JPH10182831A - Epoxy resin composition - Google Patents
Epoxy resin compositionInfo
- Publication number
- JPH10182831A JPH10182831A JP34775396A JP34775396A JPH10182831A JP H10182831 A JPH10182831 A JP H10182831A JP 34775396 A JP34775396 A JP 34775396A JP 34775396 A JP34775396 A JP 34775396A JP H10182831 A JPH10182831 A JP H10182831A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin composition
- formula
- compsn
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
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- Epoxy Resins (AREA)
- Silicon Polymers (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、半導体デバイスに
おけるパッケージの充填性、内部ボイド、及び耐半田ク
ラック性に優れた半導体封止用エポキシ樹脂組成物に関
するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for semiconductor encapsulation which is excellent in package filling, internal voids, and solder crack resistance in a semiconductor device.
【0002】[0002]
【従来の技術】従来、ダイオード、トランジスタ、集積
回路等の電子部品を、熱硬化性樹脂組成物で封止してい
るが、特に集積回路では耐熱性、耐湿性に優れたオルソ
クレゾールノボラック型エポキシ樹脂をフェノールノボ
ラック樹脂で硬化させ、充填材として溶融シリカ、結晶
シリカ等の無機充填材を配合したエポキシ樹脂組成物
(以下、樹脂組成物という)が用いられている。ところ
が近年、集積回路の高集積化に伴いチップがだんだん大
型化し、且つパッケージは、従来のDIPタイプから表
面実装化された小型、薄型のQFP、SOP、SOJ、
TSOP、TQFP、PLCC等に変わってきている。
即ち、大型チップを小型で薄いパッケージに封入するこ
とになり、成形時のパッドシフト、未充填ボイド、内部
ボイド、もしくは実装時のクラック等の問題が大きくク
ローズアップされてきている。従って、これらの問題を
解決する樹脂組成物の開発が望まれている。2. Description of the Related Art Conventionally, electronic components such as diodes, transistors, and integrated circuits are sealed with a thermosetting resin composition. In particular, in an integrated circuit, an ortho-cresol novolac epoxy having excellent heat resistance and moisture resistance is used. An epoxy resin composition (hereinafter referred to as a resin composition) in which a resin is cured with a phenol novolak resin and an inorganic filler such as fused silica or crystalline silica is blended as a filler is used. However, in recent years, chips have become larger and larger as integrated circuits have become more highly integrated, and packages have become smaller and thinner QFPs, SOPs, SOJs, and surface-mounted packages than conventional DIP types.
It is changing to TSOP, TQFP, PLCC, etc.
In other words, a large chip is sealed in a small and thin package, and problems such as pad shift during molding, unfilled voids, internal voids, and cracks during mounting have been greatly highlighted. Therefore, development of a resin composition that solves these problems is desired.
【0003】[0003]
【発明が解決しようとする課題】本発明は、このような
問題に対して、式(1)の三元ブロック共重合体ポリマ
ーを用いることにより、樹脂組成物の流動性を向上さ
せ、且つ消泡効果により、内部ボイドが少なく、薄型パ
ッケージへの充填性に優れ、リードフレーム及び半導体
チップ等の部材への密着性の向上、成形物の高温時にお
ける低弾性化による低応力化により、半導体パッケージ
の耐半田クラック性を向上させた樹脂組成物を提供する
ものである。SUMMARY OF THE INVENTION The present invention solves such a problem by using a triblock copolymer of the formula (1) to improve the flowability of the resin composition and to reduce the consumption of the resin composition. Due to the bubble effect, there are few internal voids, excellent filling in thin packages, improved adhesion to lead frames and semiconductor chips, etc., and reduced stress due to low elasticity of molded products at high temperatures, And to provide a resin composition having improved solder crack resistance.
