JPS6347926A - 半導体露光方法 - Google Patents

半導体露光方法

Info

Publication number
JPS6347926A
JPS6347926A JP61191649A JP19164986A JPS6347926A JP S6347926 A JPS6347926 A JP S6347926A JP 61191649 A JP61191649 A JP 61191649A JP 19164986 A JP19164986 A JP 19164986A JP S6347926 A JPS6347926 A JP S6347926A
Authority
JP
Japan
Prior art keywords
photomask
pattern
exposure
memory element
peripheral circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61191649A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0554689B2 (enrdf_load_stackoverflow
Inventor
Masataka Shiba
正孝 芝
Yoshisada Oshida
良忠 押田
Naoto Nakajima
直人 中島
Toshihiko Nakada
俊彦 中田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP61191649A priority Critical patent/JPS6347926A/ja
Publication of JPS6347926A publication Critical patent/JPS6347926A/ja
Publication of JPH0554689B2 publication Critical patent/JPH0554689B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61191649A 1986-08-18 1986-08-18 半導体露光方法 Granted JPS6347926A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61191649A JPS6347926A (ja) 1986-08-18 1986-08-18 半導体露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61191649A JPS6347926A (ja) 1986-08-18 1986-08-18 半導体露光方法

Publications (2)

Publication Number Publication Date
JPS6347926A true JPS6347926A (ja) 1988-02-29
JPH0554689B2 JPH0554689B2 (enrdf_load_stackoverflow) 1993-08-13

Family

ID=16278168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61191649A Granted JPS6347926A (ja) 1986-08-18 1986-08-18 半導体露光方法

Country Status (1)

Country Link
JP (1) JPS6347926A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6331885B1 (en) 1997-09-19 2001-12-18 Nikon Corporation Stage apparatus, scanning type exposure apparatus, and device produced with the same
JP2008042194A (ja) * 2006-08-04 2008-02-21 Asml Netherlands Bv リソグラフィ方法およびパターニングデバイス

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0715892U (ja) * 1993-08-23 1995-03-17 有限会社青山コンクリート 道路ｌ型用雨水浸透桝

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6331885B1 (en) 1997-09-19 2001-12-18 Nikon Corporation Stage apparatus, scanning type exposure apparatus, and device produced with the same
US6906782B2 (en) 1997-09-19 2005-06-14 Nikon Corporation Stage apparatus, scanning type exposure apparatus, and device produced with the same
JP2008042194A (ja) * 2006-08-04 2008-02-21 Asml Netherlands Bv リソグラフィ方法およびパターニングデバイス
US7879514B2 (en) 2006-08-04 2011-02-01 Asml Netherlands B.V. Lithographic method and patterning device

Also Published As

Publication number Publication date
JPH0554689B2 (enrdf_load_stackoverflow) 1993-08-13

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