JPS63312574A - Gate valve device of vacuum device - Google Patents
Gate valve device of vacuum deviceInfo
- Publication number
- JPS63312574A JPS63312574A JP14575787A JP14575787A JPS63312574A JP S63312574 A JPS63312574 A JP S63312574A JP 14575787 A JP14575787 A JP 14575787A JP 14575787 A JP14575787 A JP 14575787A JP S63312574 A JPS63312574 A JP S63312574A
- Authority
- JP
- Japan
- Prior art keywords
- gate valve
- cylinder
- pressing
- opening
- eccentric cam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 15
- 238000003780 insertion Methods 0.000 claims description 7
- 230000037431 insertion Effects 0.000 claims description 7
- 238000004544 sputter deposition Methods 0.000 claims description 7
- 238000000605 extraction Methods 0.000 claims description 4
- 238000007789 sealing Methods 0.000 abstract description 2
- 238000012856 packing Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 210000000078 claw Anatomy 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000032258 transport Effects 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
Abstract
Description
【発明の詳細な説明】
［発明の属する技術分野］
この発明はスパッタリング装置等の真空装置に使用され
るゲートバルブ装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical field to which the invention pertains] The present invention relates to a gate valve device used in a vacuum device such as a sputtering device.
〔従来の技術］
従来のゲートバルブ装置の構成を、スパッタリング装置
を例として説明する。[Prior Art] The configuration of a conventional gate valve device will be described using a sputtering device as an example.
第４図はスパッタリング装置の概略構成を示す図であり
、（１）は要処理基板を挿入するとともに処理済の基板
を取り出す挿入取出室で、上部の蓋（２）がヒンジ機構
により開閉可能となっている。Figure 4 is a diagram showing the schematic configuration of the sputtering apparatus, where (1) is an insertion/extraction chamber into which substrates to be processed are inserted and processed substrates are taken out, and the upper lid (2) can be opened and closed by a hinge mechanism. It has become.
（３）は台板で、この台板（３）上に複数の基板を取付
けた基板ホルダー（４）が載置されている。(3) is a base plate, and a substrate holder (4) to which a plurality of substrates are attached is placed on this base plate (3).
（５）は搬送機構で、挿入取出室（，１） を排気し
て真空状態とした後、この挿入取出室（１） と隣接
する処理室（８）間に形成された細長い開口部（６）を
塞ぐゲートバルブ（７）を開放して基板ホルダー（４）
を処理室（８）に移送する。(5) is a transfer mechanism, which after evacuating the insertion/unloading chamber (1) to a vacuum state, opens the elongated opening (6) formed between this loading/unloading chamber (1) and the adjacent processing chamber (8). ) and open the gate valve (7) that blocks the substrate holder (4).
is transferred to the processing chamber (8).
処理室（８）内の下方には３個のターゲット電極ＴＩ
−Ｔ３ （図示はＴＩ、Ｔ２ のみ）が設けられて
おり、上部には基板ホルダー（４）を取着する取着機構
（９）が設けられている。この取着機構（９）は椀を伏
せたような逆椀状の形状をしており、その先端には円周
上の３箇所にそれぞれ１２０度離して係止爪（９ａ）を
形成している。There are three target electrodes TI in the lower part of the processing chamber (8).
-T3 (only TI and T2 are shown), and an attachment mechanism (9) for attaching a substrate holder (4) is provided at the top. This attachment mechanism (9) has an inverted bowl-like shape, and has locking claws (9a) formed at three locations on the circumference at 120 degrees apart at the tip. There is.
このように構成された装置において、まず基板ホルダー
（４）に載置された基板は挿入取出室（１）の台板（３
） 上に載置され、排気して真空状態となった後、ゲ
ートバルブ（７）を開放し、搬送機構（５）により処理
室（８）に移送される。In the apparatus configured in this way, first, the substrate placed on the substrate holder (4) is placed on the base plate (3) of the insertion/ejection chamber (1).
), and after being evacuated to a vacuum state, the gate valve (7) is opened and the transport mechanism (5) transports it to the processing chamber (8).
