JPS63290272A - Production of rare earth element-transition metal target material - Google Patents
Production of rare earth element-transition metal target materialInfo
- Publication number
- JPS63290272A JPS63290272A JP12458487A JP12458487A JPS63290272A JP S63290272 A JPS63290272 A JP S63290272A JP 12458487 A JP12458487 A JP 12458487A JP 12458487 A JP12458487 A JP 12458487A JP S63290272 A JPS63290272 A JP S63290272A
- Authority
- JP
- Japan
- Prior art keywords
- powder
- rare earth
- transition metal
- earth element
- metal element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052761 rare earth metal Inorganic materials 0.000 title claims abstract description 35
- 229910052723 transition metal Inorganic materials 0.000 title claims abstract description 32
- 150000002910 rare earth metals Chemical class 0.000 title claims abstract description 16
- 239000013077 target material Substances 0.000 title claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000000843 powder Substances 0.000 claims abstract description 51
- 238000001513 hot isostatic pressing Methods 0.000 claims abstract description 9
- 239000002775 capsule Substances 0.000 claims abstract description 3
- 238000007789 sealing Methods 0.000 claims abstract description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 17
- 239000000956 alloy Substances 0.000 claims description 17
- 239000011812 mixed powder Substances 0.000 claims description 13
- 238000007731 hot pressing Methods 0.000 claims description 3
- 239000002994 raw material Substances 0.000 claims 2
- 239000000203 mixture Substances 0.000 abstract description 8
- 229910001209 Low-carbon steel Inorganic materials 0.000 abstract description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 3
- 239000001301 oxygen Substances 0.000 abstract description 3
- 229910052760 oxygen Inorganic materials 0.000 abstract description 3
- 239000011261 inert gas Substances 0.000 abstract description 2
- 229910000640 Fe alloy Inorganic materials 0.000 abstract 1
- 238000003825 pressing Methods 0.000 abstract 1
- 239000007858 starting material Substances 0.000 abstract 1
- 238000005245 sintering Methods 0.000 description 13
- 239000010408 film Substances 0.000 description 10
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、光磁気記録媒体として用いられる希土類元素
−遷移金属元素系スパッタリング用ターゲット材の製造
方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for manufacturing a rare earth element-transition metal element sputtering target material used as a magneto-optical recording medium.
最近、ガラスあるいは樹脂基板上にスパッタリング法を
用いて所望組成の希土類元素−遷移金属元素系の薄膜を
形成し、これを記録媒体として用いた書き換え可能で高
密度記録が可能な光磁気記録ディスクの開発が行なわれ
ている。このスパッタリングに用いられるターゲットは
、所望組成の合金粉や希土類元素粉末と遷移金属元素粉
末を所望組成に混合した粉体をホットプレスや熱間静水
圧プレスなどで加圧焼結することで製造されてい７一
る。Recently, a thin film of a rare earth element-transition metal element with a desired composition is formed on a glass or resin substrate using a sputtering method, and this is used as a recording medium to create a magneto-optical recording disk that is rewritable and capable of high-density recording. Development is underway. The target used for this sputtering is manufactured by pressurizing and sintering powder, which is a mixture of alloy powder, rare earth element powder, and transition metal element powder of a desired composition, using a hot press, hot isostatic press, etc. It's seven years old.
しかしながら、ホットプレスで加圧焼結を行なう場合、
焼結温度が固相温度以下では、得られる焼結体の相対密
度は９４〜９５％にしか達せず、このため焼結体中の空
孔にとりこまれている不活性ガスや酸素が成膜時に膜表
面に吸着したり、膜中にとりこまれて希土類元素を選択
的に酸化して磁気特性を劣化させる。一方焼結温度が固
相温度以上の場合は、焼結体の相対密度は、はぼ９９％
以上にまで達するが、液相が生ずるため焼結体が酸化し
てしまうなどの問題点がある。However, when performing pressure sintering with a hot press,
When the sintering temperature is below the solidus temperature, the relative density of the resulting sintered body reaches only 94 to 95%, and therefore, the inert gas and oxygen trapped in the pores in the sintered body form a film. Rare earth elements are sometimes adsorbed to the film surface or incorporated into the film, selectively oxidizing the rare earth elements and deteriorating their magnetic properties. On the other hand, when the sintering temperature is higher than the solidus temperature, the relative density of the sintered body is approximately 99%.
Although the above is achieved, there are problems such as the oxidation of the sintered body due to the generation of a liquid phase.
