JPS6328243U - - Google Patents
Info
- Publication number
- JPS6328243U JPS6328243U JP12237786U JP12237786U JPS6328243U JP S6328243 U JPS6328243 U JP S6328243U JP 12237786 U JP12237786 U JP 12237786U JP 12237786 U JP12237786 U JP 12237786U JP S6328243 U JPS6328243 U JP S6328243U
- Authority
- JP
- Japan
- Prior art keywords
- arc chamber
- electric field
- ion source
- extraction electrode
- electrode system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005684 electric field Effects 0.000 claims description 3
- 238000000605 extraction Methods 0.000 claims description 3
- 150000002500 ions Chemical class 0.000 claims 3
- 230000007935 neutral effect Effects 0.000 claims 2
- 238000010884 ion-beam technique Methods 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図はこの考案の一実施例を示す要部拡大図
である。第２図は従来のイオン源を用いた薄膜製
造装置を示す概略構成図、第３図は第２図の要部
拡大図である。
１：イオン源、２：アークチヤンバ、６：引き
出し電極系、６１：正電極、６２：負電極、２１
：フランジ、３０，３１：電界緩和リング。
FIG. 1 is an enlarged view of essential parts showing an embodiment of this invention. FIG. 2 is a schematic configuration diagram showing a thin film manufacturing apparatus using a conventional ion source, and FIG. 3 is an enlarged view of the main part of FIG. 2. 1: Ion source, 2: Arc chamber, 6: Extraction electrode system, 61: Positive electrode, 62: Negative electrode, 21
: flange, 30, 31: electric field relaxation ring.
Claims (1)
電離してプラズマを発生させ、このプラズマより
イオンをイオンビームとして引き出す引き出し電
極系からなるイオン源において、前記アークチヤ
ンバのフランジの内周端部と、これに対向する前
記引き出し電極系の正電極に、それぞれ電界緩和
リングを附設するとともに、これら電界緩和リン
グ間の寸法を前記アークチヤンバ内の真空中にお
ける前記中性ガスの分子の平均自由行程の１／８
以下に設定してなることを特徴とするイオン源。 In an ion source consisting of an extraction electrode system that generates plasma by ionizing neutral gas by electron collision within an arc chamber and extracting ions from this plasma as an ion beam, the inner circumferential end of the flange of the arc chamber and the An electric field relaxation ring is attached to each of the positive electrodes of the extraction electrode system, and the dimension between these electric field relaxation rings is set to 1/8 of the mean free path of the molecules of the neutral gas in the vacuum in the arc chamber.
An ion source characterized by the following settings.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12237786U JPS6328243U (en) | 1986-08-08 | 1986-08-08 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12237786U JPS6328243U (en) | 1986-08-08 | 1986-08-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6328243U true JPS6328243U (en) | 1988-02-24 |
Family
ID=31012507
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12237786U Pending JPS6328243U (en) | 1986-08-08 | 1986-08-08 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6328243U (en) |
-
1986
- 1986-08-08 JP JP12237786U patent/JPS6328243U/ja active Pending
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