JP2513599B2 - Method for manufacturing optical waveguide substrate - Google Patents

Method for manufacturing optical waveguide substrate

Info

Publication number
JP2513599B2
JP2513599B2 JP3797585A JP3797585A JP2513599B2 JP 2513599 B2 JP2513599 B2 JP 2513599B2 JP 3797585 A JP3797585 A JP 3797585A JP 3797585 A JP3797585 A JP 3797585A JP 2513599 B2 JP2513599 B2 JP 2513599B2
Authority
JP
Japan
Prior art keywords
optical waveguide
waveguide substrate
substrate
optical
optical fiber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3797585A
Other languages
Japanese (ja)
Other versions
JPS61198111A (en
Inventor
實 清野
正明 乗松
政雄 柴山
一平 佐脇
啓幾 中島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3797585A priority Critical patent/JP2513599B2/en
Publication of JPS61198111A publication Critical patent/JPS61198111A/en
Application granted granted Critical
Publication of JP2513599B2 publication Critical patent/JP2513599B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は光通信システムに用いられる光導波路基板の
製造方法に係り、特に光導波路基板の光ファイバ接合面
を滑らかな面に仕上げる方法に関する。
Description: TECHNICAL FIELD The present invention relates to a method for manufacturing an optical waveguide substrate used in an optical communication system, and more particularly to a method for finishing an optical fiber bonding surface of the optical waveguide substrate into a smooth surface.

光通信システムは情報化社会における最適の通信シス
テムとして広い分野に普及しつつある。しかしこれまで
に提供されていた光通信システムを構成する部品や装置
は、高い精度や信頼性を要求されるために量産化できな
いものが多く、光通信システムの低価格化を阻害する原
因になっている。
The optical communication system is spreading in a wide field as an optimum communication system in the information society. However, many of the parts and devices that make up the optical communication systems that have been provided so far cannot be mass-produced because they require high accuracy and reliability, and this is a cause of hindering the cost reduction of optical communication systems. ing.

そこで多量生産による光通信システムの低価格化を実
現するために、高い精度や信頼性を維持しながら量産化
できるように部品や装置の形態を改良すると共に、量産
化可能な製造技術の開発が望まれている。
Therefore, in order to reduce the cost of optical communication systems by mass production, we have improved the form of parts and devices so that mass production can be performed while maintaining high accuracy and reliability, and the development of mass-production manufacturing technology. Is desired.

〔従来の技術〕[Conventional technology]

第2図は光導波路基板上の光導波路と光ファイバの接
続方法を示す斜視図、第3図は光ファイバ接合面を鏡面
仕上げする方法の従来例を示す工程図である。
FIG. 2 is a perspective view showing a method of connecting an optical waveguide and an optical fiber on an optical waveguide substrate, and FIG. 3 is a process diagram showing a conventional example of a method of mirror-finishing an optical fiber joint surface.

図において光導波路基板1はガラスからなる基板2
と、基板2表面に形成された光導波路3および4によっ
て構成されており、光導波路3および4と光ファイバ5
との接続は光ファイバ接合面6に光ファイバ5を接着す
ることによって行われる。しかし光導波路3および4と
光ファイバ5との接合部分における光損失を小さくする
ために、光ファイバ接合面6は鏡面状に仕上げて置く必
要がある。
In the figure, an optical waveguide substrate 1 is a substrate 2 made of glass.
And the optical waveguides 3 and 4 formed on the surface of the substrate 2, and the optical waveguides 3 and 4 and the optical fiber 5
The optical fiber 5 is bonded to the optical fiber joint surface 6 for connection with the optical fiber 5. However, in order to reduce the optical loss at the joint between the optical waveguides 3 and 4 and the optical fiber 5, the optical fiber joint surface 6 needs to be mirror-finished and placed.

光導波路基板1は第3図に示す工程によって加工され
仕上げられる。即ち同一基板上に形成された複数個の光
導波路基板1を、切断工程10において切断して個々の光
導波路基板1を形成する。しかし第2図に示す如く光フ
ァイバ接合面6は基板の切断面にあり、この切断面を鏡
面状に仕上げるために研削11、砂かけ12、研摩13等の作
業が行われる。
The optical waveguide substrate 1 is processed and finished by the process shown in FIG. That is, a plurality of optical waveguide substrates 1 formed on the same substrate are cut in a cutting step 10 to form individual optical waveguide substrates 1. However, as shown in FIG. 2, the optical fiber joint surface 6 is on the cut surface of the substrate, and work such as grinding 11, sanding 12, and polishing 13 is performed to finish the cut surface into a mirror surface.

研削工程11においてダイヤモンド砥石を用いて切断面
を荒く仕上げる。研削工程11は粗研削、中間の研削、お
よび精密研削に大別され、粗研削には粒度が#100位の
砥石が、中間の研削には粒度が#200位の砥石が、精密
研削には粒度が#400位の砥石が用いられている。
In the grinding step 11, the cut surface is roughened using a diamond grindstone. Grinding process 11 is roughly divided into rough grinding, intermediate grinding, and precision grinding.A grindstone with a particle size of # 100 is used for rough grinding, a grindstone with a particle size of # 200 is used for intermediate grinding, and precision grinding is used for precision grinding. A grindstone with a grain size of # 400 is used.