また、熱間静水圧プレスで加圧焼結を行なう場合は、高
密度な焼結体の製造が可能であるが、ホットプレスのよ
うな一軸圧縮ではないため、ターゲット材に適した薄板
の製造が困建であるという問題点があった。In addition, when pressure sintering is performed using hot isostatic press, it is possible to produce a high-density sintered body, but since it is not uniaxial compression like hot press, it is difficult to produce thin plates suitable for target materials. The problem was that the building was in poor condition.
本発明者らは、ホットプレス、熱間静水圧プレスのそれ
ぞれの特徴と希土類元素−遷移金属元素合金粉末、希土
類元素粉末および遷移金属元素粉末の焼結性を冶金学的
に検討した結果、以下に示す知見を得るに至った。すな
わち。The present inventors metallurgically investigated the characteristics of hot pressing and hot isostatic pressing and the sinterability of rare earth element-transition metal element alloy powder, rare earth element powder, and transition metal element powder, and found the following. The following findings were obtained. Namely.
（１）熱間静水圧プレスでは、予備成形体の密度が７０
％以上であれば、成形体は均一収縮し、固相温度範囲内
で薄板を寸法精度良くかつ高密度に熱開成形することが
可能である。(1) In hot isostatic pressing, the density of the preform is 70
% or more, the molded body shrinks uniformly, and it is possible to hot-open a thin plate with good dimensional accuracy and high density within the solidus temperature range.
（２）希土類元素−遷移金属元素合金粉末は硬くて脆い
金属間化合物よりなり、冷間での予備成形は困鎧である
が、ホットプレスで加圧焼結すれば密度８５−９５％の
予備成形体が得られる。(2) Rare earth element-transition metal element alloy powder is made of a hard and brittle intermetallic compound, and it is difficult to preform it in the cold, but if it is pressure sintered in a hot press, it can have a density of 85-95%. A molded body is obtained.
（３）希土類元素粉末と遷移金属元素粉末の混合物は、
構成粒子自体が可塑性を有するため、常温、かつ成形圧
３５０）ｃｇｆ／ｄ以上で密度７０％以上の予備成形体
が得られる。(3) The mixture of rare earth element powder and transition metal element powder is
Since the constituent particles themselves have plasticity, a preform with a density of 70% or more can be obtained at room temperature and at a molding pressure of 350) cgf/d or more.
（４）同相焼結の場合、Ｔｂ等の希土類元素の酸化を極
力防止することが可能であり、熱間静水圧プレス後の焼
結体の酸素量を２０００ｐｐｍ以内に抑えることができ
ること等である。(4) In the case of in-phase sintering, it is possible to prevent oxidation of rare earth elements such as Tb as much as possible, and the amount of oxygen in the sintered body after hot isostatic pressing can be suppressed to within 2000 ppm. .
本発明は、上記知見に基づいて発明されたものであり、
希土類元素−遷移金属元素合金粉末、希土類元素−遷移
金属元素合金粉末と遷移金属元素粉末の混合粉、希土類
元素粉末と遷移金属元素粉末との混合粉または希土類元
素粉末と希土類元素−遷移金属元素合金粉末との混合粉
を熱間あるいは冷間で予備成形し、密度比を７０％以上
とした後該予備成形体をカプセルに真空封入し、熱間静
水圧プレスにより同相温度範囲内で加圧成形することを
特徴とする希土類元素−遷移金属元素ターゲット材の製
造方法である。The present invention was invented based on the above findings,
Rare earth element - transition metal element alloy powder, mixed powder of rare earth element - transition metal element alloy powder and transition metal element powder, mixed powder of rare earth element powder and transition metal element powder, or rare earth element powder and rare earth element - transition metal element alloy The mixed powder is preformed hot or cold to a density ratio of 70% or more, then the preform is vacuum-sealed into capsules, and pressure molded within the same temperature range by hot isostatic pressing. This is a method for producing a rare earth element-transition metal element target material.
以下、実施例により、本発明のターゲット材製造方法を
詳しく説明する。EXAMPLES Hereinafter, the target material manufacturing method of the present invention will be explained in detail with reference to Examples.
実施例１
５２．５％Ｔ ｂ−４４％Ｆｅ−３，５％Ｇｏ（重量％
）の組成を有する合金粉末を３２メツシユ以下に分級し
た後、この合金粉末４５０ ｇを内径１３０ｍｍのホッ
トプレスモールド内に充填し、加圧圧力２００ｋｇ／ｃ
ｄ、温度１０００℃、真空度１Ｏ−４ｔｏｒｒで３０分
保持して仮焼結を行なった。Example 1 52.5%Tb-44%Fe-3,5%Go (wt%
) After classifying the alloy powder having a composition of 32 meshes or less, 450 g of this alloy powder was filled into a hot press mold with an inner diameter of 130 mm, and a pressurizing pressure of 200 kg/cm was applied.
d. Preliminary sintering was performed at a temperature of 1000°C and a vacuum degree of 1O-4 torr for 30 minutes.
