JPS6355532U - - Google Patents
Info
- Publication number
- JPS6355532U JPS6355532U JP14785286U JP14785286U JPS6355532U JP S6355532 U JPS6355532 U JP S6355532U JP 14785286 U JP14785286 U JP 14785286U JP 14785286 U JP14785286 U JP 14785286U JP S6355532 U JPS6355532 U JP S6355532U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- protrusions
- sealing plate
- supporting
- inlet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007789 sealing Methods 0.000 claims 3
- 238000009792 diffusion process Methods 0.000 claims 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Description
第1図は本考案の一実施例の側面図、第2図は
底面図である。
1……ウエーハ、2……ウエーハ支持ボート、
3……ウエーハ支持ボートの支持具、4……封鎖
板、5……石英管、5′……蓋体9の支持用突起
、6……開口部。
FIG. 1 is a side view of an embodiment of the present invention, and FIG. 2 is a bottom view. 1...Wafer, 2...Wafer support boat,
3...Supporting tool for wafer support boat, 4...Blocking plate, 5...Quartz tube, 5'...Protrusion for supporting lid body 9, 6...Opening.
補正 昭61.12.10
図面の簡単な説明を次のように補正する。
明細書第5頁下から2行〔蓋体9〕を〔封鎖板
4〕に訂正する。Amendment December 10, 1981 The brief description of the drawing is amended as follows. The second line from the bottom of page 5 of the specification [lid body 9] is corrected to [closure plate 4].
Claims (1)
板支持用突起を設け、これに反応管内に移動自在
に封入された反応管入口封鎖板を乗せたことを特
徴とする縦形拡散炉における反応管入口封鎖装置
。 A vertical diffusion furnace characterized in that a plurality (three or more) of protrusions for supporting a sealing plate are provided at the inlet end of a reaction tube, and a reaction tube inlet sealing plate movably enclosed within the reaction tube is mounted on these protrusions. Reaction tube inlet sealing device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14785286U JPH0143860Y2 (en) | 1986-09-29 | 1986-09-29 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14785286U JPH0143860Y2 (en) | 1986-09-29 | 1986-09-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6355532U true JPS6355532U (en) | 1988-04-14 |
JPH0143860Y2 JPH0143860Y2 (en) | 1989-12-19 |
Family
ID=31061597
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14785286U Expired JPH0143860Y2 (en) | 1986-09-29 | 1986-09-29 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0143860Y2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07297145A (en) * | 1995-03-02 | 1995-11-10 | Tokyo Electron Tohoku Ltd | Heat treatment system |
-
1986
- 1986-09-29 JP JP14785286U patent/JPH0143860Y2/ja not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07297145A (en) * | 1995-03-02 | 1995-11-10 | Tokyo Electron Tohoku Ltd | Heat treatment system |
Also Published As
Publication number | Publication date |
---|---|
JPH0143860Y2 (en) | 1989-12-19 |
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