JPS6358338B2 - - Google Patents

Info

Publication number
JPS6358338B2
JPS6358338B2 JP20977281A JP20977281A JPS6358338B2 JP S6358338 B2 JPS6358338 B2 JP S6358338B2 JP 20977281 A JP20977281 A JP 20977281A JP 20977281 A JP20977281 A JP 20977281A JP S6358338 B2 JPS6358338 B2 JP S6358338B2
Authority
JP
Japan
Prior art keywords
pattern
electron beam
polymer
resist
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP20977281A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58114032A (ja
Inventor
Kazuo Toda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP20977281A priority Critical patent/JPS58114032A/ja
Publication of JPS58114032A publication Critical patent/JPS58114032A/ja
Publication of JPS6358338B2 publication Critical patent/JPS6358338B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP20977281A 1981-12-28 1981-12-28 パタ−ン形成方法 Granted JPS58114032A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20977281A JPS58114032A (ja) 1981-12-28 1981-12-28 パタ−ン形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20977281A JPS58114032A (ja) 1981-12-28 1981-12-28 パタ−ン形成方法

Publications (2)

Publication Number Publication Date
JPS58114032A JPS58114032A (ja) 1983-07-07
JPS6358338B2 true JPS6358338B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-11-15

Family

ID=16578348

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20977281A Granted JPS58114032A (ja) 1981-12-28 1981-12-28 パタ−ン形成方法

Country Status (1)

Country Link
JP (1) JPS58114032A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6073536A (ja) * 1983-09-30 1985-04-25 Fujitsu Ltd パタ−ン形成方法
US4849320A (en) * 1986-05-10 1989-07-18 Ciba-Geigy Corporation Method of forming images
GB8630129D0 (en) * 1986-12-17 1987-01-28 Ciba Geigy Ag Formation of image
WO2020037314A1 (en) * 2018-08-17 2020-02-20 Staar Surgical Company Polymeric composition exhibiting nanogradient of refractive index
KR20240073973A (ko) 2021-10-04 2024-05-27 스타 서지컬 컴퍼니 조정 가능한 광학 장치로 시력을 교정하기 위한 안과용 임플란트, 그 제조방법 및 그 사용방법

Also Published As

Publication number Publication date
JPS58114032A (ja) 1983-07-07

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