JPS6355775B2 - - Google Patents

Info

Publication number
JPS6355775B2
JPS6355775B2 JP57013003A JP1300382A JPS6355775B2 JP S6355775 B2 JPS6355775 B2 JP S6355775B2 JP 57013003 A JP57013003 A JP 57013003A JP 1300382 A JP1300382 A JP 1300382A JP S6355775 B2 JPS6355775 B2 JP S6355775B2
Authority
JP
Japan
Prior art keywords
wafer
irradiated
plasma
electron beam
insulating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57013003A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58131731A (ja
Inventor
Junji Sakurai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP57013003A priority Critical patent/JPS58131731A/ja
Publication of JPS58131731A publication Critical patent/JPS58131731A/ja
Publication of JPS6355775B2 publication Critical patent/JPS6355775B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
  • Recrystallisation Techniques (AREA)
JP57013003A 1982-01-29 1982-01-29 エネルギ−線照射方法 Granted JPS58131731A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57013003A JPS58131731A (ja) 1982-01-29 1982-01-29 エネルギ−線照射方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57013003A JPS58131731A (ja) 1982-01-29 1982-01-29 エネルギ−線照射方法

Publications (2)

Publication Number Publication Date
JPS58131731A JPS58131731A (ja) 1983-08-05
JPS6355775B2 true JPS6355775B2 (enrdf_load_stackoverflow) 1988-11-04

Family

ID=11820998

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57013003A Granted JPS58131731A (ja) 1982-01-29 1982-01-29 エネルギ−線照射方法

Country Status (1)

Country Link
JP (1) JPS58131731A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2602051B1 (fr) * 1986-07-23 1988-09-16 Cameca Procede et dispositif pour la decharge d'echantillons isolants lors d'une analyse ionique
JPH0745227A (ja) * 1993-06-11 1995-02-14 Mitsubishi Electric Corp 荷電粒子応用分析装置及び荷電粒子応用描画装置

Also Published As

Publication number Publication date
JPS58131731A (ja) 1983-08-05

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