研削工程11において仕上げられた光導波路基板1の面
は表面あらさが不十分で大きい凹凸が残っている。そこ
で研摩を行う前に砂かけ工程12において微細な砂ずり面
が形成される。即ち鋳鉄皿と粒度が#800〜1500位の微
細な研摩砂を用いたラッピングが行われる。
The surface of the optical waveguide substrate 1 finished in the grinding step 11 has insufficient surface roughness and large irregularities remain. Therefore, before sanding, a fine sand surface is formed in the sanding step 12. That is, lapping is performed using a cast iron dish and fine abrasive sand with a grain size of about 800 to 1500.

しかし微細な砂ずり面も表面に微細な凹凸があって不
透明である。これを研摩工程13でピッチやフエルトを張
った皿と、べんがら(酸化鉄)や酸化セリウム等の微細
研摩剤を用いて透明に艶出しを行い鏡面状に仕上げる。
However, the fine sandy surface is also opaque due to the fine irregularities on the surface. In the polishing step 13, a plate with pitch or felt and a fine abrasive such as red iron oxide (iron oxide) or cerium oxide are used to transparently polish and finish it into a mirror surface.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

光ファイバ接合面を鏡面状に仕上げるたえに従来の方
法では、3回の研削と、砂かけと、研摩を必要とし、光
導波路基板の量産性を著しく阻害するという問題があっ
た。
In the conventional method for finishing the optical fiber joint surface to be a mirror surface, grinding, sanding and polishing are required three times, and there is a problem that mass productivity of the optical waveguide substrate is significantly impaired.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点は荒仕上げされた光導波路基板の光ファイ
バ接合面に、透明で屈折率が光導波路と略等しく、且つ
融点が光導波路基板より低い材料からなる低融点層を形
成し、低融点層を加熱溶融せしめることによって、光フ
ァイバ接合面を滑らかな面に仕上げる本発明になる光導
波路基板の製造方法によって解決される。
The above problem is that a low melting point layer made of a material that is transparent and has a refractive index substantially equal to that of the optical waveguide and a melting point lower than that of the optical waveguide substrate is formed on the optical fiber bonding surface of the rough-finished optical waveguide substrate. This is solved by the method for manufacturing an optical waveguide substrate according to the present invention, in which the optical fiber joint surface is finished into a smooth surface by heating and melting.

〔作用〕[Action]

光ファイバ接合面に形成した低融点層を加熱溶融せし
めることによって、光ファイバ接合面に残っている凹凸
が埋められ、しかも冷却固化後の表面が鏡面状になるた
め、砂かけや研摩等の作業が不要になり量産化が促進さ
れる。
By heating and melting the low melting point layer formed on the optical fiber joint surface, the irregularities remaining on the optical fiber joint surface are filled, and the surface after cooling and solidification becomes a mirror surface, so sanding or polishing work Is unnecessary and mass production is promoted.

〔実施例〕〔Example〕

以下添付図により本発明の実施例について説明する。
第1図は本発明になる製造方法の一実施例を示す工程図
である。
An embodiment of the present invention will be described below with reference to the accompanying drawings.
FIG. 1 is a process drawing showing an embodiment of the manufacturing method according to the present invention.

図において同一基板上に形成された複数個の光導波路
基板1を、切断工程10において切断して個々の光導波路
基板1を形成し、次の低融点層形成工程14においてスパ
ッタリング、蒸着法、気相成長法等の生膜手段を用い
て、光ファイバ接合面に透明で屈折率が光導波路と略等
しく、且つ融点が光導波路基板より低い材料からなる低
融点層を形成する。例えば基板としてガラス(融点が61
5℃)を用いた光導波路基板では、鉛硼酸塩(融点が350
〜400℃)を用いて低融点層を形成する。
In the figure, a plurality of optical waveguide substrates 1 formed on the same substrate are cut in a cutting step 10 to form individual optical waveguide substrates 1, and in the next low melting point layer forming step 14, sputtering, vapor deposition, vapor deposition, A low melting point layer made of a material which is transparent and has a refractive index substantially equal to that of the optical waveguide and a melting point lower than that of the optical waveguide substrate is formed on the optical fiber bonding surface by using a film forming means such as a phase growth method. For example, glass (melting point 61
In the optical waveguide substrate using 5 ℃, lead borate (melting point 350
To 400 ° C.) to form the low melting point layer.

しかる後、加熱溶融工程15において光導波路基板の融
点より低い温度で低融点層を加熱し溶融せしめる。
Then, in the heating and melting step 15, the low melting point layer is heated and melted at a temperature lower than the melting point of the optical waveguide substrate.