【0004】[0004]
【課題を解決するための手段】本発明は、(A)式
(1)のポリテトラヒドロフラン(以下、PTHFとい
う)−ポリジメチルシロキサン(以下、PDMSとい
う)−ポリテトラヒドロフランの三元ブロック共重合体
ポリマー、(B)エポキシ樹脂、(C)フェノール樹脂
硬化剤、(D)無機充填材、及び(E)硬化促進剤を必
須成分とする半導体封止用エポキシ樹脂組成物であり、
従来の樹脂組成物に比べ、成形性、耐半田クラック性等
に優れた特徴を有するものである。DISCLOSURE OF THE INVENTION The present invention relates to a (A) polytetrahydrofuran (hereinafter referred to as PTHF) -polydimethylsiloxane (hereinafter referred to as PDMS) -polytetrahydrofuran terpolymer copolymer of the formula (1). , (B) an epoxy resin, (C) a phenolic resin curing agent, (D) an inorganic filler, and (E) a curing accelerator.
Compared with the conventional resin composition, it has characteristics excellent in moldability, solder crack resistance and the like.
【化2】 (Rは、水素、メチル基、又は環状オニウム塩。m、n
=30〜150)Embedded image (R is hydrogen, a methyl group, or a cyclic onium salt. M, n
= 30-150)
【0005】[0005]
【発明の実施の形態】本発明で用いる式(1)の分子構
造で示されるPTHF−PDMS−PTHFの三元ブロ
ック共重合体ポリマーは、結晶性ポリマーであるPTH
Fを含むため常温では固体であるが、樹脂組成物の製造
時の混練温度70〜100℃では溶融するので、樹脂組
成物に均一分散し、成形時の流動性を向上させる。更
に、このポリマーを配合した樹脂組成物の硬化物は、低
温時はPDMSによる低弾性、高温時にはPTHFによ
る低弾性が発現する特徴を有する。式(1)中のRは、
水素、メチル基、又は環状オニウム塩であり、特に好ま
しいのは環状オニウム塩型のものであり、環状オニウム
塩基は、フェノール性水酸基と反応し、固定化されるた
め、金型への汚れや成形物上のシミなどを生じない特徴
を有する。環状オニウム塩基は、片方もしくは両方の末
端に結合しているものが好ましい。式(1)の三元ブロ
ック共重合体ポリマーは、従来から使用されている低応
力剤であるシリコーンオイルに較べて密着性が良好で、
消泡効果が高い。式(1)中のm、nは各々30〜15
0であり、m、nが30未満だと密着性が低下し、m、
nが150を越えると増粘し、流動性が低下する。又、
式(1)の配合量としては、全樹脂組成物中に0.1〜
3重量%が好ましい。0.1重量%未満だと内部ボイド
等が発生して成形性が低下し、3重量%を越えると耐半
田クラック性が低下する。DETAILED DESCRIPTION OF THE INVENTION The triblock copolymer of PTHF-PDMS-PTHF represented by the molecular structure of formula (1) used in the present invention is a crystalline polymer, PTH.
Since it contains F, it is solid at normal temperature, but melts at a kneading temperature of 70 to 100 ° C. during the production of the resin composition, so that it is uniformly dispersed in the resin composition and improves the fluidity during molding. Furthermore, the cured product of the resin composition containing this polymer has a characteristic that low elasticity due to PDMS is exhibited at low temperatures and low elasticity due to PTHF at high temperatures. R in the formula (1) is
Hydrogen, a methyl group, or a cyclic onium salt is particularly preferable, and a cyclic onium salt type is particularly preferable.A cyclic onium base reacts with a phenolic hydroxyl group and is fixed, so that a stain or molding on a mold is caused. It has the characteristic of not causing spots on objects. Preferably, the cyclic onium base is bonded to one or both ends. The ternary block copolymer polymer of the formula (1) has better adhesion than silicone oil which is a conventionally used low stress agent,
High defoaming effect. M and n in the formula (1) are each 30 to 15
0, and when m and n are less than 30, the adhesiveness is reduced.
