JPS63283192A - Multilayer interconnection board - Google Patents

Multilayer interconnection board

Info

Publication number
JPS63283192A
JPS63283192A JP11824687A JP11824687A JPS63283192A JP S63283192 A JPS63283192 A JP S63283192A JP 11824687 A JP11824687 A JP 11824687A JP 11824687 A JP11824687 A JP 11824687A JP S63283192 A JPS63283192 A JP S63283192A
Authority
JP
Japan
Prior art keywords
glass
multilayer wiring
wiring board
conductor
thick film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11824687A
Other languages
Japanese (ja)
Inventor
Nobuyuki Sugishita
杉下 信行
Yoshinobu Watanabe
渡辺 嘉伸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TANAKA MASSEY KK
Original Assignee
TANAKA MASSEY KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TANAKA MASSEY KK filed Critical TANAKA MASSEY KK
Priority to JP11824687A priority Critical patent/JPS63283192A/en
Publication of JPS63283192A publication Critical patent/JPS63283192A/en
Pending legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Inorganic Insulating Materials (AREA)

Abstract

PURPOSE:To remarkably improve solder wettability of a conductor by adding specific additive to glass ceramics to form an insulating layer. CONSTITUTION:Glass ceramics in which small quantity of composite oxide of crystal structure of copper chromite CuCr2O4 is mixed with amorphous glass containing as filler crystallized glass or crystalline substance are used as an insulating layer to form a multilayer interconnection substrate of the layer and a thick film conductor. The solder wettability of the conductor of the multilayer interconnection substrate is remarkably improved, thereby easily forming the multilayer interconnection substrate for the purpose of reducing the size and increasing the density of an electronic circuit.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は多層配線板に関するもので、さらに詳細には電
子回路用厚膜多層配線板及びガラスセラミック多層配線
板に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a multilayer wiring board, and more particularly to a thick film multilayer wiring board for electronic circuits and a glass ceramic multilayer wiring board.

(発明の背景) 近年電子回路の小型化、高密度化の要求が高まり、厚膜
回路の多層化に加え、ガラスセラミックグリーンシート
を用いた多層配線板の開発が進められている。
(Background of the Invention) In recent years, demands for miniaturization and higher density of electronic circuits have increased, and in addition to multilayer thick film circuits, development of multilayer wiring boards using glass ceramic green sheets is progressing.

厚膜多層配線板はアルミナ等のセラミック基板上に、A
u、Ag/Pd等の厚膜導体ペーストを印刷、焼成して
形成した配線の上に結晶化ガラスまたは耐熱性酸化物等
をフィラーとした非晶質ガラスよりなる絶縁ペーストを
印刷、焼成してガラスセラミック層を形成し、さらにそ
の上に導体を形成することを繰り返して製造される。
A thick film multilayer wiring board is made of A on a ceramic substrate such as alumina.
On the wiring formed by printing and firing a thick film conductor paste such as u, Ag/Pd, etc., an insulating paste made of amorphous glass with filler such as crystallized glass or heat-resistant oxide is printed and fired. It is manufactured by repeatedly forming a glass ceramic layer and then forming a conductor thereon.

一方、ガラスセラミック多層配線板は、厚膜多層の絶縁
層と同様の材料を用いてドクターブレード法等によって
グリーンシートを製造し、このシート上に厚膜導体ペー
ストを印刷してそれを積み重ねて、−回で焼成して製造
される。焼成温度は両者とも800〜1000℃である
On the other hand, glass ceramic multilayer wiring boards are manufactured by manufacturing green sheets using the same material as the insulating layer of thick film multilayers using the doctor blade method, etc., printing thick film conductor paste on these sheets, and stacking them. - Manufactured by firing twice. The firing temperature for both is 800 to 1000°C.

これらの多層配線板はいずれも、表面の配線導体に半導
体、コンデンサ等の電子部品をはんだ付けにより搭載し
、ハイブリッドICまたはモジュールとして使用される
。したがって、表面導体ははんだ濡れ性が良好でなけれ
ばならない。
All of these multilayer wiring boards have electronic components such as semiconductors and capacitors mounted on the wiring conductors on the surface by soldering, and are used as hybrid ICs or modules. Therefore, the surface conductor must have good solder wettability.