前記焼結体の密度は、この時点で９０％にまで達してい
る。この仮焼結体を第１図に示す軟鋼製缶体内に８枚重
ねて挿入した。The density of the sintered body reached 90% at this point. Eight sheets of this temporary sintered body were stacked and inserted into a mild steel can shown in FIG.
なお、仮焼結体間および仮焼結体と缶体の間は、加熱焼
結時の反応防止および圧力媒体として作用するアルミナ
粉によって分離されている。前記缶体を１Ｏ−４ｔｏｒ
ｒ、温度２５０℃で真空加熱して封止した後、熱間静水
圧プレス機中で、温度１１００℃、圧力１２００気圧で
１時間保持して焼結を行なった。前記焼結体の密度は、
相対密度１００％に達しており、また焼結体の寸法も板
厚４±０．１ｍｍという非常に寸法精度の良好な薄板が
成形できた。Note that the pre-sintered bodies and between the pre-sintered bodies and the can body are separated by alumina powder which acts as a pressure medium and prevents reaction during heating and sintering. The can body is heated to 1O-4torr.
r. After vacuum heating and sealing at a temperature of 250°C, sintering was performed by holding in a hot isostatic press machine at a temperature of 1100°C and a pressure of 1200 atm for 1 hour. The density of the sintered body is
The relative density reached 100%, and the sintered body was molded into a thin plate with very good dimensional accuracy of 4±0.1 mm in thickness.
この薄板をターゲットに加工した後、スパッタ装置に装
着して酸化膜付Ｓｉ上に膜厚１０００人のＴｂ−Ｆｅ−
Ｇｏ膜を成膜し、さらにその上に保護膜として膜厚１０
００人のＳｉＮを成膜した。After processing this thin plate as a target, it was installed in a sputtering device and a Tb-Fe-
A Go film is formed, and a protective film with a thickness of 10
00 people deposited a SiN film.
前記スパッタ膜を温度６５℃、相対湿度９５％の環境下
で加速寿命試験を行なった。なお本試験では比較品とし
て、同組成で相対密度が９４％の焼結ターゲットを用い
て作成したスパッタ膜も同時に評価した。The sputtered film was subjected to an accelerated life test in an environment of a temperature of 65° C. and a relative humidity of 95%. In this test, a sputtered film created using a sintered target with the same composition and relative density of 94% was also evaluated as a comparative product.
第３図にこの加速寿命試験の評価結果を示す。Figure 3 shows the evaluation results of this accelerated life test.
本発明ターゲットで成膜したスパッタ膜の保磁力は、長
時間にわたって安定しているのに対して、低密度ターゲ
ットで成膜したスパッタ膜はＴｂの選択酸化進行が原因
と思われる保磁力低下が早期に生ずることがわかる。The coercive force of the sputtered film formed using the target of the present invention is stable over a long period of time, whereas the coercive force of the sputtered film formed using the low-density target decreases, which is thought to be caused by the progress of selective oxidation of Tb. It can be seen that this occurs early.
実施例２
３２メツシユに分級した８８％Ｔｂ−１２％Ｆｅ（重量
％）合金粉末と純Ｆｅ、純Ｃｏ粉を５２．５％Ｔ ｂ−
４４％Ｆｅ−３，５％Ｃｏになるよう秤量した後、Ｖ型
混合器で均一な混合粉体になるよう混合した。次に該混
合粉末４５０ｇをホットプレス温度および熱間静水圧プ
レス温度を６８０℃にすること以外は、実施例１と同様
な条件で加圧焼結を行なった。得られた焼結体の相対密
度は１００％を示し、板厚も４±０．１ｎｍであった。Example 2 88% Tb-12% Fe (wt%) alloy powder classified into 32 meshes, pure Fe, and pure Co powder were mixed into 52.5% Tb-
After weighing to give 44% Fe-3,5% Co, the powder was mixed using a V-type mixer to give a uniform mixed powder. Next, 450 g of the mixed powder was subjected to pressure sintering under the same conditions as in Example 1, except that the hot pressing temperature and hot isostatic pressing temperature were set to 680°C. The relative density of the obtained sintered body was 100%, and the plate thickness was 4±0.1 nm.