When n exceeds 150, the viscosity increases and the fluidity decreases. or,
The compounding amount of the formula (1) is 0.1 to 0.1 in the total resin composition.
3% by weight is preferred. If the amount is less than 0.1% by weight, internal voids and the like are generated, and the formability decreases. If the amount exceeds 3% by weight, the solder crack resistance decreases.
【0006】本発明に用いるエポキシ樹脂とは、エポキ
シ基を有するモノマー、オリゴマー、ポリマー全般を言
う。例えば、ビフェニル型エポキシ化合物、ビスフェノ
ール型エポキシ化合物、フェノールノボラック型エポキ
シ樹脂、クレゾールノボラック型エポキシ樹脂、トリフ
ェノールメタン型エポキシ化合物、アルキル変性トリフ
ェノールメタン型エポキシ化合物、及びトリアジン核含
有エポキシ樹脂等が挙げられるが、これらに限定される
ものではない。[0006] The epoxy resin used in the present invention refers to all monomers, oligomers and polymers having an epoxy group. For example, a biphenyl-type epoxy compound, a bisphenol-type epoxy compound, a phenol novolak-type epoxy resin, a cresol novolak-type epoxy resin, a triphenolmethane-type epoxy compound, an alkyl-modified triphenolmethane-type epoxy compound, and a triazine nucleus-containing epoxy resin are exemplified. However, the present invention is not limited to these.
【0007】本発明に用いるフェノール樹脂硬化剤とし
ては、例えば、フェノールノボラック樹脂、クレゾール
ノボラック樹脂、ジシクロペンタジエン変性フェノール
樹脂、キシリレン変性フェノール樹脂、テルペン変性フ
ェノール樹脂、トリフェノールメタン化合物等が挙げら
れ、特にフェノールノボラック樹脂、ジシクロペンタジ
エン変性フェノール樹脂、キシリレン変性フェノール樹
脂、テルペン変性フェノール樹脂が好ましい。又、これ
らのフェノール樹脂硬化剤の配合量としては、エポキシ
樹脂のエポキシ基とフェノール樹脂硬化剤のフェノール
性水酸基の比が、0.9〜1.3が好ましく、この範囲
を外れると、硬化性が低下し、離型不良が生じる。The phenol resin curing agent used in the present invention includes, for example, phenol novolak resin, cresol novolak resin, dicyclopentadiene-modified phenol resin, xylylene-modified phenol resin, terpene-modified phenol resin, triphenolmethane compound and the like. Particularly, a phenol novolak resin, a dicyclopentadiene-modified phenol resin, a xylylene-modified phenol resin, and a terpene-modified phenol resin are preferable. In addition, the ratio of the epoxy group of the epoxy resin to the phenolic hydroxyl group of the phenol resin curing agent is preferably 0.9 to 1.3. And the mold release failure occurs.
【0008】本発明に用いる硬化促進剤としては、エポ
キシ基とフェノール性水酸基との硬化反応を促進させる
ものであればよく、一般に封止材料に使用されているも
のを広く使用することができる。例えば、1,8−ジア
ザビシクロ(5,4,0)ウンデセン−7、トリフェニ
ルホスフィン、ジメチルベンジルアミン、2−メチルイ
ミダゾール等が挙げられ、これらは単独もしくは混合し
て用いられる。As the curing accelerator used in the present invention, any one can be used as long as it promotes the curing reaction between the epoxy group and the phenolic hydroxyl group, and those generally used for a sealing material can be widely used. For example, 1,8-diazabicyclo (5,4,0) undecene-7, triphenylphosphine, dimethylbenzylamine, 2-methylimidazole and the like are used, and these are used alone or in combination.
【0009】本発明に用いる無機充填材としては、一般
に封止材料に使用されているものを広く使用することが
できる。無機充填材の配合量は、全樹脂組成物中に80
〜90重量%が好ましく、80重量%未満だと耐半田ク
ラック性が低下し、90重量%を越えると流動性が低下
し、成形不良が生じる。As the inorganic filler used in the present invention, those generally used for a sealing material can be widely used. The blending amount of the inorganic filler is 80 in the total resin composition.