しかし、従来のガラスセラミック材料と厚膜導体材料の
組み合わせでは、多(の場合導体表面にガラス膜が生じ
て、はんだ濡れ性を著しく阻害し、ごく限られた組成の
材料のみが使用できるに過ぎず、この分野の発展が遅れ
ている。
However, with the combination of conventional glass-ceramic materials and thick-film conductor materials, a glass film forms on the conductor surface, which significantly inhibits solder wettability, and only materials with a limited composition can be used. However, development in this field is slow.

(発明の目的) 本発明は上記した問題点を解決し、多(のガラスセラミ
ックと厚膜導体の組み合わせで良好なはんだ濡れ性が得
られる多層配線板を提供するものである。
(Object of the Invention) The present invention solves the above-mentioned problems and provides a multilayer wiring board in which good solder wettability can be obtained by combining a multilayer glass ceramic and a thick film conductor.

(発明の概要) 前記の目的を達成するため、従来の厚膜多層用ガラスペ
ースト及び新規に作成したガラスに、種々の添加剤を加
え、Ag/Pd系導体を用いた場合のはんだ濡れ性を調
べた。その結果、Cr2o3とCuO,Mn01Cr2
03よりなる銅クロマイト(CuCr20.)結晶構造
を有する添加物は、少量でも導体のはんだ濡れ性を著し
く改善することを見い出したが、Cr2o3はガラスセ
ラミ・7りの絶縁性を低下させるため使用できない。こ
のような添加物がはんだ濡れ性をよくする理由はわがら
ないが、導体表面にガラス膜が生成しなくなることは明
らかである。
(Summary of the invention) In order to achieve the above object, various additives were added to the conventional thick film multilayer glass paste and newly created glass to improve the solder wettability when using Ag/Pd based conductors. Examined. As a result, Cr2o3 and CuO, Mn01Cr2
It has been found that an additive having a copper chromite (CuCr20.) crystal structure consisting of 03 can significantly improve the solder wettability of conductors even in small amounts, but Cr2o3 cannot be used because it lowers the insulation properties of glass ceramics. . Although we do not understand why such additives improve solder wettability, it is clear that a glass film is no longer formed on the conductor surface.

本発明のガラスセラミックは結晶化ガラス(フィラー入
り結晶化ガラスも含む)及び非晶質ガラスにA l z
 O!、Zr0=、Sin、等のフィラーを混合したも
ののいずれでもよく、ガラスの熱膨張係数、軟化温度等
の特性に特に制限はない。また、厚膜導体は一般にはん
だ付は可能なものであれば種類を問わない。
The glass-ceramic of the present invention can be applied to crystallized glass (including filler-containing crystallized glass) and amorphous glass.
O! , Zr0=, Sin, etc., and there are no particular limitations on the properties such as the thermal expansion coefficient and softening temperature of the glass. In addition, any type of thick film conductor is generally applicable as long as it can be soldered.

さらに、上記の実験において非晶質ガラスに加えるフィ
ラーとしてCaZrO3を用いると、添加物の効果が特
に顕著であることがわかった。
Furthermore, in the above experiment, it was found that when CaZrO3 was used as a filler added to the amorphous glass, the effect of the additive was particularly remarkable.

Ca Z r O3はガラスと混合して焼成するとCa
。、+sZ r o、aso+、msの結晶構造を持っ
たいわゆる安定化ジルコニアに変化する。この変化はガ
ラスの粘度に関係し、ガラスの軟化温度(粘度が107
・6poise)以上で始まり、例えば軟化温度500
℃のガラスでは、650℃以上から変化しはじめ、軟化
温度780℃のガラスでは、800℃以上で変化する。
When Ca Z r O3 is mixed with glass and fired, Ca
. , +sZ r o, aso+, ms. This change is related to the viscosity of the glass, and the softening temperature of the glass (viscosity is 107
・Starts at a softening temperature of 6 poise) or higher, for example, a softening temperature of 500
For glass with a softening temperature of 780°C, it begins to change at 650°C or higher, and for glass with a softening temperature of 780°C, it begins to change at 800°C or higher.

