JPS6325931B2 - - Google Patents

Info

Publication number
JPS6325931B2
JPS6325931B2 JP18952181A JP18952181A JPS6325931B2 JP S6325931 B2 JPS6325931 B2 JP S6325931B2 JP 18952181 A JP18952181 A JP 18952181A JP 18952181 A JP18952181 A JP 18952181A JP S6325931 B2 JPS6325931 B2 JP S6325931B2
Authority
JP
Japan
Prior art keywords
film
polyimide
glass substrate
soft
polyimide resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18952181A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5891446A (ja
Inventor
Yukio Iimura
Tomihiro Nakada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP56189521A priority Critical patent/JPS5891446A/ja
Publication of JPS5891446A publication Critical patent/JPS5891446A/ja
Publication of JPS6325931B2 publication Critical patent/JPS6325931B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Moulding By Coating Moulds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP56189521A 1981-11-26 1981-11-26 軟ｘ線リソグラフイ−用フイルムの製造法 Granted JPS5891446A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56189521A JPS5891446A (ja) 1981-11-26 1981-11-26 軟ｘ線リソグラフイ−用フイルムの製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56189521A JPS5891446A (ja) 1981-11-26 1981-11-26 軟ｘ線リソグラフイ−用フイルムの製造法

Publications (2)

Publication Number Publication Date
JPS5891446A JPS5891446A (ja) 1983-05-31
JPS6325931B2 true JPS6325931B2 (enExample) 1988-05-27

Family

ID=16242673

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56189521A Granted JPS5891446A (ja) 1981-11-26 1981-11-26 軟ｘ線リソグラフイ−用フイルムの製造法

Country Status (1)

Country Link
JP (1) JPS5891446A (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022024820A1 (ja) 2020-07-29 2022-02-03 東洋紡株式会社 フレキシブル電子デバイスの製造方法

Also Published As

Publication number Publication date
JPS5891446A (ja) 1983-05-31

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