When the content is less than 80% by weight, the solder crack resistance is reduced. When the content is more than 90% by weight, the fluidity is reduced, and molding failure occurs.
【0010】本発明の樹脂組成物は、(A)〜(E)成
分の他、必要に応じてシランカップリング剤、臭素化エ
ポキシ樹脂、三酸化アンチモン、ヘキサブロムベンゼン
等の難燃剤、カーボンブラック、ベンガラ等の着色剤、
天然ワックス、合成ワックス等の離型剤、及びシリコー
ンオイル、ゴム等の低応力添加剤等の種々の添加剤を配
合しても差し支えがない。本発明の樹脂組成物は、
(A)〜(E)成分、及びその他の添加剤をミキサー等
を用いて充分に均一にした後、更に熱ロール又はニーダ
ー等で溶融混練し、冷却後粉砕して得られる。これらの
樹脂組成物は、電気部品或いは電気部品であるトランジ
スタ、集積回路等の被覆、絶縁、封止等に用いることが
できる。The resin composition of the present invention comprises, in addition to the components (A) to (E), if necessary, a silane coupling agent, a brominated epoxy resin, a flame retardant such as antimony trioxide, hexabromobenzene, and carbon black. , Colorants such as bengalara,
Various additives such as a release agent such as natural wax and synthetic wax and a low stress additive such as silicone oil and rubber can be blended. The resin composition of the present invention,
After sufficiently homogenizing the components (A) to (E) and other additives using a mixer or the like, the mixture is further melt-kneaded with a hot roll or a kneader, cooled, and pulverized. These resin compositions can be used for covering, insulating, encapsulating, etc. electrical components or electrical components such as transistors and integrated circuits.
【0011】以下、本発明を実施例で具体的に説明す
る。 実施例1 式(2)のポリマー(m=48、n=95) 1.0重量部Hereinafter, the present invention will be described specifically with reference to examples. Example 1 1.0 part by weight of a polymer of the formula (2) (m = 48, n = 95)
【化3】 ビフェニル型エポキシ化合物(融点95℃、エポキシ当量195g/eq) 5.4重量部 パラキリシレン変性フェノール樹脂(軟化点70℃、水酸基当量175g/e q) 4.9重量部 溶融球状シリカ粉末(平均粒径20μm、最大粒子径75μm) 87.0重量部 1,8−ジアザビシクロ(5,4,0)ウンデセン−7(以下、DBUという ) 0.2重量部 カーボンブラック 0.3重量部 カルナバワックス 1.2重量部 をミキサーで常温混合し、70〜100℃で二軸ロール
を用いて混練し、冷却粉砕して樹脂組成物とし、これを
タブレット化した。得られた樹脂組成物について、以下
に示す方法で評価した。結果を表1に示す。Embedded image Biphenyl type epoxy compound (melting point: 95 ° C., epoxy equivalent: 195 g / eq) 5.4 parts by weight Paraxylene-modified phenol resin (softening point: 70 ° C., hydroxyl equivalent: 175 g / eq) 4.9 parts by weight Fused spherical silica powder (average particle diameter) 20 μm, maximum particle size 75 μm) 87.0 parts by weight 1,8-diazabicyclo (5,4,0) undecene-7 (hereinafter referred to as DBU) 0.2 part by weight Carbon black 0.3 part by weight Carnauba wax 1.2 Parts by weight were mixed at room temperature with a mixer, kneaded at 70 to 100 ° C. using a biaxial roll, cooled and pulverized to obtain a resin composition, which was formed into tablets. About the obtained resin composition, it evaluated by the method shown below. Table 1 shows the results.
