JPS63295620A - Epoxy resin composition for sealing semiconductor - Google Patents
Epoxy resin composition for sealing semiconductorInfo
- Publication number
- JPS63295620A JPS63295620A JP13428887A JP13428887A JPS63295620A JP S63295620 A JPS63295620 A JP S63295620A JP 13428887 A JP13428887 A JP 13428887A JP 13428887 A JP13428887 A JP 13428887A JP S63295620 A JPS63295620 A JP S63295620A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- liquid crystal
- epoxy resin
- crystal polymer
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 25
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 25
- 239000000203 mixture Substances 0.000 title claims description 15
- 239000004065 semiconductor Substances 0.000 title claims description 13
- 238000007789 sealing Methods 0.000 title description 6
- 229920000106 Liquid crystal polymer Polymers 0.000 claims abstract description 15
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 claims abstract description 15
- 229920003986 novolac Polymers 0.000 claims abstract description 15
- 229920001169 thermoplastic Polymers 0.000 claims abstract description 14
- 239000004416 thermosoftening plastic Substances 0.000 claims abstract description 14
- 239000004593 Epoxy Substances 0.000 claims abstract description 13
- 229920005989 resin Polymers 0.000 claims abstract description 13
- 239000011347 resin Substances 0.000 claims abstract description 13
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 12
- 238000005538 encapsulation Methods 0.000 claims description 11
- 239000011256 inorganic filler Substances 0.000 claims description 10
- 229910003475 inorganic filler Inorganic materials 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000011342 resin composition Substances 0.000 claims description 4
- 239000000843 powder Substances 0.000 abstract description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract description 5
- 239000000835 fiber Substances 0.000 abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 238000002156 mixing Methods 0.000 abstract description 4
- 125000002723 alicyclic group Chemical group 0.000 abstract description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 2
- 229910002026 crystalline silica Inorganic materials 0.000 abstract description 2
- 239000003365 glass fiber Substances 0.000 abstract description 2
- 230000035939 shock Effects 0.000 abstract description 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 2
- 239000000454 talc Substances 0.000 abstract description 2
- 229910052623 talc Inorganic materials 0.000 abstract description 2
- 239000000945 filler Substances 0.000 abstract 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract 1
- 239000002657 fibrous material Substances 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 239000005011 phenolic resin Substances 0.000 abstract 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 5
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- -1 polyethylene Polymers 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000004843 novolac epoxy resin Substances 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 238000005382 thermal cycling Methods 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- GDBUZIKSJGRBJP-UHFFFAOYSA-N 4-acetoxy benzoic acid Chemical compound CC(=O)OC1=CC=C(C(O)=O)C=C1 GDBUZIKSJGRBJP-UHFFFAOYSA-N 0.000 description 1
- 229940090248 4-hydroxybenzoic acid Drugs 0.000 description 1
- 229920001634 Copolyester Polymers 0.000 description 1
- 241000220317 Rosa Species 0.000 description 1
- OXBIGOITHYOHGV-UHFFFAOYSA-N acetic acid;naphthalene Chemical compound CC(O)=O.CC(O)=O.C1=CC=CC2=CC=CC=C21 OXBIGOITHYOHGV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- VCCBEIPGXKNHFW-UHFFFAOYSA-N biphenyl-4,4'-diol Chemical compound C1=CC(O)=CC=C1C1=CC=C(O)C=C1 VCCBEIPGXKNHFW-UHFFFAOYSA-N 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は熱可塑性液晶ポリマーを配合してなる耐熱衝撃
性、耐熱性および耐湿性に優れた新規な半導体封止用エ
ポキシ樹脂組成物に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a novel epoxy resin composition for semiconductor encapsulation which is blended with a thermoplastic liquid crystal polymer and has excellent thermal shock resistance, heat resistance and moisture resistance.
[従来の技術およびその問題虜]
現在IC1LSIなどの半導体素子をシリコーン樹脂ま
たはエポキシ樹脂などを用いて封止する樹脂封止法が広
く採用され、これらのなかでもエポキシ樹脂は比較的優
れた気密性を与え、かつ安価であることから半導体封止
用樹脂として汎用されている。[Conventional technology and its problems] At present, resin encapsulation methods are widely used to encapsulate IC1LSI and other semiconductor devices using silicone resin or epoxy resin. Of these, epoxy resin has relatively excellent airtightness. It is widely used as a resin for semiconductor encapsulation because it provides high performance and is inexpensive.