ここで、取着機４１ （０） の爪（９ａ）が基板ホ
ルダー（４）の外周をつかみ伺定する。この状態で基板
側電極（１０）及びターゲットｆｆｉ極Ｔｌ −Ｔ３
に高周波電源が印加され、スパッタリングが行なわれる
。Here, the claw (9a) of the attachment device 41 (0) grasps the outer periphery of the substrate holder (4). In this state, the substrate side electrode (10) and the target ffi pole Tl -T3
A high frequency power source is applied to perform sputtering.
そして、スパッタリング処理が終了すると、再びゲート
バルブ（７）を開いて基板ホルダー（４）を挿入取出室
（１） に移送し、大気中へ取出される。When the sputtering process is completed, the gate valve (7) is opened again and the substrate holder (4) is transferred to the insertion/extraction chamber (1) and taken out into the atmosphere.
次に、従来のゲートバルブ装置の構成について第５図に
より説明する。Next, the configuration of a conventional gate valve device will be explained with reference to FIG.
第５図において、 （１１）はゲートバルブ（７）に固
定されたローラであり、開口部（６）の左右側端に設け
られた一対のレール（１２）上を滑って移動可能となっ
ている。 （１３）は一対の腕リンクであり、傘歯車（
１４）がモータ（１５）により回動させられると。In Fig. 5, (11) is a roller fixed to the gate valve (7), which is movable by sliding on a pair of rails (12) provided at the left and right ends of the opening (6). There is. (13) is a pair of arm links, and a bevel gear (
14) is rotated by the motor (15).
この腕リンク（１３）が左右に開き、ゲートバルブ（７
）を上下に移動して開口部（６）を開閉するよう構成さ
れている。This arm link (13) opens left and right, and the gate valve (7
) is moved up and down to open and close the opening (6).
そして、ゲーＩ・バルブ（７）の両端部を押圧手段（１
６）により押圧して開口部（６）を密閉するようにして
いる。Then, both ends of the gate I valve (7) are pressed by the pressing means (1).
6) to seal the opening (6).
しかしながら、基板または基板ホルダー（５）の径が大
きくなり、Ｕ１１０部（６）の長さが長くなると、グー
１−バルブ（７）の両端部を押えるだけでは密着が不充
分となり、真空度が悪くなるという問題が生ずる。However, as the diameter of the substrate or substrate holder (5) becomes larger and the length of the U110 section (6) becomes longer, just pressing both ends of the Goo 1-bulb (7) will not provide sufficient adhesion and the degree of vacuum will decrease. The problem arises that it gets worse.
このため、第６図のようにグー１〜バルブ（７）の背面
側にバックアツプ材（１７）を設け、このバックアツプ
材（１７）の中央部に調節ネジ（１８）を取付け。For this purpose, as shown in Fig. 6, a back-up material (17) is provided on the back side of the goo 1 to valve (7), and an adjustment screw (18) is attached to the center of this back-up material (17).
この調節ネジ（１８）によりゲートバルブ（７）を湾曲
させ貞着性を向上するよう工夫されている。（特公昭６
２−１３５５１号公報）尚、 （１９）はシール用バッ
キングである。This adjustment screw (18) is designed to curve the gate valve (7) and improve the stability. (Tokuko Showa 6
2-13551) Note that (19) is a backing for a seal.
【発明が解決しようとする問題点］
しかしながら、このような調節ネジ（１８）を用いてゲ
ートバルブ（７） を湾曲させておくことは、長期に
わたってゲートバルブ（７）を変形させてしまい、また
、調節ネジ（１８）の緩み等により適切な密着性が得に
くいという問題点がある。[Problems to be Solved by the Invention] However, keeping the gate valve (7) curved using such an adjustment screw (18) deforms the gate valve (7) over a long period of time, and also However, there is a problem in that it is difficult to obtain appropriate adhesion due to loosening of the adjustment screw (18) or the like.
〔１１１題点を解決するための手段〕
この発明に係るゲートバルブ装置は、ゲートバルブの背
面両端部を押付シリンダ等の押圧手段により押圧すると
共に、中央あるいは中間部の所定位置をカムシリンダの
動作により変位する偏心カムにより密着力が必要な時だ
け押圧するようにしたものである。[Means for Solving Problem 111] The gate valve device according to the present invention presses both ends of the back surface of the gate valve with a pressing means such as a pressing cylinder, and also presses a predetermined position in the center or intermediate portion by the operation of a cam cylinder. The eccentric cam, which is displaced by the cam, applies pressure only when adhesion is required.