【0012】評価方法 スパイラルフロー:EMMI−I−66に準じたスパイ
ラルフロー測定用金型を用いて、金型温度175℃、注
入圧70kg/cm2、硬化時間2分で測定した。 内部ボイド:低圧トランスファー成形機を用いて、17
5℃、100kg/cm2、硬化時間2分で、160p
QFPを封止し、得られたパッケージを超音波探傷機を
用いて測定し、内部アイランド上の0.3mm以上のボ
イドを数えた。 耐半田クラック性:低圧トランスファー成形機を用い
て、175℃、100kg/cm2、硬化時間2分で、
9mm×9mmのチップを80pQFPに封止した。こ
のテスト用素子を85℃、相対湿度85%の環境下で1
20時間及び160時間処理し、その後240℃のIR
リフロー装置で半田処理し、内部クラックを超音波探傷
機を用いて観察した。Evaluation method Spiral flow: Measurement was performed using a mold for measuring spiral flow according to EMMI-I-66 at a mold temperature of 175 ° C., an injection pressure of 70 kg / cm 2 and a curing time of 2 minutes. Internal void: Using a low pressure transfer molding machine, 17
5 ° C., 100 kg / cm 2 , curing time 2 minutes, 160p
The QFP was sealed, and the obtained package was measured using an ultrasonic flaw detector to count voids of 0.3 mm or more on the internal island. Solder crack resistance: Using a low-pressure transfer molding machine, at 175 ° C., 100 kg / cm 2 , and curing time of 2 minutes.
A 9 mm × 9 mm chip was sealed in 80 pQFP. The test device was tested under the environment of 85 ° C. and 85% relative humidity.
Treated for 20 and 160 hours, then IR at 240 ° C
Soldering was performed with a reflow device, and internal cracks were observed using an ultrasonic flaw detector.
【0013】実施例2,3、比較例1,2 表1の配合に従って、実施例1と同様にして樹脂組成物
を作成し、実施例1と同様に評価した。結果を表1に示
す。実施例3で用いた式(1)のポリマーの構造を式
(3)(m=74、n=102)に示す。Examples 2 and 3, Comparative Examples 1 and 2 Resin compositions were prepared in the same manner as in Example 1 according to the formulations shown in Table 1, and evaluated in the same manner as in Example 1. Table 1 shows the results. The structure of the polymer of formula (1) used in Example 3 is shown in formula (3) (m = 74, n = 102).
【化4】 Embedded image
【0014】比較例2で用いたシリコーンオイルは、ポ
リオキシアルキレン変性シリコーンオイルである。The silicone oil used in Comparative Example 2 is a polyoxyalkylene-modified silicone oil.
【表1】 [Table 1]
【0015】[0015]
【発明の効果】本発明に従うと、薄型パッケージでの未
充填や内部ボイド等の成形不良が解決でき、更に、耐半
田クラック性も低下することなく、従来、相反していた
成形性と耐半田クラック性を両立できる。According to the present invention, it is possible to solve molding defects such as unfilling and internal voids in a thin package, and furthermore, the solder cracking resistance is not reduced, and the moldability and the soldering resistance, which have been contradictory to each other, have been reduced. Cracking properties can be compatible.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI C08L 61/04 C08L 61/04 63/00 63/00 83/10 83/10 H01L 23/29 H01L 23/30 R 23/31 ────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. 6 Identification code FI C08L 61/04 C08L 61/04 63/00 63/00 83/10 83/10 H01L 23/29 H01L 23/30 R 23/31
Claims (3)
ン−ポリジメチルシロキサン−ポリテトラヒドロフラン
の三元ブロック共重合体ポリマー、(B)エポキシ樹
脂、(C)フェノール樹脂硬化剤、(D)無機充填材、
及び(E)硬化促進剤を必須成分とする半導体封止用エ
ポキシ樹脂組成物。 【化1】 (Rは、水素、メチル基、又は環状オニウム塩。m、n
=30〜150)1. A polytetrahydrofuran-polydimethylsiloxane-polytetrahydrofuran triblock copolymer polymer of the formula (1), (B) an epoxy resin, (C) a phenol resin curing agent, and (D) an inorganic filler. Timber,
And (E) an epoxy resin composition for semiconductor encapsulation comprising a curing accelerator as an essential component. Embedded image (R is hydrogen, a methyl group, or a cyclic onium salt. M, n
= 30-150)
成物中に0.1〜3重量%含む請求項1記載の半導体封
止用エポキシ樹脂組成物。2. The epoxy resin composition for semiconductor encapsulation according to claim 1, wherein the polymer of the formula (1) is contained in an amount of 0.1 to 3% by weight in the total epoxy resin composition.
