JPS63310795A - マイクロ波プラズマジェットによるダイヤモンド気相合成方法 - Google Patents
マイクロ波プラズマジェットによるダイヤモンド気相合成方法Info
- Publication number
- JPS63310795A JPS63310795A JP14400687A JP14400687A JPS63310795A JP S63310795 A JPS63310795 A JP S63310795A JP 14400687 A JP14400687 A JP 14400687A JP 14400687 A JP14400687 A JP 14400687A JP S63310795 A JPS63310795 A JP S63310795A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- diamond
- microwave
- jet
- vapor phase
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910003460 diamond Inorganic materials 0.000 title claims abstract description 18
- 239000010432 diamond Substances 0.000 title claims abstract description 18
- 238000001308 synthesis method Methods 0.000 title claims description 4
- 239000012808 vapor phase Substances 0.000 title abstract description 10
- 239000007789 gas Substances 0.000 claims abstract description 16
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 230000000694 effects Effects 0.000 claims abstract description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 4
- 239000001257 hydrogen Substances 0.000 claims abstract description 4
- 239000000126 substance Substances 0.000 claims abstract description 3
- 239000002994 raw material Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 6
- 150000001722 carbon compounds Chemical class 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims 2
- 238000001816 cooling Methods 0.000 claims 1
- 238000009834 vaporization Methods 0.000 claims 1
- 230000008016 vaporization Effects 0.000 claims 1
- 239000010453 quartz Substances 0.000 abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 8
- 238000005229 chemical vapour deposition Methods 0.000 abstract description 4
- 230000005684 electric field Effects 0.000 abstract description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 238000010791 quenching Methods 0.000 abstract 1
- 230000000171 quenching effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 6
- 239000000498 cooling water Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001069 Raman spectroscopy Methods 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14400687A JPS63310795A (ja) | 1987-06-11 | 1987-06-11 | マイクロ波プラズマジェットによるダイヤモンド気相合成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14400687A JPS63310795A (ja) | 1987-06-11 | 1987-06-11 | マイクロ波プラズマジェットによるダイヤモンド気相合成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63310795A true JPS63310795A (ja) | 1988-12-19 |
| JPH0449518B2 JPH0449518B2 (ko) | 1992-08-11 |
Family
ID=15352119
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14400687A Granted JPS63310795A (ja) | 1987-06-11 | 1987-06-11 | マイクロ波プラズマジェットによるダイヤモンド気相合成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63310795A (ko) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5126164A (en) * | 1988-06-06 | 1992-06-30 | Research Development Corporation Of Japan | Method of forming a thin polymeric film by plasma reaction under atmospheric pressure |
| US6593507B2 (en) | 1998-10-23 | 2003-07-15 | Mitsubishi Heavy Industries, Ltd. | Method of decomposing organic halide |
| JP2009533872A (ja) * | 2006-04-14 | 2009-09-17 | シリカ テック リミテッド ライアビリティ カンパニー | 太陽電池を製作するためのプラズマデポジション装置及び方法 |
| GB2513439A (en) * | 2013-03-15 | 2014-10-29 | Agilent Technologies Inc | Integrated microwave source and plasma torch and related methods |
-
1987
- 1987-06-11 JP JP14400687A patent/JPS63310795A/ja active Granted
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5126164A (en) * | 1988-06-06 | 1992-06-30 | Research Development Corporation Of Japan | Method of forming a thin polymeric film by plasma reaction under atmospheric pressure |
| US6593507B2 (en) | 1998-10-23 | 2003-07-15 | Mitsubishi Heavy Industries, Ltd. | Method of decomposing organic halide |
| US6600084B2 (en) | 1998-10-23 | 2003-07-29 | Mitsubishi Heay Industries, Ltd. | Method of decomposing organic halide |
| US6635997B2 (en) | 1998-10-23 | 2003-10-21 | Mitsubishi Heavy Industries, Ltd. | Microwave plasma generator, method of decomposing organic halide, and system for decomposing organic halide |
| US6650059B2 (en) | 1998-10-23 | 2003-11-18 | Mitsubishi Heavy Industries, Ltd. | Method of decomposing organic halide |
| DE19982291C2 (de) * | 1998-10-23 | 2003-11-27 | Mitsubishi Heavy Ind Co | Mikrowellen-Plasmagenerator und Verfahren zur Zersetzung von organischen Halogeniden |
| JP2009533872A (ja) * | 2006-04-14 | 2009-09-17 | シリカ テック リミテッド ライアビリティ カンパニー | 太陽電池を製作するためのプラズマデポジション装置及び方法 |
| GB2513439A (en) * | 2013-03-15 | 2014-10-29 | Agilent Technologies Inc | Integrated microwave source and plasma torch and related methods |
| US9427821B2 (en) | 2013-03-15 | 2016-08-30 | Agilent Technologies, Inc. | Integrated magnetron plasma torch, and related methods |
| GB2513439B (en) * | 2013-03-15 | 2019-02-06 | Agilent Technologies Inc | Integrated microwave source and plasma torch, and related methods |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0449518B2 (ko) | 1992-08-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5368897A (en) | Method for arc discharge plasma vapor deposition of diamond | |
| Deshpandey et al. | Diamond and diamondlike films: Deposition processes and properties | |
| Bachmann et al. | Diamond deposition technologies | |
| US5124179A (en) | Interrupted method for producing multilayered polycrystalline diamond films | |
| JP3167938B2 (ja) | 表面のプラズマ処理のための方法及び装置 | |
| US5147687A (en) | Hot filament CVD of thick, adherent and coherent polycrystalline diamond films | |
| JPS63310795A (ja) | マイクロ波プラズマジェットによるダイヤモンド気相合成方法 | |
| JPH01179789A (ja) | ダイヤモンドの気相成長方法と熱プラズマ堆積方法およびプラズマ噴射装置 | |
| JPH01201481A (ja) | 高圧相窒化ほう素の気相合成方法及び装置 | |
| JPS63277767A (ja) | 高圧相窒化ホウ素の気相合成法 | |
| JPH0420985B2 (ko) | ||
| JPH0814024B2 (ja) | 高圧相窒化ホウ素の気相合成法 | |
| JPH0449520B2 (ko) | ||
| JP2646438B2 (ja) | ダイヤモンド気相合成方法 | |
| JPH0449517B2 (ko) | ||
| JP2840750B2 (ja) | 被膜形成方法 | |
| JPH0674199B2 (ja) | ダイヤモンドの合成方法 | |
| JPH0226894A (ja) | ダイヤモンドの気相合成方法および装置 | |
| Matsumoto | Development of CVD diamond synthesis techniques | |
| JPH0660411B2 (ja) | 光プラズマ気相合成方法及び装置 | |
| JPH01246357A (ja) | 立方晶窒化ホウ素膜の製造方法 | |
| JPH0226895A (ja) | ダイヤモンド気相合成方法及びその装置 | |
| JPS63185891A (ja) | ダイヤモンド薄膜又はダイヤモンド状薄膜の製造方法 | |
| JPH04202663A (ja) | 窒化ホウ素膜形成方法および装置 | |
| JPH0255295A (ja) | ダイヤモンドの気相合成装置およびダイヤモンドの気相合成方法 |