JPS6347362A - イオンプレ−テイング装置 - Google Patents
イオンプレ−テイング装置Info
- Publication number
- JPS6347362A JPS6347362A JP19123286A JP19123286A JPS6347362A JP S6347362 A JPS6347362 A JP S6347362A JP 19123286 A JP19123286 A JP 19123286A JP 19123286 A JP19123286 A JP 19123286A JP S6347362 A JPS6347362 A JP S6347362A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- substrate
- guns
- film
- pressure gradient
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007733 ion plating Methods 0.000 title claims description 13
- 239000000758 substrate Substances 0.000 claims abstract description 21
- 238000001704 evaporation Methods 0.000 claims abstract description 14
- 230000008020 evaporation Effects 0.000 claims abstract description 13
- 239000010409 thin film Substances 0.000 abstract description 21
- 239000000463 material Substances 0.000 abstract description 11
- 230000002250 progressing effect Effects 0.000 abstract 2
- 239000010408 film Substances 0.000 description 29
- 238000000034 method Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 230000005284 excitation Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 102100034523 Histone H4 Human genes 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- -1 polysalefone Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000001131 transforming effect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19123286A JPS6347362A (ja) | 1986-08-15 | 1986-08-15 | イオンプレ−テイング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19123286A JPS6347362A (ja) | 1986-08-15 | 1986-08-15 | イオンプレ−テイング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6347362A true JPS6347362A (ja) | 1988-02-29 |
| JPH0580555B2 JPH0580555B2 (cg-RX-API-DMAC7.html) | 1993-11-09 |
Family
ID=16271097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19123286A Granted JPS6347362A (ja) | 1986-08-15 | 1986-08-15 | イオンプレ−テイング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6347362A (cg-RX-API-DMAC7.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6160350A (en) * | 1996-03-25 | 2000-12-12 | Sumitomo Heavy Industries, Ltd. | Ion plating apparatus |
| JP2014227597A (ja) * | 2013-05-27 | 2014-12-08 | 住友重機械工業株式会社 | 成膜装置 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2946404B2 (ja) * | 1996-03-25 | 1999-09-06 | 住友重機械工業株式会社 | イオンプレーティング装置 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS512017A (cg-RX-API-DMAC7.html) * | 1974-05-28 | 1976-01-09 | Anthony Mfg Corp | |
| JPS5520792A (en) * | 1978-07-29 | 1980-02-14 | Beecham Group Ltd | Clavaranic acid derivative*its manufacture and composition |
| JPS5873770A (ja) * | 1981-10-28 | 1983-05-04 | Joshin Uramoto | 磁石とコイルの磁場を利用した高能率イオンプレ−テング装置 |
| JPS60110872A (ja) * | 1983-11-21 | 1985-06-17 | Sumitomo Electric Ind Ltd | イオンプレ−テイング法 |
| JPS60141869A (ja) * | 1983-12-29 | 1985-07-26 | Nissin Electric Co Ltd | 膜形成方法および膜形成装置 |
-
1986
- 1986-08-15 JP JP19123286A patent/JPS6347362A/ja active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS512017A (cg-RX-API-DMAC7.html) * | 1974-05-28 | 1976-01-09 | Anthony Mfg Corp | |
| JPS5520792A (en) * | 1978-07-29 | 1980-02-14 | Beecham Group Ltd | Clavaranic acid derivative*its manufacture and composition |
| JPS5873770A (ja) * | 1981-10-28 | 1983-05-04 | Joshin Uramoto | 磁石とコイルの磁場を利用した高能率イオンプレ−テング装置 |
| JPS60110872A (ja) * | 1983-11-21 | 1985-06-17 | Sumitomo Electric Ind Ltd | イオンプレ−テイング法 |
| JPS60141869A (ja) * | 1983-12-29 | 1985-07-26 | Nissin Electric Co Ltd | 膜形成方法および膜形成装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6160350A (en) * | 1996-03-25 | 2000-12-12 | Sumitomo Heavy Industries, Ltd. | Ion plating apparatus |
| JP2014227597A (ja) * | 2013-05-27 | 2014-12-08 | 住友重機械工業株式会社 | 成膜装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0580555B2 (cg-RX-API-DMAC7.html) | 1993-11-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |