JPS6327536A - シ−ト物の低温プラズマ処理装置 - Google Patents
シ−ト物の低温プラズマ処理装置Info
- Publication number
- JPS6327536A JPS6327536A JP16943286A JP16943286A JPS6327536A JP S6327536 A JPS6327536 A JP S6327536A JP 16943286 A JP16943286 A JP 16943286A JP 16943286 A JP16943286 A JP 16943286A JP S6327536 A JPS6327536 A JP S6327536A
- Authority
- JP
- Japan
- Prior art keywords
- reactor
- low
- sheet
- vacuum
- temperature plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009832 plasma treatment Methods 0.000 title abstract 2
- 239000000463 material Substances 0.000 claims description 31
- 238000003780 insertion Methods 0.000 claims description 8
- 230000037431 insertion Effects 0.000 claims description 8
- 238000007789 sealing Methods 0.000 claims description 6
- 238000002347 injection Methods 0.000 claims description 3
- 239000007924 injection Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 49
- 239000006227 byproduct Substances 0.000 description 5
- 239000004744 fabric Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000009931 harmful effect Effects 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 241001648319 Toronia toru Species 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- -1 polyethylene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
- B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
- H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Treatment Of Fiber Materials (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Processing And Handling Of Plastics And Other Materials For Molding In General (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16943286A JPS6327536A (ja) | 1986-07-18 | 1986-07-18 | シ−ト物の低温プラズマ処理装置 |
| US07/071,889 US4829189A (en) | 1986-07-18 | 1987-07-10 | Apparatus for low-temperature plasma treatment of sheet material |
| DE19873723865 DE3723865A1 (de) | 1986-07-18 | 1987-07-18 | Reaktor fuer eine plasmabehandlung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16943286A JPS6327536A (ja) | 1986-07-18 | 1986-07-18 | シ−ト物の低温プラズマ処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6327536A true JPS6327536A (ja) | 1988-02-05 |
| JPH0545616B2 JPH0545616B2 (cg-RX-API-DMAC7.html) | 1993-07-09 |
Family
ID=15886486
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16943286A Granted JPS6327536A (ja) | 1986-07-18 | 1986-07-18 | シ−ト物の低温プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6327536A (cg-RX-API-DMAC7.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5597456A (en) * | 1993-06-07 | 1997-01-28 | Hiroshi Kashiwagi | Method for producing medical materials |
| CN106142532A (zh) * | 2016-08-31 | 2016-11-23 | 南京苏曼等离子科技有限公司 | 一种大气常压低温等离子体农膜处理设备及其操作方法 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0650013U (ja) * | 1992-12-15 | 1994-07-08 | 旭光学工業株式会社 | レンズ支持構造 |
| EP3605178B1 (en) | 2017-03-24 | 2025-11-19 | Ningbo Sunny Opotech Co., Ltd. | Separated lens and camera module |
-
1986
- 1986-07-18 JP JP16943286A patent/JPS6327536A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5597456A (en) * | 1993-06-07 | 1997-01-28 | Hiroshi Kashiwagi | Method for producing medical materials |
| CN106142532A (zh) * | 2016-08-31 | 2016-11-23 | 南京苏曼等离子科技有限公司 | 一种大气常压低温等离子体农膜处理设备及其操作方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0545616B2 (cg-RX-API-DMAC7.html) | 1993-07-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4268195B2 (ja) | プラズマｃｖｄ装置 | |
| US5411591A (en) | Apparatus for the simultaneous microwave deposition of thin films in multiple discrete zones | |
| JPS62274080A (ja) | プラズマ処理方法 | |
| US6855379B2 (en) | Method and device for surface-treating substrates | |
| JPS6327536A (ja) | シ−ト物の低温プラズマ処理装置 | |
| TW521345B (en) | Plasma film-forming apparatus and cleaning method for the same | |
| JPS6411055B2 (cg-RX-API-DMAC7.html) | ||
| JPH11236676A (ja) | 常圧放電プラズマ処理方法 | |
| JP4809973B2 (ja) | 半導体素子の製造方法及びその装置 | |
| JP4099264B2 (ja) | プラズマ処理によるフィルムシートの表面改質装置 | |
| JP4023775B2 (ja) | ダイヤモンドライクカーボン膜の製膜装置 | |
| JP2014122419A (ja) | プラズマｃｖｄ装置 | |
| JP2957068B2 (ja) | 基板の表面処理方法 | |
| JP3079838B2 (ja) | プラズマｃｖｄ法およびプラズマｃｖｄ装置 | |
| JPH01225642A (ja) | 低温プラズマの均一化方法 | |
| JPH0680807A (ja) | ウエブの連続表面処理方法 | |
| JP3310875B2 (ja) | プラズマｃｖｄ装置 | |
| JPS60123033A (ja) | プラズマ処理装置 | |
| JPH0578933B2 (cg-RX-API-DMAC7.html) | ||
| CA2264371C (en) | Thin film deposition method | |
| RU2016157C1 (ru) | Способ обработки волокнистого материала и устройство для обработки волокнистого материала | |
| JP2002151436A (ja) | 半導体素子の製造方法及びその装置 | |
| JPH029442A (ja) | プラズマ処理装置 | |
| JPH01283362A (ja) | プラズマ処理装置 | |
| JPS5911337A (ja) | シ−ト状物質の低温プラズマ処理方法 |