical film parts

Publications (1)

Publication Number Publication Date
JPS6360401A true JPS6360401A (en) 1988-03-16

Family

ID=16505659

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61205366A Pending JPS6360401A (en) 1986-09-01 1986-09-01 Manufacture of optical film parts

Country Status (1)

Country Link
JP (1) JPS6360401A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01276739A (en) * 1988-04-28 1989-11-07 Tokin Corp Manufacture of ld excited solid state laser element
JPH02141703A (en) * 1988-11-24 1990-05-31 Dainippon Printing Co Ltd Production of color filter
JPH04211203A (en) * 1990-02-13 1992-08-03 Nippon Telegr & Teleph Corp <Ntt> Dielectric multilayer film filter and manufacture thereof and optical element by use of this
JP2001166141A (en) * 1999-12-09 2001-06-22 Sumitomo Chem Co Ltd Optical film
WO2002031545A1 (en) * 2000-10-10 2002-04-18 Nikon Corporation Filter member manufacturing method, filter member cutting method, filter chip cutting method, and filter chip manufacturing method
CN101963679A (en) * 2009-07-23 2011-02-02 日本电波工业株式会社 Optical filter

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01276739A (en) * 1988-04-28 1989-11-07 Tokin Corp Manufacture of ld excited solid state laser element
JPH0658982B2 (en) * 1988-04-28 1994-08-03 株式会社トーキン Method for manufacturing LD pumped solid-state laser device
JPH02141703A (en) * 1988-11-24 1990-05-31 Dainippon Printing Co Ltd Production of color filter
JPH04211203A (en) * 1990-02-13 1992-08-03 Nippon Telegr & Teleph Corp <Ntt> Dielectric multilayer film filter and manufacture thereof and optical element by use of this
JP2001166141A (en) * 1999-12-09 2001-06-22 Sumitomo Chem Co Ltd Optical film
WO2002031545A1 (en) * 2000-10-10 2002-04-18 Nikon Corporation Filter member manufacturing method, filter member cutting method, filter chip cutting method, and filter chip manufacturing method
CN101963679A (en) * 2009-07-23 2011-02-02 日本电波工业株式会社 Optical filter
JP2011027923A (en) * 2009-07-23 2011-02-10 Nippon Dempa Kogyo Co Ltd Optical filter
US8437097B2 (en) 2009-07-23 2013-05-07 Nihon Dempa Kogyo Co., Ltd. Optical filter

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