JPH0394753U - - Google Patents
Info
- Publication number
- JPH0394753U JPH0394753U JP213290U JP213290U JPH0394753U JP H0394753 U JPH0394753 U JP H0394753U JP 213290 U JP213290 U JP 213290U JP 213290 U JP213290 U JP 213290U JP H0394753 U JPH0394753 U JP H0394753U
- Authority
- JP
- Japan
- Prior art keywords
- arc chamber
- anode
- magnetic field
- cover plate
- cusp magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000605 extraction Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図は本考案の実施例に係るイオン源の中央
縦断面図。第２図は第１図中の−断面図。
１……アークチヤンバ、２……永久磁石、３…
…プラズマ電極、４……内張り、５……カソード
フイラメント、６……アノードフイラメント、７
……カソードフイラメント電源、８……アノード
フイラメント電源、９……アーク電源、１０……
円筒部、１１……蓋板、１２，１３……フランジ
、２１，２２……導入端子、２３……ガス導入口
。
FIG. 1 is a central vertical cross-sectional view of an ion source according to an embodiment of the present invention. FIG. 2 is a sectional view taken in FIG. 1. 1...Arc chamber, 2...Permanent magnet, 3...
...Plasma electrode, 4... Lining, 5... Cathode filament, 6... Anode filament, 7
...Cathode filament power supply, 8...Anode filament power supply, 9...Arc power supply, 10...
Cylindrical portion, 11...cover plate, 12, 13...flange, 21, 22...introduction terminal, 23...gas inlet.
Claims (1)
でき、アノードとなるアークチヤンバと、アーク
チヤンバの蓋板の反対側に設けられイオンを引き
出すためのプラズマ電極と、アークチヤンバの外
周に極性が交互に異なるように設けられアークチ
ヤンバ内部にカスプ磁場を生ずる複数の磁石と、
蓋板からアークチヤンバの内部に挿入されたカソ
ードフイラメントと、アークチヤンバと同じ電位
であつてアークチヤンバ内を加熱するための蓋板
からアークチヤンバ内部のカスプ磁場の存在する
部分へ挿入されたアノードフイラメントより構成
される事を特徴とするイオン源。 A container consisting of a cylindrical part and a lid plate can be evacuated, and has an arc chamber that serves as an anode, a plasma electrode provided on the opposite side of the lid plate of the arc chamber to extract ions, and an arc chamber with alternating polarity around the outer periphery of the arc chamber. a plurality of magnets arranged differently to generate a cusp magnetic field inside the arc chamber;
It consists of a cathode filament inserted into the arc chamber from the cover plate, and an anode filament inserted from the cover plate into the part of the arc chamber where the cusp magnetic field exists, which has the same potential as the arc chamber and heats the inside of the arc chamber. An ion source characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP213290U JPH0720838Y2 (en) | 1990-01-11 | 1990-01-11 | Ion source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP213290U JPH0720838Y2 (en) | 1990-01-11 | 1990-01-11 | Ion source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0394753U true JPH0394753U (en) | 1991-09-26 |
| JPH0720838Y2 JPH0720838Y2 (en) | 1995-05-15 |
Family
ID=31506012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP213290U Expired - Lifetime JPH0720838Y2 (en) | 1990-01-11 | 1990-01-11 | Ion source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0720838Y2 (en) |
-
1990
- 1990-01-11 JP JP213290U patent/JPH0720838Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0720838Y2 (en) | 1995-05-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |