JPS6342144Y2 - - Google Patents
Info
- Publication number
- JPS6342144Y2 JPS6342144Y2 JP1983158415U JP15841583U JPS6342144Y2 JP S6342144 Y2 JPS6342144 Y2 JP S6342144Y2 JP 1983158415 U JP1983158415 U JP 1983158415U JP 15841583 U JP15841583 U JP 15841583U JP S6342144 Y2 JPS6342144 Y2 JP S6342144Y2
- Authority
- JP
- Japan
- Prior art keywords
- lamp
- halogen
- halogen lamp
- radiation
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15841583U JPS6067374U (ja) | 1983-10-13 | 1983-10-13 | 輻射線集中加熱装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15841583U JPS6067374U (ja) | 1983-10-13 | 1983-10-13 | 輻射線集中加熱装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6067374U JPS6067374U (ja) | 1985-05-13 |
| JPS6342144Y2 true JPS6342144Y2 (cs) | 1988-11-04 |
Family
ID=30348990
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15841583U Granted JPS6067374U (ja) | 1983-10-13 | 1983-10-13 | 輻射線集中加熱装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6067374U (cs) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5428821B2 (cs) * | 1973-07-04 | 1979-09-19 | ||
| JPS5315185U (cs) * | 1976-07-21 | 1978-02-08 |
-
1983
- 1983-10-13 JP JP15841583U patent/JPS6067374U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6067374U (ja) | 1985-05-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2009081811A1 (ja) | 浮遊帯域溶融装置 | |
| US3653432A (en) | Apparatus and method for unidirectionally solidifying high temperature material | |
| Kitazawa et al. | A new thermal imaging system utilizing a Xe arc lamp and an ellipsoidal mirror for crystallization of refractory oxides | |
| US5762707A (en) | Floating zone melting apparatus | |
| JPS6342144Y2 (cs) | ||
| US3817710A (en) | Apparatus for producing crystal | |
| CN110528061A (zh) | 一种激光辅助加热生长大尺寸晶体的方法及专用设备 | |
| JP2550344B2 (ja) | 赤外線加熱単結晶製造装置 | |
| JP4895134B2 (ja) | 浮遊帯域溶融装置 | |
| JP3668738B1 (ja) | 単結晶育成装置 | |
| JP2558659B2 (ja) | 赤外線加熱単結晶製造装置 | |
| JPH09235171A (ja) | 浮遊帯域溶融装置 | |
| JP2017154919A (ja) | 浮遊帯域溶融装置 | |
| JPS63223487A (ja) | 高真空型輻射線集中加熱装置 | |
| JPH0388790A (ja) | 赤外線加熱単結晶製造装置 | |
| CN110528062A (zh) | 激光辅助加热生长大尺寸钛合金晶体的方法及专用设备 | |
| JP2982642B2 (ja) | 赤外線加熱単結晶製造装置 | |
| JP3723715B2 (ja) | 単結晶育成装置 | |
| JPS626136Y2 (cs) | ||
| JPS6127975Y2 (cs) | ||
| Riveros et al. | An ellipsoidal mirror furnace for czochralski growth | |
| JP2734205B2 (ja) | 帯溶融法による単結晶の育成方法 | |
| JPS6032126Y2 (ja) | 単結晶製造装置 | |
| JP6669355B2 (ja) | 浮遊帯域溶融装置 | |
| JPS6335074B2 (cs) |