JPS6334780B2 - - Google Patents
Info
- Publication number
- JPS6334780B2 JPS6334780B2 JP58118795A JP11879583A JPS6334780B2 JP S6334780 B2 JPS6334780 B2 JP S6334780B2 JP 58118795 A JP58118795 A JP 58118795A JP 11879583 A JP11879583 A JP 11879583A JP S6334780 B2 JPS6334780 B2 JP S6334780B2
- Authority
- JP
- Japan
- Prior art keywords
- wavelength
- deuterium lamp
- lamp
- reaction
- necessary
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58118795A JPS6012128A (ja) | 1983-06-30 | 1983-06-30 | 光化学的表面処理装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58118795A JPS6012128A (ja) | 1983-06-30 | 1983-06-30 | 光化学的表面処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6012128A JPS6012128A (ja) | 1985-01-22 |
JPS6334780B2 true JPS6334780B2 (enrdf_load_stackoverflow) | 1988-07-12 |
Family
ID=14745293
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58118795A Granted JPS6012128A (ja) | 1983-06-30 | 1983-06-30 | 光化学的表面処理装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6012128A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0169485B1 (en) * | 1984-07-17 | 1991-12-04 | Nec Corporation | Method and apparatus for inducing photochemical reaction |
JPH0622222B2 (ja) * | 1984-09-18 | 1994-03-23 | 株式会社東芝 | 光処理装置 |
EP2177278B1 (en) * | 2007-08-16 | 2012-06-13 | Asahi Glass Company, Limited | Method of cleaning substrate |
CN102532578A (zh) * | 2011-12-30 | 2012-07-04 | 北京工业大学 | 用氘灯uv辐射光对封边条表面处理与表面改性的工艺 |
-
1983
- 1983-06-30 JP JP58118795A patent/JPS6012128A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6012128A (ja) | 1985-01-22 |
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