しかしながら、IC,LSIの実装方法の多用化により
樹脂封止パッケージは小型化および薄型化される傾向に
あり、従来のエポキシ系樹脂を用いて小型化および薄型
化されたパッケージを作製したばあい、エポキシ系樹脂
の機械強度が低いため、半田のなかにディップした後に
封止樹脂にクラックが発生する。そこでこのクラックを
防ぐためにエポキシマトリックス中にゴム成分を分散さ
せたり(たとえば特開昭62−22824号公報など)
、線膨張係数を小さくするために無機充填剤の添加mを
増大せしめるなどの方法が検討されている。However, due to the increasing use of IC and LSI mounting methods, resin-sealed packages tend to be smaller and thinner, and if smaller and thinner packages are made using conventional epoxy resin, Due to the low mechanical strength of epoxy resin, cracks occur in the sealing resin after it is dipped into solder. Therefore, in order to prevent this crack, a rubber component is dispersed in the epoxy matrix (for example, Japanese Patent Application Laid-Open No. 62-22824).
In order to reduce the coefficient of linear expansion, methods such as increasing the amount of inorganic filler added are being considered.
前記ゴム成分をエポキシマトリックス中に分散させる方
法を採用したばあい、封止樹脂が半田のなかにディップ
させることにより誘起する応力を低減せしめ、クランク
発生が低減するという効果はあるが、封止樹脂の機械強
度が低下するので長期間にわたる信頼性の低下やIcの
アセンブリ工程におけるパッケージクラックの発生など
の不都合が生じる。If the method of dispersing the rubber component in the epoxy matrix is adopted, the stress induced by the sealing resin being dipped into the solder is reduced, and the occurrence of cranking is reduced. Since the mechanical strength of the Ic is reduced, problems such as a reduction in long-term reliability and the occurrence of package cracks during the Ic assembly process occur.
一方、無機充填剤の添加量を増大し膨張係数を低減せし
めるには、該無機充填剤の添加量は80%(重量%、以
下同様)以上必要であるが、このばあい樹脂組成物の溶
融粘度が増−大して流動性が著しく低下し、素子を封止
する際にさらに高圧成形が必要となる。また、溶融粘度
の増大により成形時に金線流れや断線が生じ、好ましく
ない状態を生じる。On the other hand, in order to increase the amount of the inorganic filler added and reduce the expansion coefficient, the amount of the inorganic filler added must be 80% (wt%, the same shall apply hereinafter) or more. The viscosity increases and the fluidity decreases significantly, and further high-pressure molding is required when sealing the device. Furthermore, the increase in melt viscosity causes wire flow and wire breakage during molding, resulting in unfavorable conditions.
[発明が解決しようとする問題点]
本発明はかかる問題点を解決するためになされたもので
、封止樹脂の機械強度を^めることにより、半田のなか
にディップした侵であってもパッケージに損傷を与えな
い耐熱性、耐湿性などに優れた半導体封止用エポキシ樹
脂組成物をうることを目的とする。[Problems to be Solved by the Invention] The present invention has been made to solve these problems, and by increasing the mechanical strength of the sealing resin, even if it is eroded by dipping into the solder, The purpose of this invention is to provide an epoxy resin composition for semiconductor encapsulation that has excellent heat resistance, moisture resistance, etc., and does not damage the package.
E問題点を解決するための手段]
本発明は多官能エポキシ化合物、フェノールノボラック
樹脂、無機質充てん剤および熱可塑性液晶ポリマーを含
有した樹脂組成物であり、該樹脂組成物に対して熱可塑
性液晶ポリマーを0.1〜25重命%含有させたことを
特徴とする半導体封止用エポキシ樹脂組成物に関する。Means for Solving Problem E] The present invention is a resin composition containing a polyfunctional epoxy compound, a phenol novolac resin, an inorganic filler, and a thermoplastic liquid crystal polymer. It relates to an epoxy resin composition for semiconductor encapsulation characterized by containing 0.1 to 25% by weight of.