結晶性のガラスでは、添加物の混合量は5%以下で十分
である。一方非晶質ガラスにフィラーを入れるタイプで
は、例えばAffizCh及びCaOを7%含む安定化
ジルコニアをそれぞれ20%ずつ混合したものでは、複
酸化物を5%以上添加しないと導体にはんだが濡れない
が、安定化ジルコニアの代わりにCaZr0:+を混合
した場合には、0.5%の添加でもはんだの濡れは良好
であった。このような理由から、非晶質のガラスのフィ
ラーはCaZr0tまたは数種類のフィラーを用いる場
合にはそのうちの一種類をCa Z r O3とするの
が好ましい。また、複酸化物の添加量は、結晶化ガラス
及びCaZr0.をフィラーとする非晶質ガラスでは0
.5%以上で効果がある。しかし、添加量が多くなるに
つれて絶縁層の誘電損失が大きくなるので、10%以上
添加することは避けなければならない。
For crystalline glass, it is sufficient to mix the additive in an amount of 5% or less. On the other hand, in a type of amorphous glass in which a filler is added, for example, if AffizCh and stabilized zirconia containing 7% CaO are mixed at 20% each, the solder will not wet the conductor unless 5% or more of double oxide is added. When CaZr0:+ was mixed instead of stabilized zirconia, the solder wetting was good even with the addition of 0.5%. For these reasons, it is preferable that the amorphous glass filler is CaZr0t, or if several types of fillers are used, one of them is CaZrO3. Further, the amount of the double oxide added is as follows: crystallized glass and CaZr0. 0 for amorphous glass with filler
.. It is effective at 5% or more. However, as the amount added increases, the dielectric loss of the insulating layer increases, so adding more than 10% must be avoided.

(実施例) 以下、実施例につき詳細に説明する。(Example) Examples will be described in detail below.

実施例1 Ca OZ n OT i Oz  A lz O3S
 i OzB 203よりなり、焼成するとCa A 
1 zS 1208(アノーサイト)の結晶を析出する
クロスオーバー用ガラスペーストに銅クロマイト形結晶
構造を持ち、CuO,Mn01Cr203よりなる複酸
化物(大日精化工業G1のダイピロキサイド ブランク
9510)  の0.5.2.5.8.10%をそれぞ
れ加えて、3本ロールミルで混練した。これらのペース
トを96%アルミナ基板上に20mm X 2(hll
のパターンでスクリーン印刷を2回行い、その上にAg
80%、Pd20%の導体ペーストを印刷して850℃
で同時焼成を行った。導体パターンは、はんだ濡れ性評
価用の5 ** X 5 msと接着強度測定用の21
1X 2**である。別に、上記導体ペーストを用いて
アルミナ基板上に下部電極を印刷、焼成して形成し、上
記ガラスペーストを印刷、焼成し、さらにもう−回印刷
してその上に導体ペーストを印刷して同時焼成してコン
デンサを作成し、絶縁層の特性を測定した。
Example 1 Ca OZ n OT i Oz A lz O3S
i Consists of 203 OzB, and when fired, CaA
1 zS 1208 (anorthite) crystals are precipitated in the crossover glass paste, which has a copper chromite type crystal structure and is composed of CuO, Mn01Cr203. 5, 2, 5, 8, and 10%, respectively, were added and kneaded using a three-roll mill. These pastes were placed on a 96% alumina substrate in a 20 mm x 2 (hl
Screen print twice with the pattern, and then add Ag on top.
80% Pd and 20% Pd conductor paste printed at 850℃
Simultaneous firing was performed. The conductor pattern is 5** x 5 ms for solder wettability evaluation and 21 x 5 ms for adhesive strength measurement.
1X 2**. Separately, a lower electrode is printed and fired on an alumina substrate using the above conductive paste, the above glass paste is printed and fired, another printing is performed, and a conductive paste is printed on top of that and simultaneously fired. A capacitor was created using the same method, and the characteristics of the insulating layer were measured.