の末端が、環状オニウム塩型である請求項1、又は2記
載の半導体封止用エポキシ樹脂組成物。3. The epoxy resin composition for semiconductor encapsulation according to claim 1, wherein one or both terminals of the polymer of the formula (1) is a cyclic onium salt type.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34775396A JP3731960B2 (en) | 1996-12-26 | 1996-12-26 | Epoxy resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP34775396A JP3731960B2 (en) | 1996-12-26 | 1996-12-26 | Epoxy resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH10182831A true JPH10182831A (en) | 1998-07-07 |
JP3731960B2 JP3731960B2 (en) | 2006-01-05 |
Family
ID=18392354
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP34775396A Expired - Fee Related JP3731960B2 (en) | 1996-12-26 | 1996-12-26 | Epoxy resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3731960B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6525103B2 (en) * | 1999-05-14 | 2003-02-25 | Goldschmift Ag | Water-insoluble poly(oxy-1,4-butanediyl)-containing polyoxyalkylene-polysiloxane block copolymers for defoaming aqueous media |
JP2011506750A (en) * | 2007-12-18 | 2011-03-03 | ダウ グローバル テクノロジーズ インコーポレイティド | Thermosetting compositions containing silicone polyethers, their manufacture and use |
WO2018221373A1 (en) | 2017-05-31 | 2018-12-06 | 東レ株式会社 | Block copolymer, method for producing same, epoxy resin composition, cured product, and semiconductor encapsulating material |
WO2020032015A1 (en) | 2018-08-10 | 2020-02-13 | 東レ株式会社 | Polysiloxane-polyalkylene glycol block copolymer and method for producing same |
-
1996
- 1996-12-26 JP JP34775396A patent/JP3731960B2/en not_active Expired - Fee Related
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6525103B2 (en) * | 1999-05-14 | 2003-02-25 | Goldschmift Ag | Water-insoluble poly(oxy-1,4-butanediyl)-containing polyoxyalkylene-polysiloxane block copolymers for defoaming aqueous media |
JP2011506750A (en) * | 2007-12-18 | 2011-03-03 | ダウ グローバル テクノロジーズ インコーポレイティド | Thermosetting compositions containing silicone polyethers, their manufacture and use |
WO2018221373A1 (en) | 2017-05-31 | 2018-12-06 | 東レ株式会社 | Block copolymer, method for producing same, epoxy resin composition, cured product, and semiconductor encapsulating material |
KR20200015475A (en) | 2017-05-31 | 2020-02-12 | 도레이 카부시키가이샤 | Block copolymer, its manufacturing method, epoxy resin composition, its hardened | cured material, and semiconductor sealing material |
US11104766B2 (en) | 2017-05-31 | 2021-08-31 | Toray Industries, Inc. | Block copolymer and method of producing same, epoxy resin composition and cured product thereof, and semiconductor encapsulating material |
WO2020032015A1 (en) | 2018-08-10 | 2020-02-13 | 東レ株式会社 | Polysiloxane-polyalkylene glycol block copolymer and method for producing same |
CN112513146A (en) * | 2018-08-10 | 2021-03-16 | 东丽株式会社 | Polysiloxane-polyalkylene glycol block copolymer and method for producing same |
KR20210042085A (en) | 2018-08-10 | 2021-04-16 | 도레이 카부시키가이샤 | Polysiloxane-polyalkylene glycol block copolymer and preparation method thereof |
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