JPS6347689A - 放射線写真用の像検出装置を製造する方法 - Google Patents
放射線写真用の像検出装置を製造する方法Info
- Publication number
- JPS6347689A JPS6347689A JP62197987A JP19798787A JPS6347689A JP S6347689 A JPS6347689 A JP S6347689A JP 62197987 A JP62197987 A JP 62197987A JP 19798787 A JP19798787 A JP 19798787A JP S6347689 A JPS6347689 A JP S6347689A
- Authority
- JP
- Japan
- Prior art keywords
- image recording
- layer
- image
- protective layer
- recording device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000010410 layer Substances 0.000 claims description 14
- 239000011241 protective layer Substances 0.000 claims description 11
- 239000011159 matrix material Substances 0.000 claims description 9
- 238000000034 method Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 238000007740 vapor deposition Methods 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 3
- 230000005855 radiation Effects 0.000 description 12
- 239000013078 crystal Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005019 vapor deposition process Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000002601 radiography Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- -1 silicon oxide nitride Chemical class 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/805—Coatings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/29—Measurement performed on radiation beams, e.g. position or section of the beam; Measurement of spatial distribution of radiation
- G01T1/2914—Measurement of spatial distribution of radiation
- G01T1/2921—Static instruments for imaging the distribution of radioactivity in one or two dimensions; Radio-isotope cameras
- G01T1/2928—Static instruments for imaging the distribution of radioactivity in one or two dimensions; Radio-isotope cameras using solid state detectors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/2018—Scintillation-photodiode combinations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/189—X-ray, gamma-ray or corpuscular radiation imagers
- H10F39/1892—Direct radiation image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/30—Coatings
- H10F77/306—Coatings for devices having potential barriers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/40—Optical elements or arrangements
- H10F77/496—Luminescent members, e.g. fluorescent sheets
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Measurement Of Radiation (AREA)
- Solid State Image Pick-Up Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8602021A NL8602021A (nl) | 1986-08-07 | 1986-08-07 | Werkwijze voor het vervaardigen van een beeldopneeminrichting voor radiografische toepassingen. |
| NL8602021 | 1986-08-07 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6347689A true JPS6347689A (ja) | 1988-02-29 |
Family
ID=19848383
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62197987A Pending JPS6347689A (ja) | 1986-08-07 | 1987-08-07 | 放射線写真用の像検出装置を製造する方法 |
Country Status (8)
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6031892A (en) * | 1989-12-05 | 2000-02-29 | University Of Massachusetts Medical Center | System for quantitative radiographic imaging |
| US5153438A (en) * | 1990-10-01 | 1992-10-06 | General Electric Company | Method of forming an x-ray imaging array and the array |
| US5187369A (en) * | 1990-10-01 | 1993-02-16 | General Electric Company | High sensitivity, high resolution, solid state x-ray imaging device with barrier layer |
| US5059800A (en) * | 1991-04-19 | 1991-10-22 | General Electric Company | Two dimensional mosaic scintillation detector |
| US5208460A (en) * | 1991-09-23 | 1993-05-04 | General Electric Company | Photodetector scintillator radiation imager having high efficiency light collection |
| US5463225A (en) * | 1992-06-01 | 1995-10-31 | General Electric Company | Solid state radiation imager with high integrity barrier layer and method of fabricating |
| US5368882A (en) * | 1993-08-25 | 1994-11-29 | Minnesota Mining And Manufacturing Company | Process for forming a radiation detector |
