JPS635624U - - Google Patents

Info

Publication number
JPS635624U
JPS635624U JP9862586U JP9862586U JPS635624U JP S635624 U JPS635624 U JP S635624U JP 9862586 U JP9862586 U JP 9862586U JP 9862586 U JP9862586 U JP 9862586U JP S635624 U JPS635624 U JP S635624U
Authority
JP
Japan
Prior art keywords
heat insulating
insulating plates
support columns
wafer
plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9862586U
Other languages
Japanese (ja)
Other versions
JPH0525228Y2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1986098625U priority Critical patent/JPH0525228Y2/ja
Publication of JPS635624U publication Critical patent/JPS635624U/ja
Application granted granted Critical
Publication of JPH0525228Y2 publication Critical patent/JPH0525228Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案に係る断熱装置の実施例を示す
斜視図、第2図は上記断熱装置を備えた半導体製
造用減圧CVD装置の断面図、第3図は本考案の
断熱装置の断熱効果についての実験例を示す線図
である。 1…断熱体、2…真空チヤンバ、3…ウエハ駆
動機構、4…面発熱体、5…ウエハ、11…断熱
板、12…支持柱。
Fig. 1 is a perspective view showing an embodiment of the heat insulating device according to the present invention, Fig. 2 is a sectional view of a low pressure CVD equipment for semiconductor manufacturing equipped with the above heat insulating device, and Fig. 3 is the heat insulation effect of the heat insulating device of the present invention. FIG. DESCRIPTION OF SYMBOLS 1... Heat insulating body, 2... Vacuum chamber, 3... Wafer drive mechanism, 4... Surface heating element, 5... Wafer, 11... Heat insulating board, 12... Support column.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 真空チヤンバ内においてウエハ駆動機構とウエ
ハを加熱するための面発熱体との間に介在させる
断熱体を、間隔を置いて重積した快削性セラミツ
クからなる多数の断熱板の間に、それらの間隔を
保持させるための断熱材からなる支持柱を、交互
に上記断熱板の面内において離れた位置に配置し
て、それらの断熱板及び支持柱を固定することに
より構成したことを特徴とする半導体製造用CV
D装置における断熱装置。
A heat insulating body is interposed between the wafer drive mechanism and the surface heating element for heating the wafer in the vacuum chamber, and the heat insulating body is placed between a number of heat insulating plates made of free-cutting ceramic stacked at intervals. Semiconductor manufacturing, characterized in that support columns made of heat insulating material for holding the heat insulating plates are alternately arranged at separate positions within the plane of the heat insulating plates, and the heat insulating plates and the support columns are fixed. CV for
Insulation device in D device.
JP1986098625U 1986-06-27 1986-06-27 Expired - Lifetime JPH0525228Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986098625U JPH0525228Y2 (en) 1986-06-27 1986-06-27

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986098625U JPH0525228Y2 (en) 1986-06-27 1986-06-27

Publications (2)

Publication Number Publication Date
JPS635624U true JPS635624U (en) 1988-01-14
JPH0525228Y2 JPH0525228Y2 (en) 1993-06-25

Family

ID=30966735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986098625U Expired - Lifetime JPH0525228Y2 (en) 1986-06-27 1986-06-27

Country Status (1)

Country Link
JP (1) JPH0525228Y2 (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49107676A (en) * 1973-02-16 1974-10-12

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49107676A (en) * 1973-02-16 1974-10-12

Also Published As

Publication number Publication date
JPH0525228Y2 (en) 1993-06-25

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