焼成温度は850℃である。結果を1表に示す。The firing temperature is 850°C. The results are shown in Table 1.

(以下余白) 第1表 添加物を混入しない比較例と比べてわかるとおり、添加
?I O,5〜10%の全てはんだ濡れ性が改善されて
いる。導体の接着強度は十分に大きく、その他の特性は
誘電損失(tanδ)が添加量の増加とともにやや大き
くなる以外は比較例と差がなく、絶縁層上の導体に電子
部品を接続することが可能である。
(Left below) Table 1: As you can see from the comparison with the comparative example where no additives are mixed, are the additives added? IO, 5-10% all have improved solder wettability. The adhesive strength of the conductor is sufficiently high, and other properties are the same as the comparative example except that the dielectric loss (tan δ) increases slightly as the amount of addition increases, making it possible to connect electronic components to the conductor on the insulating layer. It is.

実施例2 熱膨張がアルミナセラミックに近い厚膜多層用ガラスと
して、重量比でSiO□55.6%、82034.8%
、C:a07.5%、MgO2,5%、PbO17%。
Example 2 SiO□55.6% and 82034.8% by weight as thick film multilayer glass with thermal expansion close to that of alumina ceramic
, C: a07.5%, MgO2,5%, PbO17%.

A12031・8 、5%+ NazO2,5%、に2
01.5%の組成のガラスを作成した。ガラスの軟化温
度は780℃、熱膨張係数は72x 10−’/’c 
(25〜300℃)であった。
A12031.8, 5% + NazO2, 5%, 2
A glass having a composition of 0.01.5% was prepared. The softening temperature of glass is 780℃, and the coefficient of thermal expansion is 72x 10-'/'c.
(25-300°C).

このガラスにフィラーとしてAl□Q 3.  Z r
 OlCa0o、+5Zro、ssO+、ss (Ca
Oを7%含む安定化ジルコニア)及びCaZr0zの1
種または2種以上を重量で40〜50%と、実施例1と
同一の添加物を種々の割合で混合し、エチルセルロース
をα−ターピネオールに溶解して作った媒体に分散させ
、3本ロールミルで混練してガラスペーストを作成した
。これらを用い、実施例1と同様にして導体のはんだ濡
れ性、接着強度、絶縁層の特性を調べた結果を第2表に
示す。
Add Al□Q to this glass as a filler 3. Z r
OlCa0o, +5Zro, ssO+, ss (Ca
Stabilized zirconia containing 7% O) and 1 of CaZr0z
40-50% by weight of the seed or two or more and the same additives as in Example 1 were mixed in various proportions, dispersed in a medium prepared by dissolving ethylcellulose in α-terpineol, and milled in a three-roll mill. A glass paste was prepared by kneading. Using these, the solder wettability of the conductor, adhesive strength, and characteristics of the insulating layer were investigated in the same manner as in Example 1. The results are shown in Table 2.

(以下余白) 添力■物がない場合(隘1. 5. 7.10.14.
 )には導体表面にガラスが多量に浮き出し、全くはん
だに濡れない、フィラーとしてCaZrO3を混合しな
い場合には、添加物を2%を加えてもはんだ濡れ性が十
分ではないが、CaZr01が存在すると、添加物を0
.5%加えても効果が現れ、1%の添加で完全に濡れる
ことがわかる。
(Left below) Addition ■ If there is no item (1. 5. 7. 10. 14.
), a large amount of glass stands out on the conductor surface and it does not wet with solder at all.If CaZrO3 is not mixed as a filler, even if 2% of the additive is added, the solder wettability is not sufficient, but if CaZrO1 is present, , 0 additives
.. It can be seen that the effect appears even when 5% is added, and complete wetting is achieved when 1% is added.

