JPS6360300U - - Google Patents
Info
- Publication number
- JPS6360300U JPS6360300U JP15424186U JP15424186U JPS6360300U JP S6360300 U JPS6360300 U JP S6360300U JP 15424186 U JP15424186 U JP 15424186U JP 15424186 U JP15424186 U JP 15424186U JP S6360300 U JPS6360300 U JP S6360300U
- Authority
- JP
- Japan
- Prior art keywords
- nozzle hole
- plasma
- hollow cathode
- front disk
- discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims 1
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000007733 ion plating Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15424186U JPH0638399Y2 (ja) | 1986-10-07 | 1986-10-07 | プラズマ発生装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15424186U JPH0638399Y2 (ja) | 1986-10-07 | 1986-10-07 | プラズマ発生装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6360300U true JPS6360300U (cs) | 1988-04-21 |
| JPH0638399Y2 JPH0638399Y2 (ja) | 1994-10-05 |
Family
ID=31073861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15424186U Expired - Lifetime JPH0638399Y2 (ja) | 1986-10-07 | 1986-10-07 | プラズマ発生装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0638399Y2 (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0196372A (ja) * | 1987-10-07 | 1989-04-14 | Raimuzu:Kk | イオンプレーティング装置 |
| WO2018135153A1 (ja) * | 2017-01-17 | 2018-07-26 | イオンラボ株式会社 | 金属イオン源 |
-
1986
- 1986-10-07 JP JP15424186U patent/JPH0638399Y2/ja not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0196372A (ja) * | 1987-10-07 | 1989-04-14 | Raimuzu:Kk | イオンプレーティング装置 |
| WO2018135153A1 (ja) * | 2017-01-17 | 2018-07-26 | イオンラボ株式会社 | 金属イオン源 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0638399Y2 (ja) | 1994-10-05 |
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