JPS6343466B2 - - Google Patents

Info

Publication number
JPS6343466B2
JPS6343466B2 JP58227576A JP22757683A JPS6343466B2 JP S6343466 B2 JPS6343466 B2 JP S6343466B2 JP 58227576 A JP58227576 A JP 58227576A JP 22757683 A JP22757683 A JP 22757683A JP S6343466 B2 JPS6343466 B2 JP S6343466B2
Authority
JP
Japan
Prior art keywords
target
sputtering
magnet
magnetic field
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58227576A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60121268A (ja
Inventor
Tomonobu Hata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KANAZAWA DAIGAKUCHO
Original Assignee
KANAZAWA DAIGAKUCHO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KANAZAWA DAIGAKUCHO filed Critical KANAZAWA DAIGAKUCHO
Priority to JP22757683A priority Critical patent/JPS60121268A/ja
Publication of JPS60121268A publication Critical patent/JPS60121268A/ja
Publication of JPS6343466B2 publication Critical patent/JPS6343466B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP22757683A 1983-12-01 1983-12-01 電磁界圧着型マグネトロンスパッタ源 Granted JPS60121268A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22757683A JPS60121268A (ja) 1983-12-01 1983-12-01 電磁界圧着型マグネトロンスパッタ源

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22757683A JPS60121268A (ja) 1983-12-01 1983-12-01 電磁界圧着型マグネトロンスパッタ源

Publications (2)

Publication Number Publication Date
JPS60121268A JPS60121268A (ja) 1985-06-28
JPS6343466B2 true JPS6343466B2 (enrdf_load_stackoverflow) 1988-08-30

Family

ID=16863076

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22757683A Granted JPS60121268A (ja) 1983-12-01 1983-12-01 電磁界圧着型マグネトロンスパッタ源

Country Status (1)

Country Link
JP (1) JPS60121268A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6012426B2 (ja) * 1981-06-15 1985-04-01 ワ−ルドエンジニアリング株式会社 磁界圧着形マグネトロンスパッタリング装置

Also Published As

Publication number Publication date
JPS60121268A (ja) 1985-06-28

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