実施例３
３２メツシユに分級した純Ｔｂ、純Ｆｅ、純Ｃｏ粉を５
２．５％Ｔ ｂ−４４％Ｆｅ−３，５％Ｃｏになるよう
秤量し、Ｖ型混合器で均一に混合した。前記混合粉４５
０ｇを内径１３０ｍφの金型に充填し、加圧圧力３５０
ｋｇ／ｄ、常温で予備成形した。予備成形体の密度はこ
の時点で７０％に達している。この予備成形体を第２図
に示す軟鋼製缶体内に５枚重ねて装入した。Example 3 Pure Tb, pure Fe, and pure Co powders classified into 32 meshes were
They were weighed to give 2.5%Tb-44%Fe-3,5%Co and mixed uniformly using a V-type mixer. The mixed powder 45
0g was filled into a mold with an inner diameter of 130mφ, and the pressure was 350.
kg/d, and was preformed at room temperature. The density of the preform has reached 70% at this point. Five of these preforms were stacked and charged into a mild steel can shown in FIG.
予備成形体間は、板厚２■の薄いスペーサーを設置した
。また予備成形体とスペーサーおよび缶体の間には、加
圧焼結時の反応防止用としてＮｂｉを設置した。前記缶
体を１０−’ ｔｏｒｒ、温度２５０℃で真空加熱して
封止した後、熱間静水圧プレス機中で、温度６８０℃、
圧力１２００気圧で１時間保持して焼結を行ない、板厚
精度および平坦度はやや劣るものの、他はほぼ実施例１
と同等な薄板を得た。A thin spacer with a plate thickness of 2 mm was installed between the preforms. Furthermore, Nbi was placed between the preform, the spacer, and the can body to prevent reaction during pressure sintering. The can body was vacuum heated and sealed at 10-' torr and a temperature of 250°C, and then heated at a temperature of 680°C in a hot isostatic press machine.
Sintering was carried out by holding at a pressure of 1200 atm for 1 hour, and although the plate thickness accuracy and flatness were slightly inferior, other aspects were almost the same as in Example 1.
A thin plate equivalent to that was obtained.
実施例４
３２メツシユに分級した純Ｔｂ粉と８８％Ｔｂ−１２％
Ｆｅ（重量％）合金粉末と純Ｆｅ、純ＣＯ粉を、５２．
５％Ｔｂ−４４％Ｆｅ−３，５％Ｃｏになるよう秤量し
た後、■型混合器で均一な混合粉体になるよう混合し、
実施例２と同条件でホットプレス予備成形および熱間静
水圧プレス焼結した。得られた焼結体の密度は、１００
％を示し、板厚は４±０．１ｎｍであった。Example 4 Pure Tb powder classified into 32 meshes and 88% Tb-12%
Fe (wt%) alloy powder, pure Fe, pure CO powder, 52.
After weighing to make 5%Tb-44%Fe-3,5%Co, mix it with a type mixer to make a uniform mixed powder.
Hot press preforming and hot isostatic press sintering were carried out under the same conditions as in Example 2. The density of the obtained sintered body is 100
%, and the plate thickness was 4±0.1 nm.
以上述べたように、希土類元素−遷移金属元素合金粉末
、希土類元素−遷移金属元素合金粉末と遷移金属元素粉
末の混合粉、希土類元素粉末と遷移金属元素粉末との混
合粉または希土類元素粉末と希土類元素−遷移金属元素
合金粉末との混合粉を熱間あるいは冷間で予備成形し、
前記予備成形体を熱間静水圧プレスにより固相温度範囲
内で加圧成形することで、相対密度９ｇ％以上の光磁気
記録用高密度ターゲット材の製造が可能となり、これは
、工業上大きな効果を有するものである。As mentioned above, rare earth element-transition metal element alloy powder, mixed powder of rare earth element-transition metal element alloy powder and transition metal element powder, mixed powder of rare earth element powder and transition metal element powder, or rare earth element powder and rare earth element powder The mixed powder of element-transition metal element alloy powder is preformed hot or cold,
By press-forming the preform within the solidus temperature range using hot isostatic pressing, it is possible to manufacture a high-density target material for magneto-optical recording with a relative density of 9 g% or more, which is an industrially significant achievement. It is effective.