光ファイバ接合面に形成した低融点層を加熱溶融せし
めることによって、光ファイバ接合面に残っている凹凸
が埋められ、しかも冷却固化後の表面が鏡面状になるた
め、砂かけや研摩等の作業が不要になり量産化が促進さ
れる。
By heating and melting the low melting point layer formed on the optical fiber joint surface, the irregularities remaining on the optical fiber joint surface are filled, and the surface after cooling and solidification becomes a mirror surface, so sanding or polishing work Is unnecessary and mass production is promoted.

〔発明の効果〕〔The invention's effect〕

上述の如く本発明によれば量産化を促進し低価格化に
寄与する光導波路基板の製造方法を提供することができ
る。
As described above, according to the present invention, it is possible to provide a method of manufacturing an optical waveguide substrate that promotes mass production and contributes to cost reduction.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明になる光導波路基板の製造方法の一実施
例を示す工程図、 第2図は光導波路基板上の光導波路と光ファイバの接続
方法を示す斜視図、 第3図は光ファイバ接合面を鏡面仕上げする方法の従来
例を示す工程図、 である。図において 1は光導波路基板、2は基板、3、4は光導波路、5は
光ファイバ、6は光ファイバ接合面、10は切断工程、11
は研削工程、12は砂かけ工程、13は研摩工程、14は低融
点層形成工程、15は加熱溶融工程、をそれぞれ表す。
FIG. 1 is a process diagram showing an embodiment of a method for manufacturing an optical waveguide substrate according to the present invention, FIG. 2 is a perspective view showing a method of connecting an optical waveguide and an optical fiber on the optical waveguide substrate, and FIG. FIG. 6 is a process diagram showing a conventional example of a method for mirror-finishing a fiber joint surface. In the figure, 1 is an optical waveguide substrate, 2 is a substrate, 3 and 4 are optical waveguides, 5 is an optical fiber, 6 is an optical fiber joint surface, 10 is a cutting step, 11
Is a grinding step, 12 is a sanding step, 13 is a polishing step, 14 is a low melting point layer forming step, and 15 is a heating and melting step.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 佐脇 一平 川崎市中原区上小田中1015番地 富士通 株式会社内 (72)発明者 中島 啓幾 川崎市中原区上小田中1015番地 富士通 株式会社内 ─────────────────────────────────────────────────── (72) Inventor Ippei Sawaki 1015 Kamiodanaka, Nakahara-ku, Kawasaki City, Fujitsu Limited Fujitsu Limited (72) Keiichi Nakajima 1015 Kamedotachu, Nakahara-ku, Kawasaki City, Fujitsu Limited

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】少なくとも基板と該基板上に形成される光
導波路とで構成される光導波路基板の製造において、 荒仕上げされた光導波路基板の光ファイバ接合面に、透
明で屈折率が該光導波路と略等しく、且つ融点が該光導
波路基板より低い材料からなる低融点層を形成し、該低
融点層を加熱溶融せしめることによって、該光ファイバ
接合面を滑らかな面に仕上げることを特徴とする光導波
路基板の製造方法。
1. In the manufacture of an optical waveguide substrate comprising at least a substrate and an optical waveguide formed on the substrate, an optical fiber bonding surface of a rough-finished optical waveguide substrate is transparent and has a refractive index of A low melting point layer made of a material having a melting point substantially equal to that of the waveguide and lower than that of the optical waveguide substrate is formed, and the low melting point layer is melted by heating, whereby the optical fiber bonding surface is finished into a smooth surface. Method for manufacturing optical waveguide substrate.
JP3797585A 1985-02-27 1985-02-27 Method for manufacturing optical waveguide substrate Expired - Lifetime JP2513599B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3797585A JP2513599B2 (en) 1985-02-27 1985-02-27 Method for manufacturing optical waveguide substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3797585A JP2513599B2 (en) 1985-02-27 1985-02-27 Method for manufacturing optical waveguide substrate

Publications (2)

Publication Number Publication Date
JPS61198111A JPS61198111A (en) 1986-09-02
JP2513599B2 true JP2513599B2 (en) 1996-07-03

Family

ID=12512567

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3797585A Expired - Lifetime JP2513599B2 (en) 1985-02-27 1985-02-27 Method for manufacturing optical waveguide substrate

Country Status (1)

Country Link
JP (1) JP2513599B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6365405A (en) * 1986-09-05 1988-03-24 Fujitsu Ltd Optical waveguide
GB2208943B (en) * 1987-08-19 1991-07-31 Plessey Co Plc Alignment of fibre arrays
US4973125A (en) * 1989-08-25 1990-11-27 National Research Council Of Canada All optical self limiter for fiber optics
US20230002532A1 (en) * 2019-11-29 2023-01-05 Nippon Soda Co., Ltd. Terminally modified polybutadiene, resin composition for metal-clad laminates, prepreg, and metal-clad laminate

Also Published As

Publication number Publication date
JPS61198111A (en) 1986-09-02

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