JPS6340352B2 - - Google Patents

Info

Publication number
JPS6340352B2
JPS6340352B2 JP56020857A JP2085781A JPS6340352B2 JP S6340352 B2 JPS6340352 B2 JP S6340352B2 JP 56020857 A JP56020857 A JP 56020857A JP 2085781 A JP2085781 A JP 2085781A JP S6340352 B2 JPS6340352 B2 JP S6340352B2
Authority
JP
Japan
Prior art keywords
disk
ion implantation
chamber
carriage
lock chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56020857A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57136754A (en
Inventor
Nobuhiro Yoshioka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP56020857A priority Critical patent/JPS57136754A/ja
Publication of JPS57136754A publication Critical patent/JPS57136754A/ja
Publication of JPS6340352B2 publication Critical patent/JPS6340352B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
JP56020857A 1981-02-17 1981-02-17 Wafer treating device for ion implanting device Granted JPS57136754A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56020857A JPS57136754A (en) 1981-02-17 1981-02-17 Wafer treating device for ion implanting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56020857A JPS57136754A (en) 1981-02-17 1981-02-17 Wafer treating device for ion implanting device

Publications (2)

Publication Number Publication Date
JPS57136754A JPS57136754A (en) 1982-08-23
JPS6340352B2 true JPS6340352B2 (enrdf_load_stackoverflow) 1988-08-10

Family

ID=12038777

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56020857A Granted JPS57136754A (en) 1981-02-17 1981-02-17 Wafer treating device for ion implanting device

Country Status (1)

Country Link
JP (1) JPS57136754A (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5697954A (en) * 1980-01-07 1981-08-07 Hitachi Ltd Ion-implantation device

Also Published As

Publication number Publication date
JPS57136754A (en) 1982-08-23

Similar Documents

Publication Publication Date Title
US6034000A (en) Multiple loadlock system
US4534314A (en) Load lock pumping mechanism
US3968885A (en) Method and apparatus for handling workpieces
US4820106A (en) Apparatus for passing workpieces into and out of a coating chamber through locks
KR890002837B1 (ko) 연속 스퍼터 장치
US5224809A (en) Semiconductor processing system with robotic autoloader and load lock
US6494670B2 (en) Three chamber load lock apparatus
EP0344823A2 (en) Workpiece processing apparatus
WO1999065803A1 (en) Automated opening and closing of ultra clean storage containers
JP2000012647A (ja) ウエハ搬送装置及びその方法
EP0168437A1 (en) Wafer processing machine
JP2937846B2 (ja) マルチチャンバウェハ処理システム
JPS6340352B2 (enrdf_load_stackoverflow)
WO2005041275A1 (en) Wafer handler method and system
JPH0613751B2 (ja) 連続スパッタ装置
JPH0377274B2 (enrdf_load_stackoverflow)
JP2004087781A (ja) 真空処理装置及び真空処理方法
JPS6350433B2 (enrdf_load_stackoverflow)
JPH1098087A (ja) ウエハ搬送装置
JPH0733575B2 (ja) 真空処理装置
KR940004016B1 (ko) 진공 체임버(chamber)를 이용한 GaAs 웨이퍼(wafer) 왁스 마운팅(wax mounting) 방법
SU1231920A1 (ru) Установка дл молекул рно-лучевой эпитаксии
JPS62169327A (ja) 基板交換装置
JPH0722157B2 (ja) 真空処理室
JP2912318B2 (ja) 真空処理装置用搬送システム