［作 川］
この発明におけるゲートバルブ装はは、押圧手段がゲー
トバルブの背面両端部を押圧し、ゲートバルブを開口部
に押し付けた後、カムシリンダの作動により偏心カムが
ゲートバルブの中央あるいは中間部の所定位置を押圧す
ることにより、ゲートバルブは開口部に確実に密着され
る。また、押圧力の必要のない時には、カムは後退して
ゲートバルブに変形を与えない。[Sakukawa] In the gate valve device of the present invention, after the pressing means presses both ends of the back of the gate valve and presses the gate valve against the opening, the eccentric cam is moved to the center or middle of the gate valve by the operation of the cam cylinder. By pressing the predetermined position of the part, the gate valve is reliably brought into close contact with the opening part. Further, when no pressing force is required, the cam retreats and does not deform the gate valve.
［発明の実施例］
以下、第１図〜第３図によりこの発明の詳細な説明する
。[Embodiments of the Invention] The present invention will be described in detail below with reference to FIGS. 1 to 3.
第１図はこの発明のゲートバルブ装置の概略構成を示す
斜視図、第２図は平面図、第３図（Ｑ）、（ｂ）は側面
図であり、従来の装置を示す第５図〜第６図と相当する
部分には同一符号を付して示している。Fig. 1 is a perspective view showing a schematic configuration of a gate valve device of the present invention, Fig. 2 is a plan view, Figs. 3 (Q) and (b) are side views, and Figs. 5 to 5 show a conventional device. Portions corresponding to those in FIG. 6 are designated by the same reference numerals.
グー１−バルブ（７）は上下シリンダ（２０）の作動に
より上方向または下方向に移動し開口部（６）と対向す
る位置をとる。そして、押圧手段である押付シリンダ（
１６）によりゲートバルブ（７）の両端を押圧し、ゲー
トバルブ（７）を開口部（６）周囲に設けたバッキング
（１９）に圧接する。The goo 1-valve (7) is moved upward or downward by the operation of the upper and lower cylinders (20) and assumes a position facing the opening (6). Then, a pressing cylinder (
16), both ends of the gate valve (7) are pressed, and the gate valve (7) is brought into pressure contact with the backing (19) provided around the opening (6).
（２１）はグー１−バルブ（７）の背面側に差渡された
軸棒（２２）に回動自在に設けられた偏心カムであり、
カムシリンダ（２３）の作動によりゲートバルブ（７）
背面中央を押圧するよう構成されている。(21) is an eccentric cam that is rotatably installed on the shaft (22) that extends to the back side of the Goo 1-valve (7);
The gate valve (7) is activated by the operation of the cam cylinder (23).
It is configured to press the center of the back.
この偏心カム（２１）の作用について説明する。The action of this eccentric cam (21) will be explained.
第３図（ａ）は上下シリンダ（２０）を作動してグー１
−バルブ（７）を開口部（６）と対向する位置に移動し
た状態を示している。この状態ではカムシリンダ（２３
）は作動せず、ピン（２４）は長孔（２５）の先喘に位
置して偏心カム（２１）はゲートバルブ（７）の中央を
押圧することなくゲートバルブ（７）に変形を与えてい
ない、この状態で押圧手段（１６）によりゲートバルブ
（７）の両端を押圧してゲートバルブ（７）をバッキン
グ（１９）に圧接する。その後、カムシリンダ（２３）
を作動させることにより、カムシリンダ（２３）と連結
したピン（２４）が長孔（２５）の根元側へ移動し第３
図（ｂ） に示すように偏心カム（２１）がゲートバ
ルブ（７）の背面長手方向中央を押圧して中央部の押付
力を増強する。従って、ゲートノ（ルブの長手方向が長
くても、全体的に均一な押付力が得られる。Fig. 3(a) shows the goo 1 by operating the upper and lower cylinders (20).
- The valve (7) is shown moved to a position facing the opening (6). In this state, the cam cylinder (23
) does not operate, the pin (24) is located at the tip of the elongated hole (25), and the eccentric cam (21) deforms the gate valve (7) without pressing the center of the gate valve (7). In this state, both ends of the gate valve (7) are pressed by the pressing means (16) to press the gate valve (7) into contact with the backing (19). After that, the cam cylinder (23)
By operating the cam cylinder (23), the pin (24) connected to the cam cylinder (23) moves to the root side of the elongated hole (25) and the third
As shown in Figure (b), the eccentric cam (21) presses the center of the back surface of the gate valve (7) in the longitudinal direction to increase the pressing force at the center. Therefore, even if the gate knob is long in the longitudinal direction, a uniform pressing force can be obtained as a whole.