[実施例]
本発明の半導体封止用エポキシ樹脂組成物は、多官能エ
ポキシ化合物、フェノールノボラック樹脂、無機質充て
ん剤および熱可塑性液晶ポリマーからなる。[Example] The epoxy resin composition for semiconductor encapsulation of the present invention comprises a polyfunctional epoxy compound, a phenol novolak resin, an inorganic filler, and a thermoplastic liquid crystal polymer.
本発明に用いられる多官能エポキシ化合物としては、た
とえばノボラック系エポキシ樹脂、ビスフェノールA型
エポキシ樹脂、脂環族系エポキシ樹脂など種々のタイプ
のエポキシ樹脂があげられるが、これらのなかでもノボ
ラック系エポキシ樹脂は高温特性に優れているので好ま
しい。なお、これらのエポキシ樹脂は単独で用いてもよ
く、また2種以上を併用してもよい。Examples of the polyfunctional epoxy compound used in the present invention include various types of epoxy resins such as novolak epoxy resin, bisphenol A epoxy resin, and alicyclic epoxy resin. Among these, novolac epoxy resin is preferable because it has excellent high-temperature properties. Note that these epoxy resins may be used alone or in combination of two or more.
該多言能エポキシ化合物と7エノールノボラツク樹脂の
配合割合は、該多官能エポキシ化合物のエポキシ基1当
量あたりフェノールノボラック樹脂のOH当山が0.8
〜1.2当量であるのが好ましい。The blending ratio of the polyfunctional epoxy compound and the 7-enol novolak resin is such that the OH equivalent of the phenol novolac resin is 0.8 per equivalent of the epoxy group of the polyfunctional epoxy compound.
It is preferable that it is 1.2 equivalents.
該多官能エポキシ化合物のエポキシ基1当員に対してフ
ェノールノボラック樹脂のOH当量が0.8未満である
ばあい、組成物のガラス転移温度が低くなって、耐湿性
や耐熱性が低下し、またOH当山が1.2をこえるばあ
い、硬化物中にフェノールノボラック樹脂が未反応物と
して多く残り、耐湿性や耐熱性が低下するようになる。If the OH equivalent of the phenol novolak resin is less than 0.8 with respect to 1 equivalent of the epoxy group of the polyfunctional epoxy compound, the glass transition temperature of the composition will be low, and the moisture resistance and heat resistance will be reduced. Furthermore, if the OH ratio exceeds 1.2, a large amount of phenol novolac resin remains as an unreacted product in the cured product, resulting in a decrease in moisture resistance and heat resistance.
さらにこれらのエポキシ樹脂とともに必要に応じて臭素
化ノボラック系エポキシ樹脂、臭素化ビスフェノールA
型エポキシ樹脂などのエポキシ樹脂を併用してもよい。In addition to these epoxy resins, brominated novolac epoxy resins and brominated bisphenol A may be added as needed.
Epoxy resins such as mold epoxy resins may be used in combination.
このばあい、これらのエポキシ樹脂の使用量は多官能エ
ポキシ樹脂100重量部に対して50重量部以下である
のが好ましい。In this case, the amount of these epoxy resins used is preferably 50 parts by weight or less based on 100 parts by weight of the polyfunctional epoxy resin.
本発明に用いられるフェノールノボラック樹脂とは、た
とえばフェノール、クレゾール、キシレノール、ビスフ
ェノールAルゾルシンなどのフェノール系化合物とホル
ムアルデヒドまたはバラホルムアルデヒドを酸性触媒下
で縮合反応させることによりえられたものであり、未反
応モノマーはえられたフェノールノボラック樹脂中、0
.5%以下であるのが好ましい。The phenol novolac resin used in the present invention is obtained by condensing a phenolic compound such as phenol, cresol, xylenol, or bisphenol A lursorcin with formaldehyde or rose formaldehyde under an acidic catalyst, The monomer is 0 in the obtained phenolic novolak resin.
.. It is preferably 5% or less.
