JPS6337501B2 - - Google Patents
Info
- Publication number
- JPS6337501B2 JPS6337501B2 JP58159867A JP15986783A JPS6337501B2 JP S6337501 B2 JPS6337501 B2 JP S6337501B2 JP 58159867 A JP58159867 A JP 58159867A JP 15986783 A JP15986783 A JP 15986783A JP S6337501 B2 JPS6337501 B2 JP S6337501B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal substrate
- crystal
- wavelength
- compound semiconductor
- composition distribution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58159867A JPS6050936A (ja) | 1983-08-30 | 1983-08-30 | 化合物半導体結晶の組成分布評価法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58159867A JPS6050936A (ja) | 1983-08-30 | 1983-08-30 | 化合物半導体結晶の組成分布評価法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6050936A JPS6050936A (ja) | 1985-03-22 |
| JPS6337501B2 true JPS6337501B2 (enrdf_load_stackoverflow) | 1988-07-26 |
Family
ID=15702944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58159867A Granted JPS6050936A (ja) | 1983-08-30 | 1983-08-30 | 化合物半導体結晶の組成分布評価法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6050936A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03114701U (enrdf_load_stackoverflow) * | 1990-03-07 | 1991-11-26 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2741932B2 (ja) * | 1989-12-15 | 1998-04-22 | 松下電工株式会社 | 便器水洗装置 |
| JP2742459B2 (ja) * | 1989-12-15 | 1998-04-22 | 松下電工株式会社 | 便器水洗装置 |
| JP4043660B2 (ja) * | 1999-09-10 | 2008-02-06 | 日鉱金属株式会社 | 化合物半導体ウェハに含まれる特定元素の組成比のマッピング装置 |
| JP2021170005A (ja) * | 2020-04-15 | 2021-10-28 | 株式会社コーセー | 結晶構造の分布評価方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5193665A (enrdf_load_stackoverflow) * | 1975-02-14 | 1976-08-17 | ||
| JPS57206045A (en) * | 1981-06-12 | 1982-12-17 | Fujitsu Ltd | Method for checking silicon wafer |
-
1983
- 1983-08-30 JP JP58159867A patent/JPS6050936A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03114701U (enrdf_load_stackoverflow) * | 1990-03-07 | 1991-11-26 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6050936A (ja) | 1985-03-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3636651B2 (ja) | 放射線検査システム及び検査方法 | |
| US3610934A (en) | Automatic focusing system utilizing means for alternately directing light over two paths having slightly different lengths | |
| CA2304500A1 (en) | Sensor apparatus | |
| DE68916447T2 (de) | Vorrichtung für die Determination der Temperatur von Wafern oder Dünnschichten. | |
| US4061578A (en) | Infrared detection and imaging, method and apparatus | |
| US4526468A (en) | Method for determining the phase of phase transformable light scattering material | |
| JPS6337501B2 (enrdf_load_stackoverflow) | ||
| US3856407A (en) | Automatic focusing device | |
| JPS636520A (ja) | 電気光学的画像装置 | |
| US3495518A (en) | Photographic camera device | |
| JPS6245965B2 (enrdf_load_stackoverflow) | ||
| US5008542A (en) | Method and system for automated measurement of whole-wafer etch pit density in GaAs | |
| US20240063240A1 (en) | Light state imaging pixel | |
| US4798947A (en) | Focusing technique for an optical sensing system | |
| Scholiers et al. | Stokes-spectro-polarimetry with a two-dimensional diode array | |
| Monro | Performance Evaluation of CCD Imagers | |
| US12205966B1 (en) | Sensor with long wavelength infrared polarization sensitive pixels | |
| JP2770521B2 (ja) | 焦点位置検出方式 | |
| JPS62501935A (ja) | カラ−引伸器又は複写器 | |
| JPH0554621B2 (enrdf_load_stackoverflow) | ||
| Niles et al. | Radiometric calibration of a video fluorescence microscope for the quantitative imaging of resonance energy transfer | |
| JPH07270239A (ja) | 半田付け監視装置及びそれを用いた半田付け監視システム | |
| JPH0123051B2 (enrdf_load_stackoverflow) | ||
| JPS6345219B2 (enrdf_load_stackoverflow) | ||
| Monro | Performance of charge-coupled device (CCD) imaging sensors |