このように、上述の実施例に記載したゲートバルブ装置
によれば、常時ゲートバルブ（７）に変形を与えること
なく、開口部を密閉する時だけ偏、むカムを動作させて
ゲートバルブの長手方向中央の押圧力を増強できるので
、ゲートバルブを常時変形させてお〈従来のものに比べ
、ゲートノ（バルブを均等な力でバッキングに押圧でき
、摩耗力を均一となり寿命が延ばせる。In this way, according to the gate valve device described in the above embodiment, the longitudinal cam of the gate valve (7) is operated only when the opening is sealed, without deforming the gate valve (7) at all times. Since the pressing force at the center of the direction can be increased, the gate valve can be constantly deformed and the valve can be pressed against the backing with even force compared to conventional ones, making the wear force uniform and extending the life.
また、上記実施例ではゲートバルブの上下動をシリンダ
により行なっているので、第５図に示した従来例のよう
に傘歯車を使用するものに比べて摩耗等の問題がなく、
長期間安定した動作が得られる。In addition, in the above embodiment, since the vertical movement of the gate valve is performed by a cylinder, there are no problems such as wear compared to the conventional example shown in FIG. 5, which uses bevel gears.
Provides stable operation over a long period of time.
なお、上記実施例では、ゲートバルブの中央一箇所を偏
心カムにより押圧しているがこのような偏心カムを中間
部の所定位れに複数個設けても良く、このようにすれば
更に均一な押付力が得られる。In the above embodiment, one central part of the gate valve is pressed by an eccentric cam, but a plurality of such eccentric cams may be provided at a predetermined position in the intermediate part. Pressing force can be obtained.
また、上記実施例ではスパッタリング装置を例に説明し
たが、他の真空装置にも適用できることはいうまでもな
い。Furthermore, although the above embodiments have been explained using a sputtering apparatus as an example, it goes without saying that the present invention can be applied to other vacuum apparatuses as well.
［発明の効果］
この発明によれば１ｇｔ段はゲートバルブに変形を与え
ずに開口部の密閉が必要な時のみ偏心カムによりゲート
バルブの長手方向中央あるいは所定の複数箇所に押圧力
を加えるので、従来ＲＡ置のようにゲートバルブの常時
変形による不具合や調節ネジの緩み等の問題がなく、長
期間にわたり適切な押付力が得られる。[Effects of the Invention] According to the present invention, the 1gt stage uses an eccentric cam to apply pressing force to the longitudinal center of the gate valve or to a plurality of predetermined locations only when it is necessary to seal the opening without deforming the gate valve. Unlike conventional RA systems, there are no problems such as problems caused by constant deformation of the gate valve or loosening of adjustment screws, and appropriate pressing force can be obtained over a long period of time.
従って、大径の基板を使用し開口部の長さが長い場合で
も、バッキングの摩耗は均一となり長期にわたり確実に
密閉動作が行なえるとに％う効果を有する。Therefore, even when a large-diameter substrate is used and the length of the opening is long, the wear of the backing becomes uniform, which is effective in ensuring reliable sealing over a long period of time.
第１図はこの発明のゲートバルブ装置を示す斜視図、第
２図及び第３図（ａ）、（ｂ）はゲートバルブ装置の偏
心カムの動作説明図、第４図番±この発明を適用するス
パッタリング装置の概略構成図、第５図、第６図は従来
のゲートバルブ装置の構成を示す説明図である。
図中 （１）・・・・挿入数出家、（４）・・・・基板
ホルダー、（６）・・・・開口部、（７）・・・・ゲー
トノくルブ。
（８）・・・・処理室、 （１６）・・・・押付シリン
ダ、 （１９）・・・・バッキング、 （２０）・・・
・上下シリンダ、 （２１）・・・・偏心カム、 （２
３）・・・・カムシリンダ第１２
第２図
第３図
（α）（ｂ）
第４図Fig. 1 is a perspective view showing the gate valve device of this invention, Figs. 2 and 3 (a) and (b) are explanatory diagrams of the operation of the eccentric cam of the gate valve device, and Fig. 4 ± this invention is applied. 5 and 6 are explanatory diagrams showing the structure of a conventional gate valve device. In the diagram: (1)... Insertion number opening, (4)... Board holder, (6)... Opening, (7)... Gate knob. (8)...Processing chamber, (16)...Press cylinder, (19)...Backing, (20)...