CaZr01をフィラーにした場合、焼成後はCa g
、+sZ r o、mso+、msに変化するがX線回
折で調べた結果、添加物を加えない場合には850℃焼
成でこの変化率は約60%であったが、1%の添加では
90%以上が変化した。初めからCab、、5Zr。、
sso+、msを加えた場合(患8.9)も2%以上の
添加が必要であることから、CaZrO3が焼成中に変
化することが、添加物との相乗効果となっていると思わ
れる。Ca Z r O3のみをフィラーにした場合(
N114.15)には導体端部に剥離が生ずるため、他
のフィラー(例えばA 12 z Os)を−IIに加
える必要がある。
When CaZr01 is used as a filler, Ca g
, +sZ r o, mso+, ms, but as a result of investigating by X-ray diffraction, when no additive was added, this rate of change was approximately 60% when fired at 850°C, but when 1% was added, the rate of change was approximately 90%. % or more changed. Cab from the beginning, 5Zr. ,
Since addition of 2% or more is also required when sso+ and ms are added (case 8.9), it seems that the change in CaZrO3 during firing has a synergistic effect with the additive. When only Ca Z r O3 is used as filler (
N114.15) causes peeling at the conductor ends, so it is necessary to add other fillers (eg A 12 z Os) to -II.

はんだに濡れた導体の接着強度は、フィラーの種類及び
添加物の量に関係なくほぼ一定で、実用可能な値を示し
ている。
The adhesive strength of the conductor wet with solder is almost constant regardless of the type of filler and the amount of additive, and shows a value that can be used for practical purposes.

絶縁層の特性は、誘電損失が添加物の増大と共に大きく
なっており、10%の添加ではtanδが1%をこえる
。また、絶縁抵抗も添加物が多くなると低下する傾向が
見られる。したがって、このガラスでは、添加物は10
%以下にすることが望ましい。
As for the characteristics of the insulating layer, the dielectric loss increases as the amount of the additive increases, and when the amount of the additive is 10%, the tan δ exceeds 1%. Furthermore, the insulation resistance tends to decrease as the amount of additive increases. Therefore, in this glass, the additive is 10
% or less.

実施例3 CaO−AI!zOz−31oz−B 1zo3系で、
熱膨張係数が55xlO−’/℃のガラスセラミック多
層配線用ガラスに、40%のAl2O2をフィラーとし
て加え、実施例2と同様にしてガラZペーストを作成し
、実施例1と同様にして導体のはんだ濡れ性を調べたと
ころ、はとんど濡れなかった。フィラーとしてA l 
t 0320%とCaZr0s20%を用い、実施例1
と同じ添加物を1%加えてペーストにしたものでは、導
体は完全にはんだに濡れた。
Example 3 CaO-AI! zOz-31oz-B 1zo3 series,
40% Al2O2 was added as a filler to glass-ceramic multilayer wiring glass with a thermal expansion coefficient of 55xlO-'/°C to prepare a glass Z paste in the same manner as in Example 2. When I checked the solder wettability, it did not get wet at all. Al as a filler
Example 1 using t0320% and CaZr0s20%
When the paste was made by adding 1% of the same additive as above, the conductor was completely wetted by the solder.

なお、このガラスはAltO3を加えて焼成するとCa
AJ!is 1sOs (アノーサイト)ノ結晶を析出
するタイプである。
Note that when this glass is fired with AltO3 added, Ca
AJ! It is a type that precipitates is 1sOs (anorthite) crystals.

この例でも添加物を加えることによる絶縁層の特性変化
はなかった。本実施例と同様にしてガラスセラミックグ
リーンシートを形成することは容易であり、電子部品の
はんだ接続が可能な表面導体を有するガラスセラミック
多層配線板を容易に製造できる。
In this example as well, there was no change in the properties of the insulating layer due to the addition of additives. It is easy to form a glass ceramic green sheet in the same manner as in this example, and a glass ceramic multilayer wiring board having a surface conductor to which electronic components can be connected by soldering can be easily manufactured.