本発明に用いられる無機質充てん剤としては、たとえば
結晶性シリカ粉、溶融シリカ粉、アルミナ粉、タルク、
石英ガラス粉、炭酸カルシウム粉、ガラス繊維などがあ
げられる。これら無機質充てん剤は組成物中に20〜8
0%含有されるのが好ましい。20%未満では線膨張係
数および硬化収縮を低下させる効果が小さくなり、また
80%をこえると流動性が低下し、作業性が低下する傾
向にあるので、20〜80%の範囲内で要求特性に応じ
て配合量を適宜選択するのが好ましい。Examples of inorganic fillers used in the present invention include crystalline silica powder, fused silica powder, alumina powder, talc,
Examples include quartz glass powder, calcium carbonate powder, and glass fiber. These inorganic fillers are present in the composition between 20 and 8
Preferably, it is contained in an amount of 0%. If it is less than 20%, the effect of reducing linear expansion coefficient and curing shrinkage will be small, and if it exceeds 80%, fluidity will decrease and workability will tend to decrease. It is preferable to select the blending amount appropriately according to the following.
本発明に用いられる熱可塑性液晶ポリマーとしては、た
とえばポリエチレンテレフタレート−P−ハイドロキシ
安息香酸とポリエチレンテレフタレートとの共重合体、
P−アセトキシ安患香酸、テレフタル酸、ナフタレンジ
アセテートなどを溶融重合させたコポリエステル、テレ
フタル酸とP−オキシ安息香酸とp、 p’−ビフェノ
ールからなるポリエステルなどがあり、公知または市販
されている熱可塑性を示す液晶ポリマーを用いることが
できる。Examples of the thermoplastic liquid crystal polymer used in the present invention include a copolymer of polyethylene terephthalate-P-hydroxybenzoic acid and polyethylene terephthalate,
There are copolyesters made by melt polymerizing P-acetoxybenzoic acid, terephthalic acid, naphthalene diacetate, etc., and polyesters made of terephthalic acid, P-oxybenzoic acid, and p, p'-biphenol. Liquid crystal polymers exhibiting thermoplastic properties can be used.
前記熱可塑性液晶ポリマーは、溶融型液晶ポリマーであ
り、これらの繊維状のものやベレット状のものが用いら
れるが、好適にはmH径d1繊維長1としたとき、j)
/d=20以上のものである。The thermoplastic liquid crystal polymer is a molten type liquid crystal polymer, and fibrous or pellet-like polymers are used. Preferably, when the mH diameter is d1 and the fiber length is 1, j)
/d=20 or more.
前記熱可塑性液晶ポリマーは樹脂組成物に対して0.1
〜25%含有させなければならず、含有率が0.1%未
満では機械強度を向上させる効果が小さくなり、また2
5%をこえるばあい、えられる組成物の流動性が低下し
、作業性が低下して実用に適しない。The thermoplastic liquid crystal polymer has a ratio of 0.1 to the resin composition.
It must be contained at ~25%; if the content is less than 0.1%, the effect of improving mechanical strength will be small;
If it exceeds 5%, the resulting composition will have poor fluidity and workability, making it unsuitable for practical use.
本発明の半導体封止用エポキシ樹脂組成物は多官能エポ
キシ樹脂、フェノールノボラック樹脂、無機質充てん剤
および熱可塑性液晶ポリマーを必須成分とするが、必要
に応じてカーボンブラックなどの着色剤、カルナウバワ
ックス、ポリエチレンワックスなどの離型剤や三酸化ア
ンチモンなどの難燃剤、γ−グリシドキシ10ピルトリ
メトキシシランなどのカップリング剤、1,8−ジアザ
ビシクロ(5,4,0)ウンデセン−7、トリフェニル
ホスフィンなどの種々の硬化促進剤、シリコーンゴム、
フッ素ゴムなどのゴム成分を該組成物中の含有量が10
%をこえない範囲で添加してもよい。The epoxy resin composition for semiconductor encapsulation of the present invention contains a polyfunctional epoxy resin, a phenol novolac resin, an inorganic filler, and a thermoplastic liquid crystal polymer as essential components, but may optionally include a coloring agent such as carbon black, carnauba wax, etc. , mold release agents such as polyethylene wax, flame retardants such as antimony trioxide, coupling agents such as γ-glycidoxy10-pyltrimethoxysilane, 1,8-diazabicyclo(5,4,0)undecene-7, triphenylphosphine. Various curing accelerators such as silicone rubber,
The content of a rubber component such as fluororubber in the composition is 10
It may be added within a range not exceeding %.