| US5401668A (en) * | 1993-09-02 | 1995-03-28 | General Electric Company | Method for fabrication solid state radiation imager having improved scintillator adhesion |
| US5596198A (en) * | 1994-04-22 | 1997-01-21 | The Regents, University Of California | Gamma ray camera |
| US7019301B2 (en) * | 1997-02-14 | 2006-03-28 | Hamamatsu Photonics K.K. | Radiation detection device and method of making the same |
| JP4731791B2 (ja) * | 2000-09-11 | 2011-07-27 | 浜松ホトニクス株式会社 | 放射線イメージセンサおよびその製造方法 |
| AU2001284525A1 (en) | 2000-09-11 | 2002-03-26 | Hamamatsu Photonics K.K. | Scintillator panel, radiation image sensor and methods of producing them |
| US6483115B1 (en) * | 2000-11-08 | 2002-11-19 | General Electric Company | Method for enhancing scintillator adhesion to digital x-ray detectors |
| US6324249B1 (en) | 2001-03-21 | 2001-11-27 | Agilent Technologies, Inc. | Electronic planar laminography system and method |
| US6707046B2 (en) * | 2002-01-03 | 2004-03-16 | General Electric Company | Optimized scintillator and pixilated photodiode detector array for multi-slice CT x-ray detector using backside illumination |
| DE102010004890A1 (de) * | 2010-01-18 | 2011-07-21 | Siemens Aktiengesellschaft, 80333 | Photodiodenarray, Strahlendetektor und Verfahren zur Herstellung eines solchen Photodiodenarrays und eines solchen Strahlendetektors |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3936645A (en) * | 1974-03-25 | 1976-02-03 | Radiologic Sciences, Inc. | Cellularized Luminescent structures |
| US4197633A (en) * | 1977-09-01 | 1980-04-15 | Honeywell, Inc. | Hybrid mosaic IR/CCD focal plane |
| US4234792A (en) * | 1977-09-29 | 1980-11-18 | Raytheon Company | Scintillator crystal radiation detector |
| US4290844A (en) * | 1979-02-26 | 1981-09-22 | Carson Alexiou Corporation | Focal plane photo-detector mosaic array fabrication |
| JPS55129782A (en) * | 1979-03-30 | 1980-10-07 | Hitachi Medical Corp | Radiant ray detector |
| US4411059A (en) * | 1979-10-18 | 1983-10-25 | Picker Corporation | Method for manufacturing a charge splitting resistive layer for a semiconductor gamma camera |
| FR2575602B1 (fr) * | 1984-12-27 | 1987-01-30 | Thomson Csf | Dispositif photosensible de grand format, et procede d'utilisation |
| US4686761A (en) * | 1985-03-21 | 1987-08-18 | The United States Of America As Represented By The Secretary Of The Army | Method of fabrication of low crosstalk photodiode array |
| US4618380A (en) * | 1985-06-18 | 1986-10-21 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method of fabricating an imaging X-ray spectrometer |
| US4672207A (en) * | 1985-08-21 | 1987-06-09 | The United States Of America As Represented By The United States Department Of Energy | Readout system for multi-crystal gamma cameras |
| JPS6243585A (ja) * | 1985-08-21 | 1987-02-25 | Toshiba Corp | X線ct用検出器 |
-
1986
- 1986-08-07 NL NL8602021A patent/NL8602021A/nl not_active Application Discontinuation
-
1987
- 1987-07-24 DE DE8787201429T patent/DE3762176D1/de not_active Revoked
- 1987-07-24 EP EP87201429A patent/EP0257678B1/en not_active Expired - Lifetime
- 1987-07-27 US US07/079,084 patent/US4746619A/en not_active Expired - Fee Related
- 1987-07-29 IN IN581/CAL/87A patent/IN165686B/en unknown
- 1987-08-04 IL IL83428A patent/IL83428A/xx not_active IP Right Cessation
- 1987-08-05 KR KR1019870008600A patent/KR880003430A/ko not_active Ceased
- 1987-08-07 JP JP62197987A patent/JPS6347689A/ja active Pending
-
1988
- 1988-05-20 US US07/197,105 patent/US4906850A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US4746619A (en) | 1988-05-24 |
| EP0257678A1 (en) | 1988-03-02 |
| IL83428A0 (en) | 1988-01-31 |
| IN165686B (c_deeref_Disk_and_Scratch_Disk_Pools_and_Their_Defaults.html) | 1989-12-09 |
| IL83428A (en) | 1990-12-23 |
| DE3762176D1 (de) | 1990-05-10 |
| NL8602021A (nl) | 1988-03-01 |
| US4906850A (en) | 1990-03-06 |
| KR880003430A (ko) | 1988-05-17 |
| EP0257678B1 (en) | 1990-04-04 |
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