JPS6331552B2 - - Google Patents
Info
- Publication number
- JPS6331552B2 JPS6331552B2 JP56037442A JP3744281A JPS6331552B2 JP S6331552 B2 JPS6331552 B2 JP S6331552B2 JP 56037442 A JP56037442 A JP 56037442A JP 3744281 A JP3744281 A JP 3744281A JP S6331552 B2 JPS6331552 B2 JP S6331552B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photoconductive
- raw material
- compound
- general formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
- Light Receiving Elements (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56037442A JPS57152464A (en) | 1981-03-16 | 1981-03-16 | Manufacture of photoconductive member |
US06/354,898 US4468443A (en) | 1981-03-12 | 1982-03-04 | Process for producing photoconductive member from gaseous silicon compounds |
DE19823209055 DE3209055A1 (de) | 1981-03-12 | 1982-03-12 | Verfahren zur herstellung eines fotoleitfaehigen elements |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56037442A JPS57152464A (en) | 1981-03-16 | 1981-03-16 | Manufacture of photoconductive member |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57152464A JPS57152464A (en) | 1982-09-20 |
JPS6331552B2 true JPS6331552B2 (en, 2012) | 1988-06-24 |
Family
ID=12497619
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56037442A Granted JPS57152464A (en) | 1981-03-12 | 1981-03-16 | Manufacture of photoconductive member |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57152464A (en, 2012) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57174450A (en) * | 1981-04-21 | 1982-10-27 | Canon Inc | Production of photoconductive member |
JPH0691010B2 (ja) * | 1983-01-11 | 1994-11-14 | 三井東圧化学株式会社 | 非晶質薄膜の製法 |
JPH0644552B2 (ja) * | 1983-03-30 | 1994-06-08 | 三井東圧化学株式会社 | 非晶質薄膜の製法 |
US4637938A (en) * | 1983-08-19 | 1987-01-20 | Energy Conversion Devices, Inc. | Methods of using selective optical excitation in deposition processes and the detection of new compositions |
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1981
- 1981-03-16 JP JP56037442A patent/JPS57152464A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS57152464A (en) | 1982-09-20 |