また本発明の半導体封止用エポキシ樹脂組成物は、一般
に使用されている公知の混合装置、たとえばロール、ニ
ーダ、ライカイ機、ヘンシェルミキサー(−三井三池製
作所製)などを用いて容易に調製することができる。Further, the epoxy resin composition for semiconductor encapsulation of the present invention can be easily prepared using commonly used and known mixing equipment, such as a roll, a kneader, a Raikai machine, a Henschel mixer (manufactured by Mitsui Miike Seisakusho), etc. Can be done.
以下、実施例および比較例をあげて本発明をさらに詳細
に説明するが、本発明はかかる実施例のみに限定される
ものではない。Hereinafter, the present invention will be explained in more detail with reference to Examples and Comparative Examples, but the present invention is not limited only to these Examples.
実施例1〜6および比較例1〜3
一第1表に示す組成となるように多官能エポキシ化合物
、フェノールノボラック樹脂、無機質充てん剤、ヘンシ
ェルミキサーで繊維状に粉砕した熱可塑性液晶ポリマー
(繊維径d、[%雑長ρのときN/d−°2G以上)お
よび他の成分を調製し、70〜100℃の熱ロールで7
分間混練したのち、直径45履、高さ20〜35aw+
のタブレットを、かさ密度が1.4〜1.1となるよう
プレスを用いて形成した。Examples 1 to 6 and Comparative Examples 1 to 3 - Polyfunctional epoxy compound, phenol novolak resin, inorganic filler, thermoplastic liquid crystal polymer pulverized into fibers with a Henschel mixer (fiber diameter d, [N/d-°2G or more when % miscellaneous length ρ) and other ingredients are prepared, and rolled with a hot roll at 70 to 100°C.
After kneading for minutes, the diameter is 45 aw and the height is 20 to 35 aw+.
Tablets were formed using a press so that the bulk density was 1.4 to 1.1.
つぎにえられたタブレットに温度180℃、圧力80k
(1/ cIiを2分間加えてトランスファ成形し、耐
湿信頼性評価用モニターチップおよび各種評価用試片を
作製した。つぎにえられた各種評価用試片に温度175
℃で8時間で後硬化を施した。The next tablet was placed at a temperature of 180°C and a pressure of 80k.
(1/cIi was added for 2 minutes and transfer molded to produce a monitor chip for moisture resistance reliability evaluation and various evaluation specimens.Then, the various evaluation specimens obtained were
Post-curing was carried out for 8 hours at °C.
つぎにえられた各種評価用試片を用いて曲げ弾性率、曲
げ強度、線膨張係数、ガラス転移温度および流動性を測
定した。その結果を第2表に示す。Next, the flexural modulus, flexural strength, linear expansion coefficient, glass transition temperature, and fluidity were measured using the various evaluation specimens obtained. The results are shown in Table 2.
E以下余白]
ノ1ノー−−デ
比較例3は流動性がわるく、各種評価用試片を作製する
ことはできなかった。Margin below E] Comparative Example 3 had poor fluidity, and it was not possible to prepare test pieces for various evaluations.
また、えられた耐湿信頼性評価用モニターチップを用い
て耐湿試験および半田デイツプ後の耐クラツク性試験を
下記の方法により測定した。その結果を第3表に示す。In addition, using the obtained monitor chip for evaluation of moisture resistance reliability, a moisture resistance test and a crack resistance test after solder dipping were performed using the following methods. The results are shown in Table 3.
(耐湿信頼性試験)
PCT (Pressure Cooker Te5t
)により 121℃、2気圧の条件で不良が発生するま
での時間を測定した。(Moisture resistance reliability test) PCT (Pressure Cooker Te5t
), the time until failure occurred was measured under the conditions of 121°C and 2 atm.