・Upper and lower cylinder, (21)...Eccentric cam, (2
3)...Cam cylinder No. 12 Fig. 2 Fig. 3 (α) (b) Fig. 4
Claims (1)
この処理室と隣接した挿入取出室と、上記処理室と挿入
取出室との間に設けられ基板等の要処理物を挿通するた
めの細長い開口部と、この開口部を開閉するゲートバル
ブとを備えた真空装置において、上記ゲートバルブが上
記開口部に対向する状態となった後上記ゲートバルブの
長手方向中間部を偏心カムにより押圧するようにしたこ
とを特徴とする真空装置のゲートバルブ装置。A processing chamber for performing sputtering etc. in a vacuum state,
An insertion/extraction chamber adjacent to this processing chamber, an elongated opening provided between the processing chamber and the insertion/extraction chamber for inserting an object to be processed such as a substrate, and a gate valve for opening/closing this opening. What is claimed is: 1. A gate valve device for a vacuum device comprising: an eccentric cam that presses a longitudinally intermediate portion of the gate valve after the gate valve is in a state facing the opening;
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14575787A JPS63312574A (en) | 1987-06-11 | 1987-06-11 | Gate valve device of vacuum device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14575787A JPS63312574A (en) | 1987-06-11 | 1987-06-11 | Gate valve device of vacuum device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63312574A true JPS63312574A (en) | 1988-12-21 |
Family
ID=15392453
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14575787A Pending JPS63312574A (en) | 1987-06-11 | 1987-06-11 | Gate valve device of vacuum device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63312574A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0510460A (en) * | 1990-10-04 | 1993-01-19 | Seibu Shoji Kk | Sluice valve |
| US5271602A (en) * | 1992-04-13 | 1993-12-21 | The Japan Steel Works Ltd. | Vacuum gate valve |
| WO2000058654A1 (en) * | 1999-03-29 | 2000-10-05 | Lam Research Corporation | Dual-sided slot valve and method for implementing the same |
| US6390448B1 (en) | 2000-03-30 | 2002-05-21 | Lam Research Corporation | Single shaft dual cradle vacuum slot valve |
| JP2005076845A (en) * | 2003-09-03 | 2005-03-24 | Tokyo Electron Ltd | Gate valve |
| US6913243B1 (en) | 2000-03-30 | 2005-07-05 | Lam Research Corporation | Unitary slot valve actuator with dual valves |
| US7076888B2 (en) | 2004-03-10 | 2006-07-18 | The Boc Group, Plc | Freeze dryer |
| JP2006349088A (en) * | 2005-06-17 | 2006-12-28 | Nippon Valqua Ind Ltd | Gate valve |
| US9732860B2 (en) | 2014-07-04 | 2017-08-15 | Vat Holding Ag | Valve, in particular a vacuum valve |
-
1987
- 1987-06-11 JP JP14575787A patent/JPS63312574A/en active Pending
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0510460A (en) * | 1990-10-04 | 1993-01-19 | Seibu Shoji Kk | Sluice valve |
| US5271602A (en) * | 1992-04-13 | 1993-12-21 | The Japan Steel Works Ltd. | Vacuum gate valve |
| WO2000058654A1 (en) * | 1999-03-29 | 2000-10-05 | Lam Research Corporation | Dual-sided slot valve and method for implementing the same |
| US6390448B1 (en) | 2000-03-30 | 2002-05-21 | Lam Research Corporation | Single shaft dual cradle vacuum slot valve |
| US6913243B1 (en) | 2000-03-30 | 2005-07-05 | Lam Research Corporation | Unitary slot valve actuator with dual valves |
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| JP4633551B2 (en) * | 2005-06-17 | 2011-02-16 | 日本バルカー工業株式会社 | Gate valve |
| US9732860B2 (en) | 2014-07-04 | 2017-08-15 | Vat Holding Ag | Valve, in particular a vacuum valve |
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