(発明の効果) 以上詳細に説明したように、本発明は結晶化ガラスまた
はフィラー人りガラスに少量の添加物を加えることによ
り、これらのガラスを絶縁層とした多層配線板の導体の
はんだ濡れ性を著しく向上させること壷ができるため、
電子回路の小型、高密度化を目的とした多層配線板を容
易に製造し得る効果は極めて大きい。
(Effects of the Invention) As explained in detail above, the present invention adds a small amount of additives to crystallized glass or filler glass to improve the solder wetting of conductors in multilayer wiring boards using these glasses as insulating layers. Because it can significantly improve sex,
The effect of easily manufacturing a multilayer wiring board for the purpose of downsizing and increasing the density of electronic circuits is extremely large.

Claims (5)

【特許請求の範囲】[Claims] (1)結晶化ガラスまたは結晶性物質をフィラーとして
含む非晶質ガラスに、銅クロマイト(CuCr_2O_
4)の結晶構造を有する複酸化物を混合したガラスセラ
ミックよりなる絶縁層と厚膜導体とで構成されることを
特徴とする多層配線板。
(1) Copper chromite (CuCr_2O_
4) A multilayer wiring board comprising an insulating layer made of glass ceramic mixed with a double oxide having the crystal structure of item 4) and a thick film conductor.
(2)セラミック基板上に厚膜導体ペーストと絶縁ペー
ストを交互に印刷、焼成して形成する厚膜多層配線板に
おいて、絶縁層が特許請求の範囲第1項記載のガラスセ
ラミックである多層配線板。
(2) A thick film multilayer wiring board formed by alternately printing and firing a thick film conductor paste and an insulating paste on a ceramic substrate, wherein the insulating layer is a glass ceramic according to claim 1. .
(3)ガラスセラミックグリーンシートに厚膜導体を印
刷し、これを複数枚積層したのち焼成して形成するセラ
ミック多層配線板において、グリーンシートが特許請求
の範囲第1項及び第2項記載のガラスセラミックからな
る多層配線板。
(3) A ceramic multilayer wiring board formed by printing a thick film conductor on a glass ceramic green sheet, laminating a plurality of sheets, and then firing the green sheet, wherein the green sheet is the glass according to claims 1 and 2. A multilayer wiring board made of ceramic.
(4)複酸化物はCuO、MnO及びCr_2O_3か
らなる銅クロマイト(CuCr_2O_4)の結晶構造
を有し、ガラスセラミック中の含有量が重量比で0.5
〜10%である特許請求の範囲第1項〜第3項記載の多
層配線板。
(4) The double oxide has a crystal structure of copper chromite (CuCr_2O_4) consisting of CuO, MnO and Cr_2O_3, and the content in the glass ceramic is 0.5 by weight.
The multilayer wiring board according to claims 1 to 3, wherein the content is 10%.
(5)非晶質ガラスのフィラーのうち1種類はCaZr
O_3であって、焼成によりCa_0_._1_5Zr
_0_._8_5O_1_._■_5の結晶構造を有す
る安定化ジルコニアになることを特徴とする特許請求の
範囲第1項〜第4項記載の多層配線板。
(5) One type of filler in amorphous glass is CaZr
O_3, and Ca_0_. _1_5Zr
_0_. _8_5O_1_. 5. The multilayer wiring board according to claim 1, wherein the multilayer wiring board is made of stabilized zirconia having a crystal structure of _■_5.
JP11824687A 1987-05-15 1987-05-15 Multilayer interconnection board Pending JPS63283192A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11824687A JPS63283192A (en) 1987-05-15 1987-05-15 Multilayer interconnection board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11824687A JPS63283192A (en) 1987-05-15 1987-05-15 Multilayer interconnection board

Publications (1)

Publication Number Publication Date
JPS63283192A true JPS63283192A (en) 1988-11-21

Family

ID=14731855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11824687A Pending JPS63283192A (en) 1987-05-15 1987-05-15 Multilayer interconnection board

Country Status (1)

Country Link
JP (1) JPS63283192A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61274399A (en) * 1985-05-29 1986-12-04 株式会社ノリタケカンパニーリミテド Low temperature baked multilayer ceramic substrate

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61274399A (en) * 1985-05-29 1986-12-04 株式会社ノリタケカンパニーリミテド Low temperature baked multilayer ceramic substrate

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