(耐クラツク性試験)
260℃の半田浴と一196℃の液体チッ素へ各30秒
間づつ15サイクル浸漬したのち、パッケージクラック
の発生した試片数をカウントした。(Crack Resistance Test) After 15 cycles of immersion in a solder bath at 260°C and liquid nitrogen at -196°C for 30 seconds each, the number of specimens with package cracks was counted.
E以下余白]
第 3 表
第2表かられかるように、本発明の半導体封止用エポキ
シ樹脂組成物を用いたばあい、ガラス転移湿度および線
膨張係数などの曇本的特性や組成物の流動性を著しく変
えることなくその強度を向上させることができ、しかも
第3表かられかるように熱サイクル後の耐クラツク性に
も非常に優れていることがわかる。Margin below E] Table 3 As can be seen from Table 2, when the epoxy resin composition for semiconductor encapsulation of the present invention is used, the characteristic properties such as glass transition humidity and coefficient of linear expansion, and the composition's It can be seen that the strength can be improved without significantly changing the fluidity, and as can be seen from Table 3, the crack resistance after thermal cycling is also very good.
[発明の効果]
以上のように本発明の半導体封止用エポキシ樹脂組成物
は、熱可塑性液晶ポリマーが添加されているので、優れ
た機械強度、熱サイクル後の耐クラツク性、耐熱性およ
び耐湿性を有するので、ICやLSIなどの半導体封止
樹脂として好適に使用しうるという効果を奏する。[Effects of the Invention] As described above, since the epoxy resin composition for semiconductor encapsulation of the present invention contains a thermoplastic liquid crystal polymer, it has excellent mechanical strength, crack resistance after thermal cycling, heat resistance, and moisture resistance. Since it has properties, it can be advantageously used as a semiconductor sealing resin for ICs, LSIs, and the like.
Claims (1)
脂、無機質充てん剤および熱可塑性液晶ポリマーを含有
した樹脂組成物であり、該樹脂組成物に対して熱可塑性
液晶ポリマーを0.1〜25重量%含有させたことを特
徴とする半導体封止用エポキシ樹脂組成物。(1) A resin composition containing a polyfunctional epoxy compound, a phenol novolak resin, an inorganic filler, and a thermoplastic liquid crystal polymer, and the thermoplastic liquid crystal polymer is contained in an amount of 0.1 to 25% by weight based on the resin composition. An epoxy resin composition for semiconductor encapsulation characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13428887A JPS63295620A (en) | 1987-05-27 | 1987-05-27 | Epoxy resin composition for sealing semiconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13428887A JPS63295620A (en) | 1987-05-27 | 1987-05-27 | Epoxy resin composition for sealing semiconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63295620A true JPS63295620A (en) | 1988-12-02 |
Family
ID=15124777
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13428887A Pending JPS63295620A (en) | 1987-05-27 | 1987-05-27 | Epoxy resin composition for sealing semiconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63295620A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05214253A (en) * | 1991-02-13 | 1993-08-24 | Bp America Inc | Polymer composite of thermoplastic polymer with liquid crystal polymer and process for preparing same |
US7141627B2 (en) * | 2002-10-31 | 2006-11-28 | Dainippon Ink And Chemicals, Inc. | Epoxy resin composition |
US20150025188A1 (en) * | 2009-09-16 | 2015-01-22 | Kaneka Corporation | Thermally-conductive organic additive, resin composition, and cured product |
-
1987
- 1987-05-27 JP JP13428887A patent/JPS63295620A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05214253A (en) * | 1991-02-13 | 1993-08-24 | Bp America Inc | Polymer composite of thermoplastic polymer with liquid crystal polymer and process for preparing same |
US7141627B2 (en) * | 2002-10-31 | 2006-11-28 | Dainippon Ink And Chemicals, Inc. | Epoxy resin composition |
US20150025188A1 (en) * | 2009-09-16 | 2015-01-22 | Kaneka Corporation | Thermally-conductive organic additive, resin composition, and cured product |
US9234095B2 (en) * | 2009-09-16 | 2016-01-12 | Kaneka Corporation | Thermally-conductive organic additive, resin composition, and cured product |
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