JPS6351918A - 半導体製造装置用ガス精製器 - Google Patents
半導体製造装置用ガス精製器Info
- Publication number
- JPS6351918A JPS6351918A JP61196621A JP19662186A JPS6351918A JP S6351918 A JPS6351918 A JP S6351918A JP 61196621 A JP61196621 A JP 61196621A JP 19662186 A JP19662186 A JP 19662186A JP S6351918 A JPS6351918 A JP S6351918A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- filter
- adsorbent
- housing
- gas purifier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 18
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 16
- 239000003463 adsorbent Substances 0.000 claims abstract description 46
- 238000006243 chemical reaction Methods 0.000 claims abstract description 22
- 239000002184 metal Substances 0.000 claims abstract description 11
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 239000000919 ceramic Substances 0.000 claims abstract description 7
- 239000012535 impurity Substances 0.000 claims description 3
- 239000000428 dust Substances 0.000 abstract description 8
- 239000010419 fine particle Substances 0.000 abstract description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- 229910021536 Zeolite Inorganic materials 0.000 abstract description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 abstract description 3
- 239000010457 zeolite Substances 0.000 abstract description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 abstract description 2
- 239000001569 carbon dioxide Substances 0.000 abstract description 2
- 239000002245 particle Substances 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 93
- 239000010408 film Substances 0.000 description 9
- 238000010926 purge Methods 0.000 description 8
- 238000000746 purification Methods 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- 230000003749 cleanliness Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 230000008929 regeneration Effects 0.000 description 3
- 238000011069 regeneration method Methods 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- 230000002542 deteriorative effect Effects 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Separation Of Gases By Adsorption (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61196621A JPS6351918A (ja) | 1986-08-22 | 1986-08-22 | 半導体製造装置用ガス精製器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61196621A JPS6351918A (ja) | 1986-08-22 | 1986-08-22 | 半導体製造装置用ガス精製器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6351918A true JPS6351918A (ja) | 1988-03-05 |
| JPH0218894B2 JPH0218894B2 (enrdf_load_stackoverflow) | 1990-04-27 |
Family
ID=16360799
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61196621A Granted JPS6351918A (ja) | 1986-08-22 | 1986-08-22 | 半導体製造装置用ガス精製器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6351918A (enrdf_load_stackoverflow) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06196441A (ja) * | 1992-09-11 | 1994-07-15 | Nec Corp | 半導体装置の製造方法 |
| US5409526A (en) * | 1992-10-06 | 1995-04-25 | Air Products And Chemicals, Inc. | Apparatus for supplying high purity fluid |
| US5829139A (en) * | 1995-05-03 | 1998-11-03 | Pall Corporation | Method for forming a reactive medium |
| EP0897738A4 (en) * | 1997-01-31 | 2001-02-28 | Takasago Thermal | CLEANING DEVICE, FILTER AND METHOD FOR THEIR PRODUCTION |
| WO2006129481A1 (ja) * | 2005-05-30 | 2006-12-07 | Entegris, Inc. | 強化容器を有するガス精製装置 |
| US7465692B1 (en) | 2000-03-16 | 2008-12-16 | Pall Corporation | Reactive media, methods of use and assemblies for purifying |
| JP2010202453A (ja) * | 2009-03-03 | 2010-09-16 | Meidensha Corp | 液体オゾン蓄積用ベッセル |
| JP2015014235A (ja) * | 2013-07-04 | 2015-01-22 | 愛三工業株式会社 | フィルタ装置及び圧力調整器 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0540384U (ja) * | 1991-10-28 | 1993-06-01 | 三機工業株式会社 | 水洗便所 |
-
1986
- 1986-08-22 JP JP61196621A patent/JPS6351918A/ja active Granted
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06196441A (ja) * | 1992-09-11 | 1994-07-15 | Nec Corp | 半導体装置の製造方法 |
| US5409526A (en) * | 1992-10-06 | 1995-04-25 | Air Products And Chemicals, Inc. | Apparatus for supplying high purity fluid |
| US5829139A (en) * | 1995-05-03 | 1998-11-03 | Pall Corporation | Method for forming a reactive medium |
| US6066591A (en) * | 1995-05-03 | 2000-05-23 | Pall Corporation | Reactive medium for purifying fluids |
| EP0897738A4 (en) * | 1997-01-31 | 2001-02-28 | Takasago Thermal | CLEANING DEVICE, FILTER AND METHOD FOR THEIR PRODUCTION |
| US7465692B1 (en) | 2000-03-16 | 2008-12-16 | Pall Corporation | Reactive media, methods of use and assemblies for purifying |
| WO2006129481A1 (ja) * | 2005-05-30 | 2006-12-07 | Entegris, Inc. | 強化容器を有するガス精製装置 |
| JP2010202453A (ja) * | 2009-03-03 | 2010-09-16 | Meidensha Corp | 液体オゾン蓄積用ベッセル |
| JP2015014235A (ja) * | 2013-07-04 | 2015-01-22 | 愛三工業株式会社 | フィルタ装置及び圧力調整器 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0218894B2 (enrdf_load_stackoverflow) | 1990-04-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5468384A (en) | Module for filtering, separating, purifying gases or liquids, or for catalytic conversion | |
| USRE35725E (en) | Method and apparatus for removing residual hydrogen from a purified gas | |
| US7125440B2 (en) | Composite structure for high efficiency hydrogen separation and its associated methods of manufacture and use | |
| US20050284297A1 (en) | Gas purification system with an integrated hydrogen sorption and filter assembly | |
| JPS6351918A (ja) | 半導体製造装置用ガス精製器 | |
| JP2001501693A (ja) | クライオポンプ／ゲッターポンプの組み合わせポンプとその再生方法 | |
| EP2147897B1 (en) | Hydrogen separator and method of operating hydrogen separator | |
| JP3796754B2 (ja) | 流体の濾過および／または精製に関する装置および方法 | |
| CN205323397U (zh) | 一种气体纯化器 | |
| US9592469B2 (en) | Oxygen separation device for a pressure swing adsorption system | |
| US5426865A (en) | Vacuum creating method and apparatus | |
| WO1997035805A1 (en) | Method and apparatus for purifying hydrogen gas | |
| KR100483039B1 (ko) | 일체식 가열게터 정화시스템 | |
| JP2001248964A (ja) | ガス精製装置およびガス精製方法 | |
| US8002875B1 (en) | System and method for separating hydrogen gas from a mixed gas source using composite structure tubes | |
| KR20020047114A (ko) | 재생할 수 있는 주변 온도 정제기 | |
| JP4429318B2 (ja) | 高効率で水素を分離するための複合構造を有する水素ガス分離器、ならびにその製造および使用方法 | |
| JPH1129301A (ja) | 超高純度水素ガスの製造装置 | |
| JP2004344694A (ja) | 空気液化分離装置における原料空気の精製方法 | |
| JPH06171904A (ja) | 水素ガス精製装置 | |
| JPH0635650B2 (ja) | 超高純度ガス供給装置 | |
| TW201545798A (zh) | 高純度氣體純化器 | |
| JPS5932167B2 (ja) | 不純物ガストラツプ | |
| JPH04290534A (ja) | フィルタを用いた低温液化ガスのパーティクル低減方法 | |
| JPH0692605A (ja) | 水素回収精製方法及びその装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |