JPS6326195B2 - - Google Patents
Info
- Publication number
- JPS6326195B2 JPS6326195B2 JP59252205A JP25220584A JPS6326195B2 JP S6326195 B2 JPS6326195 B2 JP S6326195B2 JP 59252205 A JP59252205 A JP 59252205A JP 25220584 A JP25220584 A JP 25220584A JP S6326195 B2 JPS6326195 B2 JP S6326195B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- vacuum chamber
- accelerating
- film
- potential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 59
- 238000007664 blowing Methods 0.000 claims description 54
- 238000002347 injection Methods 0.000 claims description 43
- 239000007924 injection Substances 0.000 claims description 43
- 230000001133 acceleration Effects 0.000 claims description 18
- 230000002265 prevention Effects 0.000 claims description 5
- 239000000696 magnetic material Substances 0.000 claims description 4
- 238000005507 spraying Methods 0.000 claims description 4
- 239000004020 conductor Substances 0.000 claims 1
- 230000008878 coupling Effects 0.000 claims 1
- 238000010168 coupling process Methods 0.000 claims 1
- 238000005859 coupling reaction Methods 0.000 claims 1
- 230000001939 inductive effect Effects 0.000 claims 1
- 210000002381 plasma Anatomy 0.000 description 182
- 239000010408 film Substances 0.000 description 87
- 150000002500 ions Chemical class 0.000 description 29
- 230000015572 biosynthetic process Effects 0.000 description 20
- 239000007789 gas Substances 0.000 description 17
- 238000006243 chemical reaction Methods 0.000 description 13
- 239000000178 monomer Substances 0.000 description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 11
- 229910052799 carbon Inorganic materials 0.000 description 11
- 239000012159 carrier gas Substances 0.000 description 11
- 230000000694 effects Effects 0.000 description 11
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 6
- 238000011109 contamination Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 238000009616 inductively coupled plasma Methods 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 229910021385 hard carbon Inorganic materials 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25220584A JPS61130487A (ja) | 1984-11-29 | 1984-11-29 | プラズマ・インジエクシヨン・ｃｖｄ装置 |
| EP19850115085 EP0183254B1 (en) | 1984-11-29 | 1985-11-28 | Plasma CVD apparatus and method for forming a diamond-like carbon film |
| DE19853587881 DE3587881T2 (de) | 1984-11-29 | 1985-11-28 | Verfahren zur plasma-chemischen Abscheidung aus der Dampfphase und Verfahren zur Herstellung eines Films von diamantähnlichem Kohlenstoff. |
| US06/803,001 US4645977A (en) | 1984-08-31 | 1985-11-29 | Plasma CVD apparatus and method for forming a diamond like carbon film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25220584A JPS61130487A (ja) | 1984-11-29 | 1984-11-29 | プラズマ・インジエクシヨン・ｃｖｄ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61130487A JPS61130487A (ja) | 1986-06-18 |
| JPS6326195B2 true JPS6326195B2 (ko) | 1988-05-28 |
Family
ID=17233960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25220584A Granted JPS61130487A (ja) | 1984-08-31 | 1984-11-29 | プラズマ・インジエクシヨン・ｃｖｄ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61130487A (ko) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61238962A (ja) * | 1985-04-16 | 1986-10-24 | Matsushita Electric Ind Co Ltd | 膜形成装置 |
| DE102013217371A1 (de) | 2013-08-30 | 2015-03-05 | Robert Bosch Gmbh | Kraftstoffinjektor |
| CN112899662A (zh) * | 2019-12-04 | 2021-06-04 | 江苏菲沃泰纳米科技股份有限公司 | Dlc制备装置和制备方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5483376A (en) * | 1977-12-16 | 1979-07-03 | Fujitsu Ltd | Plasma treatment equipment |
| JPS59200753A (ja) * | 1983-04-30 | 1984-11-14 | Mitsubishi Electric Corp | 薄膜形成装置 |
| JPS59205471A (ja) * | 1983-05-02 | 1984-11-21 | Kowa Eng Kk | 被処理物品の表面に黒色被膜を形成する方法 |
-
1984
- 1984-11-29 JP JP25220584A patent/JPS61130487A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5483376A (en) * | 1977-12-16 | 1979-07-03 | Fujitsu Ltd | Plasma treatment equipment |
| JPS59200753A (ja) * | 1983-04-30 | 1984-11-14 | Mitsubishi Electric Corp | 薄膜形成装置 |
| JPS59205471A (ja) * | 1983-05-02 | 1984-11-21 | Kowa Eng Kk | 被処理物品の表面に黒色被膜を形成する方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61130487A (ja) | 1986-06-18 |
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