JPS60121268A - 電磁界圧着型マグネトロンスパッタ源 - Google Patents
電磁界圧着型マグネトロンスパッタ源Info
- Publication number
- JPS60121268A JPS60121268A JP22757683A JP22757683A JPS60121268A JP S60121268 A JPS60121268 A JP S60121268A JP 22757683 A JP22757683 A JP 22757683A JP 22757683 A JP22757683 A JP 22757683A JP S60121268 A JPS60121268 A JP S60121268A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic field
- target
- magnet
- sputtering source
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001755 magnetron sputter deposition Methods 0.000 title abstract description 8
- 230000005291 magnetic effect Effects 0.000 claims abstract description 71
- 239000002245 particle Substances 0.000 claims abstract description 14
- 230000005684 electric field Effects 0.000 claims abstract description 8
- 238000004544 sputter deposition Methods 0.000 claims description 23
- 230000006835 compression Effects 0.000 claims description 6
- 238000007906 compression Methods 0.000 claims description 6
- 239000000615 nonconductor Substances 0.000 claims description 3
- 238000002788 crimping Methods 0.000 claims description 2
- 230000000694 effects Effects 0.000 abstract description 5
- 239000011810 insulating material Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 description 21
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 230000005294 ferromagnetic effect Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- 241001330002 Bambuseae Species 0.000 description 1
- 235000017399 Caesalpinia tinctoria Nutrition 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 241000388430 Tara Species 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000004323 axial length Effects 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 230000005307 ferromagnetism Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000013528 metallic particle Substances 0.000 description 1
- 101150105786 mlc-1 gene Proteins 0.000 description 1
- 210000003739 neck Anatomy 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22757683A JPS60121268A (ja) | 1983-12-01 | 1983-12-01 | 電磁界圧着型マグネトロンスパッタ源 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22757683A JPS60121268A (ja) | 1983-12-01 | 1983-12-01 | 電磁界圧着型マグネトロンスパッタ源 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60121268A true JPS60121268A (ja) | 1985-06-28 |
| JPS6343466B2 JPS6343466B2 (enrdf_load_stackoverflow) | 1988-08-30 |
Family
ID=16863076
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22757683A Granted JPS60121268A (ja) | 1983-12-01 | 1983-12-01 | 電磁界圧着型マグネトロンスパッタ源 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60121268A (enrdf_load_stackoverflow) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57207173A (en) * | 1981-06-15 | 1982-12-18 | World Eng Kk | Magnetron sputtering device of magnetic field press contact type |
-
1983
- 1983-12-01 JP JP22757683A patent/JPS60121268A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57207173A (en) * | 1981-06-15 | 1982-12-18 | World Eng Kk | Magnetron sputtering device of magnetic field press contact type |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6343466B2 (enrdf_load_stackoverflow) | 1988-08-30 |
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