JPS6342352B2 - - Google Patents
Info
- Publication number
- JPS6342352B2 JPS6342352B2 JP59208784A JP20878484A JPS6342352B2 JP S6342352 B2 JPS6342352 B2 JP S6342352B2 JP 59208784 A JP59208784 A JP 59208784A JP 20878484 A JP20878484 A JP 20878484A JP S6342352 B2 JPS6342352 B2 JP S6342352B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- bubble
- layer
- disk
- resist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 14
- 238000005468 ion implantation Methods 0.000 claims description 11
- 239000013078 crystal Substances 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 7
- 150000002500 ions Chemical class 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 230000005381 magnetic domain Effects 0.000 claims description 2
- 230000000644 propagated effect Effects 0.000 claims 1
- 239000010931 gold Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 238000000992 sputter etching Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 230000005415 magnetization Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229910000889 permalloy Inorganic materials 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59208784A JPS6187295A (ja) | 1984-10-04 | 1984-10-04 | イオン注入バブルメモリ素子の製造方法 |
| CA000470553A CA1260754A (en) | 1983-12-26 | 1984-12-19 | Method for forming patterns and apparatus used for carrying out the same |
| DE8484402694T DE3484677D1 (de) | 1983-12-26 | 1984-12-21 | Verfahren zum herstellen von einem muster mit feinen zwischenraeumen. |
| EP84402694A EP0147322B1 (en) | 1983-12-26 | 1984-12-21 | Method for forming a pattern having a fine gap. |
| US06/686,521 US4597826A (en) | 1983-12-26 | 1984-12-26 | Method for forming patterns |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59208784A JPS6187295A (ja) | 1984-10-04 | 1984-10-04 | イオン注入バブルメモリ素子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6187295A JPS6187295A (ja) | 1986-05-02 |
| JPS6342352B2 true JPS6342352B2 (US20030220297A1-20031127-C00074.png) | 1988-08-23 |
Family
ID=16562044
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59208784A Granted JPS6187295A (ja) | 1983-12-26 | 1984-10-04 | イオン注入バブルメモリ素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6187295A (US20030220297A1-20031127-C00074.png) |
-
1984
- 1984-10-04 JP JP59208784A patent/JPS6187295A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6187295A (ja) | 1986-05-02 |
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