第１図は、本発明に係わる熱間静水圧プレス用缶体の一
実施例を示す断面図、第２図は本発明による他の実施例
を示す断面図である。第３図は本発明ターゲットの薄膜
評価結果である。
１：軟鋼製缶体、２：メツシュ、３：脱気パイプ、４：
予備成形体、５：アルミナ粉、７：スペ第１図
７ ２Ｎ−ブーｌひ・
屑１１ｊ防ｄ（Ｎｂ） 第２図
、３，２FIG. 1 is a sectional view showing one embodiment of a can for hot isostatic pressing according to the present invention, and FIG. 2 is a sectional view showing another embodiment of the present invention. FIG. 3 shows the thin film evaluation results of the target of the present invention. 1: Mild steel can body, 2: Mesh, 3: Deaeration pipe, 4:
Preformed body, 5: Alumina powder, 7: Spray Fig. 1 7 2N-Bullet Scrap 11j Prevention d (Nb) Fig. 2, 3, 2
Claims (1)
遷移金属元素合金粉末と遷移金属元素粉末の混合粉、希
土類元素粉末と遷移金属元素粉末との混合粉または希土
類元素粉末と希土類元素−遷移金属元素合金粉末との混
合粉を熱間あるいは冷間で予備成形し、密度比を７０％
以上とした後該予備成形体をカプセルに真空封入し、熱
間静水圧プレスにより固相温度範囲内で加圧成形するこ
とを特徴とする希土類元素−遷移金属元素ターゲット材
の製造方法。 ２ 原料粉末は、希土類元素−遷移金属元素合金粉末で
あり、予備成形はホットプレスによるものであることを
特徴とする特許請求の範囲第１項記載の希土類元素−遷
移金属元素ターゲット材の製造方法。 ３ 原料粉末は、希土類元素粉末と遷移金属元素粉末で
あり、これらを混合後３５０ｋｇｆ／ｃｍ＾２以上の圧
力で常温予備成形するものであることを特徴とする特許
請求の範囲第１項記載の希土類元素−遷移金属元素ター
ゲット材の製造方法。[Claims] 1. Rare earth elements - transition metal element alloy powder, rare earth elements -
A mixed powder of a transition metal element alloy powder and a transition metal element powder, a mixed powder of a rare earth element powder and a transition metal element powder, or a mixed powder of a rare earth element powder and a rare earth element-transition metal element alloy powder is heated or cold. Preform and density ratio is 70%
A method for producing a rare earth element-transition metal element target material, which comprises vacuum-sealing the preform into a capsule after the above steps, and press-forming the preform within a solidus temperature range by hot isostatic pressing. 2. The method for producing a rare earth element-transition metal element target material according to claim 1, wherein the raw material powder is a rare earth element-transition metal element alloy powder, and the preforming is performed by hot pressing. . 3. The raw material powder is a rare earth element powder and a transition metal element powder, which are mixed and then preformed at room temperature under a pressure of 350 kgf/cm^2 or more. A method for producing a rare earth element-transition metal element target material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12458487A JPS63290272A (en) | 1987-05-21 | 1987-05-21 | Production of rare earth element-transition metal target material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12458487A JPS63290272A (en) | 1987-05-21 | 1987-05-21 | Production of rare earth element-transition metal target material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63290272A true JPS63290272A (en) | 1988-11-28 |
Family
ID=14889083
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12458487A Pending JPS63290272A (en) | 1987-05-21 | 1987-05-21 | Production of rare earth element-transition metal target material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63290272A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01215972A (en) * | 1988-02-25 | 1989-08-29 | Tokin Corp | Production of target for magneto-optical medium |
| JPH02107762A (en) * | 1988-10-15 | 1990-04-19 | Sumitomo Metal Mining Co Ltd | Alloy target for magneto-optical recording |
| JPH0422906A (en) * | 1990-05-18 | 1992-01-27 | Hitachi Cable Ltd | Production of rare earth element-added waveguide |
| EP1067208A1 (en) * | 1999-07-08 | 2001-01-10 | Praxair S.T. Technology, Inc. | Method of making sputtering targets |
-
1987
- 1987-05-21 JP JP12458487A patent/JPS63290272A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01215972A (en) * | 1988-02-25 | 1989-08-29 | Tokin Corp | Production of target for magneto-optical medium |
| JPH02107762A (en) * | 1988-10-15 | 1990-04-19 | Sumitomo Metal Mining Co Ltd | Alloy target for magneto-optical recording |
| JPH0422906A (en) * | 1990-05-18 | 1992-01-27 | Hitachi Cable Ltd | Production of rare earth element-added waveguide |
| EP1067208A1 (en) * | 1999-07-08 | 2001-01-10 | Praxair S.T. Technology, Inc. | Method